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    • 33. 发明授权
    • 알킬기를 갖는 스피로비플루오렌 화합물 및 그 제조방법
    • 알킬기를갖는스피로비플루오렌화합물및그제조방알킬
    • KR100449854B1
    • 2004-09-22
    • KR1020010008989
    • 2001-02-22
    • 한국전자통신연구원
    • 이효영이정익정태형도이미추혜용김성현
    • C07F5/02
    • PURPOSE: Provided are various spirobifluorene compounds with alkyl substituents at desired positions and their preparation method, thereby preparing derivatives each having different functions and excellent solubility to be used for polymer synthesis and as electronic materials. CONSTITUTION: Spirobifluorene compound is represented by the formula(1), wherein R1 and R2 are the same or different each other, and represent a C1-C20 linear or branched alkyl group or alkoxy group, or a thioalkyl group; and X1 and X2 are the same or different each other and represent hydrogen or halogen, or a hydroxyl group, or bone or boric ester, provided that X1 and X2 don't represent hydrogen simultaneously.
    • 目的:提供在所需位置具有烷基取代基的各种螺二芴化合物及其制备方法,由此制备各种具有不同功能和优异溶解性的用于聚合物合成的衍生物和作为电子材料。 构成:螺二芴化合物由式(1)表示,其中R 1和R 2彼此相同或不同,并且表示C 1 -C 20直链或支链烷基或烷氧基或硫代烷基; X1和X2彼此相同或不同,并且代表氢或卤素,或羟基,或骨或硼酸酯,条件是X1和X2不同时代表氢。
    • 34. 发明公开
    • 4-설파닐알킬-3,5-디니트로-벤질 알콜 유도체 및 그의제조방법
    • 4-SULFANYLALKYL-3,5-DINITROBENZYL ALCOHOL衍生物及其制备方法
    • KR1020040068677A
    • 2004-08-02
    • KR1020030005174
    • 2003-01-27
    • 한국전자통신연구원
    • 이효영정문석최성율정태형
    • C07C321/06
    • C07C327/28C07C323/16
    • PURPOSE: A novel 4-sulfanylalkyl-3,5-dinitrobenzyl alcohol compound and its preparation method are provided, to obtain a compound useful as a molecular electron acceptor and applicable to a molecular electronic material. CONSTITUTION: The 4-sulfanylalkyl-3,5-dinitrobenzyl alcohol compound is represented by the formula 1, wherein R is H, an alkyl group or an acetyl group; and n is an integer of 1-25. The method comprises the steps of reacting p-methylbenzoic acid with nitric acid to prepare p-methyl-3,5-dinitrobenzoic acid; reacting the p-methyl-3,5-dinitrobenzoic acid with an alkyl alcohol in the presence of a catalyst to prepare an alkyl p-methyl-3,5-dinitrobenzoate; reacting the alkyl p-methyl-3,5-dinitrobenzoate with an N-halosuccinimide to prepare an alkyl 4-halomethyl-3,5-dinitrobenzoate; converting the ester group of the alkyl 4-halomethyl-3,5-dinitrobenzoate into an alcohol group in the presence of a catalyst to prepare a 4-halomethyl-3,5-dinitrobenzyl alcohol; and reacting the 4-halomethyl-3,5-dinitrobenzyl alcohol with potassium thioacetate or an alkyl thiosodium to prepare a compound whose R is an alkyl or acetyl group or removing the alkyl or acetyl group to prepare a compound whose R is H.
    • 目的:提供一种新型的4-硫烷基烷基-3,5-二硝基苄醇化合物及其制备方法,以获得可用作分子电子受体的化合物并适用于分子电子材料。 构成:4-硫烷基烷基-3,5-二硝基苄醇化合物由式1表示,其中R是H,烷基或乙酰基; n为1-25的整数。 该方法包括使对甲基苯甲酸与硝酸反应制备对甲基-3,5-二硝基苯甲酸; 在催化剂存在下使对甲基-3,5-二硝基苯甲酸与烷基醇反应,制备对甲基-3,5-二硝基苯甲酸烷基酯; 使对 - 甲基-3,5-二硝基苯甲酸烷基酯与N-卤代琥珀酰亚胺反应制备4-卤代甲基-3,5-二硝基苯甲酸烷基酯; 在催化剂存在下将4-卤代甲基-3,5-二硝基苯甲酸烷基酯的酯基转化为醇基,制备4-卤代甲基-3,5-二硝基苯甲醇; 并使4-卤代甲基-3,5-二硝基苄醇与硫代乙酸钾或烷基硫代钠反应,制备R为烷基或乙酰基或除去烷基或乙酰基的化合物,制备其R为H的化合物。
    • 35. 发明授权
    • 플라스틱 박막상의 인듐주석산화막 패턴 형성 방법과 그를 위한 회전 도포기
    • 플라스틱박막상의인듐주석산화막패턴형성방법과그를위한회전도포기
    • KR100413971B1
    • 2004-01-07
    • KR1020000080894
    • 2000-12-22
    • 한국전자통신연구원
    • 정태형이효영김성현도이미이정익추혜용
    • G02F1/136
    • PURPOSE: A method of patterning an indium tin oxide layer on a plastic thin film and a rotary coater used for the method are provided to coat photoresist in uniform thickness and prevent undercut generated in the event of wet etching. CONSTITUTION: An ITO layer(11) is formed on a plastic substrate(10), and photoresist is coated on the ITO layer. Heat treatment is performed in order to remove a solvent contained in the coated photoresist. Ultraviolet rays are irradiated on a portion of the ITO layer, which is etched, using a patterned mask. The exposed portion of the photoresist is developed. Heat treatment is carried out to eliminate moisture and solvent left in the photoresist. The ITO layer is dipped in an ITO etchant using the patterned photoresist as a mask to wet-etch the ITO layer. The photoresist used as the mask is stripped.
    • 目的:提供一种在塑料薄膜上图案化铟锡氧化物层的方法和用于该方法的旋转涂布机,以均匀厚度涂布光致抗蚀剂并防止在湿法蚀刻的情况下产生底切。 构成:在塑料衬底(10)上形成ITO层(11),并在ITO层上涂覆光刻胶。 进行热处理以除去包含在涂覆的光致抗蚀剂中的溶剂。 使用图案化的掩模将紫外线照射在被蚀刻的ITO层的一部分上。 光刻胶的曝光部分被显影。 进行热处理以消除残留在光致抗蚀剂中的湿气和溶剂。 使用图案化的光致抗蚀剂作为掩模将ITO层浸入ITO蚀刻剂中以湿法蚀刻ITO层。 用作掩模的光刻胶被剥离。
    • 36. 发明公开
    • 분자전자소자 제조방법
    • 制备分子电子器件的方法
    • KR1020030089936A
    • 2003-11-28
    • KR1020020027863
    • 2002-05-20
    • 한국전자통신연구원
    • 추혜용이효영김성현최성율정태형도이미
    • H01L29/02B82Y99/00
    • PURPOSE: A method for fabricating a molecular electronic device is provided to reduce a manufacturing cost by using a single crystal growth method and a selective etching method. CONSTITUTION: The first semiconductor layer(20), the second semiconductor layer, and the third semiconductor layer(40) are sequentially laminated on a substrate(10). A nanogap(35) is formed between the first semiconductor layer(20) and the third semiconductor layer(40) by etching a side of the second semiconductor layer. A metal layer is formed on a surface of the resultant. An upper part(50a) and a lower part(50b) of the resultant is electrically disconnected to each other by cutting vertically the substrate(10). A molecular electronic element(70) is coated on the upper part(50a) and the lower part(50b) near to the nanogap(35).
    • 目的:提供一种制造分子电子器件的方法,以通过使用单晶生长方法和选择性蚀刻方法来降低制造成本。 构成:第一半导体层(20),第二半导体层和第三半导体层(40)依次层叠在基板(10)上。 通过蚀刻第二半导体层的一侧,在第一半导体层(20)和第三半导体层(40)之间形成纳米隙(35)。 在所得物的表面上形成金属层。 通过垂直地切割基板(10),所得结果的上部(50a)和下部(50b)彼此电断开。 分子电子元件(70)涂覆在靠近纳米孔(35)的上部(50a)和下部(50b)上。
    • 39. 发明公开
    • 고안정성 고분자 구동기의 제조방법 및 이로부터 얻은고분자 구동기
    • 制备具有高稳定性的聚合物致动器的方法和由该方法制备的聚合物致动器
    • KR1020080041975A
    • 2008-05-14
    • KR1020070053741
    • 2007-06-01
    • 한국전자통신연구원
    • 최낙진이정현박강호이효영이형근김종대
    • C08G64/02C08G64/20C08G64/40C08J3/00
    • A method for producing a highly stable polymer actuator is provided to allow the use of a polymer actuator at a low temperature and even after treatment at an extremely high temperature. A method for producing a highly stable polymer actuator comprises: a step(S11) of preparing an ionic polymer/metal composite comprising metal electrodes plated on both surfaces of a conductive polymer membrane; a step(S12) of removing water from the conductive polymer membrane of the ionic polymer/metal composite; and a step(S13) of swelling the ionic polymer/metal composite in a polar solvent having a higher boiling point and a lower freezing point than water. The polar solvent includes propylene carbonate.
    • 提供了一种制造高度稳定的聚合物致动器的方法,以允许在低温下甚至在极高温度下处理之后使用聚合物致动器。 制造高度稳定的聚合物致动器的方法包括:制备离子聚合物/金属复合物的步骤(S11),其包含镀在导电聚合物膜的两个表面上的金属电极; 从离子型聚合物/金属复合体的导电性聚合物膜除去水的工序(S12) 和在具有比水高的沸点和低冰点的极性溶剂中使离子聚合物/金属复合物膨胀的步骤(S13)。 极性溶剂包括碳酸亚丙酯。