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31. 发明申请

US20160069589A1 RADIATOR HEATING DEVICE USING VACUUM SPIRAL HEAT PIPE 审中-公开
标题翻译：使用真空螺旋管的散热器加热装置
公开(公告)号：US20160069589A1
公开(公告)日：2016-03-10
申请号：US14784562
申请日：2014-04-16
申请人： Young-nam KIM
发明人： Young-nam KIM
IPC分类号： F24H3/08
CPC分类号： F24H3/085 , F24D2220/07 , F24H3/004 , F24H9/1863 , F28D15/0233
摘要： The present invention relates to a radiator heating device using a vacuum spiral heat pipe which can maximize heating efficiency, the radiator heating device comprising: a lower support (110) having an air hole (11); a first heat pipe (120A) and a second heat pipe (120B) provided standing in close contact with each other on the lower support (110); a first radiating pipe having, on the lower part thereof, a blower (40) for introducing outside air; a second radiating pipe (140) having a plurality of heat release nozzles formed on one side around the outer circumference thereof; a connecting pipe (150); an outer case (160) having a plurality of air contact protrusions (60) and having a discharge hole (62) provided on one side thereof; and a cover (170) detachably provided on the upper part of the outer case (160).
摘要翻译：本发明涉及一种使用真空螺旋管的散热器加热装置，该加热装置能最大限度地提高加热效率，散热器加热装置包括：具有空气孔（11）的下支撑件（110）第一热管（120A）和第二热管（120B），其在下支撑件（110）上彼此紧密接触地设置; 第一辐射管在其下部具有用于引入外部空气的鼓风机（40）; 第二辐射管（140），其具有形成在其外周的一侧上的多个散热喷嘴; 连接管（150）; 具有多个空气接触突起（60）并且具有设置在其一侧的排出孔（62）的外壳（160）以及可拆卸地设置在外壳（160）的上部上的盖（170）。

32. 发明申请

US20120112123A1 ETCHING COMPOSITION FOR AN UNDER-BUMP METALLURGY LAYER 有权
标题翻译：蚀刻组合物用于低压金属层
公开(公告)号：US20120112123A1
公开(公告)日：2012-05-10
申请号：US13347169
申请日：2012-01-10
申请人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
发明人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
IPC分类号： C09K13/00
CPC分类号： H01L21/32134 , C23F1/38 , H01L24/11 , H01L2224/05001 , H01L2224/05022 , H01L2224/05027 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05671 , H01L2224/05684 , H01L2224/13099 , H01L2224/16 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/14 , H01L2924/00014
摘要： In an etching composition for an under-bump metallurgy (UBM) layer and a method of forming a bump structure, the etching composition includes about 40% by weight to about 90% by weight of hydrogen peroxide (H2O2), about 1% by weight to about 20% by weight of an aqueous basic solution including ammonium hydroxide (NH4OH) or tetraalkylammonium hydroxide, about 0.01% by weight to about 10% by weight of an alcohol compound, and about 2% by weight to 30% by weight of an ethylenediamine-based chelating agent. The etching composition may effectively etch the UBM layer including titanium or titanium tungsten and remove impurities. A method of forming a bump structure may employ such an etching composition.
摘要翻译：在用于凸块下冶金（UBM）层的蚀刻组合物和形成凸块结构的方法中，蚀刻组合物包含约40重量％至约90重量％的过氧化氢（H 2 O 2），约1重量％至约20重量％的包含氢氧化铵（NH 4 OH）或四烷基氢氧化铵的碱性水溶液，约0.01重量％至约10重量％的醇化合物，和约2重量％至30重量％的乙二胺类螯合剂。蚀刻组合物可以有效地蚀刻包括钛或钛钨的UBM层并除去杂质。形成凸块结构的方法可以采用这种蚀刻组合物。

33. 发明授权

US08133088B2 Filament for infrared lamp and method of manufacturing the same 有权
标题翻译：红外线灯丝及其制造方法
公开(公告)号：US08133088B2
公开(公告)日：2012-03-13
申请号：US12918700
申请日：2009-12-22
申请人： Yong Sun Kim , Young Nam Kim , Kyong Hoon Park , Joeng Yeob Yun
发明人： Yong Sun Kim , Young Nam Kim , Kyong Hoon Park , Joeng Yeob Yun
IPC分类号： H01J9/00
CPC分类号： C09D183/04 , H05B3/0033 , Y02P20/124
摘要： The present invention relates to a filament for an infrared lamp used as a heater and a method of manufacturing the same. The method of fabricating the filament includes cutting a thin graphite plate into a thin graphite plate strip of a predetermined size, integrally adhering two sheets of the thin graphite plate strips using heat, primarily heating and plasticizing the integrally adhered graphite plate strips within an inert gas, coating a silicon-series coating solution on the primarily heated and plasticized graphite plate strips and naturally drying the graphite plate strips, and heating and plasticizing the naturally dried graphite plate strips using an identical process to the primary plasticity process and then naturally cooling the heated and plasticized graphite plate strips.
摘要翻译：本发明涉及用作加热器的红外线灯丝及其制造方法。制造长丝的方法包括将薄的石墨板切割成预定尺寸的薄石墨板条，使用热量将两片薄的石墨板带条一体地粘合在一起，主要在惰性气体中加热和塑化整体粘附的石墨板条在主要加热和塑化的石墨板条上涂覆硅系涂层溶液，并自然干燥石墨板条，并使用与初级可塑性工艺相同的方法加热和塑化天然干燥的石墨板条，然后自然冷却加热和塑化石墨板条。

34. 发明申请

US20120017586A1 VARIABLE TURBOCHARGER AND CONTROL METHOD FOR THE SAME 有权
标题翻译：可变涡轮增压器及其控制方法
公开(公告)号：US20120017586A1
公开(公告)日：2012-01-26
申请号：US13253560
申请日：2011-10-05
申请人： Jin Kook Kong , Soo Hyung Woo , Young Nam Kim , Young Jin Won , Young-Ju Kim , Jin Wook Son , Jeong-Hwa Cha
发明人： Jin Kook Kong , Soo Hyung Woo , Young Nam Kim , Young Jin Won , Young-Ju Kim , Jin Wook Son , Jeong-Hwa Cha
IPC分类号： F02B37/18
CPC分类号： F01D9/026 , F01D17/143 , F01D17/146 , F02B37/025 , F02B37/22 , F02D41/0007 , F05D2220/40 , F05D2250/15 , F05D2260/50 , F05D2260/56 , Y02T10/144
摘要： A variable turbocharger including a turbine housing, a first scroll fluidly communicating with a turbine, a second scroll formed along an outside of the first scroll, wherein the first scroll and the second scroll are disposed within the turbine housing for exhaust gas to exhaust through the turbine, a partitioning unit for selectively separating the first scroll and the second scroll, and a a flux control valve disposed at the exhaust gas inflow portion and selectively coupled to the partitioning unit for blocking the exhaust gas from flowing into the second scroll. The variable turbocharger may prevent turbo lag at a low speed and be highly efficient at a high speed.
摘要翻译：一种可变涡轮增压器，包括涡轮机壳体，与涡轮机流体连通的第一涡旋机构，沿着第一涡旋件外部形成的第二涡旋盘，其中第一涡旋件和第二涡旋件设置在涡轮机壳体内，以排出废气，涡轮机，用于选择性地分离第一涡旋盘和第二涡旋盘的分配单元和设置在废气流入部分的磁通控制阀，并且选择性地联接到分隔单元，用于阻止废气流入第二涡卷。可变涡轮增压器可以在低速下防止涡轮迟滞并且在高速下高效率。

35. 发明授权

US08034640B2 Apparatus and method to inspect defect of semiconductor device 失效
标题翻译：检测半导体器件缺陷的装置和方法
公开(公告)号：US08034640B2
公开(公告)日：2011-10-11
申请号：US12627222
申请日：2009-11-30
申请人： Ji-Young Shin , Young-Nam Kim , Jong-An Kim , Hyung-Suk Cho , Yu-Sin Yang
发明人： Ji-Young Shin , Young-Nam Kim , Jong-An Kim , Hyung-Suk Cho , Yu-Sin Yang
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： H01J37/241 , H01J37/265 , H01J37/28 , H01L22/12
摘要： An apparatus and method to inspect a defect of a semiconductor device. The amount of secondary electrons generated due to a scanning electron microscope (SEM) may depend on the topology of a pattern of a semiconductor substrate. The amount of secondary electrons emitted from a recess of an under layer is far smaller than that of secondary electrons emitted from a projection of a top layer. Since the recess is darker than the projection, a ratio of a value of a secondary electron signal of the under layer to a value of a secondary electron signal of the top layer may be increased in order to improve a pattern image used to inspect a defect in the under layer. To do this, a plurality of conditions under which electron beams (e-beams) are irradiated may be set, at least two may be selected out of the set conditions, and the pattern may be scanned under the selected conditions. Thus, secondary electron signals may be generated according to the respective conditions and converted into image data so that various pattern images may be displayed on a monitor. Scan information on the pattern images may be automatically stored in a computer storage along with positional information on a predetermined portion of the semiconductor substrate. When calculation conditions are input to a computer, each of scan information on the pattern images may be calculated to generate a new integrated pattern image.
摘要翻译：一种用于检查半导体器件的缺陷的装置和方法。由扫描电子显微镜（SEM）产生的二次电子量可能取决于半导体衬底图案的拓扑结构。从下层的凹部发射的二次电子的量远远小于从顶层的投影发射的二次电子的量。由于凹部比投影更暗，所以可以增加下层的二次电子信号的值与顶层的二次电子信号的值的比例，以便改善用于检查缺陷的图案图像在下层。为此，可以设置照射电子束（电子束）的多个条件，可以从设定条件中选择至少两个，并且可以在所选择的条件下扫描图案。因此，可以根据各自的条件生成二次电子信号，并将其转换为图像数据，从而可以在监视器上显示各种图案图像。关于图案图像的扫描信息可以与位于半导体基板的预定部分上的位置信息一起自动存储在计算机存储器中。当将计算条件输入到计算机时，可以计算每个关于图案图像的扫描信息，以生成新的集成图案图像。

36. 发明授权

US07847403B2 Semiconductor device having no cracks in one or more layers underlying a metal line layer 有权
标题翻译：在金属线层下面的一个或多个层中没有裂纹的半导体器件
公开(公告)号：US07847403B2
公开(公告)日：2010-12-07
申请号：US11806562
申请日：2007-06-01
申请人： Sang Hyun Yi , Young Nam Kim
发明人： Sang Hyun Yi , Young Nam Kim
IPC分类号： H01L23/48
CPC分类号： H01L23/528 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device and a method of manufacturing the same which yields high reliability and a high manufacturing yield. The semiconductor device includes a metal line layer having a plurality of metal line patterns spaced apart from each other, and at least one underlying layer under the metal line layer, wherein the space between two adjacent metal line patterns has a sufficient width to prevent a crack from occurring in one or more of the underlying layers. The cracking of an underlying layer may also be prevented by providing a slit in a direction parallel to the space between two adjacent metal line patterns at a sufficient distance from the space between the two adjacent metal line patterns.
摘要翻译：一种半导体器件及其制造方法，其产生高可靠性和高制造成品率。半导体器件包括具有彼此间隔开的多个金属线图案的金属线层和金属线层下面的至少一个下层，其中两个相邻金属线图案之间的空间具有足够的宽度以防止裂纹发生在一个或多个下层。也可以通过在与两个相邻的金属线图案之间的空间足够的距离处在与两个相邻的金属线图案之间的空间平行的方向上设置狭缝来防止下层的破裂。

37. 发明授权

US07842623B2 Composition for removing an insulation material and related methods 有权
标题翻译：去除绝缘材料的组成和相关方法
公开(公告)号：US07842623B2
公开(公告)日：2010-11-30
申请号：US12494572
申请日：2009-06-30
申请人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
发明人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
IPC分类号： H01L21/00 , C11D7/32
CPC分类号： H01L21/31111 , H01L21/02079
摘要： A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.
摘要翻译：公开了一种用于除去绝缘材料的组合物和相关使用方法。该组合物包含约1-50重量％的氧化剂，约0.1-35重量％的含氟化合物和水。绝缘材料包括低k材料和保护材料中的至少一种。

38. 发明申请

US20100000497A1 Variable Compression Ratio Apparatus 有权
标题翻译：可变压缩比设备
公开(公告)号：US20100000497A1
公开(公告)日：2010-01-07
申请号：US12498271
申请日：2009-07-06
申请人： Eun Ho LEE , Jin Kook Kong , Young Nam Kim
发明人： Eun Ho LEE , Jin Kook Kong , Young Nam Kim
IPC分类号： F02B75/04
CPC分类号： F02D15/02 , F02B75/048 , F02M26/01
摘要： A variable compression ratio apparatus may include a connecting rod rotatably connected to the piston so as to receive the combustion force therefrom, a pin link mounted to the crankshaft and rotatably connected to the connecting rod so as to receive the combustion force from the connecting rod and rotate the crankshaft, a connecting link rotatably coupled to the pin link and changing a rotation trace of the pin link with respect to a rotation axis of the crankshaft, an eccentric camshaft provided with first and second shaft portions eccentric from each other and configured to rotate by a predetermined angle according to a driving condition of the engine, a sub control link rotatably connected to the eccentric camshaft about the first shaft portion and rotatably connected to the connecting link, and a main control link rotatably connected to the eccentric camshaft about the second shaft portion and rotatably connected to the connecting link.
摘要翻译：可变压缩比装置可以包括可旋转地连接到活塞以从其接收燃烧力的连杆，安装到曲轴并可旋转地连接到连杆的销链节，以便接收来自连杆的燃烧力和旋转曲轴，可旋转地联接到销链节并且相对于曲轴的旋转轴线改变销链节的旋转轨迹的连接链节;偏心凸轮轴，其设置有彼此偏心并被构造成旋转的第一和第二轴部分根据发动机的驱动条件预定的角度;副控制链路，其可旋转地连接到偏心凸轮轴，围绕第一轴部分并且可旋转地连接到连接连杆;以及主控制连杆，可旋转地连接到偏心凸轮轴，围绕第二轴轴部分并且可旋转地连接到连接链节。

39. 发明申请

US20090288622A1 CONTINUOUS VARIABLE VALVE LIFT DEVICE 有权
标题翻译：连续可变阀门提升装置
公开(公告)号：US20090288622A1
公开(公告)日：2009-11-26
申请号：US12330323
申请日：2008-12-08
申请人： Ki Young Kwon , Young Hong Kwak , Eun Ho Lee , Soo Hyung Woo , Young Nam Kim , Jin Kook Kong
发明人： Ki Young Kwon , Young Hong Kwak , Eun Ho Lee , Soo Hyung Woo , Young Nam Kim , Jin Kook Kong
IPC分类号： F01L1/34
CPC分类号： F01L13/0063 , F01L13/0026
摘要： The CVVL device includes a rocking cam having a rolling face contacting a rocker arm is formed to press the rocker arm when pivoted, a rocking roller, which is disposed above the drive cam and rolls on an outer circumference of the drive cam, a control apparatus, which changes a position of the rocking roller rolling on the outer circumference of the drive cam; and a rocking apparatus, which pivots the rocking cam according to a position of the rocking roller such that a position where the rocker arm is contacted with the rolling face is changed depending on the position of the rocking roller.
摘要翻译： CVVL装置包括具有与摇臂接触的滚动面的摆动凸轮，以在枢转时按压摇臂;摆动辊，其布置在驱动凸轮上方并在驱动凸轮的外周上滚动;控制装置，其改变在驱动凸轮的外周上滚动的摇摆滚子的位置; 以及摇摆装置，其根据摇动滚子的位置使摆动凸轮枢转，使得摇臂与滚动面接触的位置根据摇动滚子的位置而改变。

40. 发明申请

US20090176363A1 Etching composition for an under-bump metallurgy layer and method of forming a bump structure using the same 有权
标题翻译：用于凸块下冶金层的蚀刻组合物和使用其形成凸块结构的方法
公开(公告)号：US20090176363A1
公开(公告)日：2009-07-09
申请号：US12292643
申请日：2008-11-21
申请人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
发明人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
IPC分类号： H01L21/441
CPC分类号： H01L21/32134 , C23F1/38 , H01L24/11 , H01L2224/05001 , H01L2224/05022 , H01L2224/05027 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05671 , H01L2224/05684 , H01L2224/13099 , H01L2224/16 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/14 , H01L2924/00014
摘要： In an etching composition for an under-bump metallurgy (UBM) layer and a method of forming a bump structure, the etching composition includes about 40% by weight to about 90% by weight of hydrogen peroxide (H2O2), about 1% by weight to about 20% by weight of an aqueous basic solution including ammonium hydroxide (NH4OH) or tetraalkylammonium hydroxide, about 0.01% by weight to about 10% by weight of an alcohol compound, and about 2% by weight to 30% by weight of an ethylenediamine-based chelating agent. The etching composition may effectively etch the UBM layer including titanium or titanium tungsten and remove impurities. A method of forming a bump structure may employ such an etching composition.
摘要翻译：在用于凸块下冶金（UBM）层的蚀刻组合物和形成凸块结构的方法中，蚀刻组合物包含约40重量％至约90重量％的过氧化氢（H 2 O 2），约1重量％至约20重量％的包含氢氧化铵（NH 4 OH）或四烷基氢氧化铵的碱性水溶液，约0.01重量％至约10重量％的醇化合物，和约2重量％至30重量％的乙二胺类螯合剂。蚀刻组合物可以有效地蚀刻包括钛或钛钨的UBM层并除去杂质。形成凸块结构的方法可以采用这种蚀刻组合物。

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