会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 35. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US06396563B2
    • 2002-05-28
    • US09758191
    • 2001-01-12
    • Masaru NikaidoTomoaki IshinoTetsuya Tadokoro
    • Masaru NikaidoTomoaki IshinoTetsuya Tadokoro
    • G03B23752
    • G03B27/42
    • An exposure apparatus comprises mask support portions, which support photo masks each having an exposure pattern thereon for movement between an exposure position in which the masks are in contact with a to-be-exposed object and a separate position in which the masks are kept off the object. Exposure light sources are used to expose the to-be-exposed object through the photo masks that are located in the exposure position. A clean air supplier runs clean air from a first supply portion into regions between the to-be-exposed object and the photo masks to prevent penetration of foreign substances when the photo masks are moved to the separate position. When the photo masks are moved to the exposure position, the supplier feeds clean air from a second supply portion onto the respective outer surfaces of the photo masks, thereby cooling the photo masks.
    • 曝光装置包括掩模支撑部分,其支撑各自具有曝光图案的光掩模,用于在掩模与待曝光物体接触的曝光位置和掩模被保持关闭的分离位置之间移动 物体。 曝光光源用于通过位于曝光位置的照相掩模曝光被曝光物体。 清洁空气供应器将清洁空气从第一供应部分运送到待曝光物体和照相掩模之间的区域中,以防止当光掩模移动到分离位置时异物渗透。 当光掩模移动到曝光位置时,供应商将清洁空气从第二供应部分供给到光掩模的相应外表面上,从而冷却光掩模。
    • 40. 发明授权
    • Heat-resistant insulating coating material and thermal head making use
thereof
    • 使用耐热绝缘涂层材料和热敏头
    • US5157107A
    • 1992-10-20
    • US400086
    • 1989-08-29
    • Masaru NikaidoHikaru OkunoyamaKatsumi YanagibashiYoshiaki Ouchi
    • Masaru NikaidoHikaru OkunoyamaKatsumi YanagibashiYoshiaki Ouchi
    • B41J2/335C08G73/10H01B3/30H05K1/00H05K1/03
    • B41J2/33525B41J2/3353B41J2/33535B41J2/3355B41J2/3357B41J2/3359C08G73/1007C08G73/106H01B3/30H05K1/0346H05K3/4676
    • A polymeric acid is synthesized by the ring-opening poly-addition reaction using a biphenyl tetracarboxylic acid as a tetracarboxylic acid moiety and an aromatic diamine, particularly p-phenylene diamine, as a diamine moiety. An aromatic polyimide resin layer possessing a highly desirable heat-resisting property as a heat-resistant insulating coating material and excelling in adhesive strength relative to a substrate is obtained by adjusting the polymeric acid in viscosity with a suitable organic solvent, applying the resultant polyamic acid on a substrate, and firing the applied layer of the polyamic acid. The substrate, for example, is a conductor layer formed as with copper and used as a multi-layer wiring board for hybrid IC's. In a thermal head which is obtained by forming an insulating layer on a metallic substrate and superposing a multiplicity of heat-generating resistors and conductors connected severally to the heat-generating resistors on insulating layer, the aforementioned aromatic polyamide resin layer is formed on the metallic substrate. This aromatic polyimide resin layer as an insulating layer in the thermal head withstands harsh working temperature conditions and adheres strongly to the metallic substrate. Thus, it manifests various outstanding effects.
    • 通过使用联苯四羧酸作为四羧酸部分和芳族二胺,特别是对苯二胺作为二胺部分的开环多加反应合成聚合酸。 通过用合适的有机溶剂调节聚合酸的粘度,得到具有耐热绝缘涂层材料的耐热性优异的芳族聚酰亚胺树脂层,并且相对于基材具有优异的粘合强度,将得到的聚酰胺酸 在基材上,并焙烧所述聚酰胺酸的涂覆层。 基板例如是与铜形成的导体层,用作混合IC的多层布线基板。 在通过在金属基板上形成绝缘层并将多个发热电阻体和导体分别叠加在绝缘层上的发热电阻器上而获得的热敏头中,上述芳族聚酰胺树脂层形成在金属 基质。 作为热敏头中的绝缘层的芳香族聚酰亚胺树脂层可以承受恶劣的工作温度条件,并且强烈地粘附到金属基底上。 因此,它表现出各种突出的效果。