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31. 发明授权

US06509957B1 Stage device and exposure apparatus 失效
公开(公告)号：US06509957B1
公开(公告)日：2003-01-21
申请号：US09722631
申请日：2000-11-28
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G03B2758
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70758
摘要： A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member. The first stationary member extends in the first direction and is supported at a first position in a third direction that is perpendicular to the two-dimensional plane. The second stationary member extends in the first direction and is supported at a second position in the third direction, different from the first position. The moving member has a first part that can cooperate with the first stationary member, and a second part that can cooperate with the second stationary member. When two stages are replaced, generation of a positional shift on an object on the stages is prevented, and separate processing can be performed simultaneously with respect to objects on the stages.

32. 发明授权

US06388646B1 Display device 有权
标题翻译：显示设备
公开(公告)号：US06388646B1
公开(公告)日：2002-05-14
申请号：US09494140
申请日：2000-01-28
申请人： Koji Fujiwara , Tomohiko Yamamoto , Keiichi Tanaka , Naoto Inoue , Hideki Ichioka
发明人： Koji Fujiwara , Tomohiko Yamamoto , Keiichi Tanaka , Naoto Inoue , Hideki Ichioka
IPC分类号： G09G336
CPC分类号： G09G3/3648
摘要： It is an object of the invention to reduce a leakage low-frequency electric field from a panel section of a matrix type. In the case where a panel section has a usual current structure in which the panel section has a single common electrode elongating over the whole of the display region of the panel section, the maximum voltage difference of a reference signal supplied to the common electrode is defined to be 0.3678×x−0.6136 (wherein x is the area of the display region) or less. In the case where the panel section has the so-called counter source structure and a plurality of column electrodes, the maximum voltage difference of a reference signal supplied to the column electrodes is defined to be ax−b (wherein a=0.3565×y−0.6829, b=−0.0937y+0.7091, and y is a ratio of the area of all the column electrodes to the area of the display region) or less. In the case where a panel section has the counter source structure, the average area per unit length of one part of the column electrode opposed to a signal line is smaller than the average area per unit length of the remaining part of the column electrode other than the one part.
摘要翻译：本发明的一个目的是从矩阵型的面板部分减少泄漏的低频电场。在面板部具有通常的电流结构的情况下，其中面板部分具有在面板部分的整个显示区域上延伸的单个公共电极，定义提供给公共电极的参考信号的最大电压差为0.3678xx-0.6136（其中，x为显示区域的面积）以下。在面板部分具有所谓的反向源结构和多个列电极的情况下，提供给列电极的参考信号的最大电压差定义为ax-b（其中a = 0.3565xy-0.6829 ，b = -0.0937y + 0.7091，y是所有列电极的面积与显示区域的面积的比率）以下。在面板部具有计数器源结构的情况下，与信号线相对的列电极的一部分的每单位长度的平均面积小于列电极的剩余部分的平均单位长度以外的平均面积一部分。

33. 发明授权

US06234107B1 Auxiliary vacuum chamber and vacuum processing unit using same 失效
标题翻译：辅助真空室和真空处理单元使用相同
公开(公告)号：US06234107B1
公开(公告)日：2001-05-22
申请号：US09235644
申请日：1999-01-22
申请人： Keiichi Tanaka , Masaki Sohma , Shinsuke Asao , Masahito Ozawa
发明人： Keiichi Tanaka , Masaki Sohma , Shinsuke Asao , Masahito Ozawa
IPC分类号： C23C1600
CPC分类号： H01L21/67751 , C23C14/566 , H01L21/67109 , H01L21/6719 , H01L21/67201
摘要： An auxiliary vacuum chamber 12 according to the invention comprises a container 30 having an opening 10, 14 for taking an object to be processed W into and out of the container. A holder 33a is movably placed in the container 30, which can hold the object W taken therein. The holder 33a can also form a hermetically closed space 32a with a portion of the container 30 when moved in the container 30. The container 30 is provided with supplying means 38a for supplying a gas from the outside of the container 30 into the hermetically closed space 32a. The container 30 is also provided with exhaust means 37 for exhausting the gas from the hermetically closed space 32a to the outside of the container 30. According to the invention, the auxiliary vacuum chamber 12 need not have gate-valves for being opened and shut to the other chambers 4 and 16.
摘要翻译：根据本发明的辅助真空室12包括容器30，容器30具有用于将待处理物体W进入和离开容器的开口10,14。保持器33a可移动地放置在容器30中，其可以保持被吸收在其中的物体W. 当容器30在容器30中移动时，保持器33a还可以形成具有容器30的一部分的气密封闭的空间32a。容器30设置有供应装置38a，用于将气体从容器30的外部供应到气密封闭的空间 32a。容器30还设置有用于将气体从气密封闭空间32a排出到容器30的外部的排气装置37.根据本发明，辅助真空室12不需要具有用于打开和关闭的闸阀其他腔室4和16。

34. 发明授权

US6118505A Liquid crystal display device having color organic film as the interlayer insulator 失效
标题翻译：具有彩色有机膜作为层间绝缘体的液晶显示装置
公开(公告)号：US6118505A
公开(公告)日：2000-09-12
申请号：US7536
申请日：1998-01-15
申请人： Hisashi Nagata , Keiichi Tanaka , Shingo Jogan
发明人： Hisashi Nagata , Keiichi Tanaka , Shingo Jogan
IPC分类号： G02B5/20 , G02F1/1333 , G02F1/1335 , G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368
CPC分类号： G02F1/136209 , G02F1/136213 , G02F1/136227 , G02F2001/133357 , G02F2001/136222
摘要： A method for fabricating a liquid crystal display device is provided. The liquid crystal display device includes an active matrix substrate, a counter substrate disposed to face the active matrix substrate, and a liquid crystal layer interposed between the active matrix substrate and the counter substrate. The active matrix substrate includes: gate signal lines for supplying control signals and source signal lines for supplying video signals formed to cross each other; switching elements formed at crossings of the gate signal lines and the source signal lines in a matrix, the switching elements being connected to the gate signal lines and the source signal lines; an interlayer insulating film formed on the resultant active matrix substrate; and pixel electrodes formed on the interlayer insulating film in a matrix, wherein a color organic film is used as the interlayer insulating film, and laminated to the resultant active matrix substrate.
摘要翻译：提供一种制造液晶显示装置的方法。液晶显示装置包括有源矩阵基板，配置在与有源矩阵基板相对的相对基板和插入在有源矩阵基板和对置基板之间的液晶层。有源矩阵基板包括：用于提供控制信号的栅极信号线和用于提供形成为交叉的视频信号的源极信号线; 在栅极信号线和源极信号线的交叉处形成矩阵的开关元件，开关元件连接到栅极信号线和源极信号线; 形成在所得有源矩阵基板上的层间绝缘膜; 以及在基板上形成在层间绝缘膜上的像素电极，其中使用彩色有机膜作为层间绝缘膜，并且层压到所得到的有源矩阵基板上。

35. 发明授权

US5953630A Suppression of tungsten film deposition on a semiconductor wafer bevel edge with a halogenide purge gas 失效
标题翻译：用卤化物吹扫气体抑制半导体晶片斜边上的钨膜沉积
公开(公告)号：US5953630A
公开(公告)日：1999-09-14
申请号：US892865
申请日：1997-07-14
申请人： Yuji Maeda , Katsumi Mitani , Manabu Yamazaki , Naomi Yoshida , Keiichi Tanaka
发明人： Yuji Maeda , Katsumi Mitani , Manabu Yamazaki , Naomi Yoshida , Keiichi Tanaka
IPC分类号： C23C16/14 , C23C16/44 , C23C16/455 , H01L21/205 , H01L21/28 , H01L21/285
CPC分类号： C23C16/45521 , C23C16/14 , C23C16/4404 , C23C16/45561 , H01L21/28556
摘要： Provided herein is a CVD method and apparatus for the deposition of tungsten in which formation of a film of tungsten material is suppressed at the peripheral edge of the semiconductor substrate. In accordance with the invention, a halogenide purge gas is supplied to the peripheral edge of the processing face of a semiconductor wafer during the chemical vapor deposition of tungsten. The halogenide purge gases interact with the processing gases and form a passivation film at the peripheral edge of the semiconductor wafer which suppresses or prevents the formation of a film of tungsten material on the edge surface. Consequently, CMP can be applied to the tungsten semiconductor wafer, and particles of the tungsten material, etc., are not generated from the intense polishing of the peripheral edge of the wafer. Therefore, an uncontaminated tungsten-coated semiconductor wafer with a precise multilayer electrode wiring structure can be manufactured in large volume and favorable yields.
摘要翻译：本文提供了一种用于沉积钨的CVD方法和装置，其中在半导体衬底的周边边缘处抑制形成钨材料的膜。根据本发明，在钨的化学气相沉积期间，将卤化物吹扫气体供应到半导体晶片的处理面的周边边缘。卤化物清洗气体与处理气体相互作用，并在半导体晶片的周缘形成钝化膜，其抑制或防止在边缘表面上形成钨材料膜。因此，可以将CMP施加到钨半导体晶片，并且由于晶片的周缘的强烈抛光不会产生钨材料等的粒子。因此，可以制造具有精确的多层电极布线结构的未被污染的钨涂覆的半导体晶片，其体积大且良好。

36. 发明授权

US08980121B2 Etching liquid for a copper/titanium multilayer thin film 有权
标题翻译：用于铜/钛多层薄膜的蚀刻液
公开(公告)号：US08980121B2
公开(公告)日：2015-03-17
申请号：US13575767
申请日：2011-01-28
申请人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
发明人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C09K13/00 , C09K13/08 , H01L21/3213 , C23F1/18 , C23F1/26 , C23F1/44 , H05K3/06 , H01L23/532
CPC分类号： H01L21/32134 , C23F1/18 , C23F1/26 , C23F1/44 , H01L23/53238 , H01L2924/0002 , H05K3/067 , H01L2924/00
摘要： The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要翻译：本发明提供了一种用于含有铜层和钛层的多层薄膜的蚀刻液及其用于蚀刻含有铜层和钛层的多层薄膜的方法，即，用于含有（A）过氧化氢，（B）硝酸，（C）氟化物离子源，（D）唑，（E）季铵氢氧化物和（F））的含有铜层和钛层的多层薄膜）过氧化氢稳定剂，pH为1.5〜2.5，使用其蚀刻方法。

37. 发明授权

US08623587B2 Residue removing liquid composition and method for cleaning semiconductor element using same 有权
标题翻译：残渣除去液组合物及使用其的半导体元件的清洗方法
公开(公告)号：US08623587B2
公开(公告)日：2014-01-07
申请号：US13057338
申请日：2009-07-07
申请人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
发明人： Kyoko Kamata , Keiichi Tanaka , Hiroshi Matsunaga
IPC分类号： G03F7/26
CPC分类号： H01L21/02071 , C11D7/10 , C11D7/244 , C11D7/261 , C11D7/34 , C11D7/5004 , C11D7/5013 , C11D7/5022 , C11D11/0047 , H01L21/02063
摘要： Provided are a residue removing liquid composition capable of completely removing a resist residue and a titanium (Ti)-derived residue that remains after dry etching and ashing in via hole formation in a production process for a semiconductor substrate having metal wiring of aluminum (Al) or an Al alloy, at a low temperature in a short time, not corroding parts of an interlayer insulating material, a wiring material and others, and a cleaning method for semiconductor devices using it.The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1 to 10% by mass, from 60 to 75% by mass and from 5 to 38% by mass, respectively, and (B) is contained in an amount of from 0.9 to 1.5 times (by mol) the amount of (A).
摘要翻译：本发明提供一种残留物除去液体组合物，其能够在具有铝（Al）金属配线的半导体基板的制造工序中完全除去抗蚀剂残渣和残留在通孔形成中的干法蚀刻和灰化之后残留的钛（Ti）或Al合金，在短时间内的低温下，不会腐蚀层间绝缘材料的部分，布线材料等，以及使用它的半导体器件的清洁方法。除去残渣的液体组合物含有（A）氟化铵，（B）甲磺酸，（C）具有碳 - 碳三键的化合物，（D）水溶性有机溶剂和（E）水，残渣除去液组合物中的（A），（C），（D）和（E）为0.005〜2质量％，0.1〜10质量％，60〜75质量％ 38质量％，（B）的含量为（A）的量的0.9〜1.5倍（摩尔）。

38. 发明授权

US08391676B2 Playback apparatus for performing application-synchronized playback 失效
公开(公告)号：US08391676B2
公开(公告)日：2013-03-05
申请号：US12609109
申请日：2009-10-30
申请人： Keiichi Tanaka , Hidetaka Ohto , Masahiro Oashi
发明人： Keiichi Tanaka , Hidetaka Ohto , Masahiro Oashi
IPC分类号： H04N9/80
CPC分类号： H04N9/87 , G11B27/105 , G11B27/11 , G11B27/329 , G11B2220/2516 , G11B2220/2541
摘要： A playback apparatus for playing a digital stream in conjunction with an application includes a package management unit operable to generate package information by merging files recorded on a first recording medium and a second recording medium, in accordance with merge management information, and a selection unit operable to detect a plurality of playable titles from the package information, and select one of the detected titles as a current title. After the application requests the package management unit to update the merge management information, by specifying new merge management information, the package management unit changes a file referenced from the newly specified merge management information to read-only before updating the package information, and at a point at which digital stream playback stops due to a current title change by the selection unit, the package management unit generates new package information by combining files recorded on the first and second recording media, in accordance with the newly specified merge management information.

39. 发明授权

US08390783B2 Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method 有权
标题翻译：测量掩模表面沿着高度方向的位置，曝光装置和曝光方法的方法
公开(公告)号：US08390783B2
公开(公告)日：2013-03-05
申请号：US12206720
申请日：2008-09-08
申请人： Noriyuki Hirayanagi , Keiichi Tanaka
发明人： Noriyuki Hirayanagi , Keiichi Tanaka
IPC分类号： G01B11/00 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70358 , G03F7/70783 , G03F9/7026 , G03F9/7034
摘要： A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is installed between the mask M and the projection optical system and defines an exposure area at the time of exposure.
摘要翻译：一种用于测量具有从光源发出的光照射掩模M的功能的曝光装置中的掩模M的高度方向位置的方法，并且将形成在掩模M上的图案转印到诸如晶片的感光基板上，投影光学系统，掩模表面高度方向位置测量方法，其特征在于在测量掩模M的高度方向位置之前移动曝光区域限定部件1，该曝光区域限定部件1安装在掩模M和投影光学系统之间并且限定曝光时的曝光区域。

40. 发明申请

US20130044108A1 IMAGE RENDERING DEVICE, IMAGE RENDERING METHOD, AND IMAGE RENDERING PROGRAM FOR RENDERING STEREOSCOPIC PANORAMIC IMAGES 有权
标题翻译：图像渲染设备，图像渲染方法和用于渲染立体全景图像的图像渲染程序
公开(公告)号：US20130044108A1
公开(公告)日：2013-02-21
申请号：US13635820
申请日：2012-03-02
申请人： Keiichi Tanaka , Tomoko Katayama , Osamu Yamaji
发明人： Keiichi Tanaka , Tomoko Katayama , Osamu Yamaji
IPC分类号： G06T15/04
CPC分类号： G06T15/04 , G06T15/20 , H04N13/111
摘要： An image rendering device realizes stereoscopic viewing of a joint background image. A DIBR unit 17 applies pixel shifting to each background image constructing the joint background image and also conducts boundary processing relative to the pixel shifting. The joint background image is composed of one or more background images stitched together along their edges on a three-dimensional model. The pixel shifting is to shift pixels of each background image in the row direction. The amount of shift applied to each pixel is determined based on the depth value of a corresponding pixel of a depth image. The boundary processing is to extract pixels shifted out of the display region of a given background image as a result of pixel shifting and add the extracted pixels to an edge of another background image adjacent to the given background image in the row direction.
摘要翻译：图像再现装置实现对联合背景图像的立体观看。 DIBR单元17对构成关节背景图像的每个背景图像应用像素移位，并且还相对于像素移位进行边界处理。联合背景图像由在三维模型上沿其边缘缝合在一起的一个或多个背景图像组成。像素移位是在行方向上移动每个背景图像的像素。基于深度图像的相应像素的深度值来确定施加到每个像素的移位量。边界处理是提取作为像素移位的结果从给定背景图像的显示区域移出的像素，并将提取的像素添加到与行方向上的给定背景图像相邻的另一背景图像的边缘。

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