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    • 31. 发明申请
    • Thermally Conductive Coil and Methods and Systems
    • 导热线圈和方法与系统
    • US20110109419A1
    • 2011-05-12
    • US12616907
    • 2009-11-12
    • Alexander CooperAlton H. PhillipsScott Coakley
    • Alexander CooperAlton H. PhillipsScott Coakley
    • H01F27/32
    • H01F5/06H01F27/22H01F41/074
    • Embodiments of the invention provide improved thermal conductivity within, among other things, electromagnetic coils, coil assemblies, electric motors, and lithography devices. In one embodiment, a thermally conductive coil includes at least two adjacent coil layers. The coil layers include windings of wires formed from a conductor and an insulator that electrically insulates the windings within each coil layer. In some cases the insulator of the wires is at least partially absent along an outer surface of one or both coil layers to increase the thermal conductivity between the coil layers. In some embodiments, an insulation layer is provided between the coil layers to electrically insulate the coil layers. In some cases the insulation layer has a thermal conductivity greater than the thermal conductivity of the wire insulator.
    • 本发明的实施例尤其提供了电磁线圈,线圈组件,电动马达和光刻装置之内的改进的导热性。 在一个实施例中,导热线圈包括至少两个相邻的线圈层。 线圈层包括由导体和绝缘体形成的导线的绕组,其将线圈电绝缘在每个线圈层内。 在一些情况下,线的绝缘体至少部分地沿着一个或两个线圈层的外表面不存在,以增加线圈层之间的热导率。 在一些实施例中,绝缘层设置在线圈层之间以使线圈层电绝缘。 在一些情况下,绝缘层的导热率大于导线绝缘体的导热率。
    • 32. 发明授权
    • Method and apparatus for aligning mirror blocks of a multi-element mirror assembly
    • 用于对准多元件反射镜组件的镜块的方法和装置
    • US08739383B2
    • 2014-06-03
    • US12763298
    • 2010-04-20
    • Alton H. Phillips
    • Alton H. Phillips
    • B23P11/00
    • G02B7/181G03F7/70233G03F7/70833G03F7/7085Y10T29/49002Y10T29/49902Y10T29/49963Y10T29/53913
    • Methods and apparatus for aligning a mirror block with a base plate to form a mirror assembly are disclosed. According to one aspect of the present invention, a method for forming a mirror assembly includes positioning a mirror block in contact with a base plate that has at least one alignment feature, and indexing a portion of an alignment tool with respect to the base plate. The method also includes applying at least a first force by moving the mirror block with respect to alignment feature. A determination is made as to when a first surface of the mirror block is substantially coplanar with a first surface of the alignment feature. The mirror block is coupled to the base plate when the first surface of the mirror block is substantially coplanar with the first surface of the alignment feature.
    • 公开了用于将镜块与基板对准以形成镜组件的方法和装置。 根据本发明的一个方面,一种用于形成反射镜组件的方法包括将反射镜块定位成与具有至少一个对准特征的基板接触,并且使对准工具的一部分相对于基板分度。 该方法还包括通过相对于对准特征移动镜块来应用至少第一力。 确定镜块的第一表面何时基本上与对准特征的第一表面共面。 当镜块的第一表面与对准特征的第一表面基本上共面时,反射镜块联接到基板。
    • 33. 发明授权
    • Hydrostatic liquid-metal deformable optical elements
    • 静液压液态金属可变形光学元件
    • US08002420B2
    • 2011-08-23
    • US12209094
    • 2008-09-11
    • Alton H. Phillips
    • Alton H. Phillips
    • G02B5/08
    • G03F7/70266G02B26/06G02B26/0825
    • Optical components and systems are disclosed that include an optical element and a base member. Multiple wells correspond to respective locations on a surface of the optical element. Liquid metal in the wells is coupled to the respective locations to apply respective hydrostatic pressures to the locations. At least one displacement device is coupled to at least one well to selectively change the respective hydrostatic pressure applied, relative to the base member, by the liquid metal in the well to the respective location. The “liquid metal” is any of several formulations of metal that are liquid under actual-use conditions (e.g., a liquid alloy of gallium). The liquid metal can be displaced through conduits to change the hydrostatic pressure being applied to the respective locations. The displacement, and hence the hydrostatic pressure, can be feedback controlled.
    • 公开了包括光学元件和基底构件的光学部件和系统。 多个孔对应于光学元件的表面上的相应位置。 井中的液体金属联接到相应的位置以将相应的静水压力施加到位置。 至少一个位移装置联接到至少一个井,以选择性地改变相对于基座构件由井中的液态金属施加到相应位置的相应静水压力。 “液态金属”是在实际使用条件下为液体的几种金属制剂中的任何一种(例如,镓的液体合金)。 液体金属可以通过管道移位,以改变施加到相应位置的静水压力。 位移以及因此的静水压力可以被反馈控制。
    • 35. 发明申请
    • HYDROSTATIC LIQUID-METAL DEFORMABLE OPTICAL ELEMENTS
    • 液体液体金属可变光学元件
    • US20100020423A1
    • 2010-01-28
    • US12209094
    • 2008-09-11
    • Alton H. Phillips
    • Alton H. Phillips
    • G02B7/195G02B5/08G02B7/182
    • G03F7/70266G02B26/06G02B26/0825
    • Optical components and systems are disclosed that include an optical element and a base member. Multiple wells correspond to respective locations on a surface of the optical element. Liquid metal in the wells is coupled to the respective locations to apply respective hydrostatic pressures to the locations. At least one displacement device is coupled to at least one well to selectively change the respective hydrostatic pressure applied, relative to the base member, by the liquid metal in the well to the respective location. The “liquid metal” is any of several formulations of metal that are liquid under actual-use conditions (e.g., a liquid alloy of gallium). The liquid metal can be displaced through conduits to change the hydrostatic pressure being applied to the respective locations. The displacement, and hence the hydrostatic pressure, can be feedback controlled.
    • 公开了包括光学元件和基底构件的光学部件和系统。 多个孔对应于光学元件的表面上的相应位置。 井中的液体金属联接到相应的位置以将相应的静水压力施加到位置。 至少一个位移装置联接到至少一个井,以选择性地改变相对于基座构件由井中的液态金属施加到相应位置的相应静水压力。 “液态金属”是在实际使用条件下为液体的几种金属制剂中的任何一种(例如,镓的液体合金)。 液体金属可以通过管道移位,以改变施加到相应位置的静水压力。 位移以及因此的静水压力可以被反馈控制。
    • 36. 发明授权
    • Contact material and system for ultra-clean applications
    • 用于超洁净应用的接触材料和系统
    • US07551265B2
    • 2009-06-23
    • US10956606
    • 2004-10-01
    • Alton H. Phillips
    • Alton H. Phillips
    • G03B27/62G03B27/52G03B27/42G03F1/00B65D85/00
    • G03F7/70916G03F7/70741G03F7/70808Y10S414/135
    • Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then a magnetic field is used to attract the particles. In one embodiment, the particles are attracted to and collected by a magnet. In this way, the particles are drawn away from any components that might be contaminated. In some embodiments, the magnetic component is also magnetized. In other embodiments, a magnet is placed in contact with the magnetic component. In other embodiments, each of the components that come into contact with each other are formed of a magnetic material.
    • 减少由相互脱离接触的部件磨损的颗粒污染最小化的技术。 本发明涉及从磁性材料中形成至少一种组分,使得磨损组分的颗粒本身是磁性的。 然后使用磁场来吸引颗粒。 在一个实施例中,颗粒被磁体吸引和收集。 以这种方式,将颗粒从可能被污染的任何组分中抽出。 在一些实施例中,磁性部件也被磁化。 在其它实施例中,磁体被放置成与磁性部件接触。 在其他实施例中,彼此接触的每个部件由磁性材料形成。
    • 37. 发明授权
    • Filtered device container assembly with shield for a reticle
    • 过滤的设备容器组件,带有用于掩模版的屏蔽
    • US07773198B2
    • 2010-08-10
    • US11655674
    • 2007-01-19
    • Alton H. Phillips
    • Alton H. Phillips
    • G03B27/62G03B27/52G03B27/42G03F1/00B65D85/00
    • G03B27/42G03F1/66G03F7/70866
    • A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) includes a fluid port (254) that allows for the flow of fluid (276) into and out of the device container (246). The shield assembly (250) is encircled by the device container (246). Further, the shield assembly (250) is positioned between the fluid port (254) and the reticle (26) when the reticle (26) is positioned within the device container (246). The shield assembly (250) can inhibit contaminants (278) near the fluid port (254) from being deposited on the reticle (26) and can maintain the integrity of the reticle (26).
    • 用于存储掩模版(26)的装置容器组件(30)包括装置容器(246)和屏蔽组件(250)。 装置容器(246)围绕标线(26)。 此外,装置容器(246)包括允许流体(276)流入和流出装置容器(246)的流体端口(254)。 屏蔽组件(250)被设备容器(246)包围。 此外,当标线片(26)位于装置容器(246)内时,屏蔽组件(250)定位在流体端口(254)和光罩(26)之间。 屏蔽组件(250)可以抑制流体端口(254)附近的污染物(278)沉积在掩模版(26)上并且可以保持掩模版(26)的完整性。
    • 38. 发明申请
    • DEVICES AND METHODS FOR REDUCING RESIDUAL RETICLE CHUCKING FORCES
    • 用于减少残留物冲击力的装置和方法
    • US20080291411A1
    • 2008-11-27
    • US12062378
    • 2008-04-03
    • Alton H. Phillips
    • Alton H. Phillips
    • G03B27/68
    • G03F7/707
    • Devices and methods are disclosed for holding an object, particularly a planar object. An exemplary device has a chuck and pressure-changing device. The chuck has an object-mounting surface and a deformable membrane coupled to the object-mounting surface such that conformational changes in the membrane produce corresponding changes in the object-mounting surface. The chuck has a first cavity separated by the membrane from the chuck cavity. The pressure-changing device is coupled to the first cavity to change pressure in the first cavity, relative to outside it, sufficiently to produce a conformational change of the membrane and a corresponding change in the object-mounting surface sufficient to reduce the force with which the object is being held to the object-mounting surface. The pressure change can be a pressure increase or decrease. The change in the object-mounting surface can be, for example, a reduction in area of contact of the object-mounting surface with the object, thereby reducing the holding force.
    • 公开了用于保持物体,特别是平面物体的装置和方法。 示例性的装置具有卡盘和压力改变装置。 卡盘具有物体安装表面和可耦合到物体安装表面的可变形膜,使得膜中的构象变化产生物体安装表面的相应变化。 卡盘具有由膜与卡盘腔分离的第一腔。 压力改变装置联接到第一腔体以改变第一空腔中相对于其外部的压力,足以产生膜的构象变化以及物体安装表面中相应的变化足以减小其中的力 物体被保持到物体安装表面。 压力变化可以是压力增加或减小。 物体安装表面的变化可以是例如物体安装表面与物体的接触面积的减小,从而降低保持力。
    • 39. 发明申请
    • Filtered device container assembly with shield for a reticle
    • 过滤的设备容器组件,带有用于掩模版的屏蔽
    • US20070229793A1
    • 2007-10-04
    • US11655674
    • 2007-01-19
    • Alton H. Phillips
    • Alton H. Phillips
    • G03B27/62
    • G03B27/42G03F1/66G03F7/70866
    • A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) includes a fluid port (254) that allows for the flow of fluid (276) into and out of the device container (246). The shield assembly (250) is encircled by the device container (246). Further, the shield assembly (250) is positioned between the fluid port (254) and the reticle (26) when the reticle (26) is positioned within the device container (246). The shield assembly (250) can inhibit contaminants (278) near the fluid port (254) from being deposited on the reticle (26) and can maintain the integrity of the reticle (26).
    • 用于存储掩模版(26)的装置容器组件(30)包括装置容器(246)和屏蔽组件(250)。 装置容器(246)围绕标线(26)。 此外,装置容器(246)包括允许流体(276)流入和流出装置容器(246)的流体端口(254)。 屏蔽组件(250)被设备容器(246)包围。 此外,当标线片(26)位于装置容器(246)内时,屏蔽组件(250)定位在流体端口(254)和光罩(26)之间。 屏蔽组件(250)可以抑制流体端口(254)附近的污染物(278)沉积在掩模版(26)上并且可以保持掩模版(26)的完整性。