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31. 发明申请

US20140307255A1 MULTI-SURFACE SCATTERED RADIATION DIFFERENTIATION 有权
标题翻译：多表面散射辐射差异
公开(公告)号：US20140307255A1
公开(公告)日：2014-10-16
申请号：US13861383
申请日：2013-04-12
申请人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
发明人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
IPC分类号： G01N21/958
CPC分类号： G01N21/958 , G01N21/896 , G01N2021/8967
摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.
摘要翻译：光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二波片，偏振分束器，第一检测器，聚焦透镜，阻挡器和第二检测器。辐射源照射产生圆偏振源光束的第一波片，其用源光束照射时变光束反射器上的第一位置。时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。来自样品的反射辐射被引导到产生线偏振光束的第二波片，该线偏振光束照射偏振分束器，其将一部分反射辐射引导到第一检测器。来自样品的散射辐射由聚焦透镜引导到第二检测器。将第一和第二检测器的同期测量值进行比较。

32. 发明申请

US20140218724A1 Optical Inspector 有权
标题翻译：光学检查员
公开(公告)号：US20140218724A1
公开(公告)日：2014-08-07
申请号：US13757099
申请日：2013-02-01
申请人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
发明人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9505 , G01N21/956 , G01N21/958
摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating minor, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating minor and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.
摘要翻译：光学检查器包括辐射源，时变光束反射器，远心扫描透镜，分离光和第一和第二检测器。辐射源被配置成用源光束照射时变光束反射器上的第一位置。时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。远心扫描透镜将镜面反射和近镜面散射辐射引导到时变光束反射器。镜面反射由分离镜引导到第一检测器。近镜面散射的辐射不会被分离的小分子反射并传播到第二个检测器。作为响应，光学检查器确定样品的总反射率，表面斜率或近镜面散射辐射强度。

33. 发明授权

US06757056B1 Combined high speed optical profilometer and ellipsometer 有权
标题翻译：组合高速光学轮廓仪和椭偏仪
公开(公告)号：US06757056B1
公开(公告)日：2004-06-29
申请号：US09861280
申请日：2001-05-18
申请人： Steven W. Meeks , Rusmin Kudinar
发明人： Steven W. Meeks , Rusmin Kudinar
IPC分类号： G01N2100
CPC分类号： G01B11/0616 , G01N21/211 , G01N21/94 , G01N21/9501 , H01L22/12
摘要： A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer.
摘要翻译：用于测量薄膜盘或硅晶片的缺陷，膜厚度，污染物，颗粒和高度的系统和方法。

34. 发明授权

US08830456B2 Optical inspector 有权
标题翻译：光学检查员
公开(公告)号：US08830456B2
公开(公告)日：2014-09-09
申请号：US13757099
申请日：2013-02-01
申请人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
发明人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
IPC分类号： G01N21/00 , G01N21/95 , G01N21/94
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9505 , G01N21/956 , G01N21/958
摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating mirror, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating mirror and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.
摘要翻译：光学检查器包括辐射源，时变光束反射器，远心扫描透镜，分离镜以及第一和第二检测器。辐射源被配置成用源光束照射时变光束反射器上的第一位置。时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。远心扫描透镜将镜面反射和近镜面散射辐射引导到时变光束反射器。镜面反射由分离镜引导到第一检测器。近镜面散射辐射不会被分离镜反射并传播到第二检测器。作为响应，光学检查器确定样品的总反射率，表面斜率或近镜面散射辐射强度。

35. 发明授权

US07656519B2 Wafer edge inspection 有权
标题翻译：晶圆边缘检查
公开(公告)号：US07656519B2
公开(公告)日：2010-02-02
申请号：US11848234
申请日：2007-08-30
申请人： Steven W. Meeks , Rusmin Kudinar
发明人： Steven W. Meeks , Rusmin Kudinar
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01B11/065 , G01N21/9503 , G01N21/9506
摘要： In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.
摘要翻译：在一个实施例中，表面分析器系统包括辐射瞄准组件以将辐射瞄准晶片的边缘表面，所述辐射瞄准组件包括邻近所述晶片的边缘表面定位的第一扩展的抛物面或扩展的椭球反射器，反射的辐射收集收集从表面反射的辐射的组件，用于从反射辐射产生表面参数数据的信号处理模块，以及用于分析表面参数数据以检测表面上的缺陷的缺陷检测模块。

36. 发明授权

US06392749B1 High speed optical profilometer for measuring surface height variation 有权
标题翻译：用于测量表面高度变化的高速光学轮廓仪
公开(公告)号：US06392749B1
公开(公告)日：2002-05-21
申请号：US09718054
申请日：2000-11-20
申请人： Steven W. Meeks , Rusmin Kudinar
发明人： Steven W. Meeks , Rusmin Kudinar
IPC分类号： G01B1106
CPC分类号： G01B11/065 , G01B11/303 , G01N21/211
摘要： A system and a method for measuring a height of a thin film disk or a silicon wafer having a first and a second electromagnetic signal source for generating a first and a second signal toward a first position on the thin film magnetic disk at two different angles, a first and a second sensitive detector positioned at a right angle from each other to receive a reflected portion of the first and the second signal that reflects off of the object, and to determine a radial portion of the first and the second signals and a circumferential portion of the first and the second signals. The system also includes a processor for determining the height of the first position based upon a difference between the circumferential portion of the second signal and the circumferential portion of the first signal that does not include slope information.
摘要翻译：一种用于测量具有第一和第二电磁信号源的薄膜盘或硅晶片的高度的系统和方法，用于以两个不同的角度向薄膜磁盘上的第一位置产生第一和第二信号，第一和第二灵敏检测器，其彼此成直角定位，以接收反射离开物体的第一和第二信号的反射部分，并确定第一和第二信号的径向部分，以及周向第一和第二信号的一部分。该系统还包括一个处理器，用于基于第二信号的圆周部分与不包括斜率信息的第一信号的圆周部分之间的差来确定第一位置的高度。

37. 发明申请

US20140218722A1 Optical Inspector 有权
标题翻译：光学检查员
公开(公告)号：US20140218722A1
公开(公告)日：2014-08-07
申请号：US13757154
申请日：2013-02-01
申请人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
发明人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
IPC分类号： G01N21/01 , G02B26/12 , G02B26/10
CPC分类号： G01N21/01 , G01N21/55 , G02B26/10 , G02B26/125
摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second lens, a field stop, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The first lens focuses scattered radiation from the sample to generate multiple scan lines at a first focal plane. The field stop is positioned at the first focal plane to block one or more scan lines at the first focal plane. The scan line not blocked by the field stop propagates to the second lens. The second lens de-scans the scan line and generates a point of scattered radiation at a second focal plane where the detector input is located.
摘要翻译：光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二透镜，场停止和检测器。辐射源用源光束照射时变光束反射器上的第一位置。时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。第一透镜聚焦来自样品的散射辐射，以在第一焦平面处产生多条扫描线。场停止件位于第一焦平面处以阻挡在第一焦平面处的一个或多个扫描线。不被场停止阻挡的扫描线传播到第二个镜头。第二透镜扫描扫描线并在检测器输入所位于的第二焦平面处产生散射辐射点。

38. 发明授权

US07075630B2 Combined high speed optical profilometer and ellipsometer 失效
公开(公告)号：US07075630B2
公开(公告)日：2006-07-11
申请号：US10873892
申请日：2004-06-21
申请人： Steven W Meeks , Rusmin Kudinar
发明人： Steven W Meeks , Rusmin Kudinar
IPC分类号： G01N21/00
CPC分类号： G01B11/0616 , G01N21/211 , G01N21/94 , G01N21/9501 , H01L22/12
摘要： A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer.

39. 发明授权

US06956660B2 System and method for measuring properties of an object using a phase difference between two reflected light signals 失效
标题翻译：使用两个反射光信号之间的相位差来测量物体的属性的系统和方法
公开(公告)号：US06956660B2
公开(公告)日：2005-10-18
申请号：US10782267
申请日：2004-02-18
申请人： Steven W. Meeks , Rusmin Kudinar
发明人： Steven W. Meeks , Rusmin Kudinar
IPC分类号： G01B11/06 , G01B11/30 , G01Q60/00 , G01B11/28
CPC分类号： G01B11/065 , G01B11/303
摘要： A system and method for measuring a phase difference between first and second reflected polarized light signal components, including transmitting a first incident light signal toward a first object, wherein the first object is a magnetic disk and/or a glass substrate. Seperating from a reflected light signal, a first mixed reflected polarized light signal component having a first phase and a second mixed reflected polarized light signal component having a second phase that is different from said first phase, wherein said mixed reflected polarized light signal components comprises both P-polarized and S-polarized light relative to a plane of incidence of said reflected light signal. Detecting the intensities of said first and second mixed reflected polarized light signal components, and determining a difference in phase between said first and second mixed reflected polarized light signal component based upon said first and second intensities.
摘要翻译：一种用于测量第一和第二反射偏振光信号分量之间的相位差的系统和方法，包括向第一物体发射第一入射光信号，其中第一物体是磁盘和/或玻璃衬底。从反射光信号分离出具有第一相位的第一混合反射偏振光信号分量和具有与所述第一相位不同的第二相位的第二混合反射偏振光信号分量，其中所述混合反射偏振光信号分量包括 P偏振光和S偏振光相对于所述反射光信号的入射平面。检测所述第一和第二混合反射偏振光信号分量的强度，并且基于所述第一和第二强度确定所述第一和第二混合反射偏振光信号分量之间的相位差。

40. 发明授权

US5705741A Constant-force profilometer with stylus-stabilizing sensor assembly, dual-view optics, and temperature drift compensation 失效
标题翻译：恒力轮廓仪带触笔稳定传感器组件，双视光学元件和温度漂移补偿
公开(公告)号：US5705741A
公开(公告)日：1998-01-06
申请号：US362818
申请日：1994-12-22
申请人： Steven G. Eaton , Rusmin Kudinar , William R. Wheeler
发明人： Steven G. Eaton , Rusmin Kudinar , William R. Wheeler
IPC分类号： G01B3/00 , G01B7/34 , G01B5/28
CPC分类号： G01B3/008 , G01B7/34
摘要： A profilometer has a constant force mechanism for biasing of the stylus arm. The mechanism has a centrally-aligned configuration of the moving magnet relative to the magnetic coil and also has a magnetic shield isolating these elements from other ferromagnetic materials in the assembly. The moving magnet is made of a material that is hard magnetically and the magnetic shield is made of a series of low hysteresis, high permeability materials. The force thus generated by the stylus biasing device is very linear with the drive current upon the magnetic coil at any particular position of the stylus, thereby allowing for control and predictability of the stylus force upon the surface to be profiled. This predictability is used for dynamic stylus force adjustments during profiling of a specimen. The profilometer is also equipped with a balanced, spring-loaded stylus-stabilizing sensor assembly, task-specific dual-view optics for protection of the delicate stylus assembly, and a temperature drift compensator.
摘要翻译：轮廓仪具有用于偏置触针臂的恒力机构。该机构具有相对于电磁线圈的移动磁体的中心对准配置，并且还具有将这些元件与组件中的其它铁磁材料隔离的磁屏蔽。移动磁铁由硬磁材料制成，磁屏蔽由一系列低磁滞，高磁导率材料制成。由触针偏置装置产生的力与在触控笔的任何特定位置处的磁性线圈上的驱动电流非常线性，从而允许在要被刻蚀的表面上的触针力的控制和可预测性。这种可预测性用于在样品成型期间的动态触针力调节。轮廓仪还配备有平衡的弹簧加载的触控笔稳定传感器组件，用于保护精巧触针组件的任务特定双视点光学元件和温度漂移补偿器。

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