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31. 发明授权

US08309249B2 Lithium-ion secondary battery 失效
标题翻译：锂离子二次电池
公开(公告)号：US08309249B2
公开(公告)日：2012-11-13
申请号：US12043388
申请日：2008-03-06
申请人： Masakazu Kobayashi , Yoshio Shimoida
发明人： Masakazu Kobayashi , Yoshio Shimoida
IPC分类号： H01M2/00 , B60K1/00
CPC分类号： H01M10/0585 , H01M2/024 , H01M2/0262 , H01M2/0265 , H01M2/0277 , H01M10/0525 , H01M2002/0297 , Y02E60/122 , Y02T10/7011
摘要： A lithium-ion secondary battery which includes a battery element and an exterior package covering the battery element. The battery element includes a separator, and an electrode-stacked body having a first electrode and a second electrode disposed respectively on both surfaces of the separator in a stacking direction. The exterior package includes a first package member located at one side of the battery element in the stacking direction, and a second package member located at the other side of the battery element in the stacking direction. A linear expansion coefficient α1 of the first package member is greater than a linear expansion coefficient α2 of the second package member.
摘要翻译：一种锂离子二次电池，其包括电池元件和覆盖电池元件的外部封装。电池元件包括隔板和电极堆叠体，其具有分别在层叠方向上分隔在隔膜的两个表面上的第一电极和第二电极。外包装包括位于电池元件沿层叠方向的一侧的第一包装件和位于电池元件的堆叠方向另一侧的第二包装件。第一包装件的线性膨胀系数α1大于第二包装件的线膨胀系数α2。

32. 发明申请

US20120068220A1 REVERSE CONDUCTING-INSULATED GATE BIPOLAR TRANSISTOR 审中-公开
标题翻译：反向导电绝缘栅双极晶体管
公开(公告)号：US20120068220A1
公开(公告)日：2012-03-22
申请号：US13235154
申请日：2011-09-16
申请人： Toshiaki KOBAYASHI , Masakazu Kobayashi
发明人： Toshiaki KOBAYASHI , Masakazu Kobayashi
IPC分类号： H01L29/747
CPC分类号： H01L29/7397 , H01L29/0834
摘要： According to one embodiment, in a reverse conducting-insulated gate bipolar transistor, the buffer layer is provided on the backside of the second base layer, has a higher impurity concentration in comparison with the second base layer. The first collector layer is in contact with a portion of the backside of the buffer layer, has a higher impurity concentration in comparison with the second base layer. The second collector layer is in contact with a portion of the backside of the buffer layer, is provided so as to surround the first collector layer, has a higher impurity concentration in comparison with the first base layer. The third collector layer is in contact with a portion of the backside of the buffer layer, is provided so as to surround the second collector layer, has a higher impurity concentration in comparison with the second collector layer.
摘要翻译：根据一个实施例，在反向导通绝缘栅双极晶体管中，缓冲层设置在第二基极层的背面，与第二基极层相比具有较高的杂质浓度。第一集电极层与缓冲层的背面的一部分接触，与第二基底层相比具有较高的杂质浓度。与第一基底层相比，第二集电体层与缓冲层的背面的一部分接触，设置为围绕第一集电体层，具有较高的杂质浓度。与第二集电体层相比，第三集电体层与缓冲层的背面的一部分接触，设置为围绕第二集电体层，具有较高的杂质浓度。

33. 发明授权

US08101333B2 Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method 有权
标题翻译：形成用于该方法的小型化图案和抗蚀底物处理溶液的方法
公开(公告)号：US08101333B2
公开(公告)日：2012-01-24
申请号：US12311725
申请日：2007-10-12
申请人： Go Noya , Ryuta Shimazaki , Masakazu Kobayashi
发明人： Go Noya , Ryuta Shimazaki , Masakazu Kobayashi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/032 , G03F7/40
CPC分类号： G03F7/40 , Y10S430/106 , Y10S430/107 , Y10S430/11 , Y10T428/24802
摘要： The present invention provides a method for miniaturizing a pattern without seriously increasing the production cost or impairing the production efficiency. This invention also provides a fine resist pattern and a resist substrate-treating solution used for forming the fine pattern. The pattern formation method comprises a treatment step. In the treatment step, a resist pattern after development is treated with a resist substrate-treating solution containing an amino group-containing, preferably, a tertiary polyamine-containing water-soluble polymer, so as to reduce the effective size of the resist pattern formed by the development. The present invention also relates to a resist pattern formed by that method, and further relates to a treating solution used in the method.
摘要翻译：本发明提供一种小型化图案的方法，而不会严重地增加生产成本或损害生产效率。本发明还提供用于形成精细图案的精细抗蚀剂图案和抗蚀剂基板处理溶液。图形形成方法包括处理步骤。在处理步骤中，用含有氨基，优选含叔胺的水溶性聚合物的抗蚀剂底物处理溶液处理显影后的抗蚀剂图案，以减少形成的抗蚀剂图案的有效尺寸通过发展。本发明还涉及通过该方法形成的抗蚀剂图案，还涉及该方法中使用的处理溶液。

34. 发明授权

US08061523B2 Purifier 有权
标题翻译：净化器
公开(公告)号：US08061523B2
公开(公告)日：2011-11-22
申请号：US12662090
申请日：2010-03-30
申请人： Shigeki Uebayashi , Masakazu Kobayashi , Takuji Nakano
发明人： Shigeki Uebayashi , Masakazu Kobayashi , Takuji Nakano
IPC分类号： B07B9/00
CPC分类号： B07B1/46 , B02B1/02 , B07B1/34 , B07B1/4645 , B07B4/08 , B07B13/16
摘要： A purifier is provided that is capable of uniformly sucking powder in a width direction of the sieve layers even when the purifier is configured to be provided with an air distribution chamber formed as being tapered upward and to have a horizontal cyclone provided above the air distribution chamber.The air distribution chamber is configured of paired inclined surfaces formed as being tapered upward, has a suction passage formed as a horizontal cyclone placed above the air distribution chamber. Also, a plurality of barrier walls are provided in the air distribution chamber in a direction perpendicular to a longitudinal direction of sieve layers, the air distribution chamber is sectioned by the barrier walls into a plurality of chambers, and rectifying plates are further provided to the air distribution chamber at a narrow position between the paired inclined surfaces to prevent non-uniformity of suction of powder on the sieve layers.
摘要翻译：提供一种净化器，其能够均匀地在筛层的宽度方向上吸入粉末，即使当净化器被配置为设置有形成为向上锥形的空气分配室并且具有设置在空气分配室上方的水平旋风分离器。空气分配室由成对的倾斜面形成为向上锥形，具有形成为配置在分配室上方的水平旋风分离器的吸入通路。此外，在空气分配室中沿着与筛层的纵向方向垂直的方向设置多个阻挡壁，将分配室由阻隔壁分割成多个室，并且整流板还设置在空气分配室在成对的倾斜表面之间的狭窄位置，以防止粉末在筛层上的吸力不均匀。

35. 发明授权

US07998664B2 Processing liquid for resist substrate and method of processing resist substrate using the same 有权
标题翻译：用于抗蚀剂基板的处理液体及使用其的处理抗蚀剂基板的方法
公开(公告)号：US07998664B2
公开(公告)日：2011-08-16
申请号：US12223310
申请日：2007-02-13
申请人： Go Noya , Masakazu Kobayashi , Ryuta Shimazaki
发明人： Go Noya , Masakazu Kobayashi , Ryuta Shimazaki
IPC分类号： G03F7/00 , G03F7/26 , G03F7/32 , C11D7/50
CPC分类号： G03F7/425
摘要： The present invention provides a resist substrate treating solution and a method for pattern formation using that treating solution, and thereby problems such as foreign substances on the substrate surface, pattern collapse and pattern roughness can be easily solved at the same time. The treating solution comprises water and an alkylene oxide adduct of a primary amine having a hydrocarbon group of 11 to 30 carbon atoms or of ammonia. The method for pattern formation according to the invention comprises a step of treating the developed pattern with that treating solution.
摘要翻译：本发明提供一种抗蚀剂基板处理液和使用该处理液的图案形成方法，能够容易地同时解决基板表面上的异物，图案塌陷，图案粗糙等问题。处理溶液包含水和碳原子数为11〜30的伯胺或氨的烯化氧加合物。根据本发明的图案形成方法包括用该处理溶液处理显影图案的步骤。

36. 发明授权

US07775060B2 Drive unit for electric vehicle 有权
标题翻译：电动车驱动装置
公开(公告)号：US07775060B2
公开(公告)日：2010-08-17
申请号：US10785197
申请日：2004-02-25
申请人： Yuki Nakajima , Masahiro Tsukamoto , Masakazu Kobayashi , Yutaro Kaneko , Hiroyuki Kaneko , Toshiro Shinohara , Makoto Iwashima , Yasuhiko Kitajima , Akihiro Hanamura , Kouichirou Yonekura , Tadayuki Hatsuda
发明人： Yuki Nakajima , Masahiro Tsukamoto , Masakazu Kobayashi , Yutaro Kaneko , Hiroyuki Kaneko , Toshiro Shinohara , Makoto Iwashima , Yasuhiko Kitajima , Akihiro Hanamura , Kouichirou Yonekura , Tadayuki Hatsuda
IPC分类号： F25D23/12
CPC分类号： F16H57/04 , B60L1/02 , B60L3/003 , B60L3/0061 , B60L11/1803 , B60L2210/40 , B60L2240/425 , B60L2240/525 , B60L2270/147 , H02K7/116 , H02K9/19 , H02K11/33 , Y02T10/641 , Y02T10/642 , Y02T10/7005 , Y02T10/7241
摘要： A drive unit for an electric vehicle is comprised of a motor, an inverter which supplies alternating current electric power to the motor, a speed reducer which is connected to the motor, and a cooling system which cools the motor, the inverter and the speed reducer. The speed reducer reduces a revolution speed of a mechanical output of the motor. The cooling system comprises a heat exchanger at which first refrigerant for receiving heat of at least one of the motor and the inverter receives heat of second refrigerant for receiving heat of at least one of the motor and the speed reducer.
摘要翻译：电动车辆的驱动单元由电动机，向电动机供给交流电力的逆变器，与电动机连接的减速器以及冷却电动机，变频器和减速器的冷却系统。减速机降低了电机机械输出的转速。冷却系统包括热交换器，在该热交换器中，用于接收电动机和逆变器中的至少一个的第一制冷剂接收用于接收电动机和减速器中的至少一个的第二制冷剂的热量。

37. 发明申请

US20060211725A1 Use 审中-公开
公开(公告)号：US20060211725A1
公开(公告)日：2006-09-21
申请号：US11319178
申请日：2005-12-28
申请人： Masakazu Kobayashi , Hongsi Jiang , Fan Pan , Laurie Erickson , Aaron Ebbs , Carmen Wynn
发明人： Masakazu Kobayashi , Hongsi Jiang , Fan Pan , Laurie Erickson , Aaron Ebbs , Carmen Wynn
IPC分类号： A61K31/4745 , A61K31/277 , A61K31/42
CPC分类号： A61K31/445 , A61K31/275 , A61K31/277 , A61K31/42 , A61K31/4523 , A61K31/4745 , A61K2300/00
摘要： This invention relates to a new use of a compound of the following formula (I) or (II) for the manufacture of a medicament for preventing and/or treating chronic rejection in a transplanted organ or tissue.

38. 发明授权

US06825899B2 Liquid crystal display device in which generation of moire fringes is prevented 失效
标题翻译：防止产生莫尔条纹的液晶显示装置
公开(公告)号：US06825899B2
公开(公告)日：2004-11-30
申请号：US09794477
申请日：2001-02-26
申请人： Masakazu Kobayashi
发明人： Masakazu Kobayashi
IPC分类号： G02F11335
CPC分类号： G02F1/133514 , G02F2001/133616
摘要： A liquid crystal display device is disclosed that provides improved color image quality of the display screen by preventing the generation of moiré fringes, thereby realizing an improvement in color clarity, a reduction in color inconsistency, and clearness in color separation. The liquid crystal display device includes a liquid crystal display module in which a liquid crystal layer and a color filter are formed between a pair of opposing transparent substrates and a front light is mounted to the front side of the liquid crystal display module. The color filter has a stripe pattern which is substantially perpendicular to the stripe pattern of the front light.
摘要翻译：公开了一种液晶显示装置，其通过防止产生莫尔条纹来提供显示屏的彩色图像质量，从而实现色彩清晰度的提高，颜色不一致性的降低和色彩分离的清晰度。液晶显示装置包括在一对相对的透明基板之间形成有液晶层和滤色器的液晶显示模块，并且前面的光安装在液晶显示模块的前侧。滤色器具有基本上垂直于前灯的条纹图案的条纹图案。

39. 发明授权

US06297174B2 Method for the formation of a planarizing coating film on substrate surface 有权
标题翻译：在基板表面上形成平坦化涂膜的方法
公开(公告)号：US06297174B2
公开(公告)日：2001-10-02
申请号：US09765276
申请日：2001-01-22
申请人： Etsuko Iguchi , Takako Hirosaki , Masakazu Kobayashi
发明人： Etsuko Iguchi , Takako Hirosaki , Masakazu Kobayashi
IPC分类号： H01L2131
CPC分类号： H01L21/02118 , H01L21/02282 , H01L21/31055 , H01L21/312
摘要： A method is disclosed for the formation of a planarizing coating film on the surface of a substrate having a stepped level difference under processing for the manufacture of semiconductor devices. The inventive method capable of giving a planarizing coating film of excellent planarity and good adhesion to the substrate surface comprises the steps of: (a) coating the substrate surface with a coating solution containing, as a film-forming solute uniformly dissolved in an ,organic solvent, a nitrogen-containing organic compound such as benzoguanamine and melamine having, in a molecule, at least two amino and/or imino groups each substituted for the nitrogen-bonded hydrogen atom by a hydroxyalkyl group or an alkoxyalkyl group to form a coating layer; (b) drying the coating layer by evaporating the organic solvent to form a dried coating layer; and (c) subjecting the dried coating layer to a baking treatment at a temperature in the range from 150 to 250° C.
摘要翻译：公开了一种用于在半导体器件的制造处理中在具有台阶级差的衬底的表面上形成平坦化涂膜的方法。能够赋予平坦化性和对基材表面的良好粘合性的平坦化涂膜的本发明的方法包括以下步骤：（a）用包含均匀溶解在有机物中的成膜溶质的涂布溶液涂布基材表面溶剂，诸如苯并胍胺和三聚氰胺的含氮有机化合物在分子中具有至少两个氨基和/或亚氨基，其各自通过羟烷基或烷氧基烷基取代与氮键合的氢原子，以形成涂层 ;（b）通过蒸发有机溶剂干燥涂层以形成干燥的涂层; 和（c）在150-250℃的温度下对干燥的涂层进行烘烤处理。

40. 发明授权

US06268108B1 Composition for forming antireflective coating film and method for forming resist pattern using same 失效
标题翻译：用于形成抗反射涂膜的组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US06268108B1
公开(公告)日：2001-07-31
申请号：US09116460
申请日：1998-07-16
申请人： Etsuko Iguchi , Masakazu Kobayashi , Hiroshi Komano , Toshimasa Nakayama
发明人： Etsuko Iguchi , Masakazu Kobayashi , Hiroshi Komano , Toshimasa Nakayama
IPC分类号： G03F7004
CPC分类号： G03F7/091
摘要： The present invention provides a composition for forming an antireflective coating film which is not liable to intermixing between the resist composition layer and the antireflective coating layer and a method for forming a resist pattern having an excellent dimensional accuracy and section shape. The composition consists of (A) a compound which produces an acid upon irradiation with actinic rays, (B) a compound which undergoes crosslinking reaction in the presence of an acid, (C) a dye and (D) an organic solvent. The method for forming a resist pattern comprises applying the composition for forming an antireflective coating film to a semiconductor substrate, drying the composition coated, irradiating the entire surface of the coated material with actinic rays so that it undergoes crosslinking reaction to form an antireflective coating film thereon, applying a resist composition to the antireflective coating film, drying the coated material, and then subjecting the coated material to lithographic processing to form a resist pattern thereon.
摘要翻译：本发明提供了一种用于形成不易于在抗蚀剂组合物层和抗反射涂层之间混合的抗反射涂膜的组合物和形成具有优异的尺寸精度和截面形状的抗蚀剂图案的方法。组合物由（A）在光化射线照射时产生酸的化合物，（B）在酸存在下进行交联反应的化合物，（C）染料和（D）有机溶剂。形成抗蚀剂图案的方法包括将用于形成抗反射涂膜的组合物施加到半导体衬底上，干燥涂覆的组合物，用光化射线照射涂覆材料的整个表面，使其经历交联反应以形成抗反射涂膜在其上涂布抗蚀剂组合物到抗反射涂膜上，干燥涂覆的材料，然后对涂覆材料进行光刻处理以在其上形成抗蚀剂图案。

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