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31. 发明专利

JP2001348661A ARC ION PLATING APPARATUS 失效
公开(公告)号：JP2001348661A
公开(公告)日：2001-12-18
申请号：JP2001113209
申请日：2001-04-11
申请人： KOBE STEEL LTD
发明人： HANAGURI KOJI , TSUJI KUNIHIKO , NOMURA HOMARE , TAMAGAKI HIROSHI , KAWAGUCHI HIROSHI , SHIMOJIMA KATSUHIKO , FUJII HIROBUMI , KIDO TOSHIYA , SUZUKI KOKU , INOUE YOICHI
IPC分类号： C23C14/32 , C23C14/56
摘要： PROBLEM TO BE SOLVED: To provide an AIP(arc ion plating) apparatus having a rod-like evaporating source which can realize an extremely high productivity by efficiently handling a work. SOLUTION: In this arc ion plating apparatus comprising the rod-like evaporating source 14 for generating the arc and a work 5 which is disposed to surround the rod-like evaporating source 14 with a film coated on a surface thereof, the work 5 is movable in the axial direction of the rod-like evaporating source 14 relatively to the rod-like evaporating source 14.

32. 发明专利

JP2000336478A VACUUM FILM DEPOSITION SYSTEM 失效
公开(公告)号：JP2000336478A
公开(公告)日：2000-12-05
申请号：JP14691999
申请日：1999-05-26
申请人： KOBE STEEL LTD
发明人： SUZUKI TAKESHI , FUJII HIROBUMI
IPC分类号： C23C14/54
摘要： PROBLEM TO BE SOLVED: To correctly measure the temp. of the object to be coated in the process of coating at real time. SOLUTION: In a vacuum film deposition system, in a vacuum chamber 1, while the object 9 to be coated is rotated, a film of a target material is deposited on the surface of the object 9 to be coated, a thermocouple wire 23 measuring the temp. of the object 9 to be coated is inserted into the vacuum chamber 1 penetratingly to the inside and outside in such a manner that it is made freely rotatable around the rotary axial center of the object 9 to be coated, and the sensor part on the inner end side of the thermocouple wire 23 is connected to the object 9 to be coated.

33. 发明专利

JP2000212729A VACUUM ARC VAPOR DEPOSITION DEVICE 失效
公开(公告)号：JP2000212729A
公开(公告)日：2000-08-02
申请号：JP1450899
申请日：1999-01-22
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a vacuum arc vapor deposition device capable of securely reducing molten particles of coarse particle size without causing the complication of the device, the increase of its scale or the like and also without executing difficult control. SOLUTION: Generally, the back side part of a cathode plate 3 is fed with a refrigerant such as water, and therefore, a water flow capable of being made into the refrigerant is effectively utilized as a driving source. Namely, a permanent magnet 9 is held by an eccentric shaft 18, this eccentric shaft 18 is provided with a water flow rotor 22, and the structure in which the water flow rotor 22 is rotated by the water flow of the refrigerant is made. Thus, the permanent magnet 9 circumferetially moves in accordance with the rotation of the eccentric shaft 18. In this way, the simplification and miniaturization of the structure are made possible.

34. 发明专利

JPH11269634A VACUUM ARC EVAPORATION SOURCE 失效
公开(公告)号：JPH11269634A
公开(公告)日：1999-10-05
申请号：JP7217498
申请日：1998-03-20
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a vacuum arc evaporation source capable of realizing a magnetic field shape by a compact and simple structure and capable of minimizing the influence of the magnetic field on peripheral devices and a film forming stage by suppressing the generation of molten particles without sacrificing the film forming rate and uniformly consuming an evaporating material. SOLUTION: A magnetic field generation source 1 of vacuum arc evaporation source is arranged in such a manner that the centers of magnetic poles generated thereby is in the rearside to the evaporating face 2a of an evaporating material 2 and also on the outer circumferential side surrounding the evaporating material 2 coaxially, and the homopolar magnetic poles face each other. Furthermore, the magnetic field generating source 1 is arranged in such a manner that, among the lines of magnetic force emitted from the magnetic field generating source 1, the line of magnetic force piercing an evaporating face 2a is emitted in a direction in which the components parallel to the evaporating face 2a orient toward the inside of the evaporating face 2a. Moreover, the magnetic field generating source 1 is arranged in such a manner that, among the lines of magnetic force emitted from the magnetic field generating source 1, the line of magnetic force piercing the evaporating face 2a is emitted in a direction where the components parallel to the evaporating face 2a direct toward the outside of the evaporating face 2a.

35. 发明专利

JPH0681147A ARC DISCHARGE DIAGNOSTIC DEVICE OF ARC ION PLATING DEVICE 失效
公开(公告)号：JPH0681147A
公开(公告)日：1994-03-22
申请号：JP25417392
申请日：1992-08-28
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/32 , C23C14/54
摘要： PURPOSE:To provide the arc discharge diagnostic device of an arc ion plating device which can surely discover the generation of striker fusion and short circuit in an early time by automatically discriminating the striker fusion and short circuit. CONSTITUTION:This arc discharge diagnostic device 26 is used for the arc ion plating device for generating an arc discharge by applying a voltage between an anode 3 and a cathode material 4 in a vacuum 2 and attaching and detaching a striker 6 to and from the cathode material 4 to cause ignition and has an arc voltage detecting means 27, an arc current detecting means 28, and a comparing means 24 for comparing an arc voltage and arc current with the prescribed voltage upper limit value and lower limit value and the current lower limit value. This comparing means 24 outputs a striker fusion signal when the arc voltage is within a range from the prescribed voltage lower limit value up to the prescribed voltage upper limit value and the arc current is within the prescribed current lower limit value. The means outputs a short circuit signal when the arc voltage is below the prescribed voltage lower limit value and the arc current is above the prescribed current lower limit value.

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