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    • 31. 发明授权
    • Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
    • 水平电场型液晶显示装置薄膜晶体管基板及其制造方法
    • US07556988B2
    • 2009-07-07
    • US11345370
    • 2006-02-02
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • Byung Chul AhnOh Nam KwonHeung Lyul Cho
    • H01L21/82
    • H01L27/124G02F1/134363G02F1/136213G02F1/1368G02F2001/136295H01L27/1288
    • A thin film transistor substrate of horizontal electric field type includes: a gate line and a first common line formed on a substrate to be in parallel to each other; a data line crossing the gate line and the first common line with a gate insulating film therebetween to define a pixel area; a second common line crossing the first common line having the gate insulating film therebetween; a thin film transistor connected to the gate line and the data line; a common electrode extending from the second common line in said pixel area; a pixel electrode that is parallel to the common electrode and the second common line; a protective film for covering the thin film transistor; a gate pad having a lower gate pad electrode connected to an upper gate pad electrode through a first contact hole; a common pad having a lower common pad electrode connected to an upper common pad electrode through a second contact hole; and a data pad having a lower data pad electrode connected to an upper data pad electrode provided within a third contact hole.
    • 水平电场型薄膜晶体管基板包括:形成在彼此平行的基板上的栅极线和第一公共线; 跨越所述栅极线和所述第一公共线的数据线,其间具有栅极绝缘膜,以限定像素区域; 第二公共线与其间具有栅绝缘膜的第一公共线交叉; 连接到栅极线和数据线的薄膜晶体管; 在所述像素区域中从所述第二公共线延伸的公共电极; 平行于公共电极和第二公共线的像素电极; 用于覆盖薄膜晶体管的保护膜; 栅极焊盘,其具有通过第一接触孔连接到上部栅极焊盘电极的下部栅极焊盘电极; 公共焊盘,其具有通过第二接触孔连接到上公共焊盘电极的下公共焊盘电极; 以及数据焊盘,其具有连接到设置在第三接触孔内的上数据焊盘电极的下数据焊盘电极。
    • 32. 发明授权
    • Liquid crystal display panel and method of fabricating the same
    • 液晶显示面板及其制造方法
    • US07528921B2
    • 2009-05-05
    • US11168555
    • 2005-06-29
    • Byung Chul AhnJoo Soo Lim
    • Byung Chul AhnJoo Soo Lim
    • G02F1/1339
    • G02F1/13394G02F1/1343G02F1/1368
    • This invention relates to a liquid crystal display panel, including: a first substrate having a common electrode; a second substrate including a pixel electrode that forms an electric field with the common electrode, a thin film transistor connected to the pixel electrode, a signal line that applies a signal to the thin film transistor, and a contact area in an area outside an area where the signal line is, and the contact area applies a common voltage to the common electrode; and a sealant formed between the first and second substrates with a conductive spacer that connects the contact area with the common electrode.
    • 本发明涉及一种液晶显示面板,包括:具有公共电极的第一基板; 第二基板,包括与公共电极形成电场的像素电极,连接到像素电极的薄膜晶体管,向薄膜晶体管施加信号的信号线,以及在区域外的区域中的接触区域 其中信号线是,并且接触区域向公共电极施加公共电压; 以及在所述第一和第二基板之间形成的密封剂,其具有将所述接触区域与所述公共电极连接的导电间隔件。
    • 34. 发明授权
    • Thin film transistor substrate for display device and fabricating method thereof
    • 用于显示装置的薄膜晶体管基板及其制造方法
    • US07488632B2
    • 2009-02-10
    • US11713046
    • 2007-03-02
    • Byung Chul AhnSoon Sung YooHeung Lyul Cho
    • Byung Chul AhnSoon Sung YooHeung Lyul Cho
    • H01L29/15G02F1/1365
    • G02F1/136227G02F1/136213H01L27/124H01L27/1255H01L27/1288
    • A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.
    • 在三个掩模工艺中制造薄膜晶体管(TFT)衬底。 在第一掩模工艺中,形成栅极线和栅电极。 在第二掩模处理中,从栅极绝缘膜,未掺杂和掺杂的非晶硅层形成数据线,源电极,漏极,半导体层和与栅极线重叠的第一上部存储电极,以及数据 金属层。 在第三掩模处理中,通过像素区域内和外部的保护栅极绝缘膜形成像素孔,部分地去除第一上部存储电极,像素电极在像素的像素孔内接触漏电极的一侧 并且第二上部存储电极接触像素区域外的像素孔中的第一上部存储电极的一侧。
    • 35. 发明授权
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US07471357B2
    • 2008-12-30
    • US11315151
    • 2005-12-23
    • Byung Chul AhnJoo Soo Lim
    • Byung Chul AhnJoo Soo Lim
    • G02F1/1335G02F1/13
    • G02F1/133555G02F1/133345G02F1/136213G02F1/136286G02F1/1368G02F2201/123G02F2202/02
    • This invention relates to a transflective thin film transistor substrate and a fabricating method thereof that is adaptive for simplifying process, and a liquid crystal display device using the same and a fabricating method thereof.A liquid crystal display device according to an embodiment of the present invention includes a gate line and a data line crossing each other with a gate insulating film to define a pixel area on a first substrate; a thin film transistor connected to the gate line and the data line; a pixel electrode in the pixel area connected to the thin film transistor and to be exposed through a transmission area; a reflection electrode formed in a reflection area having separated areas with the transmission area in between; and an organic insulating film formed under the reflection electrode and formed in a first horizontal area including the reflection area.
    • 本发明涉及一种适于简化工艺的透反射薄膜晶体管基板及其制造方法,以及使用该半透半导体薄膜晶体管的液晶显示装置及其制造方法。 根据本发明实施例的液晶显示装置包括栅极线和数据线,栅极绝缘膜彼此交叉以在第一基板上限定像素区域; 连接到栅极线和数据线的薄膜晶体管; 像素电极,连接到薄膜晶体管并通过透射区域曝光; 反射电极,形成在具有分离区域的反射区域中,所述反射区域之间具有透射面积; 以及形成在反射电极下方并形成在包括反射区域的第一水平区域中的有机绝缘膜。
    • 36. 发明授权
    • Liquid crystal display and fabricating method thereof
    • 液晶显示及其制造方法
    • US06509940B2
    • 2003-01-21
    • US09739824
    • 2000-12-20
    • Dong Yeung KwakSoon Sung YooYu Ho JungHu Sung KimDug Jin ParkYong Wan KimWoo Chae LeeByung Chul Ahn
    • Dong Yeung KwakSoon Sung YooYu Ho JungHu Sung KimDug Jin ParkYong Wan KimWoo Chae LeeByung Chul Ahn
    • G02F1136
    • G02F1/1368
    • A liquid crystal display device and a fabricating method thereof wherein four masks are used so as to reduce a process. In the device, a gate electrode is formed on a transparent substrate. A gate insulating film is formed on the transparent substrate to cover the gate electrode. An active layer is provided at a portion corresponding to the gate electrode on the gate insulating film. Source and drain electrodes are intervened by an ohmic contact layer on the active layer. A contact portion is connected to and extended from a portion of the drain electrode opposed to the source electrode and has an exposed side surface. A passivation layer is formed on the active layer in such a manner to cover the source and drain electrodes, but to expose the side surface of the contact portion. A pixel electrode is formed on the gate insulating film in such a manner to contact the exposed side surface of the contact portion. Accordingly, the contact portion connected to and extended from a portion of the drain electrode opposed to the source electrode or a plurality of comb-shaped contact portions having the exposed side surfaces are formed in such a manner to overlap with the black matrix of the upper plate provided with color filters. Accordingly, the pixel electrode contacts the side surface of the contact portion overlapping with a black matrix of an upper plate to be electrically connected to the drain electrode, so that an aperture ration can be improved.
    • 一种液晶显示装置及其制造方法,其中使用四个掩模以减少处理。 在该器件中,在透明基板上形成栅电极。 在透明基板上形成栅极绝缘膜以覆盖栅电极。 在与栅极绝缘膜上的栅电极对应的部分设置有源层。 源极和漏极由有源层上的欧姆接触层介入。 接触部分连接到与源电极相对的一部分漏电极,并具有暴露的侧表面。 钝化层以这样的方式形成在有源层上以覆盖源电极和漏电极,但是露出接触部分的侧表面。 像素电极以与接触部的露出侧面接触的方式形成在栅极绝缘膜上。 因此,与源极电极相对的一部分漏电极的接触部分或具有暴露侧面的多个梳形接触部分形成为与上部的黑色矩阵重叠 板上装有彩色滤光片。 因此,像素电极接触与上板的黑矩阵重叠的接触部分的侧表面,以电连接到漏电极,从而可以提高孔径比。
    • 37. 发明授权
    • Liquid crystal display and a double layered metal contact
    • 液晶显示屏和双层金属接触
    • US06288414B1
    • 2001-09-11
    • US08993195
    • 1997-12-18
    • Byung Chul Ahn
    • Byung Chul Ahn
    • H01L2976
    • G02F1/13458G02F1/1362H01L29/42384H01L29/4908H05K1/112H05K1/117H05K2201/09509H05K2201/0979
    • The present invention relates to a method for keeping contact resistance of a pad low. The present invention also discloses a structure of the pad and a method for manufacturing the same, for use in circuit boards and LCD displays. The pad terminal comprises a first metal layer and a second metal layer covering the first metal layer. The second metal layer is removed before the pad terminal is deposited. Thus, the surface of the pad is clean and contact resistance is kept low, because there are no contaminants on the pad. Furthermore, the present invention discloses a pad having a raised part and a depressed part, enlarging the contact area of the pad. Therefore, contact resistance is reduced, and adhesion between the pad and the pad terminal is enhanced.
    • 本发明涉及一种保持焊盘接触电阻较低的方法。 本发明还公开了一种用于电路板和LCD显示器的焊盘结构及其制造方法。 焊盘端子包括覆盖第一金属层的第一金属层和第二金属层。 在焊盘端子沉积之前去除第二金属层。 因此,由于焊盘上没有污染物,焊盘的表面是清洁的,并且接触电阻保持较低。 此外,本发明公开了一种具有凸起部分和凹陷部分的焊盘,其扩大焊盘的接触面积。 因此,接触电阻降低,并且焊盘和焊盘端子之间的粘附性增强。
    • 38. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US08400600B2
    • 2013-03-19
    • US12722142
    • 2010-03-11
    • Byung Chul AhnJoo Soo LimByung Ho Park
    • Byung Chul AhnJoo Soo LimByung Ho Park
    • G02F1/1333G02F1/136G02F1/1343
    • G02F1/134363G02F2001/136231G02F2001/13629G02F2001/136295
    • A method of fabricating a liquid crystal display device includes in a first mask process, forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line parallel to the gate line that have a first conductive layer group structure having at least double conductive layers. A second mask process forms a gate insulating film on the first mask pattern group and a semiconductor pattern thereon. A third mask process forms a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode that have a second conductive layer group structure having at least double conductive layers, and a protective film interfacing with the third mask pattern group on the gate insulating film.
    • 一种制造液晶显示装置的方法包括:在第一掩模处理中,形成包括栅极线的第一掩模图案组,连接到栅极线的栅电极和与栅极线平行的公共线,所述栅极线具有第一导电层 组结构具有至少双重导电层。 第二掩模工艺在第一掩模图案组上形成栅极绝缘膜,并在其上形成半导体图案。 第三掩模处理形成第三掩模图案组,其包括数据线,连接到数据线的源电极和与源电极相对的漏极,具有至少具有双重导电层的第二导电层组结构,以及保护膜 与栅极绝缘膜上的第三掩模图案组接口。
    • 39. 发明授权
    • Liquid crystal display device
    • 液晶显示装置
    • US08045072B2
    • 2011-10-25
    • US12068361
    • 2008-02-05
    • Byung Chul Ahn
    • Byung Chul Ahn
    • G02F1/1333
    • G02F1/136286G02F1/136213G02F2001/136236G02F2001/13629H01L27/124H01L27/1255H01L27/1288
    • A thin film transistor substrate of a LCD device and a fabricating method thereof are disclosed for simplifying a fabricating process and enlarging a capacitance value of a storage capacitor without any reduction of aperture ratio. The LCD device includes: a double-layered gate line having a first transparent conductive layer and a second opaque conductive layer, the second opaque conductive layer have a step coverage; a gate insulation layer film on the gate line; a data line crossing the gate line to define a pixel region; a TFT connected to the gate line and the data line; a pixel electrode connected to the TFT via a contact hole of a protective film on the TFT; and a storage capacitor overlapping the pixel electrode and having a lower storage electrode formed of the first transparent conductive layer.
    • 公开了一种LCD器件的薄膜晶体管基板及其制造方法,用于简化制造工艺并扩大存储电容器的电容值,而不会降低开口率。 LCD装置包括:具有第一透明导电层和第二不透明导电层的双层栅极线,第二不透明导电层具有台阶覆盖; 栅极线上的栅极绝缘层膜; 与栅极线交叉以限定像素区域的数据线; 连接到栅极线和数据线的TFT; 通过TFT上的保护膜的接触孔与TFT连接的像素电极; 以及与所述像素电极重叠并具有由所述第一透明导电层形成的下部存储电极的存储电容器。
    • 40. 发明授权
    • Liquid crystal display device having particular structure for data line, source electrode, drain electrode and pixel electrode
    • 具有数据线,源电极,漏电极和像素电极的特定结构的液晶显示装置
    • US07894032B2
    • 2011-02-22
    • US12654263
    • 2009-12-15
    • Byung Chul Ahn
    • Byung Chul Ahn
    • G02F1/1343G02F1/1339
    • G02F1/1362G02F1/134363G02F2001/13629
    • A liquid crystal display device and a fabricating method having a simplified process are disclosed. The liquid crystal display device comprises, among other features, first and second substrates, a gate line crossing a data line with a gate insulating film therebetween to define a pixel area. A common line is provided on the substrate substantially parallel to the gate line, and a common electrode is extended from the common line into the pixel area. A pixel electrode is extended from a drain electrode into the pixel area to form a horizontal electric field with the common electrode. The data line, a source electrode, a drain electrode and the pixel electrode are formed of a first conductive layer group having at least double conductive layers, and are formed in an area to be sealed by a sealant upon joining the first and second substrates.
    • 公开了一种具有简化工艺的液晶显示装置和制造方法。 液晶显示装置除了其他特征外还包括第一和第二基板,与数据线交叉的栅极线与栅极绝缘膜之间以限定像素区域。 在基板上基本上平行于栅极线提供公共线,并且公共电极从公共线延伸到像素区域中。 像素电极从漏电极延伸到像素区域中,以与公共电极形成水平电场。 数据线,源电极,漏电极和像素电极由具有至少两个导电层的第一导电层组形成,并且在接合第一和第二基板时形成在被密封剂密封的区域中。