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    • 37. 发明授权
    • Method of producing polishing pad
    • 抛光垫的生产方法
    • US07972396B2
    • 2011-07-05
    • US11859928
    • 2007-09-24
    • Chung-Chih FengI-Peng YaoYung-Chang Hung
    • Chung-Chih FengI-Peng YaoYung-Chang Hung
    • B24D3/34
    • B24D13/147B24B37/30B24D11/001
    • The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
    • 本发明涉及一种制造抛光垫的方法,包括以下步骤:(a)提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面,其中所述纤维包括芯和围绕所述芯的包层,并且所述包层包含疏水性聚合物; (b)用弹性体溶液浸渍基材的表面; (c)凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体和纤维之间形成多个第一连续孔; (d)使基材的表面平坦化; (e)用条件聚合物溶液浸渍在步骤(d)中获得的基材和弹性体的表面; 和(e)固化浸渍在基材表面和弹性体表面的状态聚合物,并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。