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    • 32. 发明授权
    • Method of shaping a polycrystalline diamond body
    • 多晶金刚石体的成型方法
    • US5665252A
    • 1997-09-09
    • US501632
    • 1995-07-12
    • Sungho JinWei Zhu
    • Sungho JinWei Zhu
    • C04B41/53C04B41/91H01L21/306B29D11/00B29D25/00
    • C04B41/009C04B41/5361C04B41/91H01L21/306
    • The method of shaping a polycrystalline diamond (PCD) body (exemplarily a wafer of CVD-PCD) utilizes our discovery that the rate and amount of diamond removal from a given region of a PCD body depends, for a given metal "etchant" at a given temperature, on the thickness of the etchant layer overlying the given region, with relatively larger etchant thickness being associated with relatively higher removal rate and amount. Exemplarily, the method can be used to substantially remove thickness variations and/or film curvature from as-produced PCD films. An exemplary metal that can be used in the practice of the invention is mischmetal. The metal etchant can be molten, partially molten or solid.
    • 成型多晶金刚石(PCD)体(例如CVD-PCD的晶片)的方法利用我们的发现,从PCD体的给定区域去除金刚石的速率和量取决于给定的金属“蚀刻剂” 给定温度,覆盖给定区域的蚀刻剂层的厚度,相对较大的蚀刻剂厚度与相对较高的去除速率和量相关联。 示例性地,该方法可用于基本上从生产的PCD膜中去除厚度变化和/或膜弯曲。 可用于本发明实践中的示例性金属是混合稀土。 金属蚀刻剂可以熔融,部分熔融或固体。
    • 36. 发明授权
    • Machining process for production of titanium motor housing
    • US10799934B2
    • 2020-10-13
    • US15774615
    • 2017-10-23
    • Wei Zhu
    • Wei Zhu
    • B21D22/20B21D51/16
    • The present invention discloses a machining process for manufacturing a motor housing by using metal titanium, including the following machining steps: Calendar process is adopted, use stamping equipment to stamp the base of the titanium motor housing, apply lubricant on the surface of the die before stamping, and attach a lubricating film on the surface of metal titanium to be stamped; Calendar process is adopted, use stamping equipment to stamp the barrel-shaped titanium motor housing, apply lubricant on the surface of the die before stamping, and attach a lubricating film on the surface of metal titanium to be stamped, and after stamping, a barrel-shaped housing with a barrel depth to port diameter ratio of 1.2˜1.8:1 is obtained; Spray and cleanse the housing base obtained from stamping in S1 and the barrel-shaped motor housing obtained from stamping in S2; Assemble the housing base and the barrel-shaped housing obtained in S3 to form the motor housing product; Inspect the assembled motor housing obtained in S4.
    • 38. 发明授权
    • Apparatus and method for calibrating lithography process
    • 用于校准光刻工艺的设备和方法
    • US09293354B2
    • 2016-03-22
    • US12891738
    • 2010-09-27
    • Sai Hung LamWei ZhuChin Yu Chen
    • Chun Chi ChenSai Hung LamWei ZhuChin Yu Chen
    • G03B27/42H01L21/67G03F7/20H01L23/544
    • H01L21/67253G03F7/70516H01L23/544H01L2223/54433H01L2924/0002H01L2924/00
    • A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second mark type may be located on an outer peripheral portion of the wafer to indicate the desired boundary of a wafer edge expose region (WEE). A third mark type may indicate the border of a portion of the wafer expected to bear a wafer identification mark. A fourth mark type may be located at the center of the wafer to allow for precise and uniform application of liquid photoresist material to the calibration wafer. The calibration wafer may be employed in methods of rapidly and easily assessing the accuracy of various phases of photolithography processes.
    • 校准晶片可以承载一种或多种不同的标记类型,以便于光刻工艺的检查。 第一标记类型可以位于晶片的外周部分上,以指示边缘珠去除(EBR)区域的期望边界。 第二标记类型可以位于晶片的外周部分上,以指示晶片边缘曝光区域(WEE)的期望边界。 第三标记类型可以指示期望承载晶片识别标记的晶片的一部分的边界。 第四标记类型可以位于晶片的中心,以允许液体光致抗蚀剂材料精确和均匀地施加到校准晶片。 校准晶片可以用于快速且容易地评估光刻工艺的各个阶段的精度的方法。