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    • 32. 发明申请
    • SYSTEM AND METHOD FOR MULTI-EXPOSURE PATTERN DECOMPOSITION
    • 多曝光图案分解的系统和方法
    • US20090199137A1
    • 2009-08-06
    • US12023512
    • 2008-01-31
    • Judy HuckabayWeiping FangChung-Shin KangShiying Zhou
    • Judy HuckabayWeiping FangChung-Shin KangShiying Zhou
    • G06F17/50G03F7/20
    • G06F17/5068
    • Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.
    • 一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。 一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。 一些实施例将提取的图案与存储在库中的已知图案进行比较,库中还存储了每个已知图案的至少一个先前计算的分解解。 对于库中存在的提取模式,一些实施例从库中检索先前计算的分解解。 对于在库内不存在的提取模式,一些实施例使用一个或多个模拟来确定所提取模式的分解解。 所得到的分解解代替了设计布局中提取的图案,从而产生了原始布局的变体,该变体包含该模式的分解解。
    • 33. 发明授权
    • Distributed hierarchical partitioning framework for verifying a simulated wafer image
    • 用于验证模拟晶片图像的分布式分层框架
    • US07496884B2
    • 2009-02-24
    • US11510415
    • 2006-08-25
    • Weiping FangHuijuan ZhangYibing WangZongwu Tang
    • Weiping FangHuijuan ZhangYibing WangZongwu Tang
    • G06F17/50
    • G03F1/36G03F1/68
    • A system that verifies a simulated wafer image against an intended design. During operation, the system receives a design. Next, the system generates a skeleton from the design, wherein the skeleton specifies cell placements and associated bounding boxes for the cell placements, but does not include geometries for the cell placements. The system then computes environments for cell placements based on the skeleton. Next, the system generates templates for cell placements, wherein a template for a cell placement specifies the cell placement and the environment surrounding the cell placement. The system then generates the simulated wafer image by performing model-based simulations for cell placements associated with unique templates.
    • 根据预期设计验证模拟晶片图像的系统。 在运行过程中,系统接收到一个设计。 接下来,系统从设计生成骨架,其中骨架指定单元格展示位置的单元格展示位置和相关联的边界框,但不包括单元格展示位置的几何。 然后系统基于骨架计算单元格展示位置的环境。 接下来,系统生成单元格展示位置的模板,其中单元格展示位置的模板指定单元格展示位置和单元格展示位置周围的环境。 然后,系统通过对与唯一模板相关联的单元格展示执行基于模型的模拟来生成模拟的晶片图像。