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31. 发明申请

US20060069947A1 Apparatus, method and program for the control of storage 有权
标题翻译：用于控制存储的装置，方法和程序
公开(公告)号：US20060069947A1
公开(公告)日：2006-03-30
申请号：US11008143
申请日：2004-12-10
申请人： Hideo Takahashi , Tsukasa Makino
发明人： Hideo Takahashi , Tsukasa Makino
IPC分类号： G06F11/00
CPC分类号： G06F11/1076 , G06F2211/1059
摘要： A storage control apparatus is provided that comprises a failure monitoring unit arranged to add points in proportion to detected abnormality to find statistically added points for each of N disk devices, the failure monitoring unit issuing an instruction to re-create parity when the statistically added points come closer to a predefined failure determination point, the failure monitoring unit issuing an instruction to disconnect the failed disk device when the statistically added points exceed the failure determination point; and a parity re-creation unit arranged, when receiving the instruction to re-create parity from the failure monitoring unit, to read the plural pieces of user data from (N-1) disk devices to re-calculate parity data for write into the remaining one (1) disk device for each of all addresses of the plurality of disk devices.
摘要翻译：提供了一种存储控制装置，包括：故障监视单元，其被布置成与检测到的异常成比例地添加点，以针对N个磁盘设备中的每一个添加点，所述故障监视单元在统计添加点发出重新创建奇偶校验的指令更接近预定义的故障判定点，故障监视单元在统计学上添加的点超过故障确定点时发出断开故障磁盘设备的指令; 以及奇偶校验重建单元，当从所述故障监视单元接收到重新创建奇偶校验的指令时，从（N-1）个盘设备读取多条用户数据，以重新计算用于写入的奇偶校验数据剩余的一个（1）磁盘设备用于多个磁盘设备的所有地址的每一个。

32. 发明申请

US20090043419A1 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, SEALED CONTAINER STORING APPARATUS, PROGRAM FOR IMPLEMENTING THE SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING THE PROGRAM 有权
标题翻译：基板处理系统，基板处理方法，密封容器存储装置，用于实施基板处理方法的程序和存储程序的存储介质
公开(公告)号：US20090043419A1
公开(公告)日：2009-02-12
申请号：US12249382
申请日：2008-10-10
申请人： Satoshi YAMAZAKI , Tsukasa Makino
发明人： Satoshi YAMAZAKI , Tsukasa Makino
IPC分类号： G05B19/418 , H01L21/02
CPC分类号： H01L21/67236 , H01L21/67069 , H01L21/67276 , H01L21/67772 , Y10S414/14
摘要： A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus 2 that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF 4 has a enclosure 23 that is connected to the plasma processing apparatus 2 and has a cleaned atmosphere therein, a pod stage 26 on which a pod 3 housing semiconductor wafers W is mounted, a pod mounting portion 24 that carries out removal of semiconductor wafers W from the pod 3 and housing of semiconductor wafers W into the pod 3, and a wafer cassette transfer arm 27 that transfers semiconductor wafers W between the pod stage 26 and the plasma processing apparatus 2 via the enclosure 23. A preliminary loader 5 having a stage-shaped unprocessed pod port 28 that stores a pod 3 housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port 29 that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism 30 that moves the pods 3 between the stage-shaped unprocessed pod port 28 and the pod stage 26, and between the pod stage 26 and the shelf-like processed pod port 29.
摘要翻译：一种基板处理系统，其能够防止灰尘附着到基板上，而不会将洁净室的清洁度提高到预定水平，并且还能够增加基板处理生产量而不增加对工人的负担。等离子体处理装置2，其使半导体晶片W在清洁的气氛中进行等离子体处理。 SMIF 4具有连接到等离子体处理装置2并具有清洁气氛的外壳23，容纳半导体晶片W的容器3的荚台26，进行半导体移除的荚安装部24 来自容器3的晶片W和半导体晶片W的外壳插入到容器3中，以及晶片盒传送臂27，其经由外壳23在荚状台26和等离子体处理装置2之间传送半导体晶片W.一种初步装载器5，具有存储容纳未经受等离子体处理的半导体晶片W的容器3的台状未处理容器端口28，存储容纳已经经受等离子体处理的半导体晶片W的密封容器的搁架状处理容器端口29，等离子体处理和荚运动机构30，其使荚果3在阶梯形未处理的荚果端口28和荚果台26之间以及在荚果阶段26和搁架状进程之间移动 essed pod端口29。

33. 发明申请

US20060105473A1 Substrate processing system, substrate processing method, sealed container storing apparatus, program for implementing the substrate processing method, and storage medium storing the program 有权
标题翻译：基板处理系统，基板处理方法，密封容器存储装置，用于实施基板处理方法的程序以及存储程序的存储介质
公开(公告)号：US20060105473A1
公开(公告)日：2006-05-18
申请号：US11202317
申请日：2005-08-12
申请人： Satoshi Yamazaki , Tsukasa Makino
发明人： Satoshi Yamazaki , Tsukasa Makino
IPC分类号： H01L21/00
CPC分类号： H01L21/67236 , H01L21/67069 , H01L21/67276 , H01L21/67772 , Y10S414/14
摘要： A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus 2 that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF 4 has a enclosure 23 that is connected to the plasma processing apparatus 2 and has a cleaned atmosphere therein, a pod stage 26 on which a pod 3 housing semiconductor wafers W is mounted, a pod mounting portion 24 that carries out removal of semiconductor wafers W from the pod 3 and housing of semiconductor wafers W into the pod 3, and a wafer cassette transfer arm 27 that transfers semiconductor wafers W between the pod stage 26 and the plasma processing apparatus 2 via the enclosure 23. A preliminary loader 5 having a stage-shaped unprocessed pod port 28 that stores a pod 3 housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port 29 that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism 30 that moves the pods 3 between the stage-shaped unprocessed pod port 28 and the pod stage 26, and between the pod stage 26 and the shelf-like processed pod port 29.
摘要翻译：一种基板处理系统，其能够防止灰尘附着到基板上，而不会将洁净室的清洁度提高到预定水平，并且还能够增加基板处理生产量而不增加对工人的负担。等离子体处理装置2，其使半导体晶片W在清洁的气氛中进行等离子体处理。 SMIF 4具有连接到等离子体处理装置2并具有清洁气氛的外壳23，容纳半导体晶片W的容器3的荚台26，进行半导体移除的荚安装部24 来自容器3的晶片W和半导体晶片W的壳体插入到容器3中，以及晶片盒传送臂27，其经由外壳23在荚状台26和等离子体处理装置2之间传送半导体晶片W。具有阶梯形未加工的容器端口28的初步装载机5，其存储容纳未经受等离子体处理的半导体晶片W的容器3，存储容纳半导体晶片W的密封容器的搁架状处理容器端口29，已经进行了等离子体处理，以及荚移动机构30，其使荚果3在阶梯形未处理的荚果端口28和荚果台26之间以及荚果台26和搁架状处理的荚果口29之间移动。

34. 发明授权

US06288211B1 Method of breaking foam generated from PVC paste resin latex 有权
标题翻译：从PVC糊状树脂胶乳中破泡的方法
公开(公告)号：US06288211B1
公开(公告)日：2001-09-11
申请号：US09656761
申请日：2000-09-07
申请人： Tsuyoshi Yoshida , Tsukasa Makino , Toshihiko Kimura
发明人： Tsuyoshi Yoshida , Tsukasa Makino , Toshihiko Kimura
IPC分类号： C08F616
CPC分类号： B01J19/1881 , B01J2219/00094 , B01J2219/00103 , B01J2219/0011 , C08F6/003 , C08L27/06
摘要： As a method of vacuum recovery of residual monomers from PVC paste resin latex by heating the latex, the present invention is capable of breaking foam derived from foamable PVC paste resin latex after polymerization by utilizing the methods: using a residual monomer vacuum recovery apparatus having a foam separator and transferring the foam which overflows from the vacuum recovery vessel to the foam separator so that the foam makes direct contact with steam causing a breakdown of the foam. This is done without reducing operability, without lowering stable operation, without degrading product quality, and without reducing the solid concentration of the latex.
摘要翻译：作为通过加热胶乳从PVC糊状树脂胶乳中真空回收残留单体的方法，本发明能够通过使用以下方法来破坏聚合后的可发泡PVC浆料树脂胶乳的泡沫：使用残留单体真空回收装置，其具有将泡沫从真空回收容器溢出并转移到泡沫分离器上，使得泡沫与蒸汽直接接触导致泡沫破裂。这样做不会降低可操作性，而不降低稳定的操作，而不降低产品质量，并且不降低胶乳的固体浓度。

35. 发明授权

US07925370B2 Substrate processing system, substrate processing method, sealed container storing apparatus, program for implementing the substrate processing method, and storage medium storing the program 有权
标题翻译：基板处理系统，基板处理方法，密封容器存储装置，用于实施基板处理方法的程序以及存储程序的存储介质
公开(公告)号：US07925370B2
公开(公告)日：2011-04-12
申请号：US12249382
申请日：2008-10-10
申请人： Satoshi Yamazaki , Tsukasa Makino
发明人： Satoshi Yamazaki , Tsukasa Makino
IPC分类号： G06F19/00
CPC分类号： H01L21/67236 , H01L21/67069 , H01L21/67276 , H01L21/67772 , Y10S414/14
摘要： A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus 2 that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF 4 has a enclosure 23 that is connected to the plasma processing apparatus 2 and has a cleaned atmosphere therein, a pod stage 26 on which a pod 3 housing semiconductor wafers W is mounted, a pod mounting portion 24 that carries out removal of semiconductor wafers W from the pod 3 and housing of semiconductor wafers W into the pod 3, and a wafer cassette transfer arm 27 that transfers semiconductor wafers W between the pod stage 26 and the plasma processing apparatus 2 via the enclosure 23. A preliminary loader 5 having a stage-shaped unprocessed pod port 28 that stores a pod 3 housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port 29 that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism 30 that moves the pods 3 between the stage-shaped unprocessed pod port 28 and the pod stage 26, and between the pod stage 26 and the shelf-like processed pod port 29.
摘要翻译：一种基板处理系统，其能够防止灰尘附着到基板上，而不会将洁净室的清洁度提高到预定水平，并且还能够增加基板处理生产量而不增加对工人的负担。等离子体处理装置2，其使半导体晶片W在清洁的气氛中进行等离子体处理。 SMIF 4具有连接到等离子体处理装置2并具有清洁气氛的外壳23，容纳半导体晶片W的容器3的荚台26，进行半导体移除的荚安装部24 来自容器3的晶片W和半导体晶片W的外壳插入到容器3中，以及晶片盒传送臂27，其经由外壳23在荚状台26和等离子体处理装置2之间传送半导体晶片W.一种初步装载器5，具有存储容纳未经受等离子体处理的半导体晶片W的容器3的台状未处理容器端口28，存储容纳已经经受等离子体处理的半导体晶片W的密封容器的搁架状处理容器端口29，等离子体处理和荚运动机构30，其使荚果3在阶梯形未处理的荚果端口28和荚果台26之间以及在荚果阶段26和搁架状进程之间移动 essed pod端口29。

36. 发明授权

US07462011B2 Substrate processing system, substrate processing method, sealed container storing apparatus, program for implementing the substrate processing method, and storage medium storing the program 有权
标题翻译：基板处理系统，基板处理方法，密封容器存储装置，用于实施基板处理方法的程序以及存储程序的存储介质
公开(公告)号：US07462011B2
公开(公告)日：2008-12-09
申请号：US11202317
申请日：2005-08-12
申请人： Satoshi Yamazaki , Tsukasa Makino
发明人： Satoshi Yamazaki , Tsukasa Makino
IPC分类号： H01L21/68 , H01L21/677 , B05C3/02
CPC分类号： H01L21/67236 , H01L21/67069 , H01L21/67276 , H01L21/67772 , Y10S414/14
摘要： A substrate processing system which is capable of preventing dust from becoming attached to substrates without increasing the degree of cleanliness of a clean room to a predetermined level, and also capable of increasing the substrate processing throughput without increasing the burden on workers. a plasma processing apparatus 2 that subjects semiconductor wafers W to plasma processing in a cleaned atmosphere. A SMIF 4 has a enclosure 23 that is connected to the plasma processing apparatus 2 and has a cleaned atmosphere therein, a pod stage 26 on which a pod 3 housing semiconductor wafers W is mounted, a pod mounting portion 24 that carries out removal of semiconductor wafers W from the pod 3 and housing of semiconductor wafers W into the pod 3, and a wafer cassette transfer arm 27 that transfers semiconductor wafers W between the pod stage 26 and the plasma processing apparatus 2 via the enclosure 23. A preliminary loader 5 having a stage-shaped unprocessed pod port 28 that stores a pod 3 housing semiconductor wafers W that have not been subjected to the plasma processing, a shelf-like processed pod port 29 that stores a sealed container housing semiconductor wafers W that have been subjected to the plasma processing, and a pod moving mechanism 30 that moves the pods 3 between the stage-shaped unprocessed pod port 28 and the pod stage 26, and between the pod stage 26 and the shelf-like processed pod port 29.
摘要翻译：一种基板处理系统，其能够防止灰尘附着到基板上，而不会将洁净室的清洁度提高到预定水平，并且还能够增加基板处理生产量而不增加对工人的负担。等离子体处理装置2，其使半导体晶片W在清洁的气氛中进行等离子体处理。 SMIF 4具有连接到等离子体处理装置2并具有清洁气氛的外壳23，容纳半导体晶片W的容器3的荚台26，进行半导体移除的荚安装部24 来自容器3的晶片W和半导体晶片W的外壳插入到容器3中，以及晶片盒传送臂27，其经由外壳23在荚状台26和等离子体处理装置2之间传送半导体晶片W.一种初步装载器5，具有存储容纳未经受等离子体处理的半导体晶片W的容器3的台状未处理容器端口28，存储容纳已经经受等离子体处理的半导体晶片W的密封容器的搁架状处理容器端口29，等离子体处理和荚运动机构30，其使荚果3在阶梯形未处理的荚果端口28和荚果台26之间以及在荚果阶段26和搁架状进程之间移动 essed pod端口29。

37. 发明授权

US06277954B1 Method of stripping for latex of vinyl chloride paste resin, stripping apparatus, and vinyl chloride paste resin latex having low concentration of residual monomer 有权
公开(公告)号：US06277954B1
公开(公告)日：2001-08-21
申请号：US09772077
申请日：2001-01-30
申请人： Tsukasa Makino , Tsuyoshi Yoshida , Toshihiko Kimura
发明人： Tsukasa Makino , Tsuyoshi Yoshida , Toshihiko Kimura
IPC分类号： C08F616
摘要： A method for continuously stripping an unreacted monomer from a vinyl chloride paste resin latex, comprising the steps of continuously supplying the latex to a vacuum recovery vessel, wherein the latex is boiling with generation of foam, under the condition that the temperature of the latex to be supplied is higher than that of the latex in the recovery vessel, withdrawing a monomer gas generated in the recovery vessel through an exhaust line provided with a foam separator, contacting the foam entrained into the exhaust line with steam introduced to the exhaust line and/or the foam separator, thereby destroying the foam, and returning the resulting latex in the separator to the recovery vessel. The unreacted monomer can be efficiently recovered from the latex by a continuous operation, and defoaming can be achieved without deteriorating the quality and without lowering the productivity.

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