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31. 发明申请

US20080061250A1 Ion beam monitoring in an ion implanter using an imaging device 有权
公开(公告)号：US20080061250A1
公开(公告)日：2008-03-13
申请号：US11374945
申请日：2006-03-14
申请人： Alexander S. Perel , Phil J. Ring , Ronald A. Capodilupo , Michael A. Graf
发明人： Alexander S. Perel , Phil J. Ring , Ronald A. Capodilupo , Michael A. Graf
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/221 , H01J2237/226 , H01J2237/2446 , H01J2237/24507 , H01J2237/24528 , H01J2237/24535 , H01J2237/24542 , H01J2237/24571 , H01J2237/30472 , H01J2237/30477
摘要： An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sensors that capture frames or images along a beam path of an ion beam. An image analyzer analyzes the captured frames to obtain measured characteristics. A controller determines adjustments or corrections according to the measured characteristics and desired beam characteristics.

32. 发明授权

US06479828B2 Method and system for icosaborane implantation 失效
公开(公告)号：US06479828B2
公开(公告)日：2002-11-12
申请号：US09738486
申请日：2000-12-15
申请人： Alexander S. Perel
发明人： Alexander S. Perel
IPC分类号： H01J3708
CPC分类号： H01L21/26513 , C23C14/48 , H01J37/3171 , H01L21/26566 , H01L21/2658
摘要： A method of implanting ionized icosaborane (B20HX), triantaborane (B30HX), and sarantaborane (B40HX) into a workpiece is provided, comprising the steps of (i) vaporizing and ionizing decaborane in an ion source (50) to create a plasma; (ii) extracting ionized icosaborane, triantaborane, and sarantaborane (collectively “higher order boranes”) within the plasma through a source aperture (126) to form an ion beam; (iii) mass analyzing the ion beam with a mass analysis magnet (127) to permit ionized icosaborane (B20HX+) or one of the other higher order boranes to pass therethrough; and (iv) implanting the ionized icosaborane (B20HX+) or one of the other higher order boranes into a workpiece. The step of vaporizing and ionizing the decaborane comprises the substeps of (i) vaporizing decaborane in a vaporizer (51) and (ii) ionizing the vaporized decaborane in an ionizer (53).

33. 发明授权

US06288403B1 Decaborane ionizer 有权
标题翻译： Decaborane电离器
公开(公告)号：US06288403B1
公开(公告)日：2001-09-11
申请号：US09416159
申请日：1999-10-11
申请人： Thomas N. Horsky , Alexander S. Perel , William K. Loizides
发明人： Thomas N. Horsky , Alexander S. Perel , William K. Loizides
IPC分类号： H01J2700
CPC分类号： H01J27/08
摘要： An ion source (50) for an ion implanter is provided, comprising a remotely located vaporizer (51) and an ionizer (53) connected to the vaporizer by a feed tube (62). The vaporizer comprises a sublimator (52) for receiving a solid source material such as decaborane and sublimating (vaporizing) the decaborane. A heating mechanism is provided for heating the sublimator, and the feed tube connecting the sublimator to the ionizer, to maintain a suitable temperature for the vaporized decaborane. The ionizer (53) comprises a body (96) having an inlet (119) for receiving the vaporized decaborane; an ionization chamber (108) in which the vaporized decaborane may be ionized by an energy-emitting element (110) to create a plasma; and an exit aperture (126) for extracting an ion beam comprised of the plasma. A cooling mechanism (100, 104) is provided for lowering the temperature of walls (128) of the ionization chamber (108) (e.g., to below 350° C.) during ionization of the vaporized decaborane to prevent dissociation of vaporized decaborane molecules into atomic boron ions. In addition, the energy-emitting element is operated at a sufficiently low power level to minimize plasma density within the ionization chamber (108) to prevent additional dissociation of the vaporized decaborane molecules by the plasma itself.
摘要翻译：提供了一种用于离子注入机的离子源（50），其包括位于远处的蒸发器（51）和通过进料管（62）连接到蒸发器的离子发生器（53）。蒸发器包括用于接收诸如十硼烷的固体源材料和升华（蒸发）十硼烷的升华器（52）。提供加热机构用于加热升华器和将升华器连接到离子发生器的进料管，以保持蒸发的十硼烷的合适温度。电离器（53）包括具有用于接收蒸发的十硼烷的入口（119）的主体（96）电离室（108），其中蒸发的十硼烷可以被能量发射元件（110）电离以产生等离子体; 以及用于提取由等离子体组成的离子束的出射孔（126）。提供冷却机构（100,104），用于在蒸发的十硼烷的电离期间降低电离室（108）的壁（128）的温度（例如，低于350℃），以防止汽化的十硼烷分子分解成原子硼离子此外，能量发射元件以足够低的功率水平操作以最小化电离室（108）内的等离子体密度，以防止蒸发的十硼烷分子由等离子体本身的附加解离。

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