专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

WO2006104178A1 QUARTZ-TYPE GLASS AND PROCESS FOR ITS PRODUCTION 审中-公开
标题翻译：石墨型玻璃及其生产工艺
公开(公告)号：WO2006104178A1
公开(公告)日：2006-10-05
申请号：PCT/JP2006/306379
申请日：2006-03-22
申请人： ASAHI GLASS COMPANY, LIMITED , HAYASHI, Hideaki , KOIKE, Akio , KAWATA, Mitsuhiro , SUGIMOTO, Naoki , KIKUGAWA, Shinya , YAMADA, Kenji
发明人： HAYASHI, Hideaki , KOIKE, Akio , KAWATA, Mitsuhiro , SUGIMOTO, Naoki , KIKUGAWA, Shinya , YAMADA, Kenji
IPC分类号： C03C3/06 , C03B19/14 , G02B1/00 , H01L21/027
CPC分类号： C03C3/06 , C03B19/1415 , C03B19/1438 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2207/32 , C03B2207/34 , C03C23/0095 , C03C2201/24 , C03C2201/32 , C03C2201/3405 , C03C2201/3411 , C03C2201/3417 , C03C2201/40 , C03C2203/44 , C03C2203/54
摘要： To provide quartz-type glass for a microlithographic projection exposure apparatus, which contains at least 51 mass% of SiO 2 and which further contains at least one member selected from the group consisting of lanthanum, aluminum, hafnium, nitrogen, scandium, yttrium and zirconium. It is a material which is useful for an illumination system for a microlithographic projection exposure apparatus or as a projection object lens and has a refractive index at 248 nm larger than 1.508 of quartz glass and a refractive index at 193 nm larger than 1.560 of quartz glass and which can be small-sized.
摘要翻译：为了提供含有至少51质量％的SiO 2的微光刻投影曝光装置的石英型玻璃，还含有选自镧，铝，铪等的至少一种，氮，钪，钇和锆。它是一种用于微光刻投影曝光装置的照明系统或投影物镜并且具有大于1.508的石英玻璃的248nm的折射率和大于石英玻璃的1.560的193nm的折射率的材料并且可以是小尺寸的。

32. 发明申请

WO2005059972A2 SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER AND ITS PRODUCTION METHOD 审中-公开
标题翻译：光学会员合成石英玻璃及其制作方法
公开(公告)号：WO2005059972A2
公开(公告)日：2005-06-30
申请号：PCT/JP2004/019443
申请日：2004-12-17
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , AGATA, Noriyuki
发明人： IKUTA, Yoshiaki , AGATA, Noriyuki
IPC分类号： H01L21/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03B2207/36 , Y02P40/57
摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5 ~10¿14? defects/cm¿3? and at least 1 ~10¿13? defects/cm¿3?. The fluorine concentration is preferably at most 100 ppm.
摘要翻译：得到不含压实和稀释的用于光学构件的合成石英玻璃。用于光学构件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解的氧分子或还原型缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且在氧浓度范围内至多为5〜10×14×缺陷/ cm 3的含氧缺陷。至少1〜10〜13？缺陷/cm¿3?. 氟浓度优选为100ppm以下。

33. 发明申请

WO2004097063A2 METHOD FOR PRODUCING SILICON OXIDE FILM AND METHOD FOR PRODUCING OPTICAL MULTILAYER FILM 审中-公开
标题翻译：生产硅氧烷膜的方法和生产光学多层膜的方法
公开(公告)号：WO2004097063A2
公开(公告)日：2004-11-11
申请号：PCT/JP2004/005875
申请日：2004-04-23
申请人： ASAHI GLASS COMPANY, LIMITED , ASAHI GLASS CERAMICS, CO., LTD. , IKEDA, Toru , MASHIMO, Takahiro , SHIDOJI, Eiji , KAMIYAMA, Toshihisa , KATAYAMA, Yoshihito
发明人： IKEDA, Toru , MASHIMO, Takahiro , SHIDOJI, Eiji , KAMIYAMA, Toshihisa , KATAYAMA, Yoshihito
IPC分类号： C23C14/10
CPC分类号： G02B1/10 , C23C14/0042 , C23C14/0094 , C23C14/083 , C23C14/10
摘要： The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.
摘要翻译：本发明提供一种制造氧化硅膜的方法，由此可以以高沉积速率连续地形成具有均匀光学常数如折射率，吸收系数等的膜。一种氧化硅膜的制造方法，其包括通过使用包含碳原子数为6〜6的原子的硅与硅的溅射靶进行AC溅射而在基板上沉积氧化硅膜。在含有氧化性气体的气氛中，具有1〜1000kHz的频率的交流电。

34. 发明申请

WO2004089839A1 SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION 审中-公开
标题翻译：二氧化硅玻璃含有TIO2及其生产工艺
公开(公告)号：WO2004089839A1
公开(公告)日：2004-10-21
申请号：PCT/JP2004/004833
申请日：2004-04-02
申请人： ASAHI GLASS COMPANY LIMITED , IWAHASHI, Yasutomi, , KOIKE, Akio,
发明人： IWAHASHI, Yasutomi, , KOIKE, Akio,
IPC分类号： C03C3/06
CPC分类号： C03C4/0085 , C03C3/06 , C03C2201/23 , C03C2201/42
摘要： A silica glass containing TiO 2 , which has a fictive temperature of at most 1,200 °C, an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0± 200 ppb/ C from 0 to 100 °C.
摘要翻译：含有TiO 2的二氧化硅玻璃，其原始温度为至多1200℃，OH基浓度至多为600ppm，热膨胀系数为0±200ppb /℃，为0-100℃。

35. 发明申请

WO2004089838A1 SILICA GLASS CONTAINING TIO2 AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY 审中-公开
标题翻译：含有二氧化硅的二氧化硅玻璃和光学材料用于EUV光刻
公开(公告)号：WO2004089838A1
公开(公告)日：2004-10-21
申请号：PCT/JP2004/004829
申请日：2004-04-02
申请人： ASAHI GLASS COMPANY LIMITED , IWAHASHI, Yasutomi, , KOIKE, Akio,
发明人： IWAHASHI, Yasutomi, , KOIKE, Akio,
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1484 , C03B2201/42 , C03C4/0085 , C03C2201/42
摘要： A silica glass containing TiO 2 , characterized in that the fluctuation of the refractive index (Δn) is at most 2 ~10 -4 within an area of 30 mm ~ 30 mm in at least one plane. A silica glass containing TiO 2 , characterized in that the TiO 2 concentration is at least 1 mass%, and the striae pitch is at most 10 µm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO 2 , and the fluctuation of the refractive index (Δn) is at most 2 ~10 -4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO 2 , wherein the TiO 2 concentration is at least 1 mass%, and the difference between the maximum value and the minimum value of the TiO 2 concentration is at most 0.06 mass% in a plane perpendicular to the incident light direction.
摘要翻译：含有TiO 2的二氧化硅玻璃，其特征在于，在至少一个平面内，在30mm〜30mm的范围内，折射率（Deltan）的波动为2〜10 -4以下。含有TiO 2的二氧化硅玻璃，其特征在于，TiO 2浓度为1质量％以上，所述条纹间距为10μm以下。一种用于EUV光刻的光学材料，其特征在于它由含有二氧化钛的石英玻璃制成，并且在垂直于入射光方向的平面中折射率（Deltan）的波动为至多2〜10 -4。一种用于EUV光刻的光学材料，其特征在于，其由TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且TiO 2浓度的最大值和最小值之间的差为至多0.06 在垂直于入射光方向的平面中的质量％。

36. 发明申请

WO2003054974A1 COVER GLASS FOR A SOLAR BATTERY 审中-公开
标题翻译：太阳能电池盖玻璃
公开(公告)号：WO2003054974A1
公开(公告)日：2003-07-03
申请号：PCT/JP2002/013020
申请日：2002-12-12
申请人： ASAHI GLASS COMPANY, LIMITED , KAGEYAMA, Junichi , SATO, Kazuo , KAMBE, Mika
发明人： KAGEYAMA, Junichi , SATO, Kazuo , KAMBE, Mika
IPC分类号： H01L31/0236
CPC分类号： H01L31/0236 , C03B13/08 , H01L31/048 , H01L31/0488 , H01L31/18 , Y02B10/12 , Y02E10/50
摘要： A transparent substrate for a cover for a solar battery, which can increase the quantity of incident light entering into the solar battery module in daytime and throughout the year and/or can prevent effectively an environmental problem caused by the reflection of light at a light entering side of the module, a method for producing the transparent substrate and a solar battery module having such substrate, are presented. Hemispherical concave portions 40 are formed in a surface of light entering side of a cover glass almost over the entire surface wherein the ratio d/D of the depth d of the central portion of each concave portion to the radius D of the opening of the concave portion is from 0.10 to 0.50 and the proportion of area occupied by a flat portion where no concave portion 40 is formed in the surface of light entering side is not more than 40 %.
摘要翻译：一种用于太阳能电池盖的透明基板，其可以在白天和全年增加入射到太阳能电池模块的入射光的量，和/或可以有效地防止由光入射的光的反射引起的环境问题模块的一侧，制造透明基板的方法以及具有这种基板的太阳能电池模块。半球形凹部40形成在几乎在整个表面上的玻璃进入玻璃面侧的表面，其中每个凹部的中心部分的深度d与凹部的开口的半径D的比D / D 部分为0.10〜0.50，并且在进入光的表面中没有形成凹部40的平坦部所占的面积比例不大于40％。

37. 发明申请

WO2017079238A1 ISULATED CONDUIT INCLUDING A FLUOROPOLYMER COMPOSITION FOR USE AS A THERMAL INSULATION LAYER 审中-公开
标题翻译：包括含氟聚合物组合物的导电管用作隔热层
公开(公告)号：WO2017079238A1
公开(公告)日：2017-05-11
申请号：PCT/US2016/060039
申请日：2016-11-02
申请人： AGC CHEMICALS AMERICAS INC. , ASAHI GLASS COMPANY, LIMITED
发明人： YODOGAWA, Masahide , LAVANGA, David, J. , MURPHY, Dennis, G. , IRUYA, Ken
IPC分类号： B32B27/32 , B32B27/38 , B32B27/40 , B32B1/08 , C08L27/18
CPC分类号： C08L27/18 , B32B1/08 , B32B5/18 , B32B5/32 , B32B7/12 , B32B25/042 , B32B25/08 , B32B25/16 , B32B25/18 , B32B25/20 , B32B27/065 , B32B27/08 , B32B27/32 , B32B27/322 , B32B27/325 , B32B27/38 , B32B27/40 , B32B2266/0228 , B32B2270/00 , B32B2307/302 , B32B2307/304 , B32B2307/308 , B32B2307/752 , B32B2597/00 , C08L2205/02 , C08L2205/025 , C09D127/18 , C08L27/12
摘要： An insulated conduit for use in offshore, deep water environments includes a pipe and a fluoropolymer composition. The pipe has an outer surface with the fluoropolymer composition disposed about the outer surface of the pipe for providing a thermal insulation layer. The fluoropolymer composition includes a fluoroplastic polymer present in an amount of at least 50 parts by weight based on 100 parts by weight of the fluoropolymer composition. The fluoropolymer composition also includes a fluoroelastomer present in an amount of a fluoroelastomer present in an amount of from about 20 to about 50 parts by weight based on 100 parts by weight of the fluoropolymer composition. The fluoropolymer composition has a thermal conductivity less than about 0.20W/mK at 205°C.
摘要翻译：用于近海深水环境的绝缘导管包括管道和含氟聚合物组合物。该管具有外表面，氟聚合物组合物围绕管道的外表面设置，用于提供绝热层。含氟聚合物组合物包含基于100重量份的含氟聚合物组合物以至少50重量份的量存在的氟塑料聚合物。基于100重量份的含氟聚合物组合物，含氟聚合物组合物还包括以一定量的含氟弹性体存在的含氟弹性体，其含量为约20至约50重量份。含氟聚合物组合物在205℃具有小于约0.20W / mK的热导率。

38. 发明申请

WO2015049888A1 STRENGTHENED GLASS AND METHODS FOR MAKING THE SAME BY USING DIFFERENTIAL CHEMISTRY 审中-公开
标题翻译：强化玻璃及其制造方法使用差异化学
公开(公告)号：WO2015049888A1
公开(公告)日：2015-04-09
申请号：PCT/JP2014/060352
申请日：2014-04-03
申请人： ASAHI GLASS COMPANY, LIMITED
发明人： KRESKI, Patrick Kenneth
IPC分类号： C03C21/00
CPC分类号： C03C21/002 , Y10T428/315
摘要： Provided is a method for strengthening a substrate by an exchange medium and a modified exchange medium, the substrate including a treatment-rich volume and a treatment- poor volume; the method containing: applying the modified exchange medium to a surface of the treatment-rich volume; and applying the exchange medium to a surface of the treatment- poor volume; in which the exchange medium including a composition including an invading alkali ion and the composition is associated with an ion exchange rate of the invading alkali ion; the modified exchange medium including a modified composition including invading alkali ion and the modified composition is associated with a modified ion exchange rate of the invading alkali ion, and in which the modified ion exchange rate is slower than the ion exchange rate.
摘要翻译：本发明提供一种通过交换介质和改性交换介质强化基板的方法，所述基板包括处理量大，体积小，所述方法包含：将修饰的交换介质施加到处理丰富体积的表面; 并将交换介质施加到处理不良体积的表面; 其中包括含有入侵碱离子和组合物的组合物的交换介质与入侵碱离子的离子交换速率相关联; 包括含有侵入碱离子的改性组合物和改性组合物的改性交换介质与入侵碱离子的改性离子交换速率相关，其中改性离子交换速率低于离子交换速率。

39. 发明申请

WO2014097621A1 PAIR OF ELECTRODES FOR DBD PLASMA PROCESS 审中-公开
标题翻译： DBD等离子体处理电极对
公开(公告)号：WO2014097621A1
公开(公告)日：2014-06-26
申请号：PCT/JP2013/007433
申请日：2013-12-18
申请人： ASAHI GLASS COMPANY LIMITED
发明人： TIXHON, M. Eric , MICHEL, M. Eric , LECLERCQ, M. Joseph
IPC分类号： C23C16/40 , C03C17/00 , C23C16/509 , C23C16/54 , H01J37/32
CPC分类号： H01J37/32348 , C03C17/002 , C03C17/245 , C03C2217/213 , C03C2218/15 , C03C2218/153 , C23C16/402 , C23C16/509 , C23C16/545 , H01J37/32568 , H01J37/32715 , H01J2237/332
摘要： The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (l ce ) and a length (L ce ) that are respectively smaller than the width (l e ) and the length (L e ) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.
摘要翻译：本发明涉及一种用于通过能够在大气压下产生冷丝状等离子体的电介质阻挡放电来对衬底（1）进行表面处理的器件（10），其包括反应室，其中定位有用于支撑和/ 或移动基板（2）和至少两个平行布置的电极（3,4），用于支撑和/或移动基板（2）的装置的两侧，其中一个电极（3）将被带入到高电压和对电极（4）接地。其特征在于，对电极（4）的宽度（lce）和长度（Lce）分别小于电极（3）的宽度（le）和长度（Le），因此，相对电极（4）被定位成使其被包围在包含对电极（4）的平面上的电极（3）的正交突起（5）中。本发明还涉及要求这种装置的表面处理方法，特别是用于层沉积的表面处理方法。

40. 发明申请

WO2014097620A1 IGNITION PROCESS AND DEVICE FOR PAIRS OF DBD ELECTRODES 审中-公开
标题翻译：点火工艺和DBD电极对的装置
公开(公告)号：WO2014097620A1
公开(公告)日：2014-06-26
申请号：PCT/JP2013/007432
申请日：2013-12-18
申请人： ASAHI GLASS COMPANY LIMITED
发明人： TIXHON, M. Eric , MICHEL, M. Eric , LECLERCQ, M. Joseph
IPC分类号： H01J37/32
CPC分类号： H01J37/32532 , C23C16/455 , C23C16/50 , H01J37/32174 , H01J37/32348
摘要： A process for surface treatment by dielectric barrier discharge (DBD) comprising the following operations: - feeding or passing a substrate into a reaction chamber (2), in which at least two electrodes (10, 12) and at least one counter-electrode (13, 14, 15) are positioned, wherein at least one dielectric barrier (16) is placed between these at least two electrodes (10, 12) and this at least one counter-electrode (13, 14, 15); - switching an inductance (L1, L2) in series with each of said electrodes (10, 12), wherein said inductances (L1, L2) are wound onto a common magnetic core in such a manner that the resulting magnetic flux of the two inductances is zero when identical currents circulate in the two electrodes (10, 12); - generating a high-frequency electric voltage of such a value that it causes the generation of a plasma between the at least two electrodes (10, 12) and the at least one counter-electrode (13, 14, 15); - feeding into the reaction chamber a mixture, the composition of which is such that on contact with the plasma, it breaks down and generates substances able to react with the surface of the substrate (4);
摘要翻译：一种通过电介质阻挡放电（DBD）进行表面处理的方法，包括以下操作：将基底馈送或通过反应室（2），其中至少两个电极（10,12）和至少一个对电极 13,14,15）被定位，其中至少一个电介质阻挡层（16）被放置在这些至少两个电极（10,12）和该至少一个对电极（13,14,15）之间。 - 与每个所述电极（10,12）串联地切换电感（L1，L2），其中所述电感（L1，L2）以这样的方式缠绕到公共磁芯上，使得所得到的两个电感当相同的电流在两个电极（10,12）中循环时为零; - 产生这样一个值的高频电压，使其在所述至少两个电极（10,12）和所述至少一个对电极（13,14,15）之间产生等离子体; - 将反应室的组成物与等离子体接触，分解并产生能够与衬底（4）的表面反应的物质;

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式