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31. 发明授权

US07031848B2 Real time analysis of periodic structures on semiconductors 有权
标题翻译：半导体周期性结构的实时分析
公开(公告)号：US07031848B2
公开(公告)日：2006-04-18
申请号：US11177699
申请日：2005-07-08
申请人： Jon Opsal , Hanyou Chu
发明人： Jon Opsal , Hanyou Chu
IPC分类号： G06F17/00
CPC分类号： G03F7/70616 , G01B11/24 , G01N21/211 , G03F7/705 , G03F7/70625
摘要： A system for characterizing geometric structures formed on a sample on a real time basis is disclosed. A multi-parameter measurement module generates output signals as a function of either wavelength or angle of incidence. The output signals are supplied to a parallel processor. The processor creates an initial theoretical model and then calculates the theoretical optical response of that sample. The calculated optical response is compared to measured values. Based on the comparison, the model configuration is modified to be closer to the actual measured structure. The processor recalculates the optical response of the modified model and compares the result to the measured data. This process is repeated in an iterative manner until a best fit is achieved. The steps of calculating the optical response of the model is distributed to the processors as a function of wavelength or angle of incidence so these calculations can be performed in parallel.
摘要翻译：公开了一种在实时基础上表征样品上形成的几何结构的系统。多参数测量模块产生作为波长或入射角的函数的输出信号。输出信号被提供给并行处理器。处理器创建一个初始理论模型，然后计算该样本的理论光学响应。将计算出的光学响应与测量值进行比较。基于比较，模型配置被修改为更接近实际的测量结构。处理器重新计算修改模型的光学响应，并将结果与测量数据进行比较。以迭代的方式重复该过程，直到达到最佳拟合。计算模型的光学响应的步骤作为波长或入射角分布到处理器，因此可以并行执行这些计算。

32. 发明授权

US06856385B2 Spatial averaging technique for ellipsometry and reflectometry 有权
标题翻译：用于椭圆偏振和反射测量的空间平均技术
公开(公告)号：US06856385B2
公开(公告)日：2005-02-15
申请号：US10400369
申请日：2003-03-27
申请人： Lanhua Wei , Hanyou Chu , Jon Opsal
发明人： Lanhua Wei , Hanyou Chu , Jon Opsal
IPC分类号： G01B11/06 , G01J4/04 , G01N21/00 , G01N21/21 , G01N21/95 , H01L21/66 , G01J4/00 , G01N21/55
CPC分类号： G01N21/211 , G01B11/065 , G01N21/9501 , H01L22/12
摘要： This invention relates to optical metrology tools that are used to evaluate small measurement areas on a semiconductor wafer, where the measurement area is surrounded by a material different from the measurement area. In one embodiment, a probe beam is scanned over the measurement area and the surrounding material as data is taken at multiple locations. A processor determines the characteristics of the measurement area by identifying an extremum value of the measurements which represents the center of the measurement area. In another embodiment, the processor determines the characteristics of the sample using a combination of light measured from within and without the measurement area. The measured data is treated as a combination of light from both regions and mathematically modeled to account for both the contribution of the light reflected from the measurement area and the light reflected from the surrounding material.
摘要翻译：本发明涉及光学测量工具，其用于评估半导体晶片上的小测量区域，其中测量区域由与测量区域不同的材料包围。在一个实施例中，当数据在多个位置拍摄时，探测光束被扫描在测量区域和周围的材料上。处理器通过识别表示测量区域的中心的测量值的极值来确定测量区域的特性。在另一个实施例中，处理器使用从内部和不具有测量区域测量的光的组合来确定样本的特性。测量数据被视为来自两个区域的光的组合，并且通过数学建模来考虑从测量区域反射的光的贡献和从周围材料反射的光的贡献。

33. 发明授权

US08670948B2 Numerical aperture integration for optical critical dimension (OCD) metrology 失效
标题翻译：光学关键尺寸（OCD）计量的数值孔径积分
公开(公告)号：US08670948B2
公开(公告)日：2014-03-11
申请号：US13656487
申请日：2012-10-19
申请人： Hanyou Chu , Peilin Jiang
发明人： Hanyou Chu , Peilin Jiang
IPC分类号： G01N37/00
CPC分类号： G01N21/00 , G01B2210/56 , G01N21/211 , G01N21/4788 , G01N21/9501 , G03F7/705 , G03F7/70625
摘要： Provided are techniques for numerically integrating an intensity distribution function over a numerical aperture in a manner dependent on a determination of whether the numerical aperture spans a Rayleigh singularity. Where a singularity exists, Gaussian quadrature (cubature) is performed using a set of weights and points (nodes) that account for the effect of the Wood anomaly present within the aperture space. The numerical aperture may be divided into subregions separated by curves where the Wood anomaly condition is satisfied. Each subregion is then numerically integrated and a weighted sum of the subregion contributions is the estimate of the integral. Alternatively, generalized Gaussian quadrature (cubature) is performed where an analytical polynomial function which accounts for the effect of the Wood anomaly present within the aperture space is integrated. Points and nodes generated from a fit of the analytical polynomial function are then used for integration of the intensity distribution function.
摘要翻译：提供了用于以取决于数值孔径是否跨越瑞利奇点的确定的方式将数值孔径上的强度分布函数数值积分的技术。在存在奇异点的情况下，使用一组权重和点（节点）来执行高斯正交（立方体），这些权重和点（节点）表示存在于孔径空间内的木材异常的影响。数值孔径可以分为由木材异常条件满足的曲线分开的子区域。然后每个次区域数值整合，次区域会费的加权和是积分的估计。或者，执行广义高斯正交（立方体），其中综合考虑了在孔隙空间内存在木材异常的影响的分析多项式函数。然后将从分析多项式函数的拟合生成的点和节点用于强度分布函数的积分。

34. 发明授权

US07613598B2 Global shape definition method for scatterometry 有权
标题翻译：用于散点的全局形状定义方法
公开(公告)号：US07613598B2
公开(公告)日：2009-11-03
申请号：US11542806
申请日：2006-10-04
申请人： Jon Opsal , Hanyou Chu , Xuelong Cao , Youxian Wen
发明人： Jon Opsal , Hanyou Chu , Xuelong Cao , Youxian Wen
IPC分类号： G06F17/50
CPC分类号： G01N21/4788
摘要： A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
摘要翻译：用于建模样本的方法包括使用控制点来定义线轮廓和其他几何形状。模型中使用的每个控制点影响模型内的形状。通常，控制点以连接点的方式使用，其中一组点定义形状的轮廓或轮廓。样品中的层通常被模拟，独立于使用控制点定义的形状。总体结果是最小化用于建模形状的参数数量，同时保持得到的散射测量模型的准确性。

35. 发明授权

US07106459B2 CD metrology analysis using a finite difference method 有权
标题翻译： CD测量分析使用有限差分法
公开(公告)号：US07106459B2
公开(公告)日：2006-09-12
申请号：US11150003
申请日：2005-06-10
申请人： Hanyou Chu
发明人： Hanyou Chu
IPC分类号： G01B11/00
CPC分类号： G03F7/70625
摘要： A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.
摘要翻译：用于建模衍射的方法包括构建主体的理论模型。然后使用数字方法来预测当事件场被对象衍射时创建的输出字段。数值方法通过计算衬底上边界处的输出场开始，然后向上遍历每个受试者的层。直接对结构简单的层进行评估。更复杂的层被离散成切片。使用在最下面的切片处开始（或具有基本情况）的场电流比率的递归展开，对这些层执行有限差分方案。通过所有层的组合评估创建了一个散射矩阵，该散射矩阵被评估以确定主体的输出场。

36. 发明申请

US20050231737A1 CD metrology analysis using a finite difference method 有权
标题翻译： CD测量分析使用有限差分法
公开(公告)号：US20050231737A1
公开(公告)日：2005-10-20
申请号：US11150003
申请日：2005-06-10
申请人： Hanyou Chu
发明人： Hanyou Chu
IPC分类号： G03F7/20 , G01B11/14
CPC分类号： G03F7/70625
摘要： A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.
摘要翻译：用于建模衍射的方法包括构建主体的理论模型。然后使用数字方法来预测当事件场被对象衍射时创建的输出字段。数值方法通过计算衬底上边界处的输出场开始，然后向上遍历每个受试者的层。直接对结构简单的层进行评估。更复杂的层被离散成切片。使用在最下面的切片处开始（或具有基本情况）的场电流比率的递归展开，对这些层执行有限差分方案。通过所有层的组合评估创建了一个散射矩阵，该散射矩阵被评估以确定主体的输出场。

37. 发明授权

US06947850B2 Real time analysis of periodic structures on semiconductors 有权
标题翻译：半导体周期性结构的实时分析
公开(公告)号：US06947850B2
公开(公告)日：2005-09-20
申请号：US10733598
申请日：2003-12-11
申请人： Jon Opsal , Hanyou Chu
发明人： Jon Opsal , Hanyou Chu
IPC分类号： G01B11/02 , G01B11/24 , G01N21/21 , G01N21/27 , G03F7/20 , G06F17/00 , H01L21/027 , H01L21/66
CPC分类号： G03F7/70616 , G01B11/24 , G01N21/211 , G03F7/705 , G03F7/70625
摘要： A system for characterizing periodic structures on a real time basis is disclosed. A multi-parameter measurement module generates output signals as a function of wavelength or angle of incidence. The output signals are supplied to a parallel processor, which creates an initial theoretical model and calculates the theoretical optical response. The calculated optical response is compared to measured values. Based on the comparison, the model configuration is modified to be closer to the actual measured structure. Thereafter, the complexity of the model is iteratively increased, by dividing the model into layers each having an associated width and height. The model is fit to the data in an iterative manner until a best fit model is obtained which is similar in structure to the periodic structure.
摘要翻译：公开了一种用于实时表征周期性结构的系统。多参数测量模块产生作为波长或入射角的函数的输出信号。输出信号被提供给并行处理器，其产生初始理论模型并计算理论光学响应。将计算出的光学响应与测量值进行比较。基于比较，模型配置被修改为更接近实际的测量结构。此后，通过将模型分为各自具有相关联的宽度和高度的层，迭代地增加了模型的复杂性。该模型以迭代方式适合于数据，直到获得与结构相似的周期结构相似的最佳拟合模型。

38. 发明授权

US06577384B2 Spatial averaging technique for ellipsometry and reflectometry 有权
标题翻译：用于椭圆偏振和反射测量的空间平均技术
公开(公告)号：US06577384B2
公开(公告)日：2003-06-10
申请号：US09871220
申请日：2001-05-31
申请人： Lanhua Wei , Hanyou Chu , Jon Opsal
发明人： Lanhua Wei , Hanyou Chu , Jon Opsal
IPC分类号： G01N2100
CPC分类号： G01N21/211 , G01B11/065 , G01N21/9501 , H01L22/12
摘要： This invention relates to optical metrology tools that are used to evaluate small measurement areas on a semiconductor wafer, where the measurement area is surrounded by a material different from the measurement area. In one embodiment, a probe beam is scanned over the measurement area and the surrounding material as data is taken at multiple locations. A processor determines the characteristics of the measurement area by identifying an extremum value of the measurements which represents the center of the measurement area. In another embodiment, the processor determines the characteristics of the sample using a combination of light measured from within and without the measurement area. The measured data is treated as a combination of light from both regions and mathematically modeled to account for both the contribution of the light reflected from the measurement area and the light reflected from the surrounding material.
摘要翻译：本发明涉及光学测量工具，其用于评估半导体晶片上的小测量区域，其中测量区域由与测量区域不同的材料包围。在一个实施例中，当数据在多个位置拍摄时，探测光束被扫描在测量区域和周围的材料上。处理器通过识别表示测量区域的中心的测量值的极值来确定测量区域的特性。在另一个实施例中，处理器使用从内部和不具有测量区域测量的光的组合来确定样本的特性。测量数据被视为来自两个区域的光的组合，并且通过数学建模来考虑从测量区域反射的光的贡献和从周围材料反射的光的贡献。

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