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    • 37. 发明申请
    • Optical System, Exposing Apparatus and Exposing Method
    • 光学系统,曝光装置和曝光方法
    • US20080273185A1
    • 2008-11-06
    • US11629129
    • 2005-06-09
    • Yasuhiro OmuraHaruhisa IidaTakeshi Tsuda
    • Yasuhiro OmuraHaruhisa IidaTakeshi Tsuda
    • G03B27/54G03F1/00
    • G03B27/54G03F7/70225G03F7/70566G03F7/70958
    • An optical system includes a reflecting mirror to which rays are incident across a relatively wide incidence angle range, while well suppressing a change in a polarization state in an optical path of a beam incident substantially as linearly polarized light. The optical system has a first deflecting plane mirror and a second deflecting plane mirror and a substantially linearly polarized beam is incident to the optical system. Each of the first deflecting plane mirror and the second deflecting plane mirror is so arranged that a change from a phase difference between p-polarized incident light to a reflecting surface and s-polarized incident light to the reflecting surface, to a phase difference between reflected light of the p-polarized incident light to the reflecting surface and reflected light of the s-polarized incident light to the reflecting surface is within 30° for all rays incident to the reflecting surface.
    • 光学系统包括反射镜,射线穿过相对较宽的入射角度范围入射,同时很好地抑制基本上以直线偏振光入射的光束的光路中的偏振状态的变化。 光学系统具有第一偏转平面镜和第二偏转平面镜,并且基本线性偏振光束入射到光学系统。 第一偏转平面镜和第二偏转平面镜中的每一个被布置成使得从p偏振入射光到反射表面的相位差和s偏振入射光到反射表面的相位差到反射的相位差 对入射到反射表面的所有光线,到反射面的p偏振入射光和到反射面的s偏振入射光的反射光都在30°以内。
    • 40. 发明授权
    • Photosensitizer, visible light curable resin composition using the same,
and use of the composition
    • 光敏剂,使用其的可见光固化树脂组合物,以及组合物的用途
    • US06106999A
    • 2000-08-22
    • US131418
    • 1998-08-10
    • Akira OgisoTsutami MisawaTaizo NishimotoHisashi TsukaharaKeisuke TakumaKenichi SugimotoTakeshi TsudaGenji ImaiHideo Kogure
    • Akira OgisoTsutami MisawaTaizo NishimotoHisashi TsukaharaKeisuke TakumaKenichi SugimotoTakeshi TsudaGenji ImaiHideo Kogure
    • C08F2/00G03F7/029G03C1/105
    • G03F7/029Y10S430/114Y10S430/127
    • A visible light curable resin composition containing a photocurable resin, a photoreaction initiator and a photosensitizer having the formula (1). The composition has a very high sensitivity to a general-purpose visible light laser, so that a high-speed scanning exposure is possible by the laser, and an extremely fine high resolution can be obtained. In addition, the composition can be used for coating or printing under safelight irradiating conditions and under bright circumstantial conditions without any thickening of the composition, and hence the composition can exert excellent noticeable effects in points of safe operativity, operational efficiency and the stability of products. Formula (1) is as follows: ##STR1## wherein rings X.sub.1 and X.sub.2 are each an optionally substituted pyrrole ring; Y is H, CN, optionally substituted alkyl, aralkyl, aryl, heteroaryl or alkenyl group; and Z.sub.1 and Z.sub.2 are halogen, optionally substituted alkyl, alkoxy, alkylthio, aralkyl, aralkyloxy, aryl, aryloxy, arylthio, heteroaryl, heteroaryloxy or heteroarylthio group, provided that at least one of substituents on the pyrrole rings X.sub.1 and X.sub.2, groups Z.sub.1 and Z.sub.2 is the alkoxy, aralkyloxy or aryloxy group.
    • 一种含有光固化树脂,光反应引发剂和具有式(1)的光敏剂的可见光固化树脂组合物。 该组合物对通用可见光激光器具有非常高的灵敏度,使得可以通过激光进行高速扫描曝光,并且可以获得非常好的高分辨率。 此外,该组合物可以在安全照射条件下和明亮的环境条件下用于涂布或印刷,而不会使组合物变厚,因此组合物可以在安全操作性,操作效率和产品稳定性方面发挥出色的显着效果 。 式(1)如下:其中环X1和X2各自为任选取代的吡咯环; Y是H,CN,任选取代的烷基,芳烷基,芳基,杂芳基或烯基; 并且Z 1和Z 2是卤素,任选取代的烷基,烷氧基,烷硫基,芳烷基,芳烷氧基,芳基,芳氧基,芳硫基,杂芳基,杂芳氧基或杂芳硫基,条件是吡咯环X1和X2上的至少一个取代基, Z2是烷氧基,芳烷氧基或芳氧基。