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31. 发明申请

US20080113177A1 Aromatic Polyamide Porous Film, Process for Producing the Same and Secondary Battery 有权
标题翻译：芳香族聚酰胺多孔膜，其制造方法和二次电池
公开(公告)号：US20080113177A1
公开(公告)日：2008-05-15
申请号：US11795531
申请日：2005-11-29
申请人： Masanori Sueoka , Kenta Nishihara , Akimitsu Tsukuda
发明人： Masanori Sueoka , Kenta Nishihara , Akimitsu Tsukuda
IPC分类号： B32B3/26
CPC分类号： H01M2/1653 , B01D67/0016 , B01D71/56 , B01D2323/08 , B01D2325/026 , B01D2325/22 , C08J5/18 , C08J2377/00 , H01M10/052 , H01M10/4235 , Y10T428/249921 , Y10T428/249953 , Y10T428/249954 , Y10T428/26
摘要： The problem addressed by this invention is to provide an aromatic polyamide porous film excellent in the capability of being thinned and capable of easily exhibiting stable porosity properties even if it is used for a long period of time at high temperature. This invention can be achieved by an aromatic polyamide porous film that contains an aromatic polyamide as a main component and is such that when an atomic force microscope is used to measure a range of S μm2 at least on one surface, the sectional area S(10) μm2 obtained at a depth of 10 nm from the surface and the sectional area S(20) μm2 obtained at a depth of 20 nm from the surface satisfy the following formulae simultaneously. 0.01≦S(10)/S≦0.3 5≦S(20)/S(10)≦20
摘要翻译：本发明解决的问题是提供即使在高温下长时间使用也能够变薄，能够容易地显示出稳定的孔隙性的芳香族聚酰胺多孔膜。本发明可以通过含有芳香族聚酰胺作为主要成分的芳香族聚酰胺多孔膜来实现，并且使用原子力显微镜至少在一个以上测定S mum 2范围的范围在表面深度为10nm处获得的截面面积S（10）mum <2>和在深度处获得的截面积S（20）mum <2> 表面20nm同时满足下列公式。 <？in-line-formula description =“In-line Formulas”end =“lead”？> 0.01 <= S（10）/ S <= 0.3 <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula”end =“lead”？> 5 <= S（20）/ S（10）<= 20 < description =“In-line Formulas”end =“tail”？>

32. 发明授权

US06274220B1 Aromatic polyamide resin moldings, production methods thereof, and magnetic recording medium produced therefrom 失效
标题翻译：芳香族聚酰胺树脂成形体及其制造方法以及由其制造的磁记录介质
公开(公告)号：US06274220B1
公开(公告)日：2001-08-14
申请号：US09066312
申请日：1998-04-28
申请人： Akimitsu Tsukuda , Masanori Sueoka , Toshihiro Tsuzuki
发明人： Akimitsu Tsukuda , Masanori Sueoka , Toshihiro Tsuzuki
IPC分类号： G11B873
CPC分类号： C08J5/18 , C08J2377/10 , G11B5/73 , Y10S428/90 , Y10T428/24355 , Y10T428/25 , Y10T428/31681 , Y10T428/31725 , Y10T428/31765
摘要： The present invention provides aromatic polyamide resin moldings comprising at least one surface that is 1.0 nm or more in root-mean-square roughness and is 80 nm or less in 10-point average roughness, both of the roughness being as determined by atomic force microscopy, and that is 9.8 GPa or more in tensile Young's modulus at least in one direction. Such aromatic polyamide resin moldings serve effectively as material for film, film for magnetic recording medium in particular, that is highly resistant to scraping and has highly uniform surface protrusions.
摘要翻译：本发明提供了芳族聚酰胺树脂成型体，其包含至少一个表面，其均方根粗糙度为1.0nm以上，10点平均粗糙度为80nm以下，两者的粗糙度均由原子力显微镜测定，并且至少在一个方向上的拉伸杨氏模量为9.8GPa以上。这种芳香族聚酰胺树脂成形体有效地用作膜，特别是磁记录介质的膜，耐刮擦性高，表面突起高度均匀。

33. 发明授权

US5993938A Aromatic polyamide film, method of manufacturing the same and magnetic recording medium using the same film 失效
标题翻译：芳香聚酰胺薄膜，其制造方法和使用相同薄膜的磁记录介质
公开(公告)号：US5993938A
公开(公告)日：1999-11-30
申请号：US981339
申请日：1998-01-20
申请人： Akimitsu Tsukuda , Mitsuhiro Horiuchi , Toshihiro Tsuzuki
发明人： Akimitsu Tsukuda , Mitsuhiro Horiuchi , Toshihiro Tsuzuki
IPC分类号： B29D7/01 , C08J5/18 , G11B5/73 , G11B5/733 , G11B5/704
CPC分类号： G11B5/733 , B29D7/01 , C08J5/18 , B29K2077/10 , B29K2105/16 , C08J2377/10 , Y10S428/90 , Y10T428/24355 , Y10T428/25 , Y10T428/31725 , Y10T428/31728
摘要： The present invention relates to aromatic polyamide film which is characterized in that on at least one face thereof the number of projections of height at least 20 nm but less than 50 nm is from 10.sup.3 to 10.sup.8 per mm.sup.2, and the number of projections of height at least 50 nm but less than 100 nm is from 0 to 3.times.10.sup.4 per mm.sup.2.Further, the present invention also offers a method of producing an aromatic polyamide film which is characterized in that, in a method of producing aromatic polyamide film from a solution obtained by adding to an aromatic polyamide solution a particle-containing slurry formed by dispersing particles of particle diameter 10 to 300 nm in a liquid medium of 10 poise or less, such that the amount of said particles added in terms of the aromatic polyamide is 0.005 to 4.5 wt %, the relative standard deviation in the diameters of said particles is no more than 0.8 and, furthermore, there is used a particle-containing slurry where the initial filterability index Q1 of said particle-containing slurry and the filterability index Q2 after the passage of 500 ml of liquid satisfy the following relation.Q2/Q1.gtoreq.0.3While the film of the present invention is also ideal for use as flexible printed substrates, capacitors and printer ribbons, etc, since it is possible to realise extremely high levels of both output characteristics and durability, it is especially suitable for magnetic recording media, in particular for computer external memory and digital video tape where high density and high precision are demanded.
摘要翻译： PCT No.PCT / JP97 / 01336 Sec。 371日期1998年1月20日 102（e）1998年1月20日PCT PCT 1997年4月17日PCT公布。公开号WO97 / 39876 日期：1997年10月30日本发明涉及芳族聚酰胺薄膜，其特征在于，在至少一个面上，高度至少为20nm但小于50nm的突起数为103〜108个/ mm 2，高度至少为50nm但小于100nm的突起为0至3×10 4 / mm 2。此外，本发明还提供了一种芳族聚酰胺薄膜的制造方法，其特征在于，在通过向芳香族聚酰胺溶液中添加由通过将芳香族聚酰胺薄膜分散在10泊或更低的液体介质中的粒径为10至300nm，使得以芳族聚酰胺计的所述颗粒的量为0.005至4.5重量％，所述颗粒的直径的相对标准偏差不再 0.8以上，此外，使用含有颗粒的浆料的初始过滤性指数Q1和500ml液体通过后的过滤性指数Q2满足以下关系的含有颗粒的浆料。 Q2 / Q1> / = 0.3本发明的薄膜也是理想的用作柔性印刷基板，电容器和打印机色带等，因为可以实现极高的输出特性和耐久性，所以特别是适用于磁记录介质，特别适用于需要高密度和高精度的计算机外部存储器和数字录像带。

34. 发明授权

US5969080A Film made of an aromatic polyamide and/or aromatic polyimide and a magnetic recording medium using it 失效
标题翻译：由芳族聚酰胺和/或芳族聚酰亚胺制成的膜和使用它的磁记录介质
公开(公告)号：US5969080A
公开(公告)日：1999-10-19
申请号：US981759
申请日：1997-12-30
申请人： Toshiya Ieki , Akimitsu Tsukuda , Toshihiro Tsuzuki
发明人： Toshiya Ieki , Akimitsu Tsukuda , Toshihiro Tsuzuki
IPC分类号： B29D7/01 , C08J5/18 , C09D5/23 , G11B5/73 , C08G73/00 , B32B27/00
CPC分类号： C08J5/18 , B29D7/01 , G11B5/73 , B29K2077/10 , B29K2079/08 , C08J2377/10 , C08J2379/08 , Y10S428/90 , Y10T428/265 , Y10T428/31721
摘要： A film excellent in flatness, and not degraded in flatness by curling, etc. even at high temperature during processing and use as a product.The film of the present invention is made of an aromatic polyamide and/or aromatic polyimide, and satisfies the following:(Pmax-Pmin)/Pavr.ltoreq.1.0where Pmax is the maximum value of the orientation degree obtained from the Raman spectrum in the section direction of the film; Pmin is the minimum value and Pavr is the average value.
摘要翻译： PCT No.PCT / JP97 / 01715 Sec。 371日期1997年12月30日 102（e）日期1997年12月30日PCT提交1997年5月22日PCT公布。 WO97 / 44182 PCT出版物日期1997年11月27日平板度优异，即使在作为产品的加工和使用期间的高温下也不会由于卷曲而在平坦度上劣化。本发明的膜由芳香族聚酰胺和/或芳香族聚酰亚胺构成，满足下列条件：（Pmax-Pmin）/ Pavr <1.0其中Pmax是从拉曼光谱获得的取向度的最大值，薄膜的截面方向; Pmin是最小值，Pavr是平均值。

35. 发明授权

US5460890A Biaxially stretched isotropic polyimide film having specific properties 失效
标题翻译：具有特定性质的双轴拉伸各向同性聚酰亚胺膜
公开(公告)号：US5460890A
公开(公告)日：1995-10-24
申请号：US841807
申请日：1992-02-26
申请人： Masakazu Okahashi , Akimitsu Tsukuda , Tsuneyoshi Miwa , James R. Edman , Charles M. Paulson, Jr.
发明人： Masakazu Okahashi , Akimitsu Tsukuda , Tsuneyoshi Miwa , James R. Edman , Charles M. Paulson, Jr.
IPC分类号： B29C55/14 , B29D7/01 , C08J5/18 , H05K1/03 , B32B15/08
CPC分类号： C08J5/18 , B29C55/143 , B29D7/01 , H05K1/0346 , B29K2079/08 , C08J2379/08 , Y10T428/31681 , Y10T428/31721
摘要： An isotropic, biaxially stretched polyimide film prepared by casting a solution of a polyamic acid precursor in an organic solvent containing a cyclization catalyst and dehydrating agent onto the surface of a support, imidizing the polyamic acid to give a continuous self-supporting gel film containing 5-50% by weight of solids, stretching the gel film in the machine direction (MD) at a ratio of 1.1-1.9, and stretching in the transverse direction (TD) with respect to the machine direction so as to maintain a TD/MD stretch ratio of from 0.9 to 1.3.
摘要翻译：通过将聚酰胺酸前体在含有环化催化剂和脱水剂的有机溶剂中的溶液浇铸到载体表面上制备的各向同性双轴拉伸聚酰亚胺膜，酰亚胺化聚酰胺酸，得到含有5 -50重量％的固体，以1.1-1.9的比例沿着机器方向（MD）拉伸凝胶膜，并相对于机器方向在横向（TD）上拉伸，以便保持TD / MD 拉伸比为0.9〜1.3。

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