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    • 37. 发明授权
    • Photopolymerizable composition and photosensitive lithographic printing
plate
    • 光聚合组合物和光敏平版印刷版
    • US5738974A
    • 1998-04-14
    • US520724
    • 1995-08-29
    • Hideki NagasakaToshiyuki UranoAkihisa Murata
    • Hideki NagasakaToshiyuki UranoAkihisa Murata
    • G03F7/029
    • G03F7/029Y10S430/12Y10S430/121Y10S430/127Y10S430/148
    • A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises: (a) a titanocene compound, and (b) at least one coumarin compound of the following formula (I): ##STR1## wherein (i) each of R.sup.1, R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, each of R.sup.3 and R.sup.4 is an alkyl group, provided that at least one of R.sup.3 and R.sup.4 is a C.sub.4-16 alkyl group, or (ii) R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and at least one set of R.sup.2 and R.sup.3, and R.sup.4 and R.sup.5, is connected to form an alkylene group substituted by a lower alkyl group, provided that when they do not form the connecting group, each of R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and each of R.sup.3 and R.sup.4 is an alkyl group; R.sup.6 is a hydrogen atom, an alkyl group, an alkoxy group, an acyl group, a cyano group, or a carboxyl group or a group of its ester derivative or amide derivative, and R.sup.7 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17.
    • 一种可光聚合组合物,其包含具有至少一个烯属不饱和双键的加成聚合化合物和光聚合引发剂体系,其中所述光聚合引发剂体系包括:(a)二茂钛化合物和(b)至少一种下式的香豆素化合物 I):其中(i)R1,R2和R5各自为氢原子,卤素原子,烷基或烷氧基,R3和R4各自为烷基,条件是在 R3和R4中的至少一个是C4-16烷基,或(ii)R1是氢原子,卤素原子,烷基或烷氧基,以及至少一个R2和R3以及R4和R5, 连接形成被低级烷基取代的亚烷基,条件是当它们不形成连接基团时,R 2和R 5各自为氢原子,卤素原子,烷基或烷氧基,R 3 R4为烷基; R6为氢原子,烷基,烷氧基,酰基,氰基或羧基或其酯衍生物或酰胺衍生物的基团,R7为碳原子数为 从3到17。