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31. 发明授权

US06248287B1 Corrective tempering apparatus for rolling elements 有权
标题翻译：滚动元件矫正回火设备
公开(公告)号：US06248287B1
公开(公告)日：2001-06-19
申请号：US09449676
申请日：1999-11-30
申请人： Kiyoshi Hirakawa , Akitoshi Maeda , Hiroaki Sugiyama , Manabu Ohhori
发明人： Kiyoshi Hirakawa , Akitoshi Maeda , Hiroaki Sugiyama , Manabu Ohhori
IPC分类号： C21D900
CPC分类号： C21D1/30 , C21D1/26 , C21D1/40 , C21D1/42 , C21D1/673 , C21D9/40 , F16C33/30 , Y02P10/253 , Y10S148/906
摘要： In a corrective tempering method and apparatus for a rolling element in which the thermal deformation of the rolling element is corrected within an extremely short time by utilizing plasticity exhibited during a metallic structure transforming process brought about by low-temperature tempering of the rolling element made of steel, the hardened rolling element is heated and pressured to a maximum temperature within a range of from 250 to 500° C. by a heating device while set in correcting molds to correct the deformation of the rolling element at a degree of working within a range not exceeding an elastic deformation range of the rolling element at a room temperature. The rolling element can be heated also by an induction heating device in addition to a conduction heating device. A product whose inner/outer diameter correcting degree of deformation is 60% or more, dimension standardizing rate is 30% or more, surface roughness is less than Ra 0.2 &mgr;m, and surface hardness is HRC 56 or more can be obtained for a correction time within 6 minutes and an induction heating time within 30 seconds.
摘要翻译：在一种用于滚动元件的矫正回火方法和装置中，通过利用在通过低温回火引起的金属结构转化过程中所发生的塑性，在极短的时间内校正滚动元件的热变形，通过加热装置将淬火的滚动元件加热并加压到250-500℃的最高温度，同时设置在校正模具中以在一定范围内的加工程度校正滚动元件的变形在室温下不超过滚动体的弹性变形范围。除了传导加热装置之外，滚动体也可以通过感应加热装置加热。其外径矫正度的变形量为60％以上，尺寸标准化率为30％以上，表面粗糙度小于Ra0.2μm，并且可以获得表面硬度为HRC 56以上的校正时间在6分钟内，感应加热时间在30秒以内。

32. 发明授权

US6110598A Low resistive tantalum thin film structure and method for forming the same 有权
标题翻译：低电阻钽薄膜结构及其形成方法
公开(公告)号：US6110598A
公开(公告)日：2000-08-29
申请号：US178534
申请日：1998-10-26
申请人： Akitoshi Maeda , Hideo Murata , Eiji Hirakawa
发明人： Akitoshi Maeda , Hideo Murata , Eiji Hirakawa
IPC分类号： G02F1/136 , C23C14/06 , C23C14/18 , C23C14/34 , G02F1/1343 , H01B5/14 , H01B13/00 , H01L21/00 , H01L21/02 , H01L21/28 , H01L21/285 , H01L21/316 , H01L21/3205 , H01L21/336 , H01L21/768 , H01L23/52 , B32B9/00
CPC分类号： C23C14/0641 , C23C14/185 , H01L21/28008 , H01L21/76841 , H01L29/66765 , H01L28/75
摘要： A method for forming a lamination structure of a tantalum nitride film and a tantalum thin film free of nitrogen overlying the tantalum nitride film, which have reduced resistivities, wherein a gas pressure during sputtering for growing the tantalum nitride film is limited to a predetermined value not more than about 0.5 pa so that the tantalum nitride film has a hexagonal crystal structure and the tantalum thin film free of nitrogen has a BCC structure with lattice spacing close to that of the tantalum nitride film hexagonal crystal structure.
摘要翻译：一种用于形成氮化钽膜和不含覆盖氮化钽膜的氮的钽薄膜的叠层结构的方法，其具有降低的电阻率，其中用于生长氮化钽膜的溅射期间的气体压力被限制在预定值大于约0.5Pa，使得氮化钽膜具有六方晶体结构，并且不含氮的钽薄膜具有晶格间距接近于氮化钽膜六方晶体结构的BCC结构。

33. 发明授权

US5118661A Sputtering target for use in fabricating integrated circuit device 失效
标题翻译：用于制造集成电路器件的溅射靶
公开(公告)号：US5118661A
公开(公告)日：1992-06-02
申请号：US616241
申请日：1990-11-20
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： C23C14/34 , H01L21/285 , H01L39/24
CPC分类号： H01J37/3429 , C23C14/3414 , H01L39/2435 , Y10S505/731
摘要： A sputtering target for forming a thin film of an alloy on a substrate includes a first component having a first mass number and a second component having a second mass number larger than the first mass number. The weight percentage of the first component increases with depth from the surface of the target.
摘要翻译：用于在基板上形成合金薄膜的溅射靶包括具有第一质量数的第一部件和具有大于第一质量数的第二质量数的第二部件。第一组分的重量百分比随距离目标表面的深度增加。

34. 发明授权

US08454241B2 Rolling device 有权
标题翻译：滚动装置
公开(公告)号：US08454241B2
公开(公告)日：2013-06-04
申请号：US12302430
申请日：2007-05-31
申请人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
发明人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
IPC分类号： F16C33/62
CPC分类号： G03G15/0935 , B65G39/09 , C23C28/021 , C23C28/023 , C23C28/025 , F16C13/06 , F16C19/52 , F16C23/082 , F16C33/32 , F16C33/34 , F16C33/64 , F16C2204/34 , F16C2204/36 , F16C2204/50 , F16C2223/08 , F16C2223/80 , F16C2240/60 , F16C2300/42 , G03G15/0233 , G03G15/0808 , G03G15/0818 , G03G15/2053 , G03G15/751
摘要： A rolling device in which rust development or damage on a raceway surface or rolling surface is hard to occur even if water and the like intrude is provided. A self-aligning roller bearing comprises an inner ring 1, an outer ring 2, and a plurality of rolling elements 3 disposed rotatably between a raceway surface 1a of the inner ring 1 and a raceway surface 2a of the outer ring 2. At least any one of the inner ring 1, the outer ring 2, and the rolling elements 3 is provided with a metal coating formed by shot peening of a powder of metal less noble than iron at least on a part of its surface.
摘要翻译：即使在水等侵入的情况下也难以发生生锈或轨道面或滚动面的损伤的滚动装置。自调心滚子轴承包括内圈1，外圈2和可旋转地设置在内圈1的滚道表面1a和外圈2的滚道表面2a之间的多个滚动元件3。内圈1，外圈2和滚动元件3中的一个设置有金属涂层，该金属涂层至少在其表面的一部分上通过对比金属更低的金属的粉末喷丸硬化而形成。

35. 发明申请

US20050175792A1 Liquid crystal display panel having reflection electrodes improved in smooth surface morphology and process for fabrication thereof 有权
标题翻译：具有反射电极的液晶显示面板具有光滑的表面形态和其制造工艺
公开(公告)号：US20050175792A1
公开(公告)日：2005-08-11
申请号：US11105418
申请日：2005-04-14
申请人： Akitoshi Maeda , Atsushi Yamamoto , Tomohide Shindoh
发明人： Akitoshi Maeda , Atsushi Yamamoto , Tomohide Shindoh
IPC分类号： G02F1/1337 , G02F1/1335 , G02F1/1343 , G02F1/1368 , C09K19/00
CPC分类号： G02F1/133553 , G02F1/133504 , G02F1/133555 , G02F1/136227 , Y10T428/1036
摘要： A liquid crystal display panel of the type having reflection electrodes tends to have an image-forming plane undesirably yellowed due to the wavelength dependency of transparency observed in an orientation layer on the reflection electrodes; aluminum-neodymium alloy, which has neodymium content between 5 weight % to 10 weight %, is deposited on an inter-layered insulating layer at the substrate temperature equal to or less than 170 degrees in centigrade for the reflection electrodes so that the surface morphology is represented by average pitches equal to or less than 1 micron; even though the orientation layer has the wavelength dependency of transparency, the reflection electrodes make the optical path in the orientation layer equalized so that the image-forming plane is not yellowed.
摘要翻译：由于在反射电极上的取向层中观察到的透明度的波长依赖性，具有反射电极的类型的液晶显示面板往往具有不希望的黄色的图像形成面; 钕含量在5重量％至10重量％之间的铝 - 钕合金在反应电极的基板温度等于或小于摄氏170度的层间绝缘层上沉积，使得表面形态为由等于或小于1微米的平均间距表示; 即使取向层具有透明度的波长依赖性，反射电极也使取向层中的光路平坦化，使得成像面不变黄。

36. 发明授权

US06515730B1 Method of manufacturing a liquid crystal display panel including a terminal electrode part thereof 失效
标题翻译：制造包括其端子电极部分的液晶显示面板的方法
公开(公告)号：US06515730B1
公开(公告)日：2003-02-04
申请号：US09924766
申请日：2001-08-09
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： G02F113
CPC分类号： G02F1/1345
摘要： A simple method for preventing oxidization of an aluminum surface of terminal electrode, increase of pressure contact resistance, unstability and reduction of connection reliability is provided. In a terminal electrode part on a reactive matrix substrate, for being connected to an external drive circuit, connecting electrodes are formed by using aluminum or an aluminum alloy, at least their surfaces connected to TCP are covered with an insulating film of aluminum oxide or consisting of a laminate film of aluminum oxide aluminum hydroxide, and the insulating film is selectively removed in a step subsequent to the final step in a cell formation process. In this way, adverse effects of the heat treatment processes such as the annealing in the array formation process and the orientation film sintering of the cell formation process and the oxidization of the connecting electrode surface in the washing.
摘要翻译：提供了一种防止端子电极的铝表面氧化的简单方法，增加了耐压接触性，不稳定性和连接可靠性的降低。在反应性基质基板上的端子电极部分中，为了连接到外部驱动电路，通过使用铝或铝合金形成连接电极，至少其连接到TCP的表面被氧化铝的绝缘膜覆盖，或者由的氧化铝氢氧化铝的层压膜，并且在细胞形成过程中的最终步骤之后的步骤中选择性地除去绝缘膜。以这种方式，诸如阵列形成过程中的退火和细胞形成过程的取向膜烧结以及洗涤中连接电极表面的氧化的热处理过程的不利影响。

37. 发明授权

US06452648B2 Liquid crystal display panel and method for manufacturing the same 有权
公开(公告)号：US06452648B2
公开(公告)日：2002-09-17
申请号：US09924767
申请日：2001-08-09
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： G02F1136
CPC分类号： G02F1/1345
摘要： A simple method for preventing oxidization of an aluminum surface of terminal electrode, increase of pressure contact resistance, unstability and reduction of connection reliability is provided. In a terminal electrode part on a reactive matrix substrate, for being connected to an external drive circuit, connecting electrodes are formed by using aluminum or an aluminum alloy, at least their surfaces connected to TCP are covered with an insulating film of aluminum oxide or consisting of a laminate film of aluminum oxide aluminum hydroxide, and the insulating film is selectively removed in a step subsequent to the final step in a cell formation process. In this way, adverse effects of the heat treatment processes such as the annealing in the array formation process and the orientation film sintering of the cell formation process and the oxidization of the connecting electrode surface in the washing.

38. 发明授权

US06259495B1 Liquid crystal display panel and method of manufacturing the same, including a structure for, and a method of preparing, terminal or connecting electrodes for connecting liquid crystal display panel to an external drive circuit 有权
标题翻译：液晶显示面板及其制造方法，包括用于将液晶显示面板与外部驱动电路连接的端子或连接电极的结构和方法
公开(公告)号：US06259495B1
公开(公告)日：2001-07-10
申请号：US09233961
申请日：1999-01-20
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： G02F1136
CPC分类号： G02F1/1345
摘要： A simple method for preventing oxidization of an aluminum surface of terminal electrode, increase of pressure contact resistance, unstability and reduction of connection reliability is provided. In a terminal electrode part on a reactive matrix substrate, for being connected to an external drive circuit, connecting electrodes are formed by using aluminum or an aluminum alloy, at least their surfaces connected to TCP are covered with an insulating film of aluminum oxide or consisting of a laminate film of aluminum oxide aluminum hydroxide, and the insulating film is selectively removed in a step subsequent to the final step in a cell formation process. In this way, adverse effects of the heat treatment processes such as the annealing in the array formation process and the orientation film sintering of the cell formation process and the oxidization of the connecting electrode surface in the washing.
摘要翻译：提供了一种防止端子电极的铝表面氧化的简单方法，增加了耐压接触性，不稳定性和连接可靠性的降低。在反应性基质基板上的端子电极部分中，为了连接到外部驱动电路，通过使用铝或铝合金形成连接电极，至少其连接到TCP的表面被氧化铝的绝缘膜覆盖，或者由的氧化铝氢氧化铝的层压膜，并且在细胞形成过程中的最终步骤之后的步骤中选择性地除去绝缘膜。以这种方式，诸如阵列形成过程中的退火和细胞形成过程的取向膜烧结以及洗涤中连接电极表面的氧化的热处理过程的不利影响。

39. 发明授权

US6093268A Corrective tempering method for rolling elements 失效
标题翻译：滚动元件矫正回火方法
公开(公告)号：US6093268A
公开(公告)日：2000-07-25
申请号：US632418
申请日：1996-04-24
申请人： Kiyoshi Hirakawa , Akitoshi Maeda , Hiroaki Sugiyama , Manabu Ohhori
发明人： Kiyoshi Hirakawa , Akitoshi Maeda , Hiroaki Sugiyama , Manabu Ohhori
IPC分类号： C21D1/26 , C21D1/30 , C21D1/40 , C21D1/42 , C21D1/673 , C21D9/40 , C21D9/00
CPC分类号： C21D1/30 , C21D1/26 , C21D1/42 , C21D9/40 , F16C33/30 , C21D1/40 , C21D1/673 , Y02P10/253 , Y10S148/906
摘要： In a corrective tempering method and apparatus for a rolling element in which the thermal deformation of the rolling element is corrected within an extremely short time by utilizing plasticity exhibited during a metallic structure transforming process brought about by low-temperature tempering of the rolling element made of steel, the hardened rolling element is heated and pressured to a maximum temperature within a range of from 250 to 500.degree. C. by a heating device while set in correcting molds to correct the deformation of the rolling element at a degree of working within a range not exceeding an elastic deformation range of the rolling element at a room temperature. The rolling element can be heated also by an induction heating device in addition to a conduction heating device. A product whose inner/outer diameter correcting degree of deformation is 60% or more, dimension standardizing rate is 30% or more, surface roughness is less than Ra 0.2 .mu.m, and surface hardness is HRC 56 or more can be obtained for a correction time within 6 minutes and an induction heating time within 30 seconds.
摘要翻译： PCT No.PCT / JP95 / 01662 Sec。 371日期：1996年4月24日 102（e）日期1996年4月24日PCT提交1995年8月23日PCT公布。公开号WO96 / 06194 日本特开1996年2月29日，日本特开2002-1259号公报所述的一种用于滚动元件的矫正回火方法和装置，其中通过利用由低温回火引起的金属结构变形过程中所呈现的可塑性，在极短的时间内对滚动元件的热变形进行校正由钢制的滚动元件，通过加热装置将硬化的滚动元件加热并加压到250-500℃的最高温度，同时设置在校正模具中以校正滚动元件的变形程度在不超过滚动体的弹性变形范围的范围内在室温下工作。除了传导加热装置之外，滚动体也可以通过感应加热装置加热。其内/外径矫正度为60％以上，尺寸标准化率为30％以上，表面粗糙度小于Ra0.2μm的产品，并且可以获得表面硬度为HRC 56以上的校正时间在6分钟内，感应加热时间在30秒以内。

40. 发明授权

US5316975A Method of forming multilevel interconnections in a semiconductor integrated circuit 失效
标题翻译：在半导体集成电路中形成多电平互连的方法
公开(公告)号：US5316975A
公开(公告)日：1994-05-31
申请号：US823163
申请日：1992-01-21
申请人： Akitoshi Maeda
发明人： Akitoshi Maeda
IPC分类号： H01R4/26 , H01L21/768 , H01R13/22 , H01R33/76 , H01L21/441 , H01L21/465
CPC分类号： H01L21/76877 , Y10S148/05 , Y10S438/902 , Y10S438/906
摘要： A method is disclosed for producing integrated circuit apparatus in which electroconductive interconnection films are disposed adjacent to each other and have an insulating film sandwiched therebetween. The electroconductive films are electrically connected with each other via a through-hole formed in the insulating film. First, a through-hole is formed in an insulating film so as to extend to the surface of a first electroconductive interconnection film. Then, extraneous materials existing on the surfaces of the insulating film and the electroconductive film exposed in the through-hole are removed by a sputter etching method. Next, an insulating film covering film ("covering film") is formed by a sputtering method on said insulating film by using a material which is the same material that is used for forming a second electroconductive interconnection film. Subsequently, the sputter etching method is used again to remove the covering film. Finally, the second electroconductive interconnection film is formed on the insulating film and makes electrical contact with the first electroconductive film via the through-hole.
摘要翻译：公开了一种用于制造集成电路装置的方法，其中导电互连膜彼此相邻设置并且夹在其间的绝缘膜。导电膜通过形成在绝缘膜中的通孔彼此电连接。首先，在绝缘膜中形成通孔，以延伸到第一导电互连膜的表面。然后，通过溅射蚀刻方法除去存在于绝缘膜表面上的外部材料和暴露在通孔中的导电膜。接下来，通过使用与用于形成第二导电互连膜的材料相同的材料，通过溅射法在所述绝缘膜上形成绝缘膜覆盖膜（“覆盖膜”）。随后，再次使用溅射蚀刻方法去除覆盖膜。最后，第二导电互连膜形成在绝缘膜上，并经由通孔与第一导电膜电接触。

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