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31. 发明申请

US20110142515A1 MEDIUM CONVEYING DEVICE AND IMAGE FORMING APPARATUS 有权
标题翻译：中等输送装置和图像形成装置
公开(公告)号：US20110142515A1
公开(公告)日：2011-06-16
申请号：US12878528
申请日：2010-09-09
申请人： Yousuke HASEGAWA , Michio TADA , Takashi ABE , Hisakazu ONOE , Hiroyuki SUZUKI , Akira IWASAKA , Makio UEHARA , Toshitaka TANAKA
发明人： Yousuke HASEGAWA , Michio TADA , Takashi ABE , Hisakazu ONOE , Hiroyuki SUZUKI , Akira IWASAKA , Makio UEHARA , Toshitaka TANAKA
IPC分类号： G03G15/00 , B65H5/06 , B65H9/00
CPC分类号： G03G21/00 , B65H5/062 , B65H9/166 , B65H2301/531 , B65H2404/14 , B65H2801/06 , G03G15/235 , G03G15/6567 , G03G2215/00561 , G03G2215/00679
摘要： A medium conveying device includes an alignment member, a skew conveying member, and a removal member. The alignment member faces one end of a medium and aligns the medium while contacting with the medium when the medium is conveyed in a first direction. The skew conveying member conveys the medium in a second direction crossing to the first direction so that the one end comes in contact with the alignment member and that includes a drive member and a driven member opposed to the drive member and driven by the drive member. The removal member has a tip end coming in contact with a face of the drive member to remove a deposit on the face. The removal member is placed along a rotation direction of the drive member so that the tip end faces downstream of the rotational direction.
摘要翻译：介质传送装置包括对准构件，倾斜传送构件和移除构件。当介质沿着第一方向输送时，对准构件面向介质的一端并对准介质同介质接触。倾斜输送构件沿与第一方向交叉的第二方向传送介质，使得一端与对准构件接触，并且包括与驱动构件相对并由驱动构件驱动的驱动构件和从动构件。移除构件具有与驱动构件的面接触的尖端，以去除面上的沉积物。拆卸构件沿着驱动构件的旋转方向设置，使得前端面朝向旋转方向的下游。

32. 发明申请

US20110140343A1 MEDIUM CONVEYING DEVICE AND IMAGE FORMING APPARATUS 有权
标题翻译：中等输送装置和图像形成装置
公开(公告)号：US20110140343A1
公开(公告)日：2011-06-16
申请号：US12956585
申请日：2010-11-30
申请人： Toshitaka TANAKA , Michio TADA , Takashi ABE , Yousuke HASEGAWA , Hisakazu ONOE , Hiroyuki SUZUKI , Akira IWASAKA , Makio UEHARA
发明人： Toshitaka TANAKA , Michio TADA , Takashi ABE , Yousuke HASEGAWA , Hisakazu ONOE , Hiroyuki SUZUKI , Akira IWASAKA , Makio UEHARA
IPC分类号： B65H5/06 , B65H5/00 , B65H9/00
CPC分类号： G03G21/1638 , B65H5/062 , B65H5/26 , B65H29/125 , B65H2402/10 , B65H2402/441 , B65H2402/5155 , B65H2402/54 , B65H2402/541 , B65H2402/542 , B65H2403/60 , B65H2404/144 , B65H2404/15212 , B65H2404/1522 , B65H2404/1523 , B65H2404/54 , B65H2404/611 , B65H2405/312 , B65H2405/552 , B65H2511/515 , B65H2601/11 , G03G15/6529 , G03G2215/00544 , G03G2215/00548 , G03G2215/00565 , G03G2215/00586 , G03G2221/1675 , B65H2220/01 , B65H2220/11
摘要： A medium conveying device includes a first guide member, a second guide member, a conveying member, and a support member. The first guide member guides one face of a medium to be conveyed and opposed to the one face when the medium is conveyed. The second guide member guides the other face of the medium and is opposed to the other face when the medium is conveyed, the second guide member being movable between a close position and an open position. The conveying member is provided in a conveying passage formed by the first guide member and the second guide member being at the close position in order to convey the medium in the conveying passage. The support member keeps the second guide member at the open position and is provided at a position outer than the second guide member in a direction that the medium is conveyed. When the second guide member is at the open position, the medium in the conveying passage is removable from the conveying passage.
摘要翻译：介质输送装置包括第一引导构件，第二引导构件，输送构件和支撑构件。当介质被输送时，第一引导构件引导要被输送的介质的一个面并且与一个面相对。第二引导构件引导介质的另一面，并且当介质被输送时与另一面相对，第二引导构件可在关闭位置和打开位置之间移动。输送构件设置在由第一引导构件和第二引导构件形成的输送通道中，该输送通道处于关闭位置，以便将输送通道中的介质输送。支撑构件将第二引导构件保持在打开位置，并且在介质被传送的方向上设置在比第二引导构件外侧的位置。当第二引导构件处于打开位置时，输送通道中的介质可从输送通道移除。

33. 发明申请

US20100194509A1 RARE EARTH MAGNET 有权
标题翻译：稀土磁铁
公开(公告)号：US20100194509A1
公开(公告)日：2010-08-05
申请号：US12696074
申请日：2010-01-29
申请人： Hiroyuki SUZUKI , Takao Imagawa , Yuichi Satsu , Matahiro Komuro
发明人： Hiroyuki SUZUKI , Takao Imagawa , Yuichi Satsu , Matahiro Komuro
IPC分类号： H01F7/02
CPC分类号： C22C1/0441 , C22C2202/02 , H01F1/0577 , H01F41/0293
摘要： A rare earth magnet having a composition represented by RTB wherein R denotes a rare earth element, T a transition metal and B boron, the magnet being composed of magnet powder constituted by crystalline particles. The particles of the magnetic powder have a ratio of a short diameter being 10 μm or more to a long diameter is 0.5 or less. An element Rm having a magnetic anisotropy higher than that of the rare earth element is contained in the surface and inside of the magnet constituted by the magnet powder in an approximately constant concentration. An oxy-fluoride and carbon are present at boundaries of the particles of the magnet powder.
摘要翻译：具有由RTB表示的组成的稀土类磁体，其中R表示稀土元素，T是过渡金属和B硼，所述磁体由由结晶颗粒构成的磁体粉末组成。磁粉的粒子的短径为10μm以上的长径比为0.5以下。具有高于稀土元素的磁各向异性的元素Rm被包含在以大致恒定的浓度由磁体粉末构成的磁体的表面和内部。氧氟化物和碳存在于磁体粉末颗粒的边界处。

34. 发明申请

US20100051584A1 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
标题翻译：等离子体加工设备和等离子体处理方法
公开(公告)号：US20100051584A1
公开(公告)日：2010-03-04
申请号：US12578844
申请日：2009-10-14
申请人： Shogo OKITA , Hiromi ASAKURA , Syouzou WATANABE , Ryuzou HOUCHIN , Hiroyuki SUZUKI
发明人： Shogo OKITA , Hiromi ASAKURA , Syouzou WATANABE , Ryuzou HOUCHIN , Hiroyuki SUZUKI
IPC分类号： B44C1/22 , C23C16/54 , C23F1/08 , B01J19/08
CPC分类号： F27D5/0068 , H01J37/321 , H01J37/32706 , H01L21/3065 , H01L21/67069
摘要： A tray 15 for a dry etching apparatus 1 has substrate accommodation holes 19A to 19D penetrating thickness direction and a substrate support portion 21 supporting an outer peripheral edge portion of a lower surface 2a of a substrate 2. A dielectric plate 23 has a tray support surface 28 supporting a lower surface of the tray 15, substrate placement portions 29A through 29D inserted from a lower surface side of the tray 15 into the substrate accommodation holes 19A through 19D and having a substrate placement surface 31 at its upper end surface for placing the substrate 2. A dc voltage applying mechanism 43 applies a dc voltage to an electrostatic attraction electrode 40. A heat conduction gas supply mechanism 45 supplies a heat conduction gas between the substrate 2 and substrate placement surface 31. The substrate 2 can be retained on the substrate placement surface 31 with high degree of adhesion. This results in that the cooling efficiency of the substrate 2 is improved and processing is uniformed at the entire region of the substrate surface including the vicinity of the outer peripheral edge.
摘要翻译：用于干蚀刻装置1的托盘15具有穿透厚度方向的基板容纳孔19A至19D以及支撑基板2的下表面2a的外周边缘部分的基板支撑部21.电介质板23具有托盘支撑表面 28，支撑托盘15的下表面，从托盘15的下表面侧插入到基板容纳孔19A至19D中的基板放置部分29A至29D，并且在其上端面具有用于放置基板的基板放置表面31 直流电压施加机构43对静电吸引电极40施加直流电压。导热气体供给机构45在基板2和基板配置面31之间供给导热气体。基板2能够保持在基板放置面31具有高度的粘合力。这导致基板2的冷却效率提高，并且在包括外周边缘附近的基板表面的整个区域处理均匀。

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