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31. 发明授权

US08917378B2 Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area 有权
标题翻译：曝光方法，曝光装置和具有多个投影光学系统的装置的制造方法以及具有第一部分图案区域的图案和具有第一部分图案区域的覆盖区域的第二局部区域
公开(公告)号：US08917378B2
公开(公告)日：2014-12-23
申请号：US12261741
申请日：2008-10-30
申请人： Kei Nara
发明人： Kei Nara
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70791 , G03F7/70275
摘要： A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of the projection system by the magnifying magnification; and successively transferring onto the substrate an image, projected by an associated projection system, of a first pattern provided in a first partial pattern area in each pattern area and an image, projected by the associated projection system, of a second pattern provided in a second partial pattern area in each pattern area and having at least a partial area different from the first partial pattern area in the direction in each pattern area. The occurrence of any stitch error is suppressed and the transfer accuracy is improved.
摘要翻译：一种用于曝光衬底的方法包括在一个方向上将图案区域布置成分别以间隔布置并且各具有放大倍率的投影系统，所述图案区域的面积宽度各自小于所述间隔，并且大于通过将投影系统的放大倍数的曝光宽度; 并且依次将由相关联的投影系统投影的图像转移到设置在每个图案区域中的第一部分图案区域中的第一图案和由相关联的投影系统投影的第二图案的图像，所述第二图案设置在第二图案区域中每个图案区域中的部分图案区域并且具有与每个图案区域中的方向上的第一部分图案区域不同的至少部分区域。任何针迹误差的发生被抑制，并且转印精度提高。

32. 发明申请

US20090257033A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US20090257033A1
公开(公告)日：2009-10-15
申请号：US12261741
申请日：2008-10-30
申请人： Kei Nara
发明人： Kei Nara
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275
摘要： A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of the projection system by the magnifying magnification; and successively transferring onto the substrate an image, projected by an associated projection system, of a first pattern provided in a first partial pattern area in each pattern area and an image, projected by the associated projection system, of a second pattern provided in a second partial pattern area in each pattern area and having at least a partial area different from the first partial pattern area in the direction in each pattern area. The occurrence of any stitch error is suppressed and the transfer accuracy is improved.
摘要翻译：一种用于曝光衬底的方法包括在一个方向上将图案区域布置成分别以间隔布置并且各具有放大倍率的投影系统，所述图案区域的面积宽度各自小于所述间隔，并且大于通过将投影系统的放大倍数的曝光宽度; 并且依次将由相关联的投影系统投影的图像转移到设置在每个图案区域中的第一部分图案区域中的第一图案和由相关联的投影系统投影的第二图案的图像，所述第二图案设置在第二图案区域中每个图案区域中的部分图案区域并且具有与每个图案区域中的方向上的第一部分图案区域不同的至少部分区域。任何针迹误差的发生被抑制，并且转印精度提高。

33. 发明申请

US20080266539A1 Exposure system, device production system, exposure method, and device production method 审中-公开
标题翻译：曝光系统，装置生产系统，曝光方法和装置生产方法
公开(公告)号：US20080266539A1
公开(公告)日：2008-10-30
申请号：US12213730
申请日：2008-06-24
申请人： Kei Nara , Seiji Miyazaki , Yasuo Aoki
发明人： Kei Nara , Seiji Miyazaki , Yasuo Aoki
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70991 , G03F7/70525
摘要： A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a controller which cooperatively controls the substrate transport section and the plurality of exposure sections so that operation states of the plurality of exposure sections are in desired states. Accordingly, it is possible to improve the efficiency both in using the substrate and in the device production.
摘要翻译：一种装置生产系统，包括：基板输送部，其输送基板; 多个曝光部，其能够使基板曝光; 以及控制器，其协作地控制所述基板输送部和所述多个曝光部，使得所述多个曝光部的操作状态处于期望状态。因此，可以提高使用基板和装置制造中的效率。

34. 发明申请

US20080254704A1 METHOD AND APPARATUS FOR MANUFACTURING DISPLAY DEVICES 有权
标题翻译：用于制造显示装置的方法和装置
公开(公告)号：US20080254704A1
公开(公告)日：2008-10-16
申请号：US12102509
申请日：2008-04-14
申请人： Tomohide HAMADA , Kei Nara
发明人： Tomohide HAMADA , Kei Nara
IPC分类号： H01J9/24 , H01J9/00 , H01J1/62
CPC分类号： H01L51/56 , G02F1/1303 , G02F2001/133302 , G02F2001/133325 , H01J9/241 , H01J9/242 , H01L27/3246 , H01L51/0005 , H01L51/0022
摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.
摘要翻译：一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极，涂抹器基于标准标记。提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元，应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

35. 发明授权

US06341011B1 Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US06341011B1
公开(公告)日：2002-01-22
申请号：US09603299
申请日：2000-06-23
申请人： Kei Nara
发明人： Kei Nara
IPC分类号： G03B2732
CPC分类号： G03F7/70258 , G03F7/70275 , G03F7/70358
摘要： An exposure apparatus and methods for making and using the same. The exposure apparatus includes at least one projection optical system which projects illuminating light, a substrate stage which supports a substrate to be exposed by the illuminating light and which includes a first plurality of reference marks. The exposure apparatus also includes a mask stage which supports a mask that includes a mask pattern to be projected onto the substrate by at least one projection optical system. The mask further includes a second plurality of reference marks intended to correspond to the first plurality of reference marks. The second plurality of reference marks is integrally formed with the mask pattern. The projection optical system(s) project illuminating light based on the mask pattern and the second plurality of reference marks to produce a projected image corresponding to the mask pattern and a plurality of projected images corresponding to the second plurality of reference marks. The exposure apparatus also includes an adjustment mechanism which adjusts the position of the projected image on the substrate based on a plurality of positional relationships between the plurality of projected images and the first plurality of reference marks.
摘要翻译：曝光装置及其制作及使用方法。曝光装置包括投影照明光的至少一个投影光学系统，支撑要被照明光曝光的基板并包括第一多个参考标记的基板台。曝光装置还包括掩模台，其通过至少一个投影光学系统支持包括要投影到基板上的掩模图案的掩模。掩模还包括旨在对应于第一多个参考标记的第二多个参考标记。第二多个参考标记与掩模图案一体地形成。投影光学系统基于掩模图案和第二多个参考标记投射照明光，以产生对应于掩模图案的投影图像和对应于第二多个参考标记的多个投影图像。曝光装置还包括调整机构，其基于多个投影图像与第一多个参考标记之间的多个位置关系来调整投影图像在基板上的位置。

36. 发明授权

US06239861B1 Exposure method and scanning type exposure apparatus 有权
标题翻译：曝光方法和扫描型曝光装置
公开(公告)号：US06239861B1
公开(公告)日：2001-05-29
申请号：US09479671
申请日：2000-01-10
申请人： Kei Nara , Tsuyoshi Naraki
发明人： Kei Nara , Tsuyoshi Naraki
IPC分类号： G03B2442
CPC分类号： G03F7/70466 , G03F7/70275 , G03F7/70358 , G03F7/70808
摘要： A substrate coated with a photosensitive agent is exposed to light beams passing through a mask by projecting the light beams upon the substrate through a projection optical system, on which occasion areas having a large layer thickness of the photosensitive agent on the substrate are subjected to double exposures, i.e., the exposure through the projection optical system and an exposure through an optical system different therefrom.
摘要翻译：用感光剂涂布的基材通过投影光学系统将光束投射到基板上而暴露于通过掩模的光束，在该情况下，基板上的感光剂层厚度大的区域经受双重曝光，即通过投影光学系统的曝光和通过与其不同的光学系统的曝光。

37. 发明授权

US5850279A Alignment method, projection exposure method, and projection exposure apparatus 失效
标题翻译：对准方法，投影曝光方法和投影曝光装置
公开(公告)号：US5850279A
公开(公告)日：1998-12-15
申请号：US619981
申请日：1996-03-20
申请人： Kei Nara , Masaki Kato , Kinya Kato , Tsuyoshi Narabe
发明人： Kei Nara , Masaki Kato , Kinya Kato , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.
摘要翻译：公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光，基准标记。具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。

38. 发明授权

US5849441A Alignment method utilizing plurality of marks, discriminable from each other, capable of effecting alignment individually 失效
标题翻译：利用可以彼此区分的多个标记的对准方法能够单独进行对准
公开(公告)号：US5849441A
公开(公告)日：1998-12-15
申请号：US790862
申请日：1997-02-03
申请人： Kei Nara , Seiji Miyazaki , Hideki Koitabashi
发明人： Kei Nara , Seiji Miyazaki , Hideki Koitabashi
IPC分类号： G03F9/00
CPC分类号： G03F9/7011 , G03F9/00 , G03F9/7003 , G03F9/7076 , G03F9/7088 , Y10S438/975
摘要： In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.
摘要翻译：为了提供能够在对准系统和基板之间没有相对移动的情况下进行高速对准的搜索对准方法，由具有彼此不同的形状的多个元素标记构成对准标记，多个元素标记设置成使得它们中的每一个具有比它们之间的对准系统的视场尺寸稍短的间隙，并且如果构成对准标记的元件标记中的一个进入到对准系统中，从所有元件标记中识别所述元件标记，由此从所述一个元件标记的位置测量整个对准的位置。因此，如果对准标记在比对准系统的视野宽的范围内移动，则可以通过一次测量来检测对准标记的位置。

39. 发明授权

US5617211A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5617211A
公开(公告)日：1997-04-01
申请号：US515783
申请日：1995-08-16
申请人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
发明人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00 , G01U21/86 , G06K7/015 , G03B27/52
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.
摘要翻译：本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置并且测量掩模侧参考标记。根据位移量校正多个投影光学系统的成像特性。

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