会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 31. 发明申请
    • Half duplex type optical connection structure and optical device suitable for the same
    • 半双工型光连接结构和光学装置适合相同
    • US20070154222A1
    • 2007-07-05
    • US11592304
    • 2006-11-02
    • Seung-Woo KimIn KimJeong-Seok Lee
    • Seung-Woo KimIn KimJeong-Seok Lee
    • H04B10/12
    • H04B10/43
    • Disclosed is an optical connection structure of half-duplex transmission type and an optical device suitable for the same. The optical connection structure of half-duplex type comprises two or more signal transmitting/receiving units, which are interconnected through an optical waveguide, wherein each of the signal transmitting/receiving units comprises an optical device having a light source for producing and emitting optical signals to the outside through an opening, and a photodetector for receiving the optical signals incident thereto and converting the optical signals into electric signals, the light source and the photodetector being integrated with each other; and a control unit, which in the signal transmitting mode, drives the light source, so that the corresponding signal transmitting/receiving unit functions as a light source, and in the signal receiving mode, drives the photodetector, so that the corresponding signal transmitting/receiving unit functions as a photodetector.
    • 公开了半双工传输类型的光连接结构和适合于此的光学装置。 半双工类型的光连接结构包括两个或多个通过光波导互连的信号发射/接收单元,其中信号发射/接收单元中的每一个包括具有用于产生和发射光信号的光源的光学装置 以及用于接收入射到其上的光信号并将光信号转换为电信号的光电检测器,光源和光电检测器彼此集成; 以及控制单元,其在信号发送模式下驱动光源,使得相应的信号发送/接收单元用作光源,并且在信号接收模式中驱动光电检测器,使得相应的信号发送/ 接收单元用作光电检测器。
    • 35. 发明授权
    • Electro-absorptive optical modulator module having monolithic integrated photo detector
    • 具有单片集成光电检测器的吸收光调制器模块
    • US07142343B2
    • 2006-11-28
    • US10837938
    • 2004-05-03
    • In KimYoung-Hyun KimByung-Kwon Kang
    • In KimYoung-Hyun KimByung-Kwon Kang
    • G02F1/03G02F1/07
    • H01S5/12H01S5/0264H01S5/0265H01S5/106H01S5/1064H01S5/1203
    • An electro-absorptive optical modulator module monolithic-integrated on a semiconductor substrate, which includes a distributed feedback laser having a grating for oscillating light and to output the oscillated light through a first end and a second end of the module. An electro-absorptive modulator modulates a first light output through the first end of the distributed feedback laser, and an optical detector provides detection of a second light output through the second end of the module. The optical detector is formed opposite to the second end of the distributed feedback laser on the semiconductor substrate. A first inner window permits attenuation of the intensity of the second light and electrically insulates the distributed feedback laser and the optical detector from each other, with the first inner window being arranged between the distributed feedback laser and the optical detector.
    • 一种单片集成在半导体衬底上的电吸收光调制器模块,其包括具有用于振荡光的光栅的分布式反馈激光器,并且通过模块的第一端和第二端输出振荡的光。 电吸收调制器通过分布式反馈激光器的第一端调制第一光输出,并且光学检测器提供通过模块的第二端的第二光输出的检测。 光检测器形成在半导体衬底上与分布反馈激光器的第二端相对。 第一内部窗口允许衰减第二光的强度并使分布式反馈激光器和光学检测器彼此电绝缘,其中第一内部窗口布置在分布式反馈激光器和光学检测器之间。
    • 37. 发明申请
    • Methods of forming a pattern for a semiconductor device
    • 形成半导体器件图案的方法
    • US20050136630A1
    • 2005-06-23
    • US11021072
    • 2004-12-22
    • In Kim
    • In Kim
    • H01L21/027H01L21/3205H01L21/3213H01L21/4763
    • H01L21/32139H01L21/0273
    • Methods of forming a pattern for a semiconductor device are disclosed, wherein a critical dimension (CD) of a pattern can be accurately controlled and, thus, finer critical dimension can be realized. An illustrated example method comprises: forming an etching target layer on a semiconductor substrate; forming a photoresist pattern on the etching target layer; forming polymer spacers on side surfaces of the photoresist pattern to improve side-surface roughness of the photoresist pattern; and etching the etching target layer using the photoresist pattern and the polymer spacers as a mask to form a pattern.
    • 公开了形成用于半导体器件的图案的方法,其中可以精确地控制图案的临界尺寸(CD),从而可以实现更精细的临界尺寸。 所示的示例方法包括:在半导体衬底上形成蚀刻目标层; 在蚀刻目标层上形成光致抗蚀剂图案; 在光致抗蚀剂图案的侧表面上形成聚合物间隔物以改善光致抗蚀剂图案的侧表面粗糙度; 并使用光致抗蚀剂图案和聚合物间隔物作为掩模蚀刻蚀刻目标层以形成图案。
    • 40. 发明授权
    • Method for fabricating thin film transistor
    • 制造薄膜晶体管的方法
    • US5547883A
    • 1996-08-20
    • US504688
    • 1995-07-20
    • In Kim
    • In Kim
    • H01L21/265H01L21/336H01L21/84H01L29/423H01L29/786H01L21/86
    • H01L29/78696H01L21/84H01L29/42384H01L29/66765H01L29/78624H01L29/78642Y10S148/15
    • A thin film transistor having increased channel length and self-aligned source and drain regions is fabricated by forming a gate electrode on an insulation film disposed on a substrate. Portions of the insulation film are then etched on opposite sides of the gate electrode, as well as beneath part of the gate electrode. A gate insulation film is then formed on the entire exposed surface of the gate electrode, and a semiconductor layer is then formed on the entire gate insulation film, as well as portions of the insulation film. Doping impurities may then be implanted at an angle other than 90.degree. to the surface of the substrate to achieve a thin film transistor having an extended channel length but occupying a relatively small area on the surface of the substrate.
    • 通过在设置在基板上的绝缘膜上形成栅电极来制造具有增加的沟道长度和自对准源极和漏极区的薄膜晶体管。 然后在栅电极的相对侧以及栅电极的下方蚀刻绝缘膜的一部分。 然后在栅电极的整个暴露表面上形成栅极绝缘膜,然后在整个栅极绝缘膜上形成半导体层以及绝缘膜的一部分。 然后可以以与基板表面90度以外的角度注入掺杂杂质,以实现具有延伸的沟道长度但占据基板表面上较小面积的薄膜晶体管。