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    • 31. 发明授权
    • Magnetic random access memory with field compensating layer and multi-level cell
    • 具有场补偿层和多级单元的磁随机存取存储器
    • US08565010B2
    • 2013-10-22
    • US13099321
    • 2011-05-02
    • Yuchen ZhouYiming HuaiRajiv Yadav RanjanJing Zhang
    • Yuchen ZhouYiming HuaiRajiv Yadav RanjanJing Zhang
    • G11C11/15
    • G11C11/16G11C11/161H01L43/02
    • A spin toque transfer magnetic random access memory (STTMRAM) element comprises a reference layer formed on a substrate, with a fixed perpendicular magnetic component. A junction layer is formed on top of the reference layer and a free layer is formed on top of the junction layer with a perpendicular magnetic orientation, at substantially its center of the free layer and switchable. A spacer layer is formed on top of the free layer and a fixed layer is formed on top of the spacer layer, the fixed layer has a fixed perpendicular magnetic component opposite to that of the reference layer. The magnetic orientation of the free layer switches relative to that of the fixed layer. The perpendicular magnetic components of the fixed layer and the reference layer substantially cancel each other and the free layer has an in-plane edge magnetization field.
    • 自旋转矩磁性随机存取存储器(STTMRAM)元件包括形成在基板上的参考层,具有固定的垂直磁性分量。 接合层形成在参考层的顶部,并且在接合层的顶部上以自由层的大致中心位置处具有垂直磁性取向形成自由层。 间隔层形成在自由层的顶部,固定层形成在间隔层的顶部,固定层具有与基准层相反的固定的垂直磁性部件。 自由层的磁性取向相对于固定层的磁性取向。 固定层和参考层的垂直磁性分量基本相互抵消,自由层具有面内边缘磁化场。
    • 34. 发明授权
    • Perpendicular magnetic recording write head with milling defined track width
    • 垂直磁记录写头具有铣削定义的轨道宽度
    • US08477453B2
    • 2013-07-02
    • US12799927
    • 2010-05-05
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • G11B5/31
    • G11B5/1278G11B5/3116G11B5/314G11B5/315G11B5/3163G11B2005/0024
    • A main pole layer having at least a leading taper and trimmed pole tip portion is described. The leading taper increases head field up to ≧15000 Oe even for narrow track widths approaching 50 nm. For MAMR applications, a STO and trailing shield are sequentially formed on a trailing pole tip side. Furthermore, full side shields may be added to reduce fringing field. Another embodiment involves including both of a leading taper and trailing taper at the pole tip where leading taper angle is between 20° and 60° and trailing taper angle is from 10° to 45°. A method is provided for forming various embodiments of the present invention. A key feature is that milling depth at an effective neck height distance is greater than or equal to the pole tip thickness. A self aligned STO may be formed by the same ion milling step that defines track width.
    • 描述了至少具有前导锥形和微调极尖部分的主极层。 即使对于接近50nm的窄轨道宽度,领先的锥形也增加了头部场>达15000 Oe。 对于MAMR应用,STO和后屏蔽依次形成在尾极端侧。 此外,可以添加全侧屏蔽以减少边缘场。 另一实施例涉及在极尖处包括前导锥形和后锥形两者,其中前锥度角在20°至60°之间,后锥角度为10°至45°。 提供了一种用于形成本发明的各种实施例的方法。 一个关键特征是在有效颈部高度距离处的铣削深度大于或等于极尖厚度。 可以通过定义轨道宽度的相同离子铣削步骤形成自对准STO。
    • 35. 发明申请
    • INITIALIZATION METHOD OF A PERPENDICULAR MAGNETIC RANDOM ACCESS MEMORY (MRAM) DEVICE WITH A STABLE REFERENCE CELL
    • 具有稳定参考电压的全息磁性随机存取存储器(MRAM)器件的初始化方法
    • US20130021842A1
    • 2013-01-24
    • US13360553
    • 2012-01-27
    • Yuchen ZhouYiming Huai
    • Yuchen ZhouYiming Huai
    • G11C11/16
    • G11C11/16G11C11/161G11C11/5607Y10S977/933Y10S977/935
    • A method of initializing a magnetic random access memory (MRAM) element that is configured to store a state when electric current flows therethrough is disclosed. The MRAM element includes a first magnetic tunnel junction (MTJ) for storing a data bit and a second MTJ for storing a reference bit. Each MTJ further includes a magnetic reference layer (RL) having a magnetization with a direction that is perpendicular to the film plane, and a magnetic pinned layer (PL) having a magnetization with a direction that is perpendicular to the film plane. The direction of magnetization of the RL and the PL are anti-parallel relative to each other in the first MTJ. The direction of magnetization of the FL, the RL and the PL are parallel relative to each other in the second MTJ for storing reference bit.
    • 公开了一种初始化磁性随机存取存储器(MRAM)元件的方法,该磁性随机存取存储器被配置为在电流流经时存储状态。 MRAM元件包括用于存储数据位的第一磁性隧道结(MTJ)和用于存储参考位的第二MTJ。 每个MTJ还包括具有垂直于膜平面的方向的磁化的磁参考层(RL)和具有与膜平面垂直的方向的磁化的磁性固定层(PL)。 在第一MTJ中,RL和PL的磁化方向相对于彼此是反平行的。 在第二MTJ中,FL,RL和PL的磁化方向相对于彼此平行,用于存储参考位。
    • 36. 发明申请
    • PERPENDICULAR MAGNETIC RANDOM ACCESS MEMORY (MRAM) DEVICE WITH A STABLE REFERENCE CELL
    • 具有稳定参考电压的全频磁性随机存取存储器(MRAM)器件
    • US20130021841A1
    • 2013-01-24
    • US13360524
    • 2012-01-27
    • Yuchen ZhouYiming Huai
    • Yuchen ZhouYiming Huai
    • G11C11/16
    • G11C11/16G11C11/161G11C11/5607Y10S977/933Y10S977/935
    • A magnetic random access memory (MRAM) element is configured to store a state when electric current flows and includes a first magnetic tunnel junction (MTJ) for storing a data bit and a second MTJ for storing a reference bit. The direction of magnetization of the FL is determinative of the data bit stored in the at least one MTJ. Further, the MTJ includes a magnetic reference layer (RL) having a magnetization with a direction that is perpendicular to the film plane, and a magnetic pinned layer (PL) having a magnetization with a direction that is perpendicular to the film plane. The direction of magnetization of the RL and the PL are anti-parallel relative to each other in the first MTJ. The direction of magnetization of the FL, the RL and the PL are parallel relative to each other in the second MTJ.
    • 磁性随机存取存储器(MRAM)元件被配置为存储电流流动时的状态,并且包括用于存储数据位的第一磁性隧道结(MTJ)和用于存储参考位的第二MTJ。 FL的磁化方向决定了存储在至少一个MTJ中的数据位。 此外,MTJ包括具有与膜平面垂直的方向的磁化的磁性参考层(RL)和具有与膜平面垂直的方向具有磁化的磁性固定层(PL)。 在第一MTJ中,RL和PL的磁化方向相对于彼此是反平行的。 FL,RL和PL的磁化方向在第二MTJ中相对于彼此平行。
    • 37. 发明申请
    • MAGNETIC RANDOM ACCESS MEMORY (MRAM) WITH ENHANCED MAGNETIC STIFFNESS AND METHOD OF MAKING SAME
    • 具有增强磁力的MAGNETIC RANDOM ACCESS MEMORY(MRAM)及其制造方法
    • US20120295370A1
    • 2012-11-22
    • US13238972
    • 2011-09-21
    • Yuchen ZhouYiming Huai
    • Yuchen ZhouYiming Huai
    • H01L21/02
    • G11C11/161H01L43/12
    • A STTMRAM element has a free sub-layer with enhanced internal stiffness. A first free sub-layer is made partially of boron (B), annealing is performed of the STTMRAM element at a first temperature to reduce the B content at an interface between the first free sub-layer and the barrier layer, the annealing causing a second free sub-layer to be formed on top of the first free sub-layer and being made partially of B, with an amount greater than the amount of B in the first free sub-layer. The STTMRAM element is cooled to a second temperature that is lower than the first temperature and a third free sub-layer is deposited directly on top of the second free layer, with the third free sub-layer being made partially of boron B. The amount of B in the third sub-free layer is less than the amount of B in the second free sub-layer.
    • STTMRAM元件具有增强的内部刚度的自由子层。 第一自由子层部分地由硼(B)制成,在第一温度下对STTMRAM元件进行退火以降低第一自由子层与阻挡层之间的界面处的B含量,退火引起 第二自由子层形成在第一自由子层的顶部上并且部分地由B制成,其量大于第一自由子层中的B的量。 STTMRAM元件被冷却到低于第一温度的第二温度,第三自由子层直接沉积在第二自由层的顶部上,第三自由子层部分由硼B构成。量 在第三自由层中的B的含量小于第二自由子层中的B的量。