专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20060159449A1 Substrate processing apparatus 审中-公开
标题翻译：基板加工装置
公开(公告)号：US20060159449A1
公开(公告)日：2006-07-20
申请号：US11295257
申请日：2005-12-06
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： G03D5/00
CPC分类号： H01L21/67034 , G03F7/38 , H01L21/67028 , H01L21/67051 , H01L21/67178 , H01L21/67207
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is subjected to cleaning and drying processing by the drying processing group.
摘要翻译：基板处理装置包括分度器块，防反射膜处理块，抗蚀剂膜处理块，显影处理块，干燥处理块和界面块。曝光装置设置在接口块附近。干燥处理块包括干燥处理组。接口块包括接口传送机制。基板经曝光装置进行曝光处理，随后通过界面输送机构输送到干燥处理组。通过干燥处理组对基板进行清洗和干燥处理。

32. 发明申请

US20060152693A1 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US20060152693A1
公开(公告)日：2006-07-13
申请号：US11294727
申请日：2005-12-06
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： G03B27/52
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，用于液浸曝光处理的处理块和界面块。曝光装置设置在接口块附近。用于液浸曝光处理的处理块包括用于抗蚀剂覆盖膜的涂覆处理组和抗蚀剂覆盖膜的去除处理组。在曝光处理之前，在用于液浸曝光处理的处理块中形成抗蚀剂覆盖膜。在曝光处理之后，在用于液浸曝光处理的处理块中去除抗蚀剂覆盖膜。

33. 发明授权

US07816558B2 Triarylcarboxylic acid derivative 失效
标题翻译：三芳基羧酸衍生物
公开(公告)号：US07816558B2
公开(公告)日：2010-10-19
申请号：US11910072
申请日：2006-10-06
申请人： Junji Sato , Kazuyuki Hattori , Hirokazu Kubota , Ryosuke Munakata , Toru Asano , Junko Maeda , Masakatsu Kawakami , Akio Kamikawa
发明人： Junji Sato , Kazuyuki Hattori , Hirokazu Kubota , Ryosuke Munakata , Toru Asano , Junko Maeda , Masakatsu Kawakami , Akio Kamikawa
IPC分类号： C07C63/33 , C07C321/00 , C07D277/04 , C07D333/62 , C07D231/10 , C07D211/78 , A01N43/40 , A01N43/82 , A01N43/06
CPC分类号： C07D213/79 , C07D231/14 , C07D261/18 , C07D275/03 , C07D277/56 , C07D333/38 , C07D333/60 , C07D333/76 , C07D401/10 , C07D405/10 , C07D409/10 , C07D413/10 , C07D417/10
摘要： Provided is a triarylcarboxylic acid derivative, or an isomer, a prodrug, a hydrate, a solvate, a polymorph, or a pharmaceutically acceptable salt thereof, represented by the following general formula (I): wherein A is an optionally substituted aryl or heteroaryl, and B is an optionally substituted monocyclic heteroaryl; and a pharmaceutical composition comprising the same and a pharmaceutically acceptable carrier. The triarylcarboxylic acid derivative (I) exhibits potent xanthine oxidase inhibiting action and is therefore useful as a therapeutic agent for preventing or treating hyperuricemia, gout, inflammatory bowel disease, diabetic nephropathy and diabetic retinopathy.
摘要翻译：提供由以下通式（I）表示的三芳基羧酸衍生物或其异构体，前药，水合物，溶剂合物，多晶型物或其药学上可接受的盐：其中A是任选取代的芳基或杂芳基，和B是任选取代的单环杂芳基; 以及包含其的药物组合物和药学上可接受的载体。三芳基羧酸衍生物（I）表现出有效的黄嘌呤氧化酶抑制作用，因此可用作预防或治疗高尿酸血症，痛风，炎性肠病，糖尿病性肾病和糖尿病性视网膜病变的治疗剂。

34. 发明申请

US20100190116A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20100190116A1
公开(公告)日：2010-07-29
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： G03F7/20 , B05D3/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。曝光装置被布置成与界面块相邻。接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

35. 发明申请

US20070275950A1 2-Phenylpyridine Derivative 失效
标题翻译： 2-苯基吡啶衍生物
公开(公告)号：US20070275950A1
公开(公告)日：2007-11-29
申请号：US11661284
申请日：2005-08-26
申请人： Junji Miyata , Ryo Naito , Masakatsu Kawakami , Toru Asano
发明人： Junji Miyata , Ryo Naito , Masakatsu Kawakami , Toru Asano
IPC分类号： A61K31/455 , A61K31/4545 , A61K31/55 , A61P1/00 , A61P13/12 , A61P3/10 , C07D211/06 , C07D213/04 , C07D401/08
CPC分类号： C07D213/79 , C07D401/04 , C07D401/10 , C07D401/12 , C07D405/12 , C07D409/12
摘要： The present invention relates to a novel 2-phenylpyridine derivative or a salt thereof, wherein the pyridine ring is substituted with a carboxyl group or the like and the benzene ring has an electron-withdrawing group such as a cyano group and an electron-donating group such as a substituted alkoxy group at the same time. Since the compound of the invention has good xanthine oxidase-inhibitory action and uric acid-lowering action and does not have a structure derived from nucleic acid, the compound has advantages of high safety and excellent effects as compared with conventional compounds and is useful as a therapeutic or preventive agent for hyperuricemia, gout, inflammatory bowel diseases, diabetic kidney diseases, diabetic retinopathy, or the like.
摘要翻译：本发明涉及一种新的2-苯基吡啶衍生物或其盐，其中吡啶环被羧基等取代，苯环具有吸电子基如氰基和给电子基团例如同时取代的烷氧基。由于本发明的化合物具有良好的黄嘌呤氧化酶抑制作用和尿酸降低作用，并且不具有衍生自核酸的结构，与常规化合物相比，该化合物具有安全性高，效果优异的优点，可用作高尿酸血症，痛风，炎性肠病，糖尿病性肾病，糖尿病性视网膜病变等的治疗或预防剂。

36. 发明申请

US20060147201A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20060147201A1
公开(公告)日：2006-07-06
申请号：US11294877
申请日：2005-12-06
申请人： Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Koji Kaneyama , Tsuyoshi Okumura
发明人： Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Koji Kaneyama , Tsuyoshi Okumura
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.
摘要翻译：接口传送机构在将基板传送到曝光装置期间采用上手，并且在已经从曝光装置执行的基板的传送期间使用下手。第五中央机器人在通过曝光装置进行曝光处理之后的基板传送期间使用下手，并且在从干燥处理组进行的干燥处理之后的基板的输送过程中采用上手。也就是说，上面用于输送没有附着液体的基板，并且在曝光处理之后使用下手来输送附着有液体的基板。

37. 发明申请

US20060098979A1 Substrate processing apparatus and substrate processing method 审中-公开
公开(公告)号：US20060098979A1
公开(公告)日：2006-05-11
申请号：US11273465
申请日：2005-11-10
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

38. 发明授权

US4567470A Touch sensing device 失效
标题翻译：触摸感应装置
公开(公告)号：US4567470A
公开(公告)日：1986-01-28
申请号：US488399
申请日：1983-04-25
申请人： Kazuo Yoshikawa , Hisashi Yamaguchi , Toru Asano
发明人： Kazuo Yoshikawa , Hisashi Yamaguchi , Toru Asano
IPC分类号： G06F3/044 , G06K11/06 , H03K17/96 , G06F3/02
CPC分类号： H03K17/9622 , H03K2017/9613
摘要： A touch sensing device employing a new sensing method of the present invention is composed of the sensing portion which senses capacitance change of the touch sensing electrodes forming the touch panel, plurality of capacitance compensating capacitors which are used in common for the sensing electrodes in order to compensate fluctuation of touch sensing electrodes of the touch panel, and the ROM which is storing the data for selecting the capacitance compensating capacitors. The ON-OFF output voltage levels in the touch/non-touch conditions to the touch sensing electrodes can be equalized for each electrode and thereby the touch sensing with high accuracy can be realized by selecting the capacitance compensating capacitor by means of the ROM at the time of retrieving each touch sensing electrode.
摘要翻译：采用本发明的新的感测方法的触摸感测装置由感测部分，其感测形成触摸面板的触摸感测电极的电容变化，多个电容补偿电容器共同用于感测电极，以便补偿触摸面板的触摸感测电极的波动，以及存储用于选择电容补偿电容器的数据的ROM。触摸/非触摸条件下的触摸/非触摸条件下的ON-OFF输出电压电平可以对于每个电极均衡，从而可以通过在ROM中的ROM选择电容补偿电容器来实现高精度的触摸感测检索每个触摸感测电极的时间。

39. 发明授权

US08496761B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08496761B2
公开(公告)日：2013-07-30
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： B08B3/00 , H01L21/31 , G03F7/00 , G03F1/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。曝光装置被布置成与界面块相邻。接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

40. 发明授权

US08034190B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08034190B2
公开(公告)日：2011-10-11
申请号：US12719788
申请日：2010-03-08
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kasuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kasuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
IPC分类号： B08B3/00 , G03F7/00 , H01L21/00
CPC分类号： G03F7/70991 , G03F7/7075 , Y10S438/906 , Y10S438/908
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。曝光装置设置在接口块附近。接口块包括洗涤处理单元和接口传送机构。在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。洗涤基体并通过洗涤处理单元干燥。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式