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31. 发明授权

US5213841A Metal accelerator 失效
标题翻译：金属加速器
公开(公告)号：US5213841A
公开(公告)日：1993-05-25
申请号：US523713
申请日：1990-05-15
申请人： Michael Gulla , Prasit Sricharoenchaikit
发明人： Michael Gulla , Prasit Sricharoenchaikit
IPC分类号： C23C18/30 , C23C18/28
CPC分类号： C23C18/28
摘要： A process for metal plating characterized by use of an accelerator solution of a metal reducible by stannous tin between a step of catalysis and metal deposition.

32. 发明授权

US5203911A Controlled electroless plating 失效
标题翻译：控制电镀
公开(公告)号：US5203911A
公开(公告)日：1993-04-20
申请号：US719979
申请日：1991-06-24
申请人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
发明人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
IPC分类号： C23C18/20 , C23C18/31 , C23C18/34 , C23C18/52 , H05K3/18
CPC分类号： C23C18/52
摘要： A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.

33. 发明授权

US5158860A Selective metallization process 失效
标题翻译：选择性金属化过程
公开(公告)号：US5158860A
公开(公告)日：1992-10-27
申请号：US607711
申请日：1990-11-01
申请人： Michael Gulla , Prasit Sricharoenchaikit
发明人： Michael Gulla , Prasit Sricharoenchaikit
IPC分类号： H05K3/02 , C23C18/16 , G03F7/20 , H05K3/18
CPC分类号： G03F7/2022 , C23C18/1608 , C23C18/1612 , C23C18/204 , C23C18/285 , C23C18/30 , C23C18/32 , C23C18/38 , H05K3/184 , H05K2203/0505 , H05K2203/0706 , H05K2203/1415
摘要： A process for selective metallization comprising the steps of providing a substrate coated with a photoresist, imaging the photoresist coating by exposure to pattern radiation and development, flood exposing the photoresist coating to activating radiation, depositing an electroless plating catalyst over the entire imaged photoresist coating and bared underlying substrate, removing the top surface of the flood exposed, catalyzed photoresist coating by development whereby plating catalyst remains in a desired selective pattern and depositing metal over the catalyzed surface to form a metal deposit in a selective pattern such as in a circuit pattern. The process is suitable for the manufacture of diverse articles including printed circuit boards.

34. 发明授权

US4751110A Radiation attenuation shielding 失效
标题翻译：辐射衰减屏蔽
公开(公告)号：US4751110A
公开(公告)日：1988-06-14
申请号：US885468
申请日：1986-07-14
申请人： Michael Gulla , Terrell A. Benjamin , Mark Farsi
发明人： Michael Gulla , Terrell A. Benjamin , Mark Farsi
IPC分类号： C23C18/50 , H05K1/02 , H05K3/24
CPC分类号： C23C18/50 , H05K3/24 , H05K1/0218
摘要： An electromagnetic radiation attenuating coating comprising an electronic housing base material coating with a first electroless metal alloy of copper, a member from the group of nickel, cobalt and mixtures of nickel and cobalt, and phosphorus rich in copper and a second electroless metal alloy of copper, a member from the group of nickel, cobalt and mixtures of nickel land cobalt, and phosphorus rich in nickel. The coating provides superior radiation attenuation and comprises fewer processing steps in its formation.
摘要翻译：一种电磁辐射衰减涂层，其包括电子壳体基材涂层，其具有铜，来自镍，钴和镍和钴的混合物的第一无电金属合金和富含铜的磷以及铜的第二无电金属合金，来自镍，钴和镍土钴的混合物以及富含镍的磷的成员。涂层提供优异的辐射衰减，并且在其形成中包括更少的加工步骤。

35. 发明授权

US4511403A Immersion tin composition and process for using 失效
标题翻译：浸锡组成及使用过程
公开(公告)号：US4511403A
公开(公告)日：1985-04-16
申请号：US112781
申请日：1980-01-16
申请人： Alfred P. Orio , Leonard R. Levy , Michael Gulla
发明人： Alfred P. Orio , Leonard R. Levy , Michael Gulla
IPC分类号： C23C18/31 , C23C3/02
CPC分类号： C23C18/31
摘要： This invention is for an immersion tin plating composition capable of depositing tin over metallic surfaces displaceable by tin and to processes using the same. The composition is characterized by an inhibitor that improves the plating characteristics of the solution and permits an increased ratio of thiourea to tin at a relatively high tin concentration without formation of "black tin". The tin plating compositions of this invention are capable of providing an increased yield of good quality tin compared to prior art tin plating compositions.
摘要翻译：本发明涉及一种浸锡电镀组合物，其能够在由锡可置换的金属表面上沉积锡，并使用该镀锡组合物。组合物的特征在于改善溶液的电镀特性的抑制剂，并且允许在相对高的锡浓度下硫脲与锡的比例增加而不形成“黑锡”。与现有技术的镀锡组合物相比，本发明的镀锡组合物能够提供优质锡的提高的产率。

36. 发明授权

US4419183A Etchant 失效
标题翻译：蚀刻剂
公开(公告)号：US4419183A
公开(公告)日：1983-12-06
申请号：US458956
申请日：1983-01-18
申请人： Michael Gulla , Marc Connelly
发明人： Michael Gulla , Marc Connelly
IPC分类号： C23F1/18 , H05K3/06 , H05K3/22 , C23F1/00 , B44C1/22
CPC分类号： C23F1/18 , H05K3/067 , H05K3/22
摘要： An etchant, especially for copper, comprising sulfuric acid and hydrogen peroxide and characterized by the inclusion of a small amount of tungsten in an amount sufficient to increase the surface area of the etched metal.
摘要翻译：特别是对于铜的蚀刻剂，包括硫酸和过氧化氢，其特征在于包含足以增加蚀刻金属表面积的量的少量钨。

37. 发明授权

US4404357A High temperature naphthol novolak resin 失效
标题翻译：高温萘酚酚醛清漆树脂
公开(公告)号：US4404357A
公开(公告)日：1983-09-13
申请号：US374054
申请日：1982-05-03
申请人： Paul Taylor , Michael Gulla
发明人： Paul Taylor , Michael Gulla
IPC分类号： C08G8/04 , C08G8/24
CPC分类号： C08G8/04
摘要： Novel resins are disclosed that are the reaction products of an aldehyde and an aromatic alcohol mixture of naphthol, preferably 1-naphthol, and a phenol. The molar ratio of the naphthol to the phenol in the reaction mixture can vary from about 20 to 1 to 1 to 20. The resins are formed by condensing the aldehyde with the aromatic alcohol mixture in the presence of an acid catalyst where the molar ratio of the aromatic alcohol to aldehyde is less than 1. The resins of the invention are characterized by melt temperature higher than the melt temperatures of conventional novolak resins.
摘要翻译：公开了萘酚，优选1-萘酚和苯酚的醛和芳族醇混合物的反应产物的新型树脂。反应混合物中萘酚与苯酚的摩尔比可以在约20至1至1至20之间变化。该树脂通过在酸催化剂存在下将醛与芳族醇混合物缩合而形成，其中摩尔比芳族醇与醛的摩尔比小于1.本发明的树脂的特征在于熔体温度高于常规酚醛清漆树脂的熔融温度。

38. 发明授权

US4124399A Stabilized electroless plating solutions 失效
标题翻译：稳定化学镀电解液
公开(公告)号：US4124399A
公开(公告)日：1978-11-07
申请号：US832937
申请日：1977-09-13
申请人： Michael Gulla , Christy Savas
发明人： Michael Gulla , Christy Savas
IPC分类号： C23C18/40 , C23C3/02
CPC分类号： C23C18/40
摘要： An electroless copper plating solution is characterized by the addition of a small but effective amount of a source of gallium ions for improved stability alone or in combination with a secondary stabilizer.
摘要翻译：化学镀铜溶液的特征在于添加少量但有效量的镓离子源，以改善单独的稳定性或与二级稳定剂的组合。

39. 发明授权

US3936316A Pickling solution 失效
标题翻译：酸洗液
公开(公告)号：US3936316A
公开(公告)日：1976-02-03
申请号：US310371
申请日：1972-11-29
申请人： Michael Gulla
发明人： Michael Gulla
IPC分类号： C23G1/02 , C09K13/06
CPC分类号： C23G1/02
摘要： The invention is for a process and composition for pickling metals, especially iron based metals, prior to metal finishing. A hydrohalide acid pickling solution is used which solution is characterized by the addition of urea. The urea substantially reduces, even completely eliminates, the excessive liberation of noxious and corrosive hydrohalide acid fumes normally associated with such pickling operations. This is an advantage as it greatly reduces the cost of the pickling operation as the consumption of acid is dramatically reduced. Moreover, there is less injury to personnel and equipment contacted with said fumes. Finally, a metal surface treated with the pickling solution of the invention is improved as there is less pitting and the surface is more active to a metal depositing solution.
摘要翻译：本发明涉及在金属精加工之前酸洗金属，特别是铁基金属的方法和组合物。使用氢卤酸浸酸溶液，其特征在于加入尿素。尿素基本上减少，甚至完全消除了通常与这种酸洗操作相关的有毒和腐蚀性氢卤素酸烟雾的过度释放。这是一个优点，因为大大降低了酸的消耗量，酸洗操作的成本。此外，与所述烟雾接触的人员和设备的伤害较少。最后，利用本发明的酸洗溶液处理的金属表面得到改善，因为较少的点蚀和表面对金属沉积溶液的活性更高。

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