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31. 发明申请

US20080117392A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080117392A1
公开(公告)日：2008-05-22
申请号：US11603255
申请日：2006-11-22
申请人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
发明人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译：平版印刷设备和设备制造方法公开了一种用于调节浸没式光刻设备中浸没液体的折射率的系统。将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。此外，流体可以被调节和处理以保持光学特性。

32. 发明授权

US08709908B2 Improving alignment target contrast in a lithographic double patterning process 失效
标题翻译：改善光刻双重图案化过程中的对准目标对比度
公开(公告)号：US08709908B2
公开(公告)日：2014-04-29
申请号：US12725026
申请日：2010-03-16
申请人： Harry Sewell , Mircea Dusa , Richard Johannes Franciscus Van Haren , Manfred Gawein Tenner , Maya Angelova Doytcheva
发明人： Harry Sewell , Mircea Dusa , Richard Johannes Franciscus Van Haren , Manfred Gawein Tenner , Maya Angelova Doytcheva
IPC分类号： H01L21/76
CPC分类号： G03F9/7046 , G03F7/0035 , G03F7/105 , G03F7/70466 , G03F9/7076 , H01L21/0273 , H01L21/32139
摘要： A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).
摘要翻译：提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。染料可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。波长可对应于对准光束的波长。染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。

33. 发明授权

US07898643B2 Immersion photolithography system and method using inverted wafer-projection optics interface 失效
标题翻译：浸入式光刻系统及方法采用倒置晶片投影光学接口
公开(公告)号：US07898643B2
公开(公告)日：2011-03-01
申请号：US11187010
申请日：2005-07-22
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70233
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes an optical system that images the electromagnetic radiation on the substrate. A liquid is between the optical system and the substrate. The projection optical system is positioned below the substrate.
摘要翻译：液浸光刻系统包括用电磁辐射曝光基板的曝光系统，还包括对基片上的电磁辐射进行成像的光学系统。液体在光学系统和基板之间。投影光学系统位于基板的下方。

34. 发明授权

US07410591B2 Method and system for making a nano-plate for imprint lithography 失效
标题翻译：制造用于压印光刻的纳米板的方法和系统
公开(公告)号：US07410591B2
公开(公告)日：2008-08-12
申请号：US11012489
申请日：2004-12-16
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： B29D11/00
CPC分类号： G03F7/0002 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Provided is a method and system for manufacturing a nano-plate. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. Finally, the patterned surface is then planarized and selectively etched to form a relief pattern which can be used as an imprint stamp.
摘要翻译：提供了一种用于制造纳米板的方法和系统。该方法包括在中心芯周围沉积两种或更多种类型的膜以形成多个膜层，每个膜层的类型与其相邻层不同。接下来，沉积的膜层被分割以暴露图案化表面。最后，将图案化表面平面化并选择性地蚀刻以形成可用作压印印模的浮雕图案。

35. 发明申请

US20070121375A1 System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby 有权
标题翻译：用于形成印刷光刻的纳米盘的系统和方法以及由此形成的纳米盘和存储盘
公开(公告)号：US20070121375A1
公开(公告)日：2007-05-31
申请号：US11288135
申请日：2005-11-29
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G11C11/14
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10S977/887 , Y10T29/49021 , Y10T29/49069
摘要： A system and method form a nanodisk that can be used to form isolated data bits on a memory disk. The imprint stamp is formed from first and second overlapping patterns, where the patterns are selectively etched. The selective etching leaves either pits or posts on the imprint stamp. The pits or posts are imprinted on the memory disk, leaving either pits or posts on the memory disk. The pits or posts on the memory disk are processed to form relatively small and dense isolated data bits. Instability of the isolated data bits caused by outside magnetic and thermal influences is substantially eliminated.
摘要翻译：系统和方法形成可以用于在存储器盘上形成隔离数据位的纳米盘。压印印模由第一和第二重叠图案形成，其中图案被选择性地蚀刻。选择性蚀刻留下印记戳上的凹坑或柱子。凹坑或帖子印在内存磁盘上，留下内存磁盘上的凹坑或帖子。处理存储器盘上的坑或柱以形成相对小且密集的隔离数据位。实际上消除了由外部磁和热影响引起的隔离数据位的不稳定性。

36. 发明申请

US20060130317A1 Method and system for making a computer hard drive platen using a nano-plate 失效
标题翻译：使用纳米板制作计算机硬盘的方法和系统
公开(公告)号：US20060130317A1
公开(公告)日：2006-06-22
申请号：US11012474
申请日：2004-12-16
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： H01F41/02 , B05D5/12 , B44C1/22
CPC分类号： G11B5/82 , B82Y10/00 , C23C14/24 , G11B5/743 , G11B5/855 , H01F41/34 , Y10T29/49021 , Y10T29/49025 , Y10T29/49069 , Y10T29/49798
摘要： Provided is a method and system for manufacturing a hard drive platen. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. The patterned surface is then planarized and selectively etched to expose patterns comprised of one of the types of film to a predetermined depth to produce a selectively etched surface. Magnetic material it deposited within etches of the surface and the surface is then planarized to form separated magnetic tracks therein.
摘要翻译：提供一种用于制造硬盘驱动盘的方法和系统。该方法包括在中心芯周围沉积两种或更多种类型的膜以形成多个膜层，每个膜层的类型与其相邻层不同。接下来，沉积的膜层被分割以暴露图案化表面。然后对图案化的表面进行平面化和选择性蚀刻，以将由一种类型的膜构成的图案暴露于预定深度以产生选择性蚀刻的表面。然后将其沉积在表面和表面的蚀刻内的磁性材料平坦化，以在其中形成分离的磁迹。

37. 发明申请

US20060119827A1 Maskless optical writer 有权
公开(公告)号：US20060119827A1
公开(公告)日：2006-06-08
申请号：US11337691
申请日：2006-01-24
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G03B27/54 , G03C5/00
CPC分类号： G03F7/70566 , A61B6/4435 , G03F7/70283 , G03F7/70291
摘要： A maskless pattern generating system for use in lithographic processing includes a liquid crystal pixel array. The system generates a light beam and applies a voltage level to each pixel of the pixel array to modulate a polarization state of the light beam so as to create a pattern image. The voltage levels correspond to greyscale levels assigned to the pixels. The system can receive a control signal input based on pattern information that defines the pattern image. The setting of the individual voltage levels can allow the liquid crystal pixel array to act as a phase shift mask, can allow the pattern image to be shifted, and can allow the manipulation of a pattern image edge. This maskless pattern writing system acts as a light valve to control pattern imagery, on a pixel by pixel basis, for the purposes of direct writing patterns.

38. 发明申请

US20060061748A1 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system 失效
标题翻译：光束分离器光学设计，用于保持反射折射光刻系统的未闪烁（未镜像）图像
公开(公告)号：US20060061748A1
公开(公告)日：2006-03-23
申请号：US11272147
申请日：2005-11-14
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G03B27/54
CPC分类号： G03F7/70941 , G02B17/08 , G02B17/0892 , G02B27/283 , G03F7/70225 , G03F7/70308
摘要： The present invention is a catadioptric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer optical group are placed on the same beam axis, different from aspheric mirror and folding mirror axis. The light passes through an image pattern on the reticle and is reflected by the beam splitter onto the aspheric mirror. The aspheric mirror reflects the light back through the beam splitter onto the folding mirror. The folding mirror reflects the light back to the beam splitter. The beam splitter reflects the light onto the semiconductor wafer optical group. A plurality of quarter wave plates can be placed in optical paths between optical elements of the present invention to change polarization of an incoming light. Before light passes through the semiconductor wafer optical group, it passes through the baffle plate, which prevents any background scattered light caused by internal reflections within the beam splitter from entering the semiconductor wafer optical group. In another embodiment, a spacer plate is inserted into the beam splitter. The spacer plate creates an offset between reticle optical group beam axis and semiconductor wafer optical group beam axis. This reduces direct passage of light from reticle optical group to semiconductor wafer optical group.
摘要翻译：本发明是具有光罩光学组，分束器，非球面镜，挡板，折叠镜和半导体晶片光学组的反折射系统。光掩模光学组，分束器和半导体晶片光学组被放置在与非球面镜和折叠镜轴不同的相同的光束轴上。光通过掩模版上的图像图案，并被分束器反射到非球面镜上。非球面镜通过分束器将光反射回折叠镜。折叠镜将光反射回分束器。分束器将光反射到半导体晶片光学组上。多个四分之一波片可以放置在本发明的光学元件之间的光路中，以改变入射光的偏振。在光通过半导体晶片光学组之前，它通过挡板，其防止由分束器内的内部反射引起的任何背景散射光进入半导体晶片光学组。在另一个实施例中，间隔板被插入到分束器中。间隔板在标线片光学组束轴和半导体晶片光学组束轴之间产生偏移。这减少了光线从光掩模光学组到半导体晶片光学组的直接通过。

39. 发明授权

US06967713B2 Use of multiple reticles in lithographic printing tools 有权
公开(公告)号：US06967713B2
公开(公告)日：2005-11-22
申请号：US10939328
申请日：2004-09-14
申请人： Andrew W. McCullough , Christopher Mason , Louis Markoya , Harry Sewell
发明人： Andrew W. McCullough , Christopher Mason , Louis Markoya , Harry Sewell
IPC分类号： G03F7/22 , G03F7/20 , H01L21/027 , G03B27/62 , G03B27/42 , G03C5/00
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.

40. 发明申请

US20050190355A1 Apparatus and system for improving phase shift mask imaging performance and associated methods 有权
标题翻译：用于改善相移掩模成像性能和相关方法的装置和系统
公开(公告)号：US20050190355A1
公开(公告)日：2005-09-01
申请号：US11121917
申请日：2005-05-05
申请人： Harry Sewell
发明人： Harry Sewell
IPC分类号： G03F1/26 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F1/26 , G03F7/7025 , G03F7/70283
摘要： A method for improving the imaging performance in a photolithographic system having a pupil plane and using a phase shift mask. A portion of the pupil plane where a phase error portion of a light from the phase shift mask is located. An aperture is placed at the located portion of the pupil plane. Typically, the phase error portion of the light from the phase shift mask is a zero order portion of the light often referred to as “zero order leakage”. Blocking the zero order leakage significantly mitigates the variations in the intensity of the light that exposes photoresist that is above or below the nominal focal plane. This, in turn, reduces the variations in the linewidths formed on the wafer.
摘要翻译：一种用于改善具有瞳孔平面并使用相移掩模的光刻系统中的成像性能的方法。来自相移掩模的光的相位误差部分位于光瞳面的一部分。孔位于光瞳平面的定位部分。通常，来自相移掩模的光的相位误差部分是通常被称为“零级泄漏”的光的零级部分。阻止零级泄漏显着地减轻了曝光在标称焦平面之上或之下的光致抗蚀剂的光强度的变化。这又减少了在晶片上形成的线宽的变化。

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