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31. 发明申请

US20070096094A1 Methods and apparatus for designing and using micro-targets in overlay metrology 有权
标题翻译：在重叠计量中设计和使用微观目标的方法和设备
公开(公告)号：US20070096094A1
公开(公告)日：2007-05-03
申请号：US11329716
申请日：2006-01-10
申请人： Vladimir Levinski , Michael Adel , Aviv Frommer , Daniel Kandel
发明人： Vladimir Levinski , Michael Adel , Aviv Frommer , Daniel Kandel
IPC分类号： H01L23/58 , H01L21/66
CPC分类号： H01L23/544 , G03F7/70633 , H01L22/12 , H01L2223/54453 , H01L2223/5448 , H01L2924/0002 , H01L2924/00
摘要： Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.
摘要翻译：用于制造包括几个目标结构的半导体管芯的方法和装置。形成第一层，其包括在第一方向上延伸的一个或多个线或沟槽结构。形成第二层，其包括在垂直于第一结构的第二方向上延伸的一个或多个线或沟槽结构，使得目标结构沿着第一方向的突起独立于第二方向和投影沿着第二方向的目标结构与第一方向无关。还描述了用于产生校准曲线的目标结构和方法。

32. 发明授权

US09104120B2 Structured illumination for contrast enhancement in overlay metrology 有权
标题翻译：结构化照明，用于对比度增强的重叠度量
公开(公告)号：US09104120B2
公开(公告)日：2015-08-11
申请号：US13394064
申请日：2012-02-08
申请人： Joel Seligson , Noam Sapiens , Daniel Kandel
发明人： Joel Seligson , Noam Sapiens , Daniel Kandel
IPC分类号： G01B11/14 , G03F7/20 , G01B11/02 , G01N21/00
CPC分类号： G01N21/47 , G01B11/02 , G01N21/00 , G03F7/70633
摘要： Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.
摘要翻译：计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且利用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

33. 发明申请

US20140065736A1 DEVICE CORRELATED METROLOGY (DCM) FOR OVL WITH EMBEDDED SEM STRUCTURE OVERLAY TARGETS 有权
标题翻译：具有嵌入式扫描电镜结构覆盖目标的OVL的器件相关公制（DCM）
公开(公告)号：US20140065736A1
公开(公告)日：2014-03-06
申请号：US13776550
申请日：2013-02-25
申请人： Nuriel Amir , DongSub Choi , Tal Itzkovich , Daniel Kandel
发明人： Nuriel Amir , DongSub Choi , Tal Itzkovich , Daniel Kandel
IPC分类号： H01L23/544
CPC分类号： H01L23/544 , G03F7/70633 , G03F7/70683 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Aspects of the present disclosure describe a target for use in measuring a relative position between two substantially coplanar layers of a device. The target includes periodic structures in first and second layers. Differences in relative position of the first and the second layers between the first and second periodic structures and the respective device-like structure can be measured to correct the relative position of the first and the second layers between the first and second periodic structures. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：本公开的方面描述了用于测量设备的两个基本上共面的层之间的相对位置的目标。目标包括第一层和第二层中的周期性结构。可以测量第一和第二周期结构之间的第一和第二层的相对位置与相应的器件状结构之间的差异，以校正第一和第二周期结构之间的第一和第二层的相对位置。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

34. 发明授权

US08441639B2 Metrology systems and methods 有权
标题翻译：计量系统和方法
公开(公告)号：US08441639B2
公开(公告)日：2013-05-14
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01B11/14 , G01B11/28 , G01B11/04 , G01B11/00
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

35. 发明申请

US20120206729A1 STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY 有权
标题翻译：结构化照明在超大规模的对比度增强
公开(公告)号：US20120206729A1
公开(公告)日：2012-08-16
申请号：US13394064
申请日：2012-02-08
申请人： Joel Seligson , Noam Sapiens , Daniel Kandel
发明人： Joel Seligson , Noam Sapiens , Daniel Kandel
IPC分类号： G01N21/47
CPC分类号： G01N21/47 , G01B11/02 , G01N21/00 , G03F7/70633
摘要： Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.
摘要翻译：计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且利用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

36. 发明授权

US08142966B2 Substrate matrix to decouple tool and process effects 有权
标题翻译：基板矩阵去耦工具和过程效应
公开(公告)号：US08142966B2
公开(公告)日：2012-03-27
申请号：US12990183
申请日：2009-05-20
申请人： Pavel Izikson , Michael E. Adel , Daniel Kandel
发明人： Pavel Izikson , Michael E. Adel , Daniel Kandel
IPC分类号： G03F9/00 , H01L21/66
CPC分类号： G03F7/70641 , G05B19/41845 , G05B2219/32187 , G05B2219/36307 , H01L22/20 , Y02P90/16 , Y02P90/22
摘要： A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing the substrate through the process using in each cell the value of the parameter as determined by the eccentric test matrix, measuring a property of the test structures in the cells, and developing a correlation between the parameter and the property.
摘要翻译：一种通过选择表征过程来表征过程的方法，选择过程的参数来表征，确定在测试矩阵中使用的参数的值，指定测试矩阵的偏心度，选择要在单元格中创建的测试结构在基板上，通过在每个单元中使用由偏心测试矩阵确定的参数值来处理基板，测量单元中的测试结构的性质，并且发展参数和属性之间的相关性。

37. 发明申请

US20120033215A1 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 有权
标题翻译：多层叠加计量目标和综合覆盖度量度测量系统
公开(公告)号：US20120033215A1
公开(公告)日：2012-02-09
申请号：US13186144
申请日：2011-07-19
申请人： Daniel Kandel , Vladimir Levinski , Guy Cohen
发明人： Daniel Kandel , Vladimir Levinski , Guy Cohen
IPC分类号： G01B11/06 , G01J4/00
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.
摘要翻译：公开了一种用于基于成像的计量学的多层覆盖目标。覆盖目标包括包括三个或更多个目标结构的多个目标结构，每个目标结构包括一组两个或多个模式元素，其中目标结构被配置为在目标结构对准时共享公共对称中心，每个目标结构目标结构相对于公共对称中心不变为N度旋转，其中N等于或大于180度，其中两个或更多个图案元素中的每一个具有单独的对称中心，其中两个或更多个图案每个目标结构的元素对于单个对称中心的M度旋转是不变的，其中M等于或大于180度。

38. 发明申请

US20110310388A1 DISCRETE POLARIZATION SCATTEROMETRY 有权
标题翻译：离散极化分析
公开(公告)号：US20110310388A1
公开(公告)日：2011-12-22
申请号：US13108892
申请日：2011-05-16
申请人： Andrew V. Hill , Amnon Manassen , Daniel Kandel , Vladimir Levinski , Joel Seligson , Alexander Svizher , David Y. Wang , Lawrence D. Rotter , Johannes D. de Veer
发明人： Andrew V. Hill , Amnon Manassen , Daniel Kandel , Vladimir Levinski , Joel Seligson , Alexander Svizher , David Y. Wang , Lawrence D. Rotter , Johannes D. de Veer
IPC分类号： G01J4/00
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

39. 发明授权

US07526749B2 Methods and apparatus for designing and using micro-targets in overlay metrology 有权
标题翻译：在重叠计量中设计和使用微观目标的方法和设备
公开(公告)号：US07526749B2
公开(公告)日：2009-04-28
申请号：US11329716
申请日：2006-01-10
申请人： Vladimir Levinski , Michael E. Adel , Aviv Frommer , Daniel Kandel
发明人： Vladimir Levinski , Michael E. Adel , Aviv Frommer , Daniel Kandel
IPC分类号： G06F17/50
CPC分类号： H01L23/544 , G03F7/70633 , H01L22/12 , H01L2223/54453 , H01L2223/5448 , H01L2924/0002 , H01L2924/00
摘要： Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.
摘要翻译：用于制造包括几个目标结构的半导体管芯的方法和装置。形成第一层，其包括在第一方向上延伸的一个或多个线或沟槽结构。形成第二层，其包括在垂直于第一结构的第二方向上延伸的一个或多个线或沟槽结构，使得目标结构沿着第一方向的突起独立于第二方向和投影沿着第二方向的目标结构与第一方向无关。还描述了用于产生校准曲线的目标结构和方法。

40. 发明申请

US20080266561A1 OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYSTEMS PERFORMANCE 失效
标题翻译：增强覆盖和对准系统性能的光学增益方法
公开(公告)号：US20080266561A1
公开(公告)日：2008-10-30
申请号：US12108364
申请日：2008-04-23
申请人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
发明人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
IPC分类号： G01B11/14
CPC分类号： G01B11/272 , G03F7/70633
摘要： A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.
摘要翻译：可以通过将目标图像划分成第一和第二部分并光学地修改第一和/或第二部分使得由其组合形成的最终图像由莫尔图案表征来获得光栅目标的合成图像。可以分析所得到的图像以确定光栅目标从莫尔图案的偏移中的偏移。光学对准装置可以包括第一分束器，光耦合到第一分束器的图像变换元件和第二分束器。第一分束器将光栅靶的图像分成第一和第二部分。第二分束器组合第一部分和第二部分。图像变换元件光学地修改第一和/或第二部分，使得由它们的组合形成的最终图像的特征在于莫尔图案。

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