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    • 34. 发明授权
    • Electron sources and equipment having electron sources
    • 具有电子源的电子源和设备
    • US4516146A
    • 1985-05-07
    • US439144
    • 1982-11-04
    • John M. ShannonArthur M. E. HoeberechtsGerardus G. P. Van Gorkom
    • John M. ShannonArthur M. E. HoeberechtsGerardus G. P. Van Gorkom
    • H01J1/30H01J1/308H01J29/04H01J37/305H01L49/00H01L29/34
    • H01J1/308
    • An electron source having a rapid response time comprises at least one n-p-n structure (and possibly an array of said n-p-n structure) formed in a silicon or other semiconductor body (10) by a p-type first region (1) between n-type second and third regions (2 and 3). Electrons (24) are generated in the n-p-n structure (2,1,3) for emission into free space (20) from a surface area (4) of the body (10) after flowing from the second region (2) through the first and third regions (1 and 3). The n-p-n structure (2,1,3) has electrode connections (12 and 13) only to the n-type second and third regions (2 and 3). The first region (1) provides a barrier region restricting the flow of electrons from the second region (2) to the third region (3) until a potential difference (V) is applied between the electrode connections (12 and 13) to bias the third region (3) positive with respect to the second region (2) and to establish a supply of hot electrons (24) injected into the third region (3) with sufficient energy to overcome the potential barrier present between the surface area (4) and free space (20). The barrier region (1) forms depletion layers with both the n-type second and third regions (2 and b 3) and is depleted of holes by the merging together of these depletion layers at least when the potential difference (V) is applied to establish said supply of hot electrons (24). The n-p-n structure can be provided in a mesa portion (9) of the body (10) at a window in an insulating layer (11) so as to form a compact arrangement having very low associated capacitances. The electron sources may be used in cathode-ray tubes, display devices and even electron lithography equipment.
    • 具有快速响应时间的电子源包括通过p型第一区域(1)在n型第二区域(1)中形成于硅或其它半导体本体(10)中的至少一个npn结构(以及可能的所述npn结构的阵列) 和第三区域(2和3)。 在npn结构(2,1,3)中产生电子(24),用于在从第二区域(2)流过第一区域(2)之后从主体(10)的表面区域(4)发射到自由空间(20) 和第三区域(1和3)。 n-p-n结构(2,1,3)仅具有到n型第二和第三区域(2和3)的电极连接(12和13)。 第一区域(1)提供限制从第二区域(2)到第三区域(3)的电子流动的势垒区域,直到在电极连接件(12和13)之间施加电位差(V) 第三区域(3)相对于第二区域(2)是正的,并以足够的能量建立注入到第三区域(3)中的热电子(24)的供应,以克服存在于表面区域(4) 和自由空间(20)。 阻挡区域(1)形成具有n型第二和第三区域(2和b 3)的耗尽层,并且通过将这些耗尽层合并在一起,至少当电位差(V)被施加到 建立热电子供应(24)。 n-p-n结构可以在绝缘层(11)中的窗口处设置在主体(10)的台面部分(9)中,以形成具有非常低的相关电容的紧凑布置。 电子源可以用于阴极射线管,显示装置甚至电子光刻设备中。