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31. 发明授权

US08828856B2 Substrate on which film is formed, and organic EL display device 有权
标题翻译：形成有膜的基板和有机EL显示装置
公开(公告)号：US08828856B2
公开(公告)日：2014-09-09
申请号：US13980873
申请日：2012-01-13
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L21/22 , C23C16/00 , H01L27/32 , C23C14/04 , C23C14/56 , H01L51/56
CPC分类号： H01L27/3295 , C23C14/042 , C23C14/56 , H01L27/3211 , H01L27/3276 , H01L27/3283 , H01L51/56 , H01L2227/323
摘要： Provided is a TFT substrate (10) on which vapor-deposited sections are to be formed by use of a vapor deposition device (50) which includes a vapor deposition source (85) having injection holes (86); and a vapor deposition mask (81) having opening (82) through which vapor deposition particles are deposited to form the vapor-deposited sections. The TFT substrate (10) includes pixels two-dimensionally arranged in a pixel region (AG); and wires (14) electrically connected to the respective pixels. The vapor-deposited sections (Q) are formed with gaps (X) therebetween, and the wires (14) having respective terminals that are disposed in the gaps (X).
摘要翻译：提供了通过使用包括具有喷射孔（86）的气相沉积源（85）的蒸镀装置（50）形成蒸镀部的TFT基板（10）。和具有开口（82）的气相沉积掩模（81），通过蒸镀掩模沉积气相沉积颗粒以形成气相沉积部分。 TFT基板（10）包括像素区域（AG）二维排列的像素。以及电连接到各个像素的导线（14）。气相沉积部分（Q）在它们之间形成有间隙（X），并且具有设置在间隙（X）中的各个端子的导线（14）。

32. 发明申请

US20130340680A1 VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE 审中-公开
标题翻译：蒸气沉积颗粒投影装置和蒸气沉积装置
公开(公告)号：US20130340680A1
公开(公告)日：2013-12-26
申请号：US14004151
申请日：2012-03-05
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L21/02
CPC分类号： H01L51/0011 , C23C14/24 , C23C14/243 , C23C14/564 , H01L21/02104 , H01L51/001 , H01L51/56
摘要： The vapor deposition particle injecting device (20) includes a crucible (22), a holder (21) having at least one injection hole (21a), and plate members (23 through 25) provided in the holder (21). The plate members (23 through 25) have respective openings (23a through 25a) corresponding to the injection hole (21a), and the plate members (23 through 25) are arranged away from each other in a direction perpendicular to the opening planes of the openings. The injection hole (21a) and the openings (23a through 25a) overlap each other in the plan view.
摘要翻译：气相沉积粒子注入装置（20）包括坩埚（22），具有至少一个注入孔（21a）的保持器（21）和设置在保持器（21）中的板构件（23至25）。板构件（23至25）具有与喷射孔（21a）相对应的相应的开口（23a至25a），并且板构件（23至25）在与开口注射孔（21a）和开口（23a至25a）在平面图中彼此重叠。

33. 发明申请

US20130323882A1 VAPOR DEPOSITION PARTICLE EMITTING DEVICE, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD 有权
标题翻译：蒸气沉积颗粒发射装置，蒸气沉积装置，蒸气沉积方法
公开(公告)号：US20130323882A1
公开(公告)日：2013-12-05
申请号：US13985281
申请日：2012-03-07
申请人： Satoshi Inoue , Shinichi Kawato , Tohru Sonoda , Satoshi Hashimoto
发明人： Satoshi Inoue , Shinichi Kawato , Tohru Sonoda , Satoshi Hashimoto
IPC分类号： H01L51/56 , H01L51/50
CPC分类号： H01L51/5012 , B05D1/60 , C23C14/042 , C23C14/243 , C23C14/542 , C23C14/564 , H01L51/0003 , H01L51/56
摘要： A vapor deposition particle injection device (30) includes a vapor deposition particle generating section (41), at least one nozzle stage made of an intermediate nozzle section (51), a vapor deposition particle emitting nozzle section (61), and heat exchangers (43, 63, 53). The vapor deposition particle emitting nozzle section (61) is controlled so as to be at a temperature lower than a temperature at which a vapor deposition material turns into gas. Meanwhile, the intermediate nozzle section (51) is controlled by the heat exchanger (53) so as to be at a temperature between a temperature of the vapor deposition particle generating section (41) and a temperature of the vapor deposition particle emitting nozzle section (61).
摘要翻译：气相沉积粒子注入装置（30）包括气相沉积粒子产生部分（41），由中间喷嘴部分（51），气相沉积粒子发射喷嘴部分（61）和热交换器 43，63，53）。气相沉积粒子发射喷嘴部分（61）被控制在低于气相沉积材料变成气体的温度的温度。同时，中间喷嘴部（51）由热交换器（53）控制，处于蒸镀微粒生成部（41）的温度与蒸镀微粒发射喷嘴部的温度 61）。

34. 发明申请

US20130285038A1 SUBSTRATE TO WHICH FILM IS FORMED AND ORGANIC EL DISPLAY DEVICE 有权
标题翻译：衬底形成电影和有机EL显示设备
公开(公告)号：US20130285038A1
公开(公告)日：2013-10-31
申请号：US13979845
申请日：2012-01-12
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/50
CPC分类号： H01L51/5036 , C23C14/042 , C23C14/24 , H01L27/3276 , H01L51/001 , H01L51/0011 , H01L2227/323
摘要： On the TFT substrate (10), a vapor deposition layer is formed by use of a vapor deposition device (50) which includes (i) a vapor deposition source (85) having injection holes (86) and (ii) a vapor deposition mask (81) having openings (82) through which vapor deposition particles injected from the injection holes (86) are deposited so as to form the vapor deposition layer. The TFT substrate (10) has a plurality of pixels two-dimensionally arranged in a pixel region (AG), and terminals of a plurality of wires (14), which are electrically connected with the plurality of pixels, are gathered outside a vapor deposition layer formation region.
摘要翻译：在TFT基板（10）上，通过使用蒸镀装置（50）形成蒸镀层，该蒸镀装置包括：（i）具有喷射孔（86）的蒸镀源（85）和蒸镀掩模（81），其具有开口（82），沉积从喷射孔（86）喷射的气相沉积颗粒以形成气相沉积层。 TFT基板（10）具有像素区域（AG）二维排列的多个像素，并且与多个像素电连接的多根电线（14）的端子聚集在气相沉积层形成区域。

35. 发明申请

US20130260501A1 VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE 审中-公开
标题翻译：蒸气沉积装置，蒸发沉积方法和制造有机电致发光显示装置的方法
公开(公告)号：US20130260501A1
公开(公告)日：2013-10-03
申请号：US13993677
申请日：2011-12-14
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/00
CPC分类号： H01L51/56 , C23C14/12 , C23C14/24 , C23C14/243 , H01L27/3211 , H01L51/0008 , H01L51/0011 , H01L51/0012 , H01L51/0021 , H01L51/5203 , H01L51/5253 , H05B33/04 , H05B33/10
摘要： A vapor deposition device (50) in accordance with the present invention includes: a vapor deposition source (80) which has a plurality of injection holes (81) from which vapor deposition particles are to be injected towards a film formation substrate (60); a plurality of pipes (83a and 83b); a vapor deposition source crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80); and moving means for moving the film formation substrate (60) relative to the vapor deposition source (80). The pipes (83a and 83b) are connected to first and second sides of the vapor deposition source (80) on one end side and the other end side, respectively, of a line of the injection holes (81).
摘要翻译：根据本发明的气相沉积装置（50）包括：气相沉积源（80），其具有多个喷射孔（81），气相沉积颗粒将从该注入孔向成膜基底（60）注入; 多个管道（83a和83b）; 用于将气相沉积颗粒供应到气相沉积源（80）的蒸镀源坩埚（82）; 以及用于相对于气相沉积源（80）移动成膜衬底（60）的移动装置。管道（83a和83b）分别在喷射孔（81）的一行的一端侧和另一端侧连接到气相沉积源（80）的第一和第二侧。

36. 发明申请

US20130260499A1 VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE 有权
标题翻译：蒸气沉积装置，蒸发沉积方法和制造有机电致发光显示装置的方法
公开(公告)号：US20130260499A1
公开(公告)日：2013-10-03
申请号：US13992613
申请日：2011-12-07
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/00
CPC分类号： H01L51/0008 , C23C14/24 , C23C14/243 , C23C14/246 , C23C14/568 , H01L27/3211 , H01L51/56
摘要： A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), including: a vapor deposition source (91) which has a plurality of injection holes (92) from which vapor deposition particles are to be injected towards the film formation substrate (60), the plurality of injection holes (92) being arranged in a line or in a plurality of lines; a vapor deposition crucible (93) for supplying the vapor deposition particles to the vapor deposition source (91) via a pipe (94), the pipe being connected to the vapor deposition source (91) on a side where one end of the line(s) of the plurality of injection holes (92) is located; moving means for moving the film formation substrate (60) relative to the vapor deposition source(s) (91); and a rotation mechanism (100) for rotating the vapor deposition source (91).
摘要翻译：根据本发明的蒸镀装置（50）是在成膜基板（60）上形成膜的蒸镀装置，其特征在于，包括：具有多个喷射孔（92）的蒸镀源（91）从该气相沉积粒子向成膜基板（60）喷射，多个喷射孔（92）以一行或多条线排列; 一种用于通过管道（94）将气相沉积颗粒供应到气相沉积源（91）的气相沉积坩埚（93），该管道连接到气相淀积源（91）的一端（92）的位置; 用于相对于气相沉积源（91）移动成膜衬底（60）的移动装置; 以及用于旋转气相沉积源（91）的旋转机构（100）。

37. 发明授权

US09297547B2 Control device for varying the angle of air conditioning discharge flaps 有权
标题翻译：用于改变空调排放襟翼角度的控制装置
公开(公告)号：US09297547B2
公开(公告)日：2016-03-29
申请号：US13497701
申请日：2010-09-17
申请人： Gen Kumamoto , Satoshi Hashimoto
发明人： Gen Kumamoto , Satoshi Hashimoto
IPC分类号： F24F11/00 , F24F1/00 , F24F11/02
CPC分类号： F24F11/0078 , F24F1/0011 , F24F1/0014 , F24F11/30 , F24F11/64 , F24F11/65 , F24F11/72 , F24F11/79 , F24F11/85 , F24F13/1413 , F24F2001/0037 , F24F2110/10
摘要： A control device controls a swing action of flaps of an air conditioning apparatus. The flaps are swung up and down. The control device includes an operation mode determining section, a swing pattern storage area and a control command generator. The operation mode determining section determines at least an air-cooling operation mode and an air-warming operation mode that are operation modes of the air conditioning apparatus. The swing pattern storage area stores a plurality of swing patterns that include information pertaining to the swing action. The control command generator generates a control command of the air conditioning apparatus on the basis of a swing pattern corresponding to the mode determined by the operation mode determining section from among the plurality of swing patterns.
摘要翻译：控制装置控制空调装置的襟翼的摆动动作。襟翼上下摆动。控制装置包括操作模式确定部，摆动模式存储区和控制指令发生器。操作模式确定部至少确定作为空调装置的操作模式的制冷运转模式和制热运转模式。摆动图案存储区域存储包括与摆动动作有关的信息的多个摆动图案。控制指令发生器根据与多个摆动模式中由操作模式确定部分确定的模式相对应的摆动模式，生成空调装置的控制命令。

38. 发明授权

US08293038B2 Ferritic stainless steel casting and sheet and method for producing the same 有权
标题翻译：铁素体不锈钢铸件及其制造方法
公开(公告)号：US08293038B2
公开(公告)日：2012-10-23
申请号：US11985296
申请日：2007-11-13
申请人： Akihiko Takahashi , Junichi Hamada , Ken Kimura , Takashi Morohoshi , Yoshihito Yamada , Toyohiko Kakihara , Satoshi Hashimoto
发明人： Akihiko Takahashi , Junichi Hamada , Ken Kimura , Takashi Morohoshi , Yoshihito Yamada , Toyohiko Kakihara , Satoshi Hashimoto
IPC分类号： C22C38/00
CPC分类号： C22C38/002 , C21C5/005 , C21C7/0006 , C21C7/005 , C21D8/021 , C21D8/0268 , C21D8/0273 , C21D8/041 , C21D8/0468 , C21D8/0473 , C21D2211/005 , C22C38/004 , C22C38/28
摘要： The present invention provides a ferritic stainless steel casting and a sheet thereof excellent in deep drawability, punch stretchability and ridging resistance and a method for producing the casting and the sheet. In the present invention, a chemical composition is controlled so that the amounts of C, N, Si, Mn, P and Ti may be reduced to the utmost for securing high workability and, on the basis of the chemical composition, the roping and ridging of a steel sheet product is reduced by adding Mg, thus dispersing Mg containing oxides that accelerate the formation of nuclei for solidification and, resultantly, suppressing the development of coarse columnar crystals in a casting. The present invention is characterized in that the average composition of the Mg containing oxides dispersing in a casting satisfies the following expressions and , 17.4(Al2O3)+3.9(MgO)+0.3(MgAl2O4)+18.7(CaO)≦500 , (Al2O3)+(MgO)+(MgAl2O4)+(CaO)≧95 .
摘要翻译：本发明提供一种铁素体不锈钢铸件及其深冲性，冲压伸缩性和抗皱性优异的片材以及铸造和片材的制造方法。在本发明中，化学成分被控制为使得可以将C，N，Si，Mn，P和Ti的量最大限度地降低以确保高的可加工性，并且基于化学成分，卷绕和起皱通过添加Mg来还原钢板产品，从而分散加速形成核固化的含Mg氧化物，从而抑制铸造中的粗大柱状晶体的发展。本发明的特征在于，分散在铸件中的含Mg氧化物的平均组成满足以下表达式2和3，17.4（Al 2 O 3）+3.9（MgO）+0.3（MgAl 2 O 4）+18.7（CaO）＆Al; 500 2，（Al 2 O 3）+（MgO）+（MgAl 2 O 4）+（CaO）≥953。

39. 发明申请

US20120264519A1 Center Device 有权
标题翻译：中心设备
公开(公告)号：US20120264519A1
公开(公告)日：2012-10-18
申请号：US13532043
申请日：2012-06-25
申请人： Mariko Hino , Satoshi Hashimoto , Ken Kutaragi
发明人： Mariko Hino , Satoshi Hashimoto , Ken Kutaragi
IPC分类号： A63F9/24
CPC分类号： A63F13/73 , A63F13/00 , A63F13/212 , A63F13/235 , A63F13/24 , A63F13/79 , A63F2300/1012 , A63F2300/1031 , A63F2300/201 , A63F2300/208 , A63F2300/8088 , G06F3/0482 , G06F21/305 , G06F21/31 , G06F21/445 , G06F2221/0797 , G06F2221/2109 , G08B5/36 , H04L63/08 , H04L63/0876 , H04L67/38
摘要： To provide a center device for accommodating a variety of situations which may occur when a home-use game machine, or the like, is used, in which a plurality of users use their own controller devices such as an input device. A center device communicates with a plurality of devices in either a wired or radio manner, receives an instruction operation from a user of each device, and carries out a process based on the instruction operation, the plurality of devices each having unique identifier, including: a unit that obtains an identifier of a device; a unit that provides information concerning the device, the identifier of the device is not associated with the identifier of the user; and a unit that associates the identifier of the device selected by the user, the identifier of the user is already associated with the identifier of another device, with the identifier of the user.
摘要翻译：为了提供用于适应当使用家用游戏机等时可能发生的各种情况的中心设备，其中多个用户使用其自己的控制器设备，例如输入设备。中心设备以有线或无线方式与多个设备通信，从每个设备的用户接收指令操作，并且执行基于指令操作的处理，所述多个设备各自具有唯一的标识符，包括：获取设备的标识符的单元; 提供关于设备的信息的单元，设备的标识符不与用户的标识符相关联; 以及将用户选择的设备的标识符与用户的标识符相关联的单元已经与另一设备的标识符相关联的用户的标识符。

40. 发明申请

US20110257794A1 LOAD PROCESSING BALANCE SETTING APPARATUS 失效
标题翻译：负载处理平衡设定装置
公开(公告)号：US20110257794A1
公开(公告)日：2011-10-20
申请号：US13139752
申请日：2009-12-21
申请人： Atsushi Nishino , Satoshi Hashimoto
发明人： Atsushi Nishino , Satoshi Hashimoto
IPC分类号： G05D23/19 , G06F1/32
CPC分类号： F24F11/30 , F24F11/46 , F24F11/54 , F24F11/62
摘要： A load processing balance setting apparatus includes first and second air-conditioners for targeted first and second areas, a calculating unit, a determining unit and an adjusting unit. The first area is included within the second area. The calculating unit calculates a sum of an air-conditioning load for the first and second air-conditioners. Preferably, the determining unit determines a first and second processing throughputs for the first and second air-conditioners so that a COP (Coefficient of Performance) for the sum of the air-conditioning loads calculated by the calculating unit is maximized or is equal to or greater than a predetermined level, or so that a power consumption level for the sum of the air-conditioning loads calculated by the calculating unit is minimized or is equal to or less than a predetermined level. The adjusting unit controls the first and second air-conditioners based on the first and second processing throughputs.
摘要翻译：负载处理平衡设定装置包括用于目标的第一和第二区域的第一和第二空调器，计算单元，确定单元和调整单元。第一个区域包括在第二个区域内。计算单元计算第一和第二空调的空调负荷的总和。优选地，确定单元确定第一和第二空调的第一和第二处理吞吐量，使得由计算单元计算的空调负载之和的COP（性能的系数）最大化或等于或等于大于预定水平，或者使得由计算单元计算的空调负载之和的功率消耗水平被最小化或者等于或小于预定水平。调整单元基于第一和第二处理吞吐量来控制第一和第二空调。

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