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31. 发明申请

US20120320359A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120320359A1
公开(公告)日：2012-12-20
申请号：US13580118
申请日：2011-02-18
申请人： Erwin John Van Zwet , Pieter Willem Herman De Jager , Johnannes Onvlee , Erik Christiaan Fritz
发明人： Erwin John Van Zwet , Pieter Willem Herman De Jager , Johnannes Onvlee , Erik Christiaan Fritz
IPC分类号： G03B27/54
CPC分类号： G03F7/704 , G03F7/70391
摘要： A lithographic apparatus having a substrate table constructed to hold a substrate and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may include a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.
摘要翻译：一种光刻设备，具有构造成保持基板的基板台和能够在基板的目标部分上形成图案的光学柱。光学柱可以包括被配置为提供多个辐射束的可编程图案形成装置和被配置为将多个光束投影到基板上的投影系统。该设备可以设置有致动器，以相对于基板移动光学柱或其一部分。光学柱可以被布置成经由投影系统的多个透镜的相同透镜将多个光束中的至少两个投影到基板的目标部分上。

32. 发明授权

US08194242B2 Substrate distortion measurement 有权
标题翻译：基板失真测量
公开(公告)号：US08194242B2
公开(公告)日：2012-06-05
申请号：US11192400
申请日：2005-07-29
申请人： Antonius Theodorus Anna Maria Derksen , Pieter Willem Herman De Jager , Erik Marie Jose Smeets
发明人： Antonius Theodorus Anna Maria Derksen , Pieter Willem Herman De Jager , Erik Marie Jose Smeets
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/70783 , G03F7/70791
摘要： A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
摘要翻译：一种失真测量装置，包括被布置为测量衬底的失真的检测器，以及被配置为接收指示所测量的衬底的失真的失真数据并将失真数据变换为频域表示的处理器。可以将失真数据变换为正交多项式或正交多项式表示。

33. 发明授权

US07684009B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684009B2
公开(公告)日：2010-03-23
申请号：US11647426
申请日：2006-12-29
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。位移系统导致透镜阵列和基板之间的位移。颗粒检测器检测正在接近透镜阵列的基板上的颗粒。响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。因此可以避免对透镜阵列的损坏。

34. 发明申请

US20080291417A1 Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control 有权
标题翻译：包括允许剂量控制的多个光路的激光束调节系统
公开(公告)号：US20080291417A1
公开(公告)日：2008-11-27
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G03B27/54 , G21K5/04
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译：一种辐射束调节系统，包括至少三个光路，其中辐射被调节。

35. 发明授权

US07342644B2 Methods and systems for lithographic beam generation 有权
标题翻译：光刻光束生成的方法和系统
公开(公告)号：US07342644B2
公开(公告)日：2008-03-11
申请号：US11023628
申请日：2004-12-29
申请人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/7005
摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
摘要翻译：光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

36. 发明授权

US07251019B2 Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging 有权
标题翻译：利用连续光束与像素网格成像相结合的平版印刷设备和器件制造方法
公开(公告)号：US07251019B2
公开(公告)日：2007-07-31
申请号：US11185024
申请日：2005-07-20
申请人： Patricius Aloysius Jacobus Tinnemans , Pieter Willem Herman De Jager
发明人： Patricius Aloysius Jacobus Tinnemans , Pieter Willem Herman De Jager
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70358 , G03F7/70275 , G03F7/70291
摘要： A continuous source of radiation, for example a lamp, is used in conjunction with pixel grid imaging. In one example, the individually controllable elements operate at a frequency of at least about 50 kHz. To compensate for any distortion of an exposed spot a point spread function is adjusted to be shorter in a scanning direction.
摘要翻译：连续的辐射源，例如灯，与像素网格成像结合使用。在一个示例中，独立可控元件以至少约50kHz的频率工作。为了补偿曝光点的任何变形，点扩散函数被调整为在扫描方向上更短。

37. 发明授权

US07218380B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07218380B2
公开(公告)日：2007-05-15
申请号：US11450384
申请日：2006-06-12
申请人： Pieter Willem Herman De Jager
发明人： Pieter Willem Herman De Jager
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70275
摘要： Provided is an apparatus including an array of individually controllable elements and a plurality of projection systems that project respective ones of patterned beams onto a substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the respective patterned beams are scanned across the substrate in a predetermined scanning direction. The projection systems are arranged in groups, such that lenses in the array of lenses of different groups direct parts of different ones of the patterned beams to different ones of the respective target areas of the substrate that are aligned in the scanning direction. The groups are spaced apart in the scanning direction, wherein each group scans the respective ones of the patterned beams across a respective area of the substrate.
摘要翻译：提供了一种装置，其包括单独可控元件的阵列和将图案化束的各个投影到衬底上的多个投影系统。位移系统引起衬底和投影系统之间的相对位移，使得各个图案化的束在预定扫描方向上跨过衬底扫描。投影系统被分组地布置，使得不同组的透镜阵列中的透镜将不同图案的光束的部分的不同部分引导到在扫描方向上对齐的基板的各个目标区域中的不同的。这些组在扫描方向上间隔开，其中每组扫描沿衬底的相应区域的各个图案化束。

38. 发明授权

US07079225B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07079225B2
公开(公告)日：2006-07-18
申请号：US10939947
申请日：2004-09-14
申请人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70058 , G03F7/70291 , G03F7/70583
摘要： Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
摘要翻译：使用折射光栅将辐射束划分成多个子光束，每个子光束被引导到独立可控元件的阵列上，由此调制，并作为点阵列投影到基板上。

39. 发明授权

US07061581B1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07061581B1
公开(公告)日：2006-06-13
申请号：US10994185
申请日：2004-11-22
申请人： Pieter Willem Herman De Jager
发明人： Pieter Willem Herman De Jager
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70275
摘要： A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.
摘要翻译：一种光刻设备，包括用于提供多个辐射束的照明系统，用于将每个光束赋予其横截面中的图案的独立可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化光束投影的投影系统到基板上。位移系统引起基板和投影系统之间的相对位移，使得突起束在预定的扫描方向上跨过基板扫描。每个投影系统包括透镜阵列，使得阵列中的每个透镜将相应光束的相应部分朝着基板上的相应目标区域引导。投影系统被组合成使得不同组的阵列中的透镜将不同光束的部分指向基板的沿扫描方向对准的不同目标区域。投影系统组在扫描方向上间隔开，并且每个组将光束引导到邻近的衬底的目标区域并且占据衬底的相应连续部分。因此，基板的不同部分被不同的投影系统组曝露，通过放置相对较低的基板位移速度和相对较小的基板位移能够实现高。

40. 发明申请

US20060109440A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20060109440A1
公开(公告)日：2006-05-25
申请号：US10994185
申请日：2004-11-22
申请人： Pieter Willem Herman De Jager
发明人： Pieter Willem Herman De Jager
IPC分类号： G03B27/42
CPC分类号： G03F7/70275
摘要： A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.
摘要翻译：一种光刻设备，包括用于提供多个辐射束的照明系统，用于将每个光束赋予其横截面中的图案的独立可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化光束投影的投影系统到基板上。位移系统引起基板和投影系统之间的相对位移，使得突起束在预定的扫描方向上跨过基板扫描。每个投影系统包括透镜阵列，使得阵列中的每个透镜将相应光束的相应部分朝着基板上的相应目标区域引导。投影系统被组合成使得不同组的阵列中的透镜将不同光束的部分指向基板的沿扫描方向对准的不同目标区域。投影系统组在扫描方向上间隔开，并且每个组将光束引导到邻近的衬底的目标区域并且占据衬底的相应连续部分。因此，基板的不同部分被不同的投影系统组曝露，通过放置相对较低的基板位移速度和相对较小的基板位移能够实现高。

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