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    • 33. 发明申请
    • PRODUCTION OF CARBOXYLIC ACID FLUORIDES
    • 生产碳素酰基氟
    • WO1998024750A1
    • 1998-06-11
    • PCT/EP1997006647
    • 1997-11-28
    • SOLVAY FLUOR UND DERIVATE GMBHBRAUN, MaxEICHHOLZ, KerstinRUDOLPH, Werner
    • SOLVAY FLUOR UND DERIVATE GMBH
    • C07C51/58
    • C07C51/60B01J19/02B01J19/123B01J2219/00078B01J2219/0245B01J2219/0254B01J2219/0875C07C51/58C07C53/50C07C53/48C07C53/46
    • The invention relates to a method for the production of carboxylic acid fluorides of the formula RCFXC(O)F, wherein X designates F or Cl. Compounds of the formula RCFXCHFCl are reacted with oxygen by photochemical oxidation in the gaseous phase. This yields good quantities of highly selective carboxylic acid fluorides. It is preferable to work under sensitization with chlorine and light at a wavelength of lambda >/=280 nm. This makes it possible to work without the use of pressure. Glass apparatus may be covered with a protective coating so as to protect it against traces of hydrogen fluoride. To this end, for example, heat-shrinkable sleeves made of translucent hydrogen fluoride-resistant material may be used. Polytetrafluoroethylene, polyfluoropropylene or a mixture thereof are especially suitable for this purpose. This type of protection is also suited for other reactions, such as photo-induced fluoro-dediazonation in hydrogen fluoride/pyridine for the production of aromatic compounds fluorinated in the nucleus or the oxidation of CHCL2 groups for the production of carboxylic acid fluorides.
    • 公开的是用于制备式RCFXC(O)F,其中X是F或Cl的羧酸氟化物的方法。 反应与氧气式RCFXCHFCl的化合物转化成在气相中的光化学氧化。 形成以良好的收率和高选择性的羧酸氟化物。 优选在敏化进行与波长为λ的氯和光> / = 280纳米。这是可能的,而不的工作压力。 玻璃装置可被提供用于防止RF迹线以保护涂层。 对于这一个就可以了,例如, 热收缩使用耐HF,半透明材料制成。 作为该材料聚四氟乙烯,Polyfluorpropylen或它们的混合物是特别合适的。 这种保护也适用于其它反应,例如,光诱导氟dediazoniation在氟化氢/吡啶生产核氟化的芳族化合物的或CHCl 2的基团为羧酸氯化物的制剂的目的氧化的目的。