会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 31. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US07949027B2
    • 2011-05-24
    • US12407822
    • 2009-03-20
    • Kimio Shigihara
    • Kimio Shigihara
    • H01S5/00
    • H01S5/20B82Y20/00H01S5/1053H01S5/2004H01S5/343H01S5/3436H01S2301/18
    • A semiconductor laser device includes: an n-type cladding layer; a p-type cladding layer; and an optical waveguide portion disposed between the n-type and p-type cladding layers and including spaced-apart active layers. The optical waveguide portion permits lasing in a crystal growth direction of the active layers in at least three modes, including the fundamental mode and two higher order modes. The number of active layers is equal to or greater than the number of extreme points of the electric field of a particular one of the higher order modes. At least one of the active layers is disposed near each extreme point of the electric field of the particular higher order mode, within the optical waveguide portion.
    • 半导体激光装置包括:n型包层; p型覆层; 以及设置在n型和p型包覆层之间并且包括间隔开的有源层的光波导部分。 光波导部分允许至少三种模式在有源层的晶体生长方向上发光,包括基模和两高阶模。 有源层的数量等于或大于特定一个较高阶模式的电场的极值点的数量。 在光波导部分内,有源层中的至少一个设置在特定高阶模式的电场的每个极点附近。
    • 32. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US07415054B2
    • 2008-08-19
    • US11674727
    • 2007-02-14
    • Kimio Shigihara
    • Kimio Shigihara
    • H01S5/00
    • H01S5/20H01S5/2004H01S5/3211H01S5/32308
    • A semiconductor laser device includes first and second conductivity type cladding layer side guide layers disposed in direct contact with respective surfaces of an active layer, sandwiching the active layer; and first and second conductivity type cladding layers disposed in direct contact with the first and second conductivity type cladding layer side guide layer, respectively. The first and second conductivity type cladding layer side guide layers are InGaAsP which is lattice-matched to GaAs and have an As composition ratio more than 0 and not exceeding 0.3. The first and second conductivity type cladding layers are AlGaAs, having an Al composition ratio less than 1.0 and at least equal to an Al composition ratio at which refractive index of the AlGaAs is less than the refractive index of the InGaAsP.
    • 半导体激光器件包括与有源层的各个表面直接接触的第一和第二导电型包覆层引导层,夹持有源层; 以及分别与第一和第二导电型包层侧引导层直接接触设置的第一和第二导电类型的覆层。 第一和第二导电型包层侧引导层是与GaAs晶格匹配且具有大于0且不超过0.3的As组成比的InGaAsP。 第一和第二导电类型包层是具有Al组成比小于1.0且至少等于AlGaAs的折射率小于InGaAsP的折射率的Al组成比的AlGaAs。
    • 37. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06804282B2
    • 2004-10-12
    • US10359125
    • 2003-02-06
    • Kimio ShigiharaKazushige Kawasaki
    • Kimio ShigiharaKazushige Kawasaki
    • H01S3113
    • H01S5/028H01S5/0287
    • A multilayer film includes alternately laminated, a first film with a refractive index of n1 and a second film with a refractive index of n2, the multilayer film having the first film in contact with an end face of a semiconductor laser element. The first film and the second film satisfy relations expressed by the formulas n1 (nc)1/2. The reflectivity characteristic of the multilayer film has a 1 maximum at a wavelength &lgr;1 in a wavelength region and minimums at wavelengths &lgr;2 and &lgr;3 on a shorter-wavelength side and a longer-wavelength side of the wavelength &lgr;1, respectively.
    • 多层膜交替层叠,折射率为n1的第一膜和折射率为n2的第二膜,所述多层膜具有与半导体激光元件的端面接触的多层膜。 第一膜和第二膜满足由公式n1 <(Nc)1/2和n2>(nc)1/2表示的关系。 多层膜的反射率特性在波长区域的波长λ1处最大为1,在波长λ1的较短波长侧和长波长侧的波长λ2和λ3处分别为最小。