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31. 发明授权

US5663423A Method for handling (2-alkyl) (acryloyl) isocyanate, method for stabilizing (2-alkyl) (acryloyl) isocyanate, method for producing (2-alkyl) (acryloyl) isocyanate, heterocyclic compound, and method for producing heterocyclic compound 失效
标题翻译：（2-烷基）（丙烯酰基）异氰酸酯的处理方法，（2-烷基）（丙烯酰基）异氰酸酯的稳定化方法，（2-烷基）（丙烯酰基）异氰酸酯的制造方法，杂环化合物及其制造方法
公开(公告)号：US5663423A
公开(公告)日：1997-09-02
申请号：US611411
申请日：1996-03-05
申请人： Noriyuki Tsuboniwa , Satoshi Urano , Otohiko Tsuge , Taizo Hatta
发明人： Noriyuki Tsuboniwa , Satoshi Urano , Otohiko Tsuge , Taizo Hatta
IPC分类号： C07C263/08 , C07C263/18 , C07D273/04 , C07D413/04 , C07C263/00
CPC分类号： C07D413/04 , C07C263/08 , C07C263/18 , C07D273/04
摘要： A method for producing a (2-alkyl)acryloyl isocyanate of the formula ICH.sub.2 .dbd.C(R.sup.1)--C(O)--NCO (I)wherein R.sup.1 is defined herein, from the dissociation of a compound of formula III ##STR1## wherein R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are defined herein and wherein the dissociation of the compound of formula III produces the compound of formula I and a compound of formula II(R.sup.3) (R.sup.4)C.dbd.N--R.sup.2 (II)wherein R.sup.3, R.sup.4 and R.sup.2 are defined herein.
摘要翻译：从式III化合物的解离制备式I的二（2-烷基）丙烯酰基异氰酸酯的方法CH 2 = C（R 1）-C（O）-NCO（I）（III）其中R5，R6，R7和R8在本文中定义，其中式III化合物的解离产生式I化合物和式II化合物（R3）（R4）C = N-R2（II）其中R3，R4和R2在本文中定义。

32. 发明授权

US5606096A Production of unsaturated carbamic acid derivative 失效
标题翻译：生产不饱和氨基甲酸衍生物
公开(公告)号：US5606096A
公开(公告)日：1997-02-25
申请号：US417431
申请日：1995-04-03
申请人： Eiji Yamanaka , Noriyuki Tsuboniwa , Takao Morimoto , Masamichi Furukawa , Satoshi Urano
发明人： Eiji Yamanaka , Noriyuki Tsuboniwa , Takao Morimoto , Masamichi Furukawa , Satoshi Urano
IPC分类号： C07C269/00 , C07C271/64 , C07C261/00
CPC分类号： C07C271/64 , C07C269/00
摘要： The present invention provides a process for producing a variety of unsaturated carbamic acid derivatives from corresponding unsaturated carbamates by substitution reaction. The present invention provides a process for producing unsaturated carbamic acid derivatives, comprising reacting an unsaturated carbamate represented by ##STR1## wherein R represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R.sup.1 represents a residue of an alcohol from which an OH group is removed,with an alcohol, a primary or secondary amine or an oxime at a temperature of 80.degree. to 150.degree. C. to substitute the --OR.sup.1 group in the formula (A).
摘要翻译：本发明提供了通过取代反应从相应的不饱和氨基甲酸酯生产各种不饱和氨基甲酸衍生物的方法。本发明提供一种不饱和氨基甲酸衍生物的制造方法，其特征在于，使由（A）表示的不饱和氨基甲酸酯反应，其中R表示氢原子或碳原子数1〜8的烷基，R1表示醇的残基在80至150℃的温度下用醇，伯或仲胺或肟除去OH基团，以取代式（A）中的-OR 1基团。

33. 发明授权

US5556933A Polyacylurethane and process for producing the same 失效
标题翻译：聚酰胺及其制备方法
公开(公告)号：US5556933A
公开(公告)日：1996-09-17
申请号：US432705
申请日：1995-05-02
申请人： Masami Yabuta , Satoshi Urano
发明人： Masami Yabuta , Satoshi Urano
IPC分类号： C08G63/685 , C08G18/71 , C08G71/00 , C08G71/04
CPC分类号： C08G18/711 , C08G71/04
摘要： The present invention provides a novel polyacylurethane, and a process for producing the same. More specifically, the polyacylurethane has a number average molecular weight of 500 to 100,000, and the main chain of said polyacylurethane comprises repeating units of the formula: ##STR1## where R.sub.1 represents an alkylene group or an alkenylene group having a molecular weight of 28 to 30,000, which may contain an alicylcic group, an aromatic group and/or an oxygen atom; and R.sub.2 represents an alkylene group, an arylene group or an alkenylene group having 1 to 8 carbon atoms.
摘要翻译：本发明提供一种新型的聚酰氨基甲酸酯及其制造方法。更具体地说，多酰基氨基甲酸酯的数均分子量为500〜100,000，所述多酰基氨基甲酸酯的主链包含下式的重复单元：其中R 1表示亚烷基或亚乙烯基，其分子量为28〜 30,000，其可以含有脂肪族基团，芳族基团和/或氧原子; R2表示亚烷基，亚芳基或碳原子数1〜8的亚烯基。

34. 发明授权

US5504242A Acyl carbamate containing a hydroxyl group and process for producing the same 失效
标题翻译：含羟基的酰基氨基甲酸酯及其制备方法
公开(公告)号：US5504242A
公开(公告)日：1996-04-02
申请号：US437128
申请日：1995-05-05
申请人： Masami Yabuta , Satoshi Urano
发明人： Masami Yabuta , Satoshi Urano
IPC分类号： C07D207/408 , C07C269/00 , C07C271/64 , C07D207/452 , C07D209/48 , C07C271/02
CPC分类号： C07C271/64 , C07C2101/14
摘要： The present invention provides the compound containing one hydroxyl group and one acyl carbamate group per molecule, which is useful for introducing the acyl carbamate group in chemical materials. By employing the present compound, it becomes possible to introduce the acyl carbamate group in various chemical materials other than acrylic polymers. According to the present process, the compound containing one hydroxyl group and one acyl carbamate group per molecule is provided in excellent yield with a suppressed amount of by-product.
摘要翻译：本发明提供每分子含有一个羟基和一个酰基氨基甲酸酯基团的化合物，其可用于在化学材料中引入酰基氨基甲酸酯基团。通过使用本发明化合物，可以将丙烯酸聚合物以外的各种化学材料引入酰基氨基甲酸酯基。根据本方法，每分子含有一个羟基和一个酰基氨基甲酸酯基的化合物以优异的收率与抑制量的副产物一起提供。

35. 发明授权

US5179184A Polymerizable cyclic urea derivatives and polymers having a pendant urea 失效
标题翻译：可聚合的环脲衍生物和具有侧链脲的聚合物
公开(公告)号：US5179184A
公开(公告)日：1993-01-12
申请号：US683543
申请日：1991-04-10
申请人： Noriyuki Tsuboniwa , Satoshi Urano , Hirotoshi Umemoto , Noriyuki Sakamoto , Kenshiro Tobinaga , Yasuyuki Tsuchiya
发明人： Noriyuki Tsuboniwa , Satoshi Urano , Hirotoshi Umemoto , Noriyuki Sakamoto , Kenshiro Tobinaga , Yasuyuki Tsuchiya
IPC分类号： C07D229/00 , C07D233/38 , C07D239/10 , C07D243/04 , C08F20/36 , C08F20/60
CPC分类号： C07D239/10 , C07D229/00 , C07D233/38 , C07D243/04 , C08F20/36 , C08F20/60
摘要： The present invention relates to polymerizable cyclic urea derivatives which can be thermally split to give rise to an isocyanate group; and to a polymer having cyclic urea pendant groups, which can be cured by heating without any additional curing agent such as an isocyanate blocked with a volatile lower molecular weight material, so that volatile material is not released in a thermal curing process.
摘要翻译：本发明涉及可热分解以产生异氰酸酯基团的聚合性环状脲衍生物; 以及具有环状脲侧基的聚合物，其可以通过加热而固化，而不需要任何额外的固化剂，例如用挥发性低分子量材料封端的异氰酸酯，使得挥发性物质在热固化过程中不释放。

36. 发明授权

US5070167A Novel peroxide monomer and a polymer therefrom 失效
标题翻译：新型过氧化单体和聚合物
公开(公告)号：US5070167A
公开(公告)日：1991-12-03
申请号：US661622
申请日：1991-02-28
申请人： Noriyuki Tsuboniwa , Satoshi Urano , Ryuzo Mizuguchi
发明人： Noriyuki Tsuboniwa , Satoshi Urano , Ryuzo Mizuguchi
IPC分类号： C07C409/40 , C08F20/36 , C08F20/58 , C08G18/72
CPC分类号： C08G18/728 , C07C409/40 , C08F20/36 , C08F20/58
摘要： Disclosed is a peroxide monomer having the formula:CH.sub.2 =CR--A--OO--B (I)wherein R represents a hydrogen atom or an alkyl having 1 to 5 carbon atoms, A represents --NH--CO--, --CO--NH--CO--, or --CO--O--CH.sub.2 CH.sub.2 --NH--CO--, and B represents a moiety which has excluded the group (--OOH) from a hydroperoxide and a preparation thereof. The present invention also provides a polymer whose a main chain composed of carbon-carbon bonds is bonded with a pendant peroxide group represented by the formula:--A--OO--B (II)wherein A and B is the same as mentioned above, the content of the pendant peroxide group being 0.1 to 99.9% by weight and a molecular weight of said polymer being 1,000 to 100,000; and a preparation thereof.

37. 发明申请

US20060237786A1 Power semiconductor device 审中-公开
标题翻译：功率半导体器件
公开(公告)号：US20060237786A1
公开(公告)日：2006-10-26
申请号：US11384260
申请日：2006-03-21
申请人： Hideaki Ninomiya , Masanobu Tsuchitani , Satoshi Teramae , Masakazu Yamaguchi , Koichi Sugiyama , Satoshi Urano , Keiko Kawamura
发明人： Hideaki Ninomiya , Masanobu Tsuchitani , Satoshi Teramae , Masakazu Yamaguchi , Koichi Sugiyama , Satoshi Urano , Keiko Kawamura
IPC分类号： H01L29/76
CPC分类号： H01L29/7397 , H01L29/0623 , H01L29/0653 , H01L29/407 , H01L29/4236 , H01L29/42368 , H01L29/7393
摘要： A power semiconductor device according to the present invention comprises: a first conductive type base layer; a second conductive type base layer selectively formed on the first conductive type base layer; an insulation layer formed in the region on the first conductive type base layer on which the second conductive type base layer is not formed; a gate insulation film formed on the inner surface of a trench formed between the second conductive type base layer and the insulation layer so as to separate them from each other and to reach the first conductive type base layer from the surface of the second conductive type base layer; a first conductive type source layer selectively formed on the surface of the second conductive type base layer in contact with the gate insulation film; a gate electrode formed in the trench and insulated from the first conductive type base layer, the second conductive type base layer, and the first conductive type source layer by the gate insulation film; a main electrode electrically connected to the first conductive type base layer and the second conductive type base layer; and a first conductive type or second conductive type floating layer formed on the bottom of the insulation layer.
摘要翻译：根据本发明的功率半导体器件包括：第一导电型基极层; 选择性地形成在所述第一导电型基底层上的第二导电型基底层; 形成在不形成第二导电型基底层的第一导电型基底层上的区域中的绝缘层; 形成在形成在第二导电型基极层和绝缘层之间的沟槽的内表面上以便将它们彼此分离并从第二导电类型基底的表面到达第一导电型基极的栅极绝缘膜层; 选择性地形成在与所述栅极绝缘膜接触的所述第二导电型基底层的表面上的第一导电型源极层; 形成在所述沟槽中的栅电极，通过所述栅极绝缘膜与所述第一导电型基极层，所述第二导电型基极层和所述第一导电型源极绝缘; 电连接到第一导电型基极层和第二导电型基极层的主电极; 以及形成在绝缘层的底部上的第一导电型或第二导电型浮动层。

38. 发明授权

US06137136A Power semiconductor device 失效
标题翻译：功率半导体器件
公开(公告)号：US06137136A
公开(公告)日：2000-10-24
申请号：US932464
申请日：1997-09-18
申请人： Akihiro Yahata , Satoshi Urano , Tomoki Inoue , Ichiro Omura
发明人： Akihiro Yahata , Satoshi Urano , Tomoki Inoue , Ichiro Omura
IPC分类号： H01L29/74 , H01L21/336 , H01L29/06 , H01L29/423 , H01L29/739 , H01L29/749 , H01L29/78 , H01L29/76
CPC分类号： H01L29/0696 , H01L29/7397 , H01L29/4236
摘要： An injection enhanced insulated gate bipolar transistor is disclosed in which an average roughness of silicon on the side and bottom surfaces of trench grooves below a gate oxide film is made to be 0.6 nm or smaller. Irregular portions on the surface of silicon of the gate oxide film can be prevented. Thus, lowering of the gate breakdown voltage occurring because of dispersion of the thickness of the gate oxide film due to the irregular portions can be prevented.
摘要翻译：公开了一种注入增强型绝缘栅双极型晶体管，其中在栅极氧化膜下方的沟槽槽的侧表面和底表面上的平均粗糙度为0.6nm或更小。可以防止栅极氧化膜的硅表面上的不规则部分。因此，可以防止由于不规则部分导致的栅极氧化膜的厚度的分散而产生的栅极击穿电压的降低。

39. 发明授权

US5837874A Hydrazide intermediates 失效
标题翻译：酰肼中间体
公开(公告)号：US5837874A
公开(公告)日：1998-11-17
申请号：US631260
申请日：1996-04-15
申请人： Otohiko Tsuge , Taizo Hatta , Satoshi Urano , Noriyuki Tsuboniwa , Ryuzo Mizuguchi
发明人： Otohiko Tsuge , Taizo Hatta , Satoshi Urano , Noriyuki Tsuboniwa , Ryuzo Mizuguchi
IPC分类号： C07C281/06 , C07C281/08 , C07C281/10 , C07C281/14 , C07D249/12 , C07C243/24
CPC分类号： C07C281/14 , C07C281/06 , C07C281/10 , C07D249/12
摘要： The present invention relates to a triazole compound represented by the formula (1): ##STR1## wherein R.sup.1 represents a lower alkyl group which may have a substituent; R.sup.2 and R.sup.3 represent respectively hydrogen, an aryl group, a benzoyl group, a tosyl group, a lower alkoxy carbonyl group, or an aryl sulfonyl group, each of which except for hydrogen may have a substituent; provided that when R.sup.2 is hydrogen, the triazole compound is represented by the formula (2): ##STR2## wherein R.sup.1 and R.sup.3 have the same as defined above.
摘要翻译：本发明涉及由式（1）表示的三唑化合物：其中R 1表示可以具有取代基的低级烷基; R2和R3分别表示氢，芳基，苯甲酰基，甲苯磺酰基，低级烷氧基羰基或芳基磺酰基，除氢以外可以具有取代基。条件是当R 2为氢时，三唑化合物由式（2）表示：其中R 1和R 3具有与上述相同的含义。

40. 发明授权

US5659064A Hydrazone intermediates 失效
标题翻译：腙中间体
公开(公告)号：US5659064A
公开(公告)日：1997-08-19
申请号：US632317
申请日：1996-04-15
申请人： Otohiko Tsuge , Taizo Hatta , Satoshi Urano , Noriyuki Tsuboniwa , Ryuzo Mizuguchi
发明人： Otohiko Tsuge , Taizo Hatta , Satoshi Urano , Noriyuki Tsuboniwa , Ryuzo Mizuguchi
IPC分类号： C07C281/06 , C07C281/08 , C07C281/10 , C07C281/14 , C07D249/12 , C07C251/76 , C07C251/86
CPC分类号： C07C281/14 , C07C281/06 , C07C281/10 , C07D249/12
摘要： The present invention relates to a triazole compound represented by the formula (1): ##STR1## wherein R.sup.1 represents a lower alkyl group which may have a substituent; R.sup.2 and R.sup.3 represent respectively hydrogen, an aryl group, a benzoyl group, a tosyl group, a lower alkoxy carbonyl group, or an aryl sulfonyl group, each of which except for hydrogen may have a substituent; provided that when R.sup.2 is hydrogen, the triazole compound is represented by the formula (2): ##STR2## wherein R.sup.1 and R.sup.3 have the same as defined above.
摘要翻译：本发明涉及由式（1）表示的三唑化合物：其中R 1表示可以具有取代基的低级烷基; R2和R3分别表示氢，芳基，苯甲酰基，甲苯磺酰基，低级烷氧基羰基或芳基磺酰基，除氢以外可以具有取代基。条件是当R 2为氢时，三唑化合物由式（2）表示：其中R 1和R 3具有与上述相同的含义。

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