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31. 发明公开

EP2795657A1 VORRICHTUNG ZUM ERZEUGEN EINES HOHLKATHODENBOGENENTLADUNGSPLASMAS 有权
标题翻译：器具，用于产生空心阴极电弧放电等离子体
公开(公告)号：EP2795657A1
公开(公告)日：2014-10-29
申请号：EP12775662.5
申请日：2012-10-17
申请人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
发明人： MORGNER, Henry , MATTAUSCH, Gösta , METZNER, Christoph , JUNGHÄHNEL, Michael , LABITZKE, Rainer , KLOSE, Lars , WERNER, Lars , KUBUSCH, Jörg
IPC分类号： H01J37/32
CPC分类号： H01J37/32568 , H01J37/32055 , H01J37/32064 , H01J37/32596 , H01J37/32669 , H01J37/32807 , H01J2237/0822 , H01J2237/152 , H01J2237/327 , H05H1/48
摘要： The invention relates to a device for generating a hollow cathode arc discharge plasma, consisting of two plasma sources (11; 12), each comprising a hollow cathode (13; 14) and an electrode (15; 16) that is associated with the hollow cathode (13; 14) and has an opening extending through the electrode (15; 16), wherein the hollow cathodes (13; 14) of the two plasma sources (11; 12) are connected to a pulse generator (17) that generates a bipolar, medium frequency pulsed voltage between the two hollow cathodes (13; 14). In both plasma sources (11; 12), the hollow cathode (13; 14) is connected in an electrically conductive manner to the associated electrode (15; 16), either directly or with the intercalation of at least one component (38; 39) that delimits the current direction.

32. 发明公开

EP1803140A2 DEVICE AND METHOD FOR MILLING OF MATERIAL USING IONS 有权
标题翻译：设备和方法加工材使用ION
公开(公告)号：EP1803140A2
公开(公告)日：2007-07-04
申请号：EP05776553.9
申请日：2005-07-27
申请人： E.A. Fischione Instruments Inc.
发明人： FISCHIONE, Paul E. , SMITH, David W. , SCHEINFEIN, Michael R. , MATESA, Joseph M. , SWIHART, Thomas C. , MARTIN, David
IPC分类号： H01J37/08
CPC分类号： H01J37/3002 , H01J37/08 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/305 , H01J2237/0822 , H01J2237/30477 , H01J2237/3174 , H01J2237/31745
摘要： A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

33. 发明公开

EP1259974A1 THROUGH-THE-LENS COLLECTION OF SECONDARY PARTICLES FOR A FOCUSED ION BEAM SYSTEM 审中-公开
标题翻译：后代通过镜头镜头聚焦离子束设备获取
公开(公告)号：EP1259974A1
公开(公告)日：2002-11-27
申请号：EP01910553.5
申请日：2001-02-08
申请人： FEI COMPANY
发明人： GERLACH, Robert, L. , UTLAUT, Mark, W.
IPC分类号： H01J37/08 , H01J37/26 , B01D59/44
CPC分类号： H01J37/08 , H01J37/3056 , H01J2237/0822 , H01J2237/0825 , H01J2237/244
摘要： Secondary particles (418) are collected along the optical axis of a focused ion beam system (508) thereby eliminating the need for side-mounted detectors that make close packing of multiple columns difficult and that require the final lens to be spaced further away from the target (510). Secondary particles can be collected through the lens and then diverted away from the optical axis of the ion column for detection without significantly degrading the resolution of the focused ion beam (420). Secondary particles can also be collected using a conductive plate connected to an amplifier to detect the electrical current caused by the secondary particles.

34. 发明申请

WO2016022427A2 GCIB NOZZLE ASSEMBLY 审中-公开
标题翻译： GCIB喷嘴组件
公开(公告)号：WO2016022427A2
公开(公告)日：2016-02-11
申请号：PCT/US2015043203
申请日：2015-07-31
申请人： TEL EPION INC
发明人： GWINN MATTHEW C , FREYTSIS AVRUM , BECKER ROBERT K
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/08 , H01J37/305 , H01J2237/006 , H01J2237/0206 , H01J2237/061 , H01J2237/0812 , H01J2237/0822 , H01J2237/3151
摘要： A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.
摘要翻译：描述了用于执行各种材料的气体簇离子束（GCIB）蚀刻处理的喷嘴组件。特别地，喷嘴组件包括两个或更多个对齐的锥形喷嘴，使得它们都用于产生相同的GCIB。第一锥形喷嘴可以包括最初形成GCIB的喉部，并且第二喷嘴可以形成可以附加到第一锥形喷嘴的较大的锥形腔。过渡区域可以设置在两个圆锥形喷嘴之间，所述两个圆锥形喷嘴可以基本上圆柱形并且略大于第一锥形喷嘴的最大直径。

35. 发明申请

WO2016018771A1 ION BEAM SAMPLE PREPARATION AND COATING APPARATUS AND METHODS 审中-公开
标题翻译：离子束样品制备和涂层装置和方法
公开(公告)号：WO2016018771A1
公开(公告)日：2016-02-04
申请号：PCT/US2015/042149
申请日：2015-07-25
申请人： HUNT, John Andrew , COYLE, Steven Thomas , HASSEL-SHEARER, Michael Patrick , HOSMAN, Thijs C.
发明人： HUNT, John Andrew , COYLE, Steven Thomas , HASSEL-SHEARER, Michael Patrick , HOSMAN, Thijs C.
IPC分类号： H01J27/00
CPC分类号： C23C14/46 , C23C14/022 , C23C14/50 , C23C14/505 , C23C14/545 , C23C14/566 , H01J37/3053 , H01J37/3178 , H01J2237/0822 , H01J2237/184 , H01J2237/202 , H01J2237/204 , H01J2237/3146 , H01J2237/3151
摘要： Ion beam sample preparation and coating apparatus and methods are described. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
摘要翻译：描述了离子束样品制备和涂布装置和方法。可以在一个或多个离子束中制备样品，然后在相同的装置内将涂层溅射到制备的样品上。真空转移装置可以与该装置一起使用，以便在受控环境中将样品转入和移出装置。公开了改善制备和涂布均匀性的各种方法，包括：旋转样品保留阶段; 调节样品保留期; 可变倾斜离子束照射装置，多于一个离子束照射装置，涂层厚度监测，样品的选择性屏蔽以及调节涂层供体保持器。

36. 发明申请

WO2006014986A2 DEVICE AND METHOD FOR MILLING OF MATERIAL USING IONS 审中-公开
标题翻译：使用离子切割材料的装置和方法
公开(公告)号：WO2006014986A2
公开(公告)日：2006-02-09
申请号：PCT/US2005/026542
申请日：2005-07-27
申请人： E.A. FISCHIONE INSTRUMENTS, INC.
发明人： FISCHIONE, Paul, E. , SMITH, David, W. , SCHEINFEIN, Michael, R. , MATESA, Joseph, M. , SWIHART, Thomas, C. , MARTIN, David
IPC分类号： H01J37/08
CPC分类号： H01J37/3002 , H01J37/08 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/305 , H01J2237/0822 , H01J2237/30477 , H01J2237/3174 , H01J2237/31745
摘要： A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.
摘要翻译：公开了用于通过使用离子轰击制备显微镜试样或其它表面科学应用的研磨装置。该设备提供了通过使用高能量和低能量离子源来利用样品表面的粗略和细微改性的能力。由离子源产生的冲击波束内的样本位置的精确控制提供了使样本相对于其倾斜和旋转的能力。位置控制还允许在程序化控制下和在一致的真空条件下在各种来源之间移动试样。还提供了一种装载锁定机构，以允许将样品引入装置中而不会损失真空，并且能够在这种加载和卸载操作期间将样品返回到环境温度。可以在所有活动期间观察和成像样本。

37. 发明申请

WO2006014986A3 DEVICE AND METHOD FOR MILLING OF MATERIAL USING IONS 审中-公开
标题翻译：使用离子铣削材料的装置和方法
公开(公告)号：WO2006014986A3
公开(公告)日：2006-04-20
申请号：PCT/US2005026542
申请日：2005-07-27
申请人： E A FISCHIONE INSTR INC
发明人： FISCHIONE PAUL E , SMITH DAVID W , SCHEINFEIN MICHAEL R , MATESA JOSEPH M , SWIHART THOMAS C , MARTIN DAVID
IPC分类号： H01J37/08
CPC分类号： H01J37/3002 , H01J37/08 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/305 , H01J2237/0822 , H01J2237/30477 , H01J2237/3174 , H01J2237/31745
摘要： A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.
摘要翻译：公开了一种通过使用离子轰击来制备显微镜样品或其他表面科学应用的研磨装置。该设备能够通过使用高能和低能离子源来利用样品表面的粗略和精细修饰。精确控制由离子源产生的冲击射束内样本的位置提供了相对于其倾斜和旋转样本的能力。定位控制还允许在程序控制下和一致的真空条件下在不同来源之间移动样本。还提供负载锁定机构，以允许在不损失真空的情况下将样本引入到装置中，并且能够在这种装载和卸载操作期间将样本返回到环境温度。在运行的所有活动阶段期间可以观察和成像标本。

38. 发明申请

WO01059805A1 MULTI-COLUMN FIB FOR NANOFABRICATION APPLICATIONS 审中-公开
标题翻译：用于纳米应用的多列FIB
公开(公告)号：WO01059805A1
公开(公告)日：2001-08-16
申请号：PCT/EP2001/001278
申请日：2001-02-07
IPC分类号： C23C14/32 , H01J27/26 , H01J37/08 , H01J37/244 , H01J37/305 , H01J37/317
CPC分类号： H01J37/08 , H01J37/3056 , H01J2237/0822
摘要： A multi-gun FIB system for nanofabrication provides increased throughput at reduced cost while maintaining resolution. Multiple guns are maintained in modular gun chambers that can be vacuum isolated from the primary vacuum chamber containing the targets. A system can include multiple gun chambers, each of which can include multiple guns, with each gun chamber being capable of being vacuum isolated, so that each gun chamber can be removed and replaced without disturbing the vacuum in other gun chambers or in the main chamber. An optical column is associated with each gun. Optical elements for multiple columns can be formed in a bar that extends into several columns. Some of the optical elements are positioned in the gun chambers and others are positioned in the primary vacuum chamber. A through-the-lens secondary particle collection can be used in connection with each of the individual columns.
摘要翻译：用于纳米制造的多枪FIB系统在降低成本的同时提供增加的吞吐量，同时保持分辨率。多个枪保持在模块化枪室中，其可以与包含靶的初级真空室真空隔离。系统可以包括多个枪室，每个枪室可以包括多个枪，每个枪室能够被真空隔离，使得每个枪室可被移除和更换，而不会干扰其他枪室或主腔中的真空。光学柱与每个喷枪相关联。用于多列的光学元件可以形成在延伸到几列中的条中。一些光学元件位于枪室中，而其它光学元件位于初级真空室中。透镜二次粒子收集可以与每个单独的列结合使用。

39. 发明申请

WO99059384A1 PROCESSING SYSTEM WITH DUAL ION SOURCES 审中-公开
标题翻译：具有双离子源的加工系统
公开(公告)号：WO99059384A1
公开(公告)日：1999-11-18
申请号：PCT/US1999/010164
申请日：1999-05-07
IPC分类号： H05H1/46 , B05C21/00 , C23C16/26 , C23C16/27 , C23C16/44 , C23C16/50 , C23C16/513 , G11B5/84 , H01J37/317 , H05H1/00 , B05C5/00 , C23C16/00
CPC分类号： C23C16/513 , C23C16/26 , H01J37/3178 , H01J2237/08 , H01J2237/0822 , H01J2237/3142
摘要： A substrate processing system includes a processing chamber (10), a substrate holder (12) positioned in the chamber, a gas source (54) for supplying a process gas to the chamber, first and second ion sources (20, 22) located in the chamber, and a power source (50) for energizing the first and second ion sources. Each ion source ionizes the process gas to produce ions for processing a substrate disposed on the substrate holder. The first and second ion sources include first and second anodes (30, 40), respectively. The power source energizes the first and second anodes in a time multiplexed manner, such that only one of the first and second ion sources is energized at any time and interactions between ion sources are eliminated.
摘要翻译：基板处理系统包括处理室（10），位于所述室中的基板保持器（12），用于向所述室供应处理气体的气体源（54），位于所述室中的第一和第二离子源（20,22）所述室以及用于激励所述第一和第二离子源的电源（50）。每个离子源使工艺气体离子化以产生用于处理设置在衬底保持器上的衬底的离子。第一和第二离子源分别包括第一和第二阳极（30,40）。电源以时间复用的方式激励第一和第二阳极，使得第一和第二离子源中的仅一个在任何时间被激励，并且消除了离子源之间的相互作用。

40. 发明申请

US20180308658A1 Ion Beam Apparatus 审中-公开
公开(公告)号：US20180308658A1
公开(公告)日：2018-10-25
申请号：US15935409
申请日：2018-03-26
申请人： Hitachi High-Tech Science Corporation
发明人： Shinichi MATSUBARA , Yoshimi KAWANAMI , Hiroyasu SHICHI
IPC分类号： H01J37/08 , H01J37/28 , H01J37/153 , H01J37/10 , H01J37/147 , H01J37/22
CPC分类号： H01J37/08 , H01J37/10 , H01J37/147 , H01J37/153 , H01J37/222 , H01J37/28 , H01J2237/0807 , H01J2237/0822 , H01J2237/1532
摘要： According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.

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