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31. 发明申请

WO2011161593A2 STACK ARRANGEMENT COMPRISING A LIGHTING UNIT IN BETWEEN A SUPPORT AND A SUPPORT COVER 审中-公开
标题翻译：包含支持和支持封面的照明单元的堆叠布置
公开(公告)号：WO2011161593A2
公开(公告)日：2011-12-29
申请号：PCT/IB2011052631
申请日：2011-06-16
申请人： KONINKL PHILIPS ELECTRONICS NV , VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
发明人： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
CPC分类号： F21S8/00 , E04B1/00 , E04F2290/026 , F21S8/04 , F21V33/006 , F21Y2115/10 , G09F9/33 , G09F19/22 , G09F19/228 , G09F2019/225 , Y10T29/49826
摘要： The invention provides a stack arrangement (100) comprising a support (30) and a support cover (20). The support cover (20) may be wall paper, and carpet, PVC flooring, linoleum flooring and plaster. At a position (1) between the support (30) and the support cover (20) a lighting unit (10) is configured to provide light (15) through the support cover (20). The support cover (20) and the support (30) are adhesively bonded to each other. The lighting unit (10) is releasably bonded to at least one of the support (30) and the support cover (20) via a release liner unit (40). The release liner unit (40) comprises a release liner (141) for releasable binding.
摘要翻译：本发明提供一种包括支撑件（30）和支撑盖（20）的堆叠装置（100）。支撑罩（20）可以是墙纸，地毯，PVC地板，油毡地板和石膏。在支撑件（30）和支撑盖（20）之间的位置（1）处，照明单元（10）构造成通过支撑盖（20）提供光（15）。支撑盖（20）和支撑件（30）彼此粘合。照明单元（10）经由隔离衬垫单元（40）可释放地结合到支撑件（30）和支撑盖（20）中的至少一个上。释放衬垫单元（40）包括用于可释放结合的释放衬垫（141）。

32. 发明申请

WO2011036596A1 LIGHT GUIDE, ILLUMINATION SYSTEM, BACKLIGHTING SYSTEM AND DISPLAY DEVICE 审中-公开
标题翻译：光导，照明系统，背光系统和显示装置
公开(公告)号：WO2011036596A1
公开(公告)日：2011-03-31
申请号：PCT/IB2010/054073
申请日：2010-09-09
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , PIJLMAN, Fetze , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN BAARDWIJK, Menno
发明人： PIJLMAN, Fetze , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN BAARDWIJK, Menno
IPC分类号： G02B6/00 , F21V8/00
CPC分类号： G02B6/0028 , G02B6/008 , G02B6/0088
摘要： The invention relates to a light guide (10) for illuminating a light output window (120) of an illumination system (100), the illumination system, a backlighting system (100) and a display device (200). The light guide comprises a first light guide part (10A) comprising a first light guide extension (70A) extending from a first edge wall (40A) of the first light guide part (10A), and comprises a second light guide part (10B) comprising a second light guide extension (70B) extending from a second edge wall (40B) of the second light guide part (10B), the first light guide extension (70A) being configured for positioning a first light input window (80A) at a side of the second light guide part (10B) facing a rear wall (30B) of the second light guide part (10B), the second light guide extension (70B) being configured for positioning a second light input window (80B) at a side of the first light guide part (10A) facing the rear wall (30A) of the first light guide part. An effect of the light guide according to the invention is that due to the configuration of the first light guide extension and the second light guide extension, the first light input window of the first light guide part is arranged behind the second light guide part, and the second light input window of the second light guide part is arranged behind the first light guide part.
摘要翻译：本发明涉及一种用于照明照明系统（100），照明系统，背光系统（100）和显示装置（200）的光输出窗口（120）的光导（10）。所述导光体包括第一导光部（10A），其包括从所述第一导光部（10A）的第一边缘壁（40A）延伸的第一导光延伸部（70A），所述第一导光部包括第二导光部（10B）包括从所述第二导光部分（10B）的第二边缘壁（40B）延伸的第二导光延伸部（70B），所述第一光导延伸部（70A）被配置用于将第一光输入窗口（80A）所述第二导光部（10B）的与所述第二导光部（10B）的后壁（30B）相对的一侧，所述第二导光体延伸部（70B）构成为将第二光输入窗（80B）的第一导光部分（10A）面向第一导光部分的后壁（30A）。根据本发明的光导的效果是，由于第一导光体延伸部和第二导光体延伸部的结构，第一导光部的第一光输入窗配置在第二导光部的后方，第二导光部的第二光输入窗设置在第一导光部的后方。

33. 发明申请

WO2011033428A2 OPTICAL ELEMENT 审中-公开
标题翻译：光学元件
公开(公告)号：WO2011033428A2
公开(公告)日：2011-03-24
申请号：PCT/IB2010/054065
申请日：2010-09-09
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , CORNELISSEN, Hugo, Johan , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN PIETERSON, Liesbeth
发明人： CORNELISSEN, Hugo, Johan , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN PIETERSON, Liesbeth
IPC分类号： G02B6/42 , F21V8/00 , G02B6/04
CPC分类号： G02B6/0006 , G02B6/001 , G02B6/0018 , G02B6/0023 , G02B6/0026 , G02B6/0031 , G02B6/0055 , G02B6/0076 , G02B6/04 , G02B6/4298 , G02F1/133555 , G02F1/133605
摘要： It is disclosed an optical element (200) wherein one or more light-emitting diodes, LEDs, and additional optics may be provided in an integrated solution that may relatively easily be assembled and maintained in a desired position relatively each other. The optical element (200) may enable one or more LEDs and additional optics to be provided in an integrated solution that is relatively thin and compact in comparison with known devices, such that light from one or more LEDs may be injected into a thin light guide (205, 206) such as an optical fiber, an optical fiber array, a ribbon-shaped light-guiding structure, etc.
摘要翻译：公开了一种光学元件（200），其中一个或多个发光二极管，LED和附加光学器件可以提供在可以相对容易地组装和维持在相对彼此的期望位置的整合解决方案中。光学元件（200）可以使一个或多个LED和附加光学器件提供在与已知器件相比较薄且紧凑的集成解决方案中，使得来自一个或多个LED的光可以被注入薄导光板（205,206），例如光纤，光纤阵列，带状导光结构等

34. 发明申请

WO2010143109A1 CONTRAST ENHANCING DEVICE FOR LIGHTING SYSTEMS 审中-公开
标题翻译：照明系统对比度增强装置
公开(公告)号：WO2010143109A1
公开(公告)日：2010-12-16
申请号：PCT/IB2010/052495
申请日：2010-06-04
申请人： KONINKLIJKE PHILIPS ELECTRONICS N.V. , CORNELISSEN, Hugo, Johan , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN PIETERSON, Liesbeth
发明人： CORNELISSEN, Hugo, Johan , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , VAN PIETERSON, Liesbeth
IPC分类号： G02B5/20
CPC分类号： G02B5/003 , A41D27/085 , G02B5/128
摘要： A contrast enhancing device (13) for arrangement in front of a lighting system (1) comprising a plurality of light-sources (11), the contrast enhancing device (13) having a first side for receiving light emitted by the light-sources (11) and a second side opposite the first side. The contrast enhancing device (13) comprises: a carrier sheet (15) exhibiting a first reflectance for light incident on the first side of the contrast enhancing device (13) and exhibiting a second reflectance being lower than the first reflectance for light incident on the second side of the contrast enhancing device; and a plurality of optically transparent optical elements (16a-e) embedded in the carrier sheet (15) in such a way that light is allowed to pass the contrast enhancing device (13) through the optical elements (16a-e). This allows for a higher absorption of the ambient light than of the useful light emanating from the light sources, whereby an improved optical contrast can be achieved.
摘要翻译：一种用于在包括多个光源（11）的照明系统（1）的前面配置的对比度增强装置（13），所述对比度增强装置（13）具有用于接收光源发射的光的第一侧 11）和与第一侧相对的第二侧。对比度增强装置（13）包括：载体片（15），其对入射在对比度增强装置（13）的第一侧上的光具有第一反射率，并且表现出比入射到对角线增强装置（13）的光的第一反射率低的第二反射率对比度增强装置的第二面; 以及以允许光通过对比度增强装置（13）通过光学元件（16a-e）的方式嵌入载体片（15）中的多个光学透明光学元件（16a-e）。这允许比从光源发出的有用光更高的环境光吸收，由此可以实现改善的光学对比度。

35. 发明申请

WO2009108049A1 DEVICE CONSTRUCTED AND ARRANGED TO GENERATE RADIATION, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：设备构造和安排生成辐射，光刻设备和设备制造方法
公开(公告)号：WO2009108049A1
公开(公告)日：2009-09-03
申请号：PCT/NL2009/050082
申请日：2009-02-23
申请人： ASML NETHERLANDS B.V. , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , SOER, Wouter Anthon
发明人： VAN HERPEN, Maarten Marinus Johannes Wilhelmus , SOER, Wouter Anthon
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： A device is constructed and arranged to generate radiation by using an electrical discharge through a gaseous medium. The device includes a first electrode and a second electrode (12a, 12b), and a liquid supply arranged to provide a liquid to a location in the device. The device is arranged to be electrically supplied with a voltage and to supply the voltage at least partially to the first electrode and the second electrode in order to allow the electrical discharge to be generated in an electrical fieldcreated by the voltage. The electrical discharge produces a radiating plasma. The device also includes a shield arranged between the discharge location (13) and a conducting part (11a) connected to the first electrode and/or the second electrode.
摘要翻译：一种器件被构造和布置成通过使用通过气体介质的放电来产生辐射。该装置包括第一电极和第二电极（12a，12b），以及液体供应装置，用于向装置中的一个位置提供液体。该器件被布置成电气供应电压，并且至少部分地将电压提供给第一电极和第二电极，以便允许在由电压产生的电场中产生放电。放电产生辐射等离子体。该装置还包括布置在放电位置（13）和连接到第一电极和/或第二电极的导电部分（11a）之间的屏蔽。

36. 发明申请

WO2009061192A1 RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER 审中-公开
标题翻译：辐射系统和方法，以及光谱滤光片
公开(公告)号：WO2009061192A1
公开(公告)日：2009-05-14
申请号：PCT/NL2008/050704
申请日：2008-11-07
申请人： ASML NETHERLANDS B.V. , SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
发明人： SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70575 , G03F7/70983 , G21K1/10 , G21K2201/061 , H05G2/003
摘要： A radation system (3) configured to generate a radiation beam (B). The system (3) has a chamber (3). The chamber (3) includes a radiation source (50) configured to generate radiation (B), and a radiation collector (70) configured to collect radiation (B) generated by the source (50), to transmit collected radiation to a radiation beam emission aperture (60). A spectral purity filter (80) enhances a spectral purity of the radiation (B) that is to be emitted via the aperture (60). The filter (80) is divided the chamber (3) into a high pressure region (Rl) and a low pressure region (R2).
摘要翻译：辐射系统（3），被配置为产生辐射束（B）。系统（3）具有腔室（3）。腔室（3）包括被配置为产生辐射（B）的辐射源（50）和被配置为收集由源（50）产生的辐射（B））的辐射收集器（70），以将收集的辐射传输到辐射束发射孔径（60）。光谱纯度滤光器（80）增强了经由孔径（60）发射的辐射（B）的光谱纯度。过滤器（80）将腔室（3）分成高压区域（R1）和低压区域（R2）。

37. 发明申请

WO2009014439A3 DEBRIS PREVENTION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：防破坏系统和平面设备
公开(公告)号：WO2009014439A3
公开(公告)日：2009-05-07
申请号：PCT/NL2008050502
申请日：2008-07-22
申请人： ASML NETHERLANDS BV , SOER WOUTER ANTHON , VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
发明人： SOER WOUTER ANTHON , VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
IPC分类号： G03F7/20 , B08B1/00
CPC分类号： G03F7/70925 , B08B1/00 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source (7) from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap (2) that is rotatable around an axis of rotation (3), and a, second foil trap (4) that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils (6) optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
摘要翻译：构建和布置了防碎片系统，以防止从辐射源（7）发出的碎片不被来自辐射源的辐射传播到光刻设备内或其中。碎片防止系统包括可围绕旋转轴线（3）旋转的第一箔片捕集器（2）和至少部分地包围第一箔片捕获器的第二箔片捕获器（4）。第二箔阱包括多个箔片（6），其相应于中心位置光学地开放，用于放置辐射源并且相应于垂直于旋转轴线的方向光学闭合。

38. 发明申请

WO2008044925A3 LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：WO2008044925A3
公开(公告)日：2009-03-05
申请号：PCT/NL2007050469
申请日：2007-09-25
申请人： ASML NETHERLANDS BV , ZEISS CARL SMT AG , VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS , BANINE VADIM YEVGENYEVICH , DE KUSTER JOHANNES PETERUS HENRICUS , MOORS JOHANNES HUBERTUS JOSEPHINA , STEVENS LUCAS HENRICUS JOHANNS , WOLSCHRIJN BASTIAAN THEODOOR , SIDELNIKOV YURII VICTOROVITCH , VAN DER VELDEN MARC HUBERTUS LORENZ , SOER WOUTER ANTHON , GIELISSEN KURT , STEIN THOMAS
发明人： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS , BANINE VADIM YEVGENYEVICH , DE KUSTER JOHANNES PETERUS HENRICUS , MOORS JOHANNES HUBERTUS JOSEPHINA , STEVENS LUCAS HENRICUS JOHANNES , WOLSCHRIJN BASTIAAN THEODOOR , SIDELNIKOV YURII VICTOROVITCH , VAN DER VELDEN MARC HUBERTUS LORENZ , SOER WOUTER ANTHON , GIELISSEN KURT , STEIN THOMAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译：公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。该装置包括第一辐射剂量检测器（10A）和第二辐射剂量检测器（10B），每个检测器包括二次电子发射表面（11），其被配置为接收辐射通量并由于接收到辐射而发射二次电子通量，相对于辐射传播方向观察到的相对于第二辐射剂量检测器位于上游的第一辐射剂量检测器和连接到每个检测器的仪表（13），以检测由二次电子产生的电流或电压从各个电子发射表面发射。

39. 发明申请

WO2008133506A1 EXTREME ULTRAVIOLET MICROSCOPE 审中-公开
标题翻译：极端超紫外线显微镜
公开(公告)号：WO2008133506A1
公开(公告)日：2008-11-06
申请号：PCT/NL2008/050238
申请日：2008-04-23
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim, Yevgenyevich , BLEEKER, Arno, Jan , IVANOV, Vladimir, Vitalevitch , KOSHELEV, Konstantin, Nikolaevitch , SCHUURMANS, Frank, Jeroen, Pieter , KRIVTSUN, Vladimir, Mihailovitch , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus
发明人： BANINE, Vadim, Yevgenyevich , BLEEKER, Arno, Jan , IVANOV, Vladimir, Vitalevitch , KOSHELEV, Konstantin, Nikolaevitch , SCHUURMANS, Frank, Jeroen, Pieter , KRIVTSUN, Vladimir, Mihailovitch , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus
IPC分类号： G21K7/00
CPC分类号： G21K7/00
摘要： An extreme ultraviolet (EUV) microscope configured to analyze a sample (5). The microscope includes a source (2) of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2 - 6 nm, and an optical system (3) constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating (6) from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in- phase reflection of at least a portion of the radiation in the range of about 2 - 6 nm.
摘要翻译：配置用于分析样品（5）的极紫外（EUV）显微镜。显微镜包括EUV辐射源（2），其被构造和布置成产生波长至少在约2-6nm范围内的EUV辐射;以及光学系统（3），被构造和布置成用 EUV辐射并从样品中收集辐射（6）。光学系统布置有至少一个反射镜，其包括多层结构，用于在约2-6nm的范围内的至少一部分辐射的同相反射。

40. 发明申请

WO2008079007A1 PATTERNING DEVICE, METHOD OF PROVIDING A PATTERNING DEVICE, PHOTOLITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案装置，提供图案装置的方法，光刻设备和装置制造方法
公开(公告)号：WO2008079007A1
公开(公告)日：2008-07-03
申请号：PCT/NL2007/050691
申请日：2007-12-21
申请人： ASML NETHERLANDS B.V. , SOER, Wouter Anthon , BANINE, Vadim Yevgenyevich , VAN HERPEN, Maarten Marinus Johannes Wilhelmus
发明人： SOER, Wouter Anthon , BANINE, Vadim Yevgenyevich , VAN HERPEN, Maarten Marinus Johannes Wilhelmus
IPC分类号： G03F1/14
CPC分类号： G03F7/70283 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/34 , G21K1/062 , G21K2201/067
摘要： A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.
摘要翻译：用于光刻设备的图案形成装置用于通过在从图案形成装置反射期间将辐射束赋予横截面图案来形成图案化的辐射束。图案形成装置包括相变材料层，其能够局部地经历诱发的结构相变为多个稳定和/或亚稳态中的相应的。此外，图案形成装置包括具有与相变材料层相邻的周期性排列的层的辐射反射结构。辐射反射结构不参与相位变化。通过局部改变相变材料的相位，整个结构的反射率被改变，例如由于相变材料层中的厚度变化导致反射光的不同分量的破坏性干扰或由于辐射反射结构的表面粗糙度变化。

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