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31. 发明授权

US5433788A Apparatus for plasma treatment using electron cyclotron resonance 失效
标题翻译：使用电子回旋共振等离子体处理的装置
公开(公告)号：US5433788A
公开(公告)日：1995-07-18
申请号：US131519
申请日：1993-10-04
申请人： Yasuhiro Mochizuki , Naohiro Momma , Shigeru Takahashi , Takuya Fukuda , Noboru Suzuki , Tadasi Sonobe , Kiyoshi Chiba , Kazuo Suzuki
发明人： Yasuhiro Mochizuki , Naohiro Momma , Shigeru Takahashi , Takuya Fukuda , Noboru Suzuki , Tadasi Sonobe , Kiyoshi Chiba , Kazuo Suzuki
IPC分类号： C23C16/511 , H01J37/32 , H05H1/46 , C23C16/50
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32678 , H05H1/46
摘要： A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.
摘要翻译：用于在真空容器中的基板上形成薄膜的等离子体处理装置包括可位于真空容器内部或外部的磁场发生器和微波源。磁场强度是可控制的，使得在衬底附近限定电子回旋共振（ECR）区域。磁场发生器可以布置成等离子体和反应性气体引入口位于ECR区域的微波引入侧，衬底位于ECR区域的相对侧。或者，可以将气体引入口定位成使得反应气体被引入到ECR区域或衬底上。

32. 发明授权

US5247375A Display device, manufacturing method thereof and display panel 失效
标题翻译：显示装置及其制造方法以及显示面板
公开(公告)号：US5247375A
公开(公告)日：1993-09-21
申请号：US986893
申请日：1992-12-08
申请人： Yasuhiro Mochizuki , Takashi Aoyama
发明人： Yasuhiro Mochizuki , Takashi Aoyama
IPC分类号： G02F1/1362
CPC分类号： G02F1/13454
摘要： A display device such as a liquid crystal display device is provided which comprises a single substrate, a plurality of thin film semiconductor elements provided on the substrate, a plurality of display elements whose pixel display is controlled by the semiconductor elements, and electrodes for driving the display elements. The substrate includes a display zone having the thin film semiconductor elements arranged in the display elements as well as a non-display zone. The non-display zone has a display scan drive circuit area and a display signal drive circuit area. The thin film semiconductor elements are formed in the both zones. A distance between the display signal drive circuit area and the semiconductor elements of the display zone on the substrate is physically arranged so as be larger than a distance between the display scan drive circuit area and the semiconductor elements of the display zone. In the display device, the multiplicity of semiconductor elements are formed on a glass substrate having one side of several or more inches so that minimum processing dimensions of the semiconductor elements in the display zone are smaller than those in the non-display zone.
摘要翻译：提供了诸如液晶显示装置的显示装置，其包括单个基板，设置在基板上的多个薄膜半导体元件，其像素显示由半导体元件控制的多个显示元件和用于驱动显示元素。衬底包括具有布置在显示元件中的薄膜半导体元件以及非显示区的显示区。非显示区域具有显示扫描驱动电路区域和显示信号驱动电路区域。薄膜半导体元件形成在两个区域中。显示信号驱动电路区域和衬底上的显示区域的半导体元件之间的距离物理地布置成大于显示扫描驱动电路区域和显示区域的半导体元件之间的距离。在显示装置中，多个半导体元件形成在具有几个或更多英寸的一侧的玻璃基板上，使得显示区域中的半导体元件的最小处理尺寸小于非显示区域中的半导体元件的最小处理尺寸。

33. 发明授权

US4876983A Plasma operation apparatus 失效
标题翻译：等离子体操作装置
公开(公告)号：US4876983A
公开(公告)日：1989-10-31
申请号：US145371
申请日：1988-01-19
申请人： Takuya Fukuda , Yasuhiro Mochizuki , Naohiro Momma , Shigeru Takahashi , Noboru Suzuki , Tadasi Sonobe , Kiyosi Chiba , Kazuo Suzuki
发明人： Takuya Fukuda , Yasuhiro Mochizuki , Naohiro Momma , Shigeru Takahashi , Noboru Suzuki , Tadasi Sonobe , Kiyosi Chiba , Kazuo Suzuki
IPC分类号： C23C16/511 , H01J37/32
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32678
摘要： A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.

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