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31. 发明授权

US07492440B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07492440B2
公开(公告)日：2009-02-17
申请号：US10936712
申请日：2004-09-09
申请人： Koen Jacobus Johannes Maria Zaal , Edwin Johan Buis , Henrikus Herman Marie Cox , Noud Jan Gilissen , Harmen Klaas Van Der Schoot
发明人： Koen Jacobus Johannes Maria Zaal , Edwin Johan Buis , Henrikus Herman Marie Cox , Noud Jan Gilissen , Harmen Klaas Van Der Schoot
IPC分类号： G02B27/52 , G02B27/42 , H02K41/00
CPC分类号： G03F7/70716 , G03F7/709
摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.
摘要翻译：在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。

32. 发明授权

US07250237B2 Optimized correction of wafer thermal deformations in a lithographic process 失效
标题翻译：光刻过程中晶片热变形的优化校正
公开(公告)号：US07250237B2
公开(公告)日：2007-07-31
申请号：US10743272
申请日：2003-12-23
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G03C5/00 , G03F9/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations.Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译：本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

33. 发明授权

US07012264B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07012264B2
公开(公告)日：2006-03-14
申请号：US10860654
申请日：2004-06-04
申请人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
发明人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
IPC分类号： G21K5/10
CPC分类号： G03F7/70716
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
摘要翻译：提供光刻设备。该装置包括照射辐射束的照明系统，支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑构件以及用于移动物品支撑构件的可移动托架。托架包括设置有非复合安装界面和/或冷却界面的分隔复合结构。通过这种布置，使用例如金属或陶瓷材料的常规接口可以与复合结构的优点结合使用，诸如低比重，高的杨氏模量和需要的方向，高强度，高稳定性和高电阻率。

34. 发明授权

US06943464B2 Lithographic apparatus and motor for use in the apparatus 有权
标题翻译：用于设备的平版印刷设备和电机
公开(公告)号：US06943464B2
公开(公告)日：2005-09-13
申请号：US10740576
申请日：2003-12-22
申请人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Cesar Peter De Klerk , Harmen Klaas Van Der Schoot
发明人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Cesar Peter De Klerk , Harmen Klaas Van Der Schoot
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H02K41/03 , H02K41/035
CPC分类号： G03F7/70758 , H02K41/0356 , Y10S414/135
摘要： A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.
摘要翻译：洛伦兹致动器在装置的第一部分和第二部分之间提供力，包括附接到装置的第一部分并提供第一磁场的主磁体系统; 辅助磁体系统，附接到第一部分并且以Halbach配置布置，提供第二磁场; 以及导电元件，其附接到所述设备的第二部分并且布置成通过所述导电元件承载的电流与所述第一和第二元件的组合相互作用而在所述设备的所述第一和第二部分之间产生力磁场。

35. 发明授权

US07440081B2 Lithographic apparatus, device manufacturing method, and substrate table 有权
标题翻译：光刻设备，器件制造方法和衬底台
公开(公告)号：US07440081B2
公开(公告)日：2008-10-21
申请号：US10981729
申请日：2004-11-05
申请人： Cheng-Qun Gui , Harmen Klaas Van Der Schoot
发明人： Cheng-Qun Gui , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于使辐射束在其横截面上具有图案的图案化系统，用于支撑衬底的衬底台，以及用于将图案化的射束投影的投影系统到基板的目标部分上。衬底台包括具有用于将衬底的目标部分的至少一部分支撑在流体衬垫上的上支撑表面的支撑构件。该装置还包括流体供应系统，该流体供应系统布置成将流体供应到上部支撑表面以便提供缓冲垫，以及布置成作用在支撑构件上的致动器系统。致动器系统是可控制的，以提供相对于参考平面调整上支撑表面的形貌。因此可以对衬底厚度不规则进行补偿，以实现光束到目标表面的正确聚焦。

36. 发明授权

US07408617B2 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method 有权
标题翻译：使用装有编码器的大面积FPD卡盘的光刻设备和器件制造方法进行编码器刻度校准方法
公开(公告)号：US07408617B2
公开(公告)日：2008-08-05
申请号：US11165575
申请日：2005-06-24
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70625
摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.
摘要翻译：光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。照明系统调节辐射束。独立可控元件的阵列调制辐射束的横截面。衬底台支撑衬底。投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。该图案包括第一行和第二行。第一行偏离第二行。位置编码器确定衬底台的位置。位置编码器包括位置传感器和秤。该刻度尺包括多条相互直线并平行的线。成像装置获得第一行和第二行的图像。图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。

37. 发明申请

US20080174750A1 Apparatus configured to position a workpiece 有权
标题翻译：被配置为定位工件的装置
公开(公告)号：US20080174750A1
公开(公告)日：2008-07-24
申请号：US12068071
申请日：2008-02-01
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
摘要翻译：一种装置构造成定位工件。该装置包括平面基座和被配置为支撑工件的可移动台。该台被配置成在平面底座上移动。该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。

38. 发明授权

US07359032B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07359032B2
公开(公告)日：2008-04-15
申请号：US10925148
申请日：2004-08-25
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62 , H02K41/00
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.
摘要翻译：公开了一种光刻投影装置。该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。

39. 发明授权

US07292317B2 Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 有权
标题翻译：利用基板台补偿的平版印刷设备和器件制造方法
公开(公告)号：US07292317B2
公开(公告)日：2007-11-06
申请号：US11147467
申请日：2005-06-08
申请人： Henrikus Herman Marie Cox , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Henrikus Herman Marie Cox , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58
CPC分类号： G03F7/709
摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.
摘要翻译：光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。图案形成装置对辐射束进行图案化。光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基板支撑驱动器至少一个方向。光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体帧。

40. 发明授权

US07245047B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07245047B2
公开(公告)日：2007-07-17
申请号：US10834359
申请日：2004-04-29
申请人： Patricia Vreugdewater , Henrikus Herman Marie Cox , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot
发明人： Patricia Vreugdewater , Henrikus Herman Marie Cox , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot
IPC分类号： H02K41/00
CPC分类号： G03F7/70991 , G03F7/70758 , H02K41/03 , H02K2201/18
摘要： A lithographic projection apparatus includes a conduit shuttle used to at least partly support conduits which provide utilities to moveable objects. The conduit shuttle has an actuator which is positionable with six degrees of freedom. The actuator comprises a 2-phase or 3-phase motor with one degree of freedom and a Lorentz actuator with five degrees of freedom.
摘要翻译：平版印刷投影设备包括用于至少部分地支撑向可移动物体提供效用的导管的导管梭。导管梭具有可以六自由度定位的致动器。执行器包括具有一个自由度的2相或3相电动机和具有5个自由度的洛伦兹致动器。

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