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    • 36. 发明授权
    • Stitched write head design having a sunken shared pole
    • 拼接写头设计有一个凹陷的共享极点
    • US06469875B1
    • 2002-10-22
    • US09525672
    • 2000-03-15
    • Mao-Min ChenPo-Kang WangCherng-Chyi Han
    • Mao-Min ChenPo-Kang WangCherng-Chyi Han
    • G11B539
    • B82Y25/00B82Y10/00G11B5/3163G11B5/3903G11B5/3967G11B2005/3996Y10T29/49048
    • A structure and a method for a stitched write head having a sunken share pole. The method includes forming a bottom coil dielectric layer over the first half shared pole. Coils are formed over the bottom coil dielectric layer. Next, second half shared poles (P1) are formed over the first half shared pole (S2). We form a top coil dielectric layer over the structure. In a key step, we chemical-mechanical polish the top coil dielectric layer. A write gap layer (WG) is formed over the front second half shared pole and the top coil dielectric layer over the coils. An upper pole (P3) and hard mask are formed over the write gap layer. We etch the write gap layer and the second half shared pole (P1) using the upper pole as an etch mask to remove a portion of the second half shared pole (P1) adjacent to the write gap layer thereby forming a partially trimmed pole.
    • 一种具有凹陷的共享极的缝合写头的结构和方法。 该方法包括在第一半共享极上形成底部线圈电介质层。 线圈形成在底部线圈电介质层上。 接下来,在第一半共享极(S2)上形成第二半共享极(P1)。 我们在结构上形成顶层线圈介电层。 在关键步骤中,我们化学机械抛光顶层线圈介电层。 写入间隙层(WG)形成在线圈上的前第二半共享极和顶部线圈电介质层上。 在写间隙层上形成上极(P3)和硬掩模。 我们使用上极蚀刻写间隙层和第二半共享极(P1)作为蚀刻掩模,以去除与写间隙层相邻的第二半共享极(P1)的一部分,从而形成部分修整的极。
    • 38. 发明授权
    • Ion implantation method for fabricating magnetoresistive (MR) sensor element
    • 用于制造磁阻(MR)传感器元件的离子注入方法
    • US06383574B1
    • 2002-05-07
    • US09360118
    • 1999-07-23
    • Cherng-Chyi HanRong-Fu XiaoMao-Min ChenPo-Kang Wang
    • Cherng-Chyi HanRong-Fu XiaoMao-Min ChenPo-Kang Wang
    • B05D500
    • H01L43/12B82Y10/00B82Y25/00B82Y40/00C23C14/48G11B5/3163H01F41/302
    • A method for forming a magnetoresistive (MR) layer first employs a substrate over which is formed a magnetoresistive (MR) layer formed of a magnetoresistive (MR) material. There is then ion implanted selectively, while employing an ion implant method, the magnetoresistive (MR) layer to form: (1) an ion implanted portion of the magnetoresistive (MR) layer formed of an ion implanted magnetoresistive (MR) material; and (2) an adjoining non ion implanted portion of the magnetoresistive (MR) layer formed of the magnetoresistive (MR) material, where the ion implanted magnetoresistive (MR) material is a non magnetoresistive (MR) material. The method may be employed for forming within magnetoresistive (MR) sensor elements magnetoresistive (MR) layers with enhanced dimensional uniformity, and in particular enhanced overlay dimensional uniformity.
    • 形成磁阻(MR)层的方法首先采用形成由磁阻(MR)材料形成的磁阻(MR)层的衬底。 然后选择性地离子注入,同时采用离子注入法,磁阻(MR)层形成:(1)由离子注入的磁阻(MR)材料形成的磁阻(MR)层的离子注入部分; 和(2)由磁阻(MR)材料形成的磁阻(MR)层的邻接非离子注入部分,其中离子注入磁阻(MR)材料是非磁阻(MR)材料。 该方法可以用于在具有增强的尺寸均匀性的磁阻(MR)传感器元件磁阻(MR)层内形成,特别是增强的覆盖尺寸均匀性。