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31. 发明申请

US20120206704A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 有权
标题翻译：投影光刻照明光学单元
公开(公告)号：US20120206704A1
公开(公告)日：2012-08-16
申请号：US13368430
申请日：2012-02-08
申请人： Johannes Wangler , Markus Deguenther , Stig Bieling
发明人： Johannes Wangler , Markus Deguenther , Stig Bieling
IPC分类号： G03B27/54
CPC分类号： G03F7/70058
摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.
摘要翻译：用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。照明光学单元的瞳孔面镜具有多个光瞳面。瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

32. 发明申请

US20080111983A1 Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20080111983A1
公开(公告)日：2008-05-15
申请号：US11813529
申请日：2005-12-30
申请人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
发明人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70083
摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).
摘要翻译：微光刻曝光系统的照明系统（12）包括多个发光元件（24），该发光元件具有光出射面，其位于或靠近场平面（OP）或光瞳平面，并被配置为单独激活。可以使用光收集元件，例如蝇眼透镜的微透镜或圆柱透镜阵列来收集由发光元件（24）发射的光束。可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

33. 发明申请

US20070285644A1 Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20070285644A1
公开(公告)日：2007-12-13
申请号：US11575042
申请日：2005-09-13
申请人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
发明人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.
摘要翻译：用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配目的。

34. 发明申请

US20060126049A1 Illumination system for a microlithography projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20060126049A1
公开(公告)日：2006-06-15
申请号：US11271844
申请日：2005-11-14
申请人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
发明人： Markus Deguenther , Johannes Wangler , Markus Brotsack , Ella Mizkewitsch
IPC分类号： G03B27/72
CPC分类号： G03F7/70075 , G03F7/70091
摘要： An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.
摘要翻译：用于微光刻投影曝光装置的照明系统设计成用具有可预定程度的一致性sigma的照明辐射照射照明场，可以在相干范围内的相干程度范围内调整相干度相干度显着小于σ= 0.2。照明系统可以具有用于在光混合装置的入射面中产生可预定的光分布的第一光学系统，以及用于均匀化入射辐射的光混合装置。在每种情况下，可以在对应于不同程度的相干范围的多个配置之间改变第一光学系统和光混合装置。相干度的重叠程度重叠，其尺寸使得所产生的总相干度范围大于相干范围的个体程度。

35. 发明申请

US20070146853A1 Optical device with raster elements, and illumination system with the optical device 有权
标题翻译：具有光栅元件的光学装置，以及具有光学装置的照明系统
公开(公告)号：US20070146853A1
公开(公告)日：2007-06-28
申请号：US11598180
申请日：2006-11-10
申请人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
发明人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
IPC分类号： G02B26/08
CPC分类号： G02B27/0961 , G02B17/0657 , G02B27/0983 , G03F7/70075
摘要： The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
摘要翻译：本发明涉及一种光学装置，其包括（a）具有至少一个第一光栅元件的第一光学元件，其中第一光栅元件具有第一轴，（b）具有至少一个第二光栅元件的第二光学元件，其中第二光栅元件具有第二轴。可以将第一光栅元件相对于第二光栅元件的位置改变，使得第一轴与第二轴之间的距离是可变的。

36. 发明授权

US08520307B2 Optical integrator for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光学积分器
公开(公告)号：US08520307B2
公开(公告)日：2013-08-27
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

37. 发明申请

US20090021839A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微电子投影曝光装置照明系统的光学积分器
公开(公告)号：US20090021839A1
公开(公告)日：2009-01-22
申请号：US12186365
申请日：2008-08-05
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

38. 发明申请

US20110083542A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微电子投影曝光装置照明系统的光学积分器
公开(公告)号：US20110083542A1
公开(公告)日：2011-04-14
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： B26D3/06 , B26D7/27
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光设备的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

39. 发明申请

US20120153189A1 OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE 审中-公开
标题翻译：用于产生用于处理基板的光束的光学系统
公开(公告)号：US20120153189A1
公开(公告)日：2012-06-21
申请号：US13352725
申请日：2012-01-18
申请人： Johannes Wangler , Michael Layh , Markus Zenzinger , Holger Muenz
发明人： Johannes Wangler , Michael Layh , Markus Zenzinger , Holger Muenz
IPC分类号： B01J19/12
CPC分类号： G02B27/0927 , B23K26/0608 , B23K26/0676 , B23K26/0732 , B23K26/0738
摘要： An optical system for generating a light beam for treating a substrate arranged in a substrate plane is disclosed. The optical system includes first and second optical arrangements.
摘要翻译：公开了一种用于产生用于处理布置在基板平面中的基板的光束的光学系统。光学系统包括第一和第二光学装置。

40. 发明授权

US07880969B2 Optical integrator for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光学积分器
公开(公告)号：US07880969B2
公开(公告)日：2011-02-01
申请号：US12186365
申请日：2008-08-05
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

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