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31. 发明申请

US20100015553A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20100015553A1
公开(公告)日：2010-01-21
申请号：US12500528
申请日：2009-07-09
申请人： Hiroaki Shimizu , Tsuyoshi Nakamura , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Akiya Kawaue
发明人： Hiroaki Shimizu , Tsuyoshi Nakamura , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Akiya Kawaue
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; R1 represents a C3 or more branched alkyl group; and each of R2 and R3 independently represents an alkyl group, wherein R2 and R3 may be mutually bonded to form a polycyclic group) and/or general formula (a0-2) (R is the same as defined above; R8 represents a divalent linking group that contains no halogen atom; and R7 represents an acid dissociable, dissolution inhibiting group), and an acid generator (B1) consisting of a compound represented by general formula (b1) (Y1 represents a C1-C4 fluorinated alkylene group which may have a substituent; X represents a C3-C30 aliphatic cyclic group which may have a substituent; and A+ represents an organic cation).
摘要翻译：一种正型抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的树脂组分（A）（R表示氢原子，C1-C5烷基或C1-C5卤代烷基; R1 表示C3或更多支链烷基; R2和R3各自独立地表示烷基，其中R2和R3可以相互键合形成多环基）和/或通式（a0-2）（R相同） R8表示不含卤原子的二价连接基团，R7表示酸解离性溶解抑制基团）和由通式（b1）表示的化合物（Y1）表示的酸产生剂（B1）可以具有取代基的C1-C4氟化亚烷基; X表示可具有取代基的C 3 -C 30脂族环基; A +表示有机阳离子。

32. 发明授权

US08846291B2 Resist composition, method of forming resist pattern, and new compound 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法和新化合物
公开(公告)号：US08846291B2
公开(公告)日：2014-09-30
申请号：US13312013
申请日：2011-12-06
申请人： Yoshiyuki Utsumi , Kenichiro Miyashita , Akiya Kawaue
发明人： Yoshiyuki Utsumi , Kenichiro Miyashita , Akiya Kawaue
IPC分类号： G03F7/004 , C07C303/32 , C07C309/07 , C07D213/79 , C07D213/80 , C07D215/48 , C07D215/50 , C07D215/54 , C07D219/04 , C07D221/10 , G03F7/039
CPC分类号： C07D213/79 , C07D213/80 , C07D215/48 , C07D215/50 , C07D215/54 , C07D219/04 , C07D221/10 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A）含有下述通式（c1）表示的化合物（C1）的含氮有机化合物成分（C）以及暴露后产生酸的酸产生剂组分（B），条件是化合物（C1）不在酸产生剂组分（B）中：其中RN表示可以具有取代基的含氮杂环基; X 0表示1〜10个碳原子的直链或支链的二价脂族烃基，3〜20个碳原子的环状二价脂族烃基或具有环状部分结构的3〜20个碳的二价脂肪族烃基，这些基团中的一部分或全部氢原子被氟原子取代; M +表示有机阳离子。

33. 发明申请

US20130089819A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND 有权
标题翻译：耐蚀组合物，形成耐蚀图案的方法，聚合物和化合物
公开(公告)号：US20130089819A1
公开(公告)日：2013-04-11
申请号：US13703865
申请日：2011-06-14
申请人： Akiya Kawaue , Kazushige Dohtani , Yoshiyuki Utsumi , Jun Iwashita , Kenri Konno , Daiju Shiono , Daichi Takaki
发明人： Akiya Kawaue , Kazushige Dohtani , Yoshiyuki Utsumi , Jun Iwashita , Kenri Konno , Daiju Shiono , Daichi Takaki
IPC分类号： G03F7/027
CPC分类号： G03F7/027 , C07C69/54 , C07C309/04 , C07C309/09 , C07C309/10 , C07C309/12 , C07C311/48 , C07C311/51 , C07C381/12 , C07C2601/14 , C07C2603/74 , C08F20/38 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111 , Y10S430/121
摘要： A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
摘要翻译：可以形成具有优异的光刻性能的非常精细的抗蚀剂图案的抗蚀剂组合物，可用于抗蚀剂组合物的新的聚合物和可用作聚合物的单体的化合物。抗蚀剂组合物含有含有下述通式（a0）表示的结构单元（a0）的高分子化合物。在式（a0）中，A是由通式（1）或（2）表示的阴离子。

34. 发明授权

US08367297B2 Resist composition, method of forming resist pattern, novel compound and acid generator 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
公开(公告)号：US08367297B2
公开(公告)日：2013-02-05
申请号：US12654066
申请日：2009-12-09
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Shinichi Hidesaka , Natsuko Maruyama
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Shinichi Hidesaka , Natsuko Maruyama
IPC分类号： G03F7/004 , G03F7/30 , C07D333/00 , C07C69/66 , C07C309/06 , C07C309/19
CPC分类号： G03F7/0045 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07C2603/74 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂（B1），其含有具有由通式（I）表示的阳离子部分的化合物（式中，R5表示氢原子或可具有取代基的1〜30个碳原子的有机基团，Q5表示单键或二价连接基团）。

35. 发明授权

US08252505B2 Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern 有权
标题翻译：化合物及其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08252505B2
公开(公告)日：2012-08-28
申请号：US12371876
申请日：2009-02-16
申请人： Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
发明人： Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
IPC分类号： G03F7/004 , C07D493/08 , C07D495/08
CPC分类号： C07D493/08 , C07D493/18 , G03F7/0045 , G03F7/0397
摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z− (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
摘要翻译：一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸 [化学式1] A + Z-（b1-2）其中A +表示有机阳离子，由式（b1-2）表示的化合物组成的发生剂（B1） Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成酯键直接键合到环结构上，另一个基团包括阴离子部分。

36. 发明申请

US20120107744A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，新型化合物和酸发生剂
公开(公告)号：US20120107744A1
公开(公告)日：2012-05-03
申请号：US13282920
申请日：2011-10-27
申请人： Yoshiyuki Utsumi , Akiya Kawaue , Yoshitaka Komuro , Kenichiro Miyashita
发明人： Yoshiyuki Utsumi , Akiya Kawaue , Yoshitaka Komuro , Kenichiro Miyashita
IPC分类号： G03F7/20 , G03F7/027 , C07D311/02 , G03F7/004
CPC分类号： G03F7/0045 , C07D307/00 , C07D327/02 , C07D327/04 , C07D493/18 , C07D497/18 , G03F7/0046 , G03F7/0397 , Y10S430/115
摘要： A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.
摘要翻译：一种抗蚀剂组合物，其含有在酸的作用下在显影液中显示出改变的溶解性的碱成分（A）和暴露时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸发生剂（B1）在阳离子部分具有下述通式（b1-1）表示的基团。

37. 发明授权

US09023581B2 Resist composition, method of forming resist pattern, polymeric compound, and compound 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，聚合物和化合物
公开(公告)号：US09023581B2
公开(公告)日：2015-05-05
申请号：US13703865
申请日：2011-06-14
申请人： Akiya Kawaue , Kazushige Dohtani , Yoshiyuki Utsumi , Jun Iwashita , Kenri Konno , Daiju Shiono , Daichi Takaki
发明人： Akiya Kawaue , Kazushige Dohtani , Yoshiyuki Utsumi , Jun Iwashita , Kenri Konno , Daiju Shiono , Daichi Takaki
IPC分类号： G03F7/004 , G03F7/30 , C07C69/54 , C08F220/38 , G03F7/027 , C07C309/04 , C07C309/09 , C07C309/10 , C07C309/12 , C07C311/48 , C07C311/51 , C07C381/12 , C08F20/38 , G03F7/039 , G03F7/20
CPC分类号： G03F7/027 , C07C69/54 , C07C309/04 , C07C309/09 , C07C309/10 , C07C309/12 , C07C311/48 , C07C311/51 , C07C381/12 , C07C2601/14 , C07C2603/74 , C08F20/38 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/111 , Y10S430/121
摘要： A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
摘要翻译：可以形成具有优异的光刻性能的非常精细的抗蚀剂图案的抗蚀剂组合物，可用于抗蚀剂组合物的新的聚合物和可用作聚合物的单体的化合物。抗蚀剂组合物含有含有下述通式（a0）表示的结构单元（a0）的高分子化合物。在式（a0）中，A是由通式（1）或（2）表示的阴离子。

38. 发明授权

US09005874B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern 有权
标题翻译：化合物，聚合物，酸发生剂，抗蚀剂组合物，以及形成抗蚀剂图案的方法
公开(公告)号：US09005874B2
公开(公告)日：2015-04-14
申请号：US13449727
申请日：2012-04-18
申请人： Yoshitaka Komuro , Yoshiyuki Utsumi , Akiya Kawaue , Masatoshi Arai
发明人： Yoshitaka Komuro , Yoshiyuki Utsumi , Akiya Kawaue , Masatoshi Arai
IPC分类号： G03F7/029 , G03F7/039 , C07C69/533 , C08F220/18 , C07C381/12 , C07C309/12 , C07C309/19 , C07C309/42 , C07C309/43 , C07C311/09 , C07C311/48 , C07D307/93 , C07D493/18 , C08F220/28 , C08F228/02 , G03F7/004 , G03F7/20
CPC分类号： C07C381/12 , C07C309/12 , C07C309/19 , C07C309/42 , C07C309/43 , C07C311/09 , C07C311/48 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/93 , C07D493/18 , C08F220/28 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , G03F7/2041 , Y10S430/115 , Y10S430/122 , Y10S522/904
摘要： There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,
摘要翻译：提供了一种新型化合物，高分子化合物，抗蚀剂组合物，酸产生剂和由通式（1-1）表示的化合物形成抗蚀剂图案的方法：其中R 1和R 3各自独立地表示单键或二价连接基团; A表示二价连接基团; R2和R4各自独立地表示羟基，可以具有取代基的烃基或由通式（1-an1），（1-an2）或（1-an3）表示的基团），条件是至少一个 R 2和R 4表示由通式（1-an1），（1-an2）或（1-an3）表示的基团。 n0优选为0或1，并且其中Y1表示单键或-SO2-; R5表示1〜10个碳原子的直链或支链一价烃基，3〜20个碳原子的环状一价烃基或具有可被氟原子取代的环状部分结构的3〜20个碳原子的一价烃基; M +表示有机阳离子或金属阳离子，

39. 发明授权

US08541157B2 Resist composition, method of forming resist pattern, compound and acid generator including the same 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，包括其的化合物和酸发生剂
公开(公告)号：US08541157B2
公开(公告)日：2013-09-24
申请号：US12567643
申请日：2009-09-25
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Sho Abe
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Sho Abe
IPC分类号： G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C07C309/10 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/67 , C07C311/48 , C07C311/51 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.
摘要翻译：一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，酸发生剂成分（B）含有酸性发生剂（B1），其由在阳离子部分内具有碱解离基团的化合物组成。

40. 发明申请

US20120301829A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法
公开(公告)号：US20120301829A1
公开(公告)日：2012-11-29
申请号：US13478390
申请日：2012-05-23
申请人： Akiya Kawaue , Yoshiyuki Utsumi
发明人： Akiya Kawaue , Yoshiyuki Utsumi
IPC分类号： C07D497/18 , G03F7/20 , G03F7/027
CPC分类号： C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/325
摘要： A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation]. [Chemical Formula 1] X-Q1-Y1—SO3⊖A⊕ (b1-1)
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂组分（B），所述酸产生剂组分（B）包含酸产生剂 B1），其由下述通式（b1-1）表示的化合物[其中，X表示可以具有取代基的3〜30个碳原子的环状基团，条件是环状基团的环状骨架包含-SO 2 - 键或-O-SO2-键，并且与-SO 2 - 键或-O-SO 2 - 键不相邻的至少一个碳原子具有氧原子作为取代基; Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; A +表示有机阳离子]。 [化学式1] X-Q1-Y1-SO3⊖A⊕（b1-1）

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