专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20060273488A1 Processing apparatus, processing method, and process for producing chip 有权
标题翻译：加工设备，加工方法和生产芯片的工艺
公开(公告)号：US20060273488A1
公开(公告)日：2006-12-07
申请号：US11448033
申请日：2006-06-07
申请人： Junichi Seki , Masao Majima , Nobuhito Suehira
发明人： Junichi Seki , Masao Majima , Nobuhito Suehira
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint apparatus includes a first holding portion 1000 for holding a mold; a second holding portion 1040 for holding a member to be processed; and a support portion 1050 for partially supporting the member to be processed at a position opposite to the mold held by said first holding portion. The mold and the support portion determines a pressurizing axis for pressurizing the member to be processed. The support portion and the second holding portion are movable relative to each other, independently of said first holding portion, in a direction parallel to the pressurizing axis so that said support portion is moved apart from the member to be processed.
摘要翻译：压印装置包括用于保持模具的第一保持部分1000; 用于保持待处理部件的第二保持部1040; 以及用于在与由所述第一保持部保持的模具相对的位置处部分地支撑待加工构件的支撑部分1050。模具和支撑部分确定用于对待处理的构件加压的加压轴线。支撑部分和第二保持部分可以在平行于加压轴线的方向上相对于所述第一保持部分彼此相对移动，使得所述支撑部分与被处理部件分离。

32. 发明申请

US20060272535A1 Process for producing member having pattern, pattern transfer apparatus, and mold 有权
标题翻译：用于制造具有图案，图案转印装置和模具的构件的方法
公开(公告)号：US20060272535A1
公开(公告)日：2006-12-07
申请号：US11410892
申请日：2006-04-26
申请人： Junichi Seki , Masao Majima , Nobuhito Suehira
发明人： Junichi Seki , Masao Majima , Nobuhito Suehira
IPC分类号： B41F3/34
CPC分类号： G03F7/70 , B29C43/021 , B29C43/14 , B29C59/022 , B29C2043/025 , B29C2043/144 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A pattern transfer apparatus is constituted by a first mold holding portion for holding a first mold for forming a pattern inside a peripheral area of a member and a second mold holding portion for holding a second mold for forming a pattern in the peripheral area of the member.
摘要翻译：图案转印装置由第一模具保持部分构成，第一模具保持部分用于保持用于在构件的周边区域内形成图案的第一模具和第二模具保持部分，用于在构件的周边区域中保持用于形成图案的第二模具。

33. 发明授权

US08845317B2 Alignment method, imprint method, alignment apparatus, and position measurement method 有权
标题翻译：校准方法，压印方法，校准装置和位置测量方法
公开(公告)号：US08845317B2
公开(公告)日：2014-09-30
申请号：US11719878
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00 , B29C43/58 , B82Y10/00 , G03F9/00 , B82Y40/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/703 , G03F9/7049 , G03F9/7088
摘要： An imprint apparatus for performing alignment between a mold and a substrate and imprinting a pattern of the mold to a layer of the substrate. A holder holds the mold. A stage holds the substrate opposite to the mold held by the holder. A microscope, including an image pickup device, detects a first alignment mark formed in the mold, via a first image pickup area of the image pickup device, and detects a second alignment mark formed in the substrate, via a second image pickup area of the image pickup device. The first and second image pickup areas do not overlap with each other. A contrast of signals obtained by the image pickup device is adjusted with respect to each of the first and second image pickup areas, and the alignment is performed by changing relative positions of the holder and the stage based on first information about a deviation of the detected first alignment mark from a predetermined position in the first image pickup area and second information about a deviation of the detected second alignment mark from a predetermined position in the second image pickup area.
摘要翻译：一种用于在模具和基板之间进行对准并将模具的图案压印到基板的层的压印装置。持有人持有模具。阶段保持与由保持器保持的模具相对的基板。包括图像拾取装置的显微镜经由图像拾取装置的第一图像拾取区域检测在模具中形成的第一对准标记，并且经由第二图像拾取区域检测形成在基板中的第二对准标记图像拾取装置。第一和第二摄像区域彼此不重叠。基于图像拾取装置获得的信号的对比度相对于第一和第二图像拾取区域中的每一个被调整，并且通过基于关于检测到的偏移的第一信息来改变保持器和台的相对位置来执行对准第一对准标记从第一图像拾取区域中的预定位置开始，以及关于所检测到的第二对准标记与第二图像拾取区域中的预定位置的偏差的第二信息。

34. 发明申请

US20110272840A1 Light Transmissive Mold and Apparatus For Imprinting a Pattern Onto a Material Applied on a Semiconductor Workpiece and Related Methods 有权
标题翻译：光透射模具和用于将图案印刷在应用于半导体工件上的材料上的装置及相关方法
公开(公告)号：US20110272840A1
公开(公告)日：2011-11-10
申请号：US13153512
申请日：2011-06-06
申请人： Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
IPC分类号： B29C59/02 , B29C43/58 , C03C25/68 , B29C43/00
CPC分类号： G03F9/7084 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076
摘要： A light transmissive mold used for imprinting a pattern onto a material applied on a semiconductor workpiece. The mold includes a first surface having an area of a pattern to be imprinted onto the material, a second surface located opposite from the first surface, and a third surface disposed between the first surface and the second surface, at a position inwardly away from the first surface. The third surface is arranged opposite to an area of the workpiece subjected to dicing. An alignment structure, provided for alignment between the mold and the workpiece, is formed in the third surface.
摘要翻译：用于将图案压印到施加在半导体工件上的材料上的透光模具。模具包括具有待印在材料上的图案区域的第一表面，与第一表面相对的第二表面和设置在第一表面和第二表面之间的第三表面，第一表面。第三表面布置成与被切割的工件的区域相对。在第三表面中形成有用于在模具和工件之间对准的对准结构。

35. 发明授权

US07884935B2 Pattern transfer apparatus, imprint apparatus, and pattern transfer method 有权
标题翻译：图案转印装置，压印装置和图案转印方法
公开(公告)号：US07884935B2
公开(公告)日：2011-02-08
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00 , G01B15/00 , G01N21/86 , G01V8/00 , B41F1/34 , B41F21/12 , B41F21/14 , B41L1/02 , B29C45/76 , B29C35/08 , B29C35/12 , B29C47/92 , B29C47/96 , B29B13/00 , B29B15/00 , B28B17/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.
摘要翻译：图案转印装置将形成在具有对准标记的模具上的印模图案转印到具有对准标记的基板上的树脂材料上。第一图像拾取装置获取位于第一对象位置的对象的图像。第二图像拾取装置获取位于第二对象位置的对象的图像。第二物体位置比第一物体位置更远离模具的对准标记。光学系统形成位于第一物体位置的物体的图像和位于第二物体位置的物体的图像。基于获得的关于参考基板的对准标记的图像的位置和基板的对准标记获得的第一和第二信息进行对准，以将印刷图案转印到树脂材料上。

36. 发明授权

US07828984B2 Imprint method, imprint apparatus, and process for producing chip 有权
标题翻译：压印方法，压印装置和制造芯片的工艺
公开(公告)号：US07828984B2
公开(公告)日：2010-11-09
申请号：US11548525
申请日：2006-10-11
申请人： Junichi Seki , Nobuhito Suehira
发明人： Junichi Seki , Nobuhito Suehira
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/56 , B82Y10/00 , B82Y40/00
摘要： An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.
摘要翻译：用于将模具的印模图案压印到基板上的图案形成材料上以便实现高生产量的压印方法包括使压印图案和图案形成材料彼此接触的步骤; 在模具和基板之间施加第一压力以增加压印图案和图案形成材料之间的接触面积; 以及在低于所述第一压力的第二压力下调节所述模具和所述基板之间的位置关系。

37. 发明申请

US20080073604A1 IMPRINT APPARATUS AND IMPRINT METHOD 有权
标题翻译： IMPRINT设备和印刷方法
公开(公告)号：US20080073604A1
公开(公告)日：2008-03-27
申请号：US11851006
申请日：2007-09-06
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G06K9/00
CPC分类号： G03F9/7088 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G06K9/325
摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.
摘要翻译：一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

38. 发明申请

US20070242272A1 PATTERN TRANSFER APPARATUS, IMPRINT APPARATUS, AND PATTERN TRANSFER METHOD 有权
标题翻译：图案转印装置，印刷装置和图案转印方法
公开(公告)号：US20070242272A1
公开(公告)日：2007-10-18
申请号：US11736696
申请日：2007-04-18
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina , Koichi Sentoku
IPC分类号： G01B11/00
CPC分类号： G03F7/0002 , B41M3/00 , B41M2205/26 , B82Y10/00 , B82Y40/00 , G03F9/00 , G03F9/7015 , G03F9/7042 , G03F9/7088
摘要： A pattern transfer method for transferring an imprinting pattern formed on a mold provided with an alignment mark onto a substrate provided with an alignment mark or a resin material interposed between the substrate and the mold includes a first step for obtaining a first image by disposing the alignment mark provided to the mold and an alignment mark provided to a reference substrate at a first object position and observing the alignment marks through a first image pickup portion, a second step for obtaining a second image by disposing the alignment mark provided to the reference substrate at a second object position spaced apart from the first object position and observing the alignment mark through a second image pickup portion, and a third step for obtaining information about a difference in image position between the alignment marks by using the first and second images.
摘要翻译：用于将形成在具有对准标记的模具上形成的压印图案转印到设置有在基板和模具之间的对准标记或树脂材料的基板上的图案转印方法包括：第一步骤，通过设置对准来获得第一图像提供给模具的标记和在第一物体位置处提供给参考基板的对准标记，并且通过第一图像拾取部分观察对准标记;第二步骤，通过将设置在参考基板上的对准标记设置在第二图像与第一对象位置间隔开的第二对象位置，并通过第二图像拾取部分观察对准标记;以及第三步骤，通过使用第一和第二图像来获得关于对准标记之间的图像位置差异的信息。

39. 发明申请

US20070035056A1 IMPRINT APPARATUS AND IMPRINT METHOD 有权
标题翻译： IMPRINT设备和印刷方法
公开(公告)号：US20070035056A1
公开(公告)日：2007-02-15
申请号：US11462187
申请日：2006-08-03
申请人： Nobuhito Suehira , Junichi Seki , Masao Majima
发明人： Nobuhito Suehira , Junichi Seki , Masao Majima
IPC分类号： B29C35/08
CPC分类号： B29C35/0288 , B29C35/0888 , B29C59/02 , B29C2035/0827 , B29C2059/023 , Y10S977/887
摘要： An imprint apparatus for imprinting a pattern formed on a mold in a resin material formed on a substrate with accuracy is constituted by a light source for irradiating the resin material with light for curing the resin material; a measuring device for measuring a physical value which reflects a state of the resin material resulting from the irradiation of light from the light source; and a controller for controlling a spatial positional relationship between the mold and the substrate or an amount of light from the light source on the basis of information obtained from the measuring device.
摘要翻译：用于在形成在基板上的树脂材料中的模具上形成的图案的压印精度的压印装置由用于照射树脂材料的光用于固化树脂材料的光源构成; 测量装置，用于测量反映由所述光源照射光产生的树脂材料的状态的物理值; 以及控制器，其基于从测量装置获得的信息来控制模具和基板之间的空间位置关系或来自光源的光量。

40. 发明授权

US09046793B2 Light transmissive mold and apparatus for imprinting a pattern onto a material applied on a semiconductor workpiece and related methods 有权
标题翻译：用于将图案压印到施加在半导体工件上的材料上的透光模具和设备及相关方法
公开(公告)号：US09046793B2
公开(公告)日：2015-06-02
申请号：US13153512
申请日：2011-06-06
申请人： Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Masao Majima , Atsunori Terasaki , Hideki Ina
IPC分类号： B29C59/02 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00
CPC分类号： G03F9/7084 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076
摘要： A light transmissive mold used for imprinting a pattern onto a material applied on a semiconductor workpiece. The mold includes a first surface having an area of a pattern to be imprinted onto the material, a second surface located opposite from the first surface, and a third surface disposed between the first surface and the second surface, at a position inwardly away from the first surface. The third surface is arranged opposite to an area of the workpiece subjected to dicing. An alignment structure, provided for alignment between the mold and the workpiece, is formed in the third surface.
摘要翻译：用于将图案压印到施加在半导体工件上的材料上的透光模具。模具包括具有待印在材料上的图案区域的第一表面，与第一表面相对的第二表面和设置在第一表面和第二表面之间的第三表面，第一表面。第三表面布置成与被切割的工件的区域相对。在第三表面中形成有用于在模具和工件之间对准的对准结构。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式