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31. 发明专利

JPH0328810B2 失效
公开(公告)号：JPH0328810B2
公开(公告)日：1991-04-22
申请号：JP7526582
申请日：1982-05-07
申请人： HITACHI LTD
发明人： KUNYOSHI SHINJI , TAKANASHI AKIHIRO , HOSAKA SUMIO , KAWAMURA YOSHIO , KUROSAKI TOSHISHIGE , TERASAWA TSUNEO
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , H01L21/027

32. 发明专利

JPH0371007A METHOD AND MECHANISM FOR AIR MICRO DETECTION 失效
公开(公告)号：JPH0371007A
公开(公告)日：1991-03-26
申请号：JP20677689
申请日：1989-08-11
申请人： HITACHI LTD
发明人： KAWAMURA YOSHIO , KUROSAKI TOSHISHIGE
IPC分类号： G01B13/00 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30
摘要： PURPOSE:To easily correct a focus position error due to variation in atmospheric pressure with high accuracy by making an air micro type detector and a reference device different in effective contraction area ratio. CONSTITUTION:The air micro type detector 2 and reference device 7 air made different in effective contraction area ratio to have different sensitivity characteristics and detected pressure and reference pressure vary as the detector 2 and reference device 7 vary in blowout atmospheric pressure. For the purpose, control is performed by a zero-point method so that the detected pressure and reference pressure balance with each other, and then a sample surface can be set at a position matching the atmospheric pressure. Further, alloy, etc., which varies in shape with temperature is used for the contraction part of the reference device 7 and the effective area ratio is varied by a specific quantity corresponding to humidity variation to balance the detected pressure of the detector 2 with the reference pressure of the reference device 7 by the zero-point method, thereby setting the sample surface at a position matching the temperature variation.

33. 发明专利

JPH0350752A WAFER ALIGNING METHOD AND DEVICE 失效
公开(公告)号：JPH0350752A
公开(公告)日：1991-03-05
申请号：JP18463789
申请日：1989-07-19
申请人： HITACHI LTD
发明人： KOHIDA HIROYUKI , KAWAMURA YOSHIO , OYAMA MITSUO
IPC分类号： H01L21/68 , G05D3/00 , G05D3/12
摘要： PURPOSE:To determine the inclination of an orientation flat with high precision by a method wherein, after the orientation flat of a wafer is roughly determined, the wafer is considerably moved in the direction perpendicular to an edge position detecting equipment, and the edge of the wafer is detected. CONSTITUTION:After a table is revolved to a position where an orientation flat is set above an edge position detector, a wafer is moved in the direction perpendicular to the edge position detector. At this time, change of the length up to the wafer end-portion is detected through the edge position detector. When the wafer is moved in the direction perpendicular to the edge position detector in the case where the orientation flat is not perpendicular to the edge position detector, the edge positions to be detected before and after movement of the wafer are different each other. Inclination of the orientation flat is determined by DELTAtheta=tan (DELTAY/DELTAX) where DELTAX is the amount of wafer movement, and DELTAY is the difference of edge positions measured before and after movement. When the amount of wafer movement is increased, the detected difference of edge position is increased, and thereby micro inclination of the orientation flat can be measured without requiring a highly accurate edge position detector.

34. 发明专利

JPH02132350A MEASURING METHOD FOR TOOL CHIP COMPOSITION AND TOOL CHIP POLISHING DEVICE 失效
公开(公告)号：JPH02132350A
公开(公告)日：1990-05-21
申请号：JP28564488
申请日：1988-11-14
申请人： HITACHI LTD
发明人： KAWAMURA YOSHIO , MORITA KENJI , HORIUCHI YASUAKI , KAWAKUBO YOICHI
IPC分类号： G01N21/70 , B24B3/34
摘要： PURPOSE:To predict the life of a diamond tool and to perform machining of good surface accuracy by detecting the light emission color, brightness, and light emission pattern of a spark and specifying the components and the amount of impurity in the material of a chip. CONSTITUTION:The chip 1 is held by a moving mechanism for adjusting the attitude and load against a polishing disk finely so as to polish a prescribed part of the chip blade edge. A detector 7 is equipped with an objective 4, a diffraction grating 5 for diffusing the light emission color of the spark spectrally, a linear image sensor 6 for detecting the wavelength range and brightness of the spectral light, and a two-dimensional image sensor 11 which forms an image of the spark separately by a half-mirror 10 and obtains the image for the image processing of the light emission pattern. Then the spark 3 emitted by friction light emission from the contact point between the chip 1 of the diamond tool and the polishing disk 2 where abrasive grains 9 are stuck is detected 7 and the detection signal is processed 8 and displayed.

35. 发明专利

JPS6462817A METHOD AND DEVICE FOR PRODUCING MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPS6462817A
公开(公告)日：1989-03-09
申请号：JP21781587
申请日：1987-09-02
申请人： HITACHI LTD
发明人： OGAWA OSAMU , FUMIOKA JIYUN , KATO YOSHIKI , KAWAKUBO YOICHI , KAWAMURA YOSHIO
IPC分类号： G11B5/84
摘要： PURPOSE:To form a recording medium having high-accuracy film thickness tolerance and good smoothness by providing grasping means which grasps a grinding tape with prescribed force into a grinding tape traveling path before grinding and subjecting the grinding tape to a calendering treatment. CONSTITUTION:The grinding tape 4 is delivered by clamping roller units 2 and, therefore, the grinding of a magnetic disk 1 is executed always at a stable traveling speed under the specified tension on a rubber roller 5 which is a pressing member even if there is a fluctuation in the tension state by a change in the winding torque or winding diameter of the tape 4 on a feed reel 8. Furthermore, the calendering treatment of the tape 4 is executed by the clamping roller units 2 and, therefore, the grinding surface of the tape 4 is maintained in the specified abrasive grain state and the specified grinding characteristic is maintained. The thickness of the magnetic film is thus obtd. with high accuracy and the good finish surface having less ruggedness is formed.

36. 发明专利

JPS6450483A SUPERCONDUCTING DEVICE 失效
公开(公告)号：JPS6450483A
公开(公告)日：1989-02-27
申请号：JP20631087
申请日：1987-08-21
申请人： HITACHI LTD
发明人： TODA AKIZO , KAWAMURA YOSHIO , IMAI KUNINORI , KATO SHIGEO
IPC分类号： H01L23/38 , H01L35/28 , H01L39/04
摘要： PURPOSE:To improve cooling efficiency by cooling a high temperature superconductor by the use of an electronic cooling element through a substance having a high thermal conductivity. CONSTITUTION:High temperature superconducting ceramics 2 are connected as a superconducting element to wirings 2 for a superconductor, and cooled to a predetermined temperature by an electronic cooling element 3. In this case, in order to hold electric insulation between the superconductor 1 and the element 3, aluminum nitride ceramics 5 having insulation and 150W/m.k or more of thermal conductivity are interposed between both. Thus, wirings 4 for the element is energized to effectively cool the superconductor 1 and to simultaneously reduce the whole size of a superconducting device.

37. 发明专利

JPS6349893B2 失效
公开(公告)号：JPS6349893B2
公开(公告)日：1988-10-06
申请号：JP3797781
申请日：1981-03-18
申请人： HITACHI LTD
发明人： TAKANASHI AKIHIRO , HARADA TATSUO , AKEYAMA MASAMOTO , KONDO YATARO , KUROSAKI TOSHISHIGE , KUNYOSHI SHINJI , HOSAKA SUMIO , KAWAMURA YOSHIO
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027

38. 发明专利

JPS63155722A ALIGNER 失效
公开(公告)号：JPS63155722A
公开(公告)日：1988-06-28
申请号：JP30123786
申请日：1986-12-19
申请人： HITACHI LTD
发明人： TANAKA SHINJI , SATO KAZUO , TERASAWA TSUNEO , KAWAMURA YOSHIO
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
摘要： PURPOSE:To accurately align a photomask pattern to a crystal face orientation by specifying a crystal orientation by a parallel beam reflected or diffracted on a substrate crystal to measure the crystal orientation of the single crystal substrate and to regulate the relative position of the substrate to a photomask. CONSTITUTION:A light emitting unit 3 for supplying a parallel beam irradiates the beam to the crystal face of a recess 2 formed on an Si wafer, and a reflected light quantity is measured by a photodetector 4. A rotary table 5 is rotated by a rotary driver 8 at the recess 2 as a center at this time, and stopped at the position where the reflected light quantity supplied to the photodetector 4 becomes maximum. The incident light and the reflected light at a crystal plane (111) 10 formed in the recess and a crystal orientation vector 9 exist in the same plane, and are positioned in an accurate orientation. A pattern transfer mask 6 is positioned to a normal direction by measuring in advance mark holes 11, 11' by other optical systems 12, 12'. The mask 6 is accurately aligned to the crystal orientation of the substrate 1 by this operation to transfer a desired pattern accurately.

39. 发明专利

JPS6396722A FLOATING TYPE MAGNETIC HEAD 失效
公开(公告)号：JPS6396722A
公开(公告)日：1988-04-27
申请号：JP23919486
申请日：1986-10-09
申请人： HITACHI LTD
发明人： KAWAMURA YOSHIO , KATO SHIGEO , KANASUGI SEIJI , IMAI KUNINORI , SHIOKAWA TAKEJI
IPC分类号： G11B5/60 , G11B21/21
摘要： PURPOSE:To improve an electromagnetic transform characteristic, and to stabilize magnetic recording with high density, by constituting a floating slider plane with plural plane parts, and one ore more curved plane parts, and providing a magnetic flux gap part at a position making a minimum distance between the projecting part of the floating slider part and a magnetic recording medium. CONSTITUTION:The floating slider part 2 of a magnetic head 1 is formed with two planes intersecting mutually, and at the front of the part, an air flow terminal 4 is formed. And the magnetic flux gap part 3 of the magnetic head 1 is provided on the cross line of two floating slider planes 2 including a point P2, is provided. Thereby, it is possible to make only the magnetic flux gap part 3 approach to a magnetic disk 8 that is the magnetic recording medium, and to expand the distance between the floating slider plane 2 and the magnetic disk 8 comparatively, and an air layer passing the slider floating plane 2 is thickened, and it is possible to obtain a stable floating characteristic from the standpoint of aerodynamics. In this way, it is possible to obtain the magnetic head with few frequency of head crash due to contact with the magnetic disk, and to attain the magnetic recording with high reliability and high density.

40. 发明专利

JPS6390023A MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPS6390023A
公开(公告)日：1988-04-20
申请号：JP23459786
申请日：1986-10-03
申请人： HITACHI LTD
发明人： TSUCHIYAMA RYUJI , KAWAMURA YOSHIO , IMAMURA MASAAKI , ITO YASUSHI , OTANI YUICHI , SUZUKI SHOJI , MAEHARA KIYOSHI
IPC分类号： G11B5/62 , G11B5/82
摘要： PURPOSE:To decrease the quantity of reinforcing materials to a greater extent and to improve electrical characteristics by arranging the reinforcing materials to a specific shape on a disk surface in such a manner that a magnetic head can be supported at least at 3 points. CONSTITUTION:The reinforcing materials 3 on the disk 1 are so disposed to the prescribed position that the magnetic head, disposed in direct contact with the disk surface, can be supported at least at the 3 points. For example, the reinforcing materials 3 are disposed concentrically, spirally or radially at specified intervals by using a lithographic technique. While 10 pieces of the reinforcing materials exist in the conventional random arrangement, the quantity can be greatly decreased to half said pieces; i.e., 10 pieces in this method. The chipping away of the foreign matter stuck to the head is effectively satisfied and the improvement in the electrical characteristics is attained.

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