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31. 发明授权

US06406828B1 Polymer and photoresist compositions 有权
标题翻译：聚合物和光刻胶组合物
公开(公告)号：US06406828B1
公开(公告)日：2002-06-18
申请号：US09511726
申请日：2000-02-24
申请人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
发明人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia wherein A=CH2; G=C(Z′), O, and NR2; R2=H, (C1-C8)alkyl or substituted (C1-C8)alkyl; E and W are independently selected from C(Z′), O and a chemical bond; Z′=O; n=1; m=1; m′=0; 1=0 to 5; and p=0 to 5; provided that when both E and W are C(Z′), G is NR2; wherein T and L are taken together to form a double bond. These polymers are useful in photoresist compositions. Methods of making and using these polymers are also disclosed.
摘要翻译：公开了包括作为聚合单元的一种或多种式I或Iawherein A = CH 2的螺环烯烃单体的聚合物; G = C（Z'），O和NR2; R2 = H，（C1-C8）烷基或取代的（C1-C8）烷基; E和W独立地选自C（Z'），O和化学键; Z'= O; n = 1; m = 1; m'= 0; 1 = 0〜5; 和p = 0至5; 条件是当E和W都为C（Z'）时，G为NR2; 其中T和L一起形成双键。这些聚合物可用于光致抗蚀剂组合物。还公开了制备和使用这些聚合物的方法。

32. 发明授权

US6165674A Polymers and photoresist compositions for short wavelength imaging 失效
标题翻译：用于短波长成像的聚合物和光致抗蚀剂组合物
公开(公告)号：US6165674A
公开(公告)日：2000-12-26
申请号：US7617
申请日：1998-01-15
申请人： Gary N. Taylor , George G. Barclay , Charles R. Szmanda
发明人： Gary N. Taylor , George G. Barclay , Charles R. Szmanda
IPC分类号： G03F7/039 , H01L21/027 , G03F7/004
CPC分类号： G03F7/039 , Y10S430/106 , Y10S430/111
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron features imaged at 193 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that includes a cyano moiety, as well as polymers that contain cyano and itaconic anhydride moieties in combination.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于极短波长的情况下提供高度分辨的浮雕图像，包括在193nm下成像的良好分辨的0.25微米特征。本发明的聚合物包括包含氰基部分的光生酸不稳定单元的聚合物，以及组合含有氰基和衣康酸酐部分的聚合物。

33. 发明授权

US5861231A Copolymers and photoresist compositions comprising copolymer resin binder component 失效
公开(公告)号：US5861231A
公开(公告)日：1999-01-19
申请号：US665002
申请日：1996-06-11
申请人： George G. Barclay , Michael F. Cronin , Ronald A. Dellaguardia , James W. Thackeray , Hiroshi Ito , Greg Breyta
发明人： George G. Barclay , Michael F. Cronin , Ronald A. Dellaguardia , James W. Thackeray , Hiroshi Ito , Greg Breyta
IPC分类号： C08F212/14 , G03F7/004 , G03F7/039 , G03F7/30 , H01L21/027 , G03F7/038
CPC分类号： C08F212/14 , G03F7/0045 , G03F7/039 , G03F7/0392
摘要： The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.

34. 发明授权

US07582412B2 Multilayer photoresist systems 有权
标题翻译：多层光刻胶系统
公开(公告)号：US07582412B2
公开(公告)日：2009-09-01
申请号：US10717975
申请日：2003-11-20
申请人： James F. Cameron , Dana A. Gronbeck , George G. Barclay
发明人： James F. Cameron , Dana A. Gronbeck , George G. Barclay
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0755 , G03F7/0757 , G03F7/0758 , G03F7/094 , Y10S430/106 , Y10S430/128
摘要： Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.
摘要翻译：提供多层光刻胶系统。在具体方面，本发明涉及用于外包层光致抗蚀剂的底层组合物，特别是外包覆的含硅光致抗蚀剂。优选的底层组合物包含赋予抗蚀刻和抗反射性能的一种或多种树脂或其它组分，例如含有苯基或其它抗蚀刻基团的一种或多种树脂和作为光致抗蚀剂曝光的有效抗反射发色团的蒽或其它部分辐射。

35. 发明授权

US07208261B2 Polymers, processes for polymer synthesis and photoresist compositions 有权
标题翻译：聚合物，聚合物合成方法和光致抗蚀剂组合物
公开(公告)号：US07208261B2
公开(公告)日：2007-04-24
申请号：US10819686
申请日：2004-04-05
申请人： George G. Barclay , Stefan J. Caporale , Robert J. Kavanagh , Nick Pugliano
发明人： George G. Barclay , Stefan J. Caporale , Robert J. Kavanagh , Nick Pugliano
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
摘要翻译：本发明包括用于提供包含聚合物的这种聚合物和光致抗蚀剂的新聚合物和方法。本发明的方法包括提供反应混合物并在聚合反应过程中向反应混合物中加入一种或多种聚合试剂以提供聚合物的方法。含有本发明聚合物的光致抗蚀剂可显示出显着改善的平版印刷性能。

36. 发明授权

US07008750B2 Processes for producing polysiloxanes and photoresist compositions comprising same 失效
公开(公告)号：US07008750B2
公开(公告)日：2006-03-07
申请号：US10378287
申请日：2003-03-03
申请人： George G. Barclay , Subbareddy Kanagasabapathy , Matthew A. King
发明人： George G. Barclay , Subbareddy Kanagasabapathy , Matthew A. King
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C08G77/04 , C08G77/06 , C08G77/14 , C08G77/24 , G03F7/0046 , G03F7/0757 , Y10S430/106 , Y10S430/108
摘要： New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

37. 发明授权

US06841331B2 Polymers, processes for polymer synthesis and photoresist compositions 有权
标题翻译：聚合物，聚合物合成方法和光致抗蚀剂组合物
公开(公告)号：US06841331B2
公开(公告)日：2005-01-11
申请号：US10083675
申请日：2002-02-26
申请人： George G. Barclay , Stefan J. Caporale , Robert J. Kavanagh , Nick Pugliano
发明人： George G. Barclay , Stefan J. Caporale , Robert J. Kavanagh , Nick Pugliano
IPC分类号： G03F7/033 , G03F7/038 , G03F7/039 , G03F7/26 , H01L21/027 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
摘要翻译：本发明包括用于提供包含聚合物的这种聚合物和光致抗蚀剂的新聚合物和方法。本发明的方法包括提供反应混合物并在聚合反应过程中向反应混合物中加入一种或多种聚合试剂以提供聚合物的方法。含有本发明聚合物的光致抗蚀剂可显示出显着改善的平版印刷性能。

38. 发明授权

US06803171B2 Photoimageable composition 失效
标题翻译：可光成像
公开(公告)号：US06803171B2
公开(公告)日：2004-10-12
申请号：US10140761
申请日：2002-05-08
申请人： Dana A. Gronbeck , George G. Barclay , Leo L. Linehan , Kao Xiong , Subbareddy Kanagasabapathy
发明人： Dana A. Gronbeck , George G. Barclay , Leo L. Linehan , Kao Xiong , Subbareddy Kanagasabapathy
IPC分类号： G03C173
CPC分类号： G03F7/0005 , G03F7/001 , G03F7/0382 , G03F7/0392 , G03F7/0757 , Y10S430/106 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/115
摘要： Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
摘要翻译：公开了含有倍半硅氧烷粘合剂聚合物和光活性化合物的可光成像组合物，使用这种组合物形成浮雕图像的方法和使用这种组合物制造电子器件的方法。这样的组合物可用作光致抗蚀剂和制造光电器件。

39. 发明授权

US06379861B1 Polymers and photoresist compositions comprising same 有权
标题翻译：包含其的聚合物和光致抗蚀剂组合物
公开(公告)号：US06379861B1
公开(公告)日：2002-04-30
申请号：US09510069
申请日：2000-02-22
申请人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
发明人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
IPC分类号： G03C172
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/115
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C═O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于包括193nm和248nm的短波长的情况下提供高度分辨的浮雕图像。本发明的抗蚀剂也可用于其它波长例如365nm。本发明的聚合物包括包含光生酸不稳定单元的那些，其是包含具有约5个或更多个碳原子和至少两个仲，叔或季碳原子的烷基部分的酯基。酯基的烷基部分可以是非环或单环脂环族基团。酯基的羧基（C = O（O））氧通常优选直接键合到季碳原子。

40. 发明授权

US06316165B1 Planarizing antireflective coating compositions 有权
标题翻译：平面化抗反射涂料组合物
公开(公告)号：US06316165B1
公开(公告)日：2001-11-13
申请号：US09264061
申请日：1999-03-08
申请人： Edward K. Pavelchek , Timothy G. Adams , Manuel doCanto , Suzanne Coley , George G. Barclay
发明人： Edward K. Pavelchek , Timothy G. Adams , Manuel doCanto , Suzanne Coley , George G. Barclay
IPC分类号： G03F700
CPC分类号： G03F7/091 , Y10S430/151
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
摘要翻译：本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，包括用于深UV应用。本发明的抗反射组合物在需要平面化涂层时特别有用。本发明的ARCs含有低分子量树脂，增塑剂化合物和/或低Tg树脂。本发明还包括用于施加成形平坦化ARC涂层的方法。

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