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21. 发明专利

NL9000822A 未知
公开(公告)号：NL9000822A
公开(公告)日：1991-11-01
申请号：NL9000822
申请日：1990-04-09
申请人： PHILIPS NV
IPC分类号： H01J27/22 , H01J37/147 , H01J37/30 , C23C14/48 , H01J37/317 , H01L21/265
摘要： A low-energetic charged particle beam, involving only a slight space charge effect, can be obtained by high-frequency deflection of a charged particle beam before deceleration. Using a deceleration element provided with curved surfaces and a slit-shaped aperture, a focusing effect is obtained so that the charged particle beam is imaged along a linear path on a target surface. For implantation of a semiconductor substrate, a uniform and shallow implantation can be achieved at adequate speed by means of a low-energetic ion beam obtained in the above manner.

22. 发明专利

GB1510203A ION SOURCE 未知
公开(公告)号：GB1510203A
公开(公告)日：1978-05-10
申请号：GB2659975
申请日：1975-06-23
申请人： SHARP KK
IPC分类号： H01J27/02 , H01J27/22 , H01J3/04
摘要： 1510203 Ion sources SHARP KK 23 June 1975 [21 June 1974 22 Oct 1974(2)] 26599/75 Heading H1D An ion source comprises a cathode 42 through which a discharge gas is introduced and an anode 43 of spiral construction, an electric field being established in use between the anode and cathode and a magnetic field being produced by current flow through the anode, the two fields being orthogonal thereby dispensing with the usual surrounding magnetic coil. An alternative cathode shape is a planar spiral interleaved with a planar spiral anode with a cathode current direction to provide a further magnetic field in the same direction as that caused by the anode current, Figs. 1 and 2 (not shown). In Fig. 3 (not shown) a similar arrangement of interleaved anode and cathode spirals are in the form of a constricted cylinder. In Fig. 4 (not shown) anode and cathode segments are arranged alternately and external connecting wires provide a spiral configuration. In Fig. 5 (not shown) a stack of planar spiral anode-cathode structures is used. In Fig. 6 (not shown) a plurality of anode-cathode structures is arranged over an imaginary curved surface to provide high beam intensity. An extraction and focussing electrode comprising a helically wound wire to which a potential is applied and through which a current passes having a cylindrical portion and a conical portion adjacent the exit aperture of the ion source is described with reference to Fig. 8 (not shown). Additional excitation may be provided by microwave or laser radiation enabling cyclotron resonance of electrons emitted from the cathode to be achieved.

23. 发明申请

WO02078036A3 DEVICE FOR GENERATING AN ION BEAM 审中-公开
标题翻译：用于产生离子束的装置
公开(公告)号：WO02078036A3
公开(公告)日：2002-11-14
申请号：PCT/FR0201041
申请日：2002-03-26
申请人： CENTRE NAT RECH SCIENT , GIERAK JACQUES , LAGADEC YVON , SEPTIER ALBERT
发明人： GIERAK JACQUES , LAGADEC YVON , SEPTIER ALBERT
IPC分类号： H01J27/26 , H01J27/02 , H01J27/22 , H01J37/08 , H01J37/317
CPC分类号： H01J27/26 , B82Y30/00 , H01J27/022 , H01J27/22 , H01J37/08 , H01J37/09 , H01J37/3007 , H01J37/3045 , H01J37/3056 , H01J2237/024 , H01J2237/0805 , H01J2237/1501 , H01J2237/1502 , H01J2237/30433 , H01J2237/3174
摘要： The invention relates to a device for generating an ion beam. The inventive device comprises an ion source (2), a means (6) for extracting ions emitted by said source, a means (8) for accelerating ions thus extracted, a means (34) for selecting ions thus accelerated and an electrostatic optical system (10) that is intended to focus the ions thus selected along a first axis (Z1). Said device also comprises a means (F) for varying the distance (D) between the ion source and the ion extraction means, said distance being included along a second axis (Z) which is parallel to the first axis and which constitutes the axis of the beam of ions (14) emitted by the source. The invention is particularly suitable for the production of nano-structures.
摘要翻译：本发明涉及一种用于产生离子束的装置。本发明的装置包括离子源（2），用于提取由所述源发射的离子的装置（6），用于加速如此提取的离子的装置（8），用于选择如此加速的离子的装置（34）和静电光学系统（10），其旨在使沿着第一轴线（Z1）选择的离子聚焦。所述装置还包括用于改变离子源和离子提取装置之间的距离（D）的装置（F），所述距离沿着平行于第一轴线的第二轴线（Z）包括，并且构成由源发射的离子束（14）。本发明特别适用于纳米结构的生产。

24. 发明申请

WO1991006969A1 METAL-ION SOURCE AND PROCESS FOR THE GENERATION OF METAL IONS 审中-公开
标题翻译：金属离子的金属离子源和方法
公开(公告)号：WO1991006969A1
公开(公告)日：1991-05-16
申请号：PCT/DE1990000666
申请日：1990-08-31
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , KLUGE, Andreas , NELLE, Peter
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： H01J27/22
CPC分类号： H01J27/22 , H01J37/08 , H01J2237/081 , H01J2237/082 , H01J2237/31701
摘要： In order to simplify the structure of a metal-ion source, in particular a source for the implantation of low doses of non-volatile metals in semiconductor wafers, the invention calls for the metal-ion source to include an electrically-heated thermionic cathode in the form of a hot wire inside an ion chamber (1a), the hot wire (3) being located close to an element (6) made of the metal to be ionized and being at substantially the same potential.

25. 发明申请

WO2004057643A3 LIQUID-METAL ION SOURCE 审中-公开
标题翻译：液态金属离子源
公开(公告)号：WO2004057643A3
公开(公告)日：2005-07-14
申请号：PCT/AT0300370
申请日：2003-12-17
申请人： ARC SEIBERSDORF RES GMBH , TAJMAR MARTIN , SEMERAD ERNST
发明人： TAJMAR MARTIN , SEMERAD ERNST
IPC分类号： F03H1/00 , H01J27/22 , H01J27/26
CPC分类号： H01J27/26 , F03H1/005
摘要： The invention relates to a liquid-metal ion source comprising an electro-conductive housing (2) which is preferably made of metal and provided with a hollow space (4) for liquid or fusable metal (3), preferably indium, or a metal alloy. The hollow space (4) is connected to a capillary passage (5b) which extends through an emission body (5) protruding from the wall of a housing (2a). According to said invention, the capillary passage (5b) has a circular cross section whose diameter (rc) ranges from 1 to 100 µm, preferably from 3 to 10µm, at the level of the opening thereof (5a) in the emission body (5).
摘要翻译：本发明涉及一种液体金属离子源包括导电外壳（2），优选金属的，具有腔体（4），用于接收液体或可液化的金属（3），优选铟，或金属合金，其中，所述腔（4 ）（与由一个突出本身（由壳体壁2a）发射体5）穿过其延伸的毛细管通道（5b）的连通。根据本发明，它提供了具有在其发射极体（5）开口（5a）的一个基本为圆形的横截面的毛细管通道（5b）的直径（RC）1-100微米，优选3-10微米，具有，

26. 发明申请

WO2005050694A2 METAL ION EMISSION DEVICE AND PROCESS FOR PRODUCING THE SAME, ION BEAM IRRADIATION DEVICE, PROCESSING APPARATUS AND ANALYZING APPARATUS PROVIDED WITH EMISSION DEVICE 审中-公开
标题翻译：金属离子发射装置及其制造方法，离子束辐射装置，处理装置和分析装置的发射装置
公开(公告)号：WO2005050694A2
公开(公告)日：2005-06-02
申请号：PCT/JP2004017330
申请日：2004-11-16
申请人： CANON KK , OHTSUKA MITSURU
发明人： OHTSUKA MITSURU
IPC分类号： G01N23/225 , G21K1/00 , G21K5/04 , H01J9/02 , H01J27/22 , H01J27/26 , H01J37/08 , H01J37/252 , H01J37/317
CPC分类号： B82Y10/00 , H01J27/26 , H01J37/08 , H01J2237/0805
摘要： A metal ion emission device for emitting a metal ion by applying voltage to a molten liquid metal, characterized inthat the device for emitting a metal ion comprises a needle-like part having holes in which the liquid metal can be moved, and the needle-like part has a first opening for supplying the liquid metal to the holes and a second opening for emitting the liquid metal as a metal ion.
摘要翻译：一种用于通过向熔融液体金属施加电压而发射金属离子的金属离子发射装置，其特征在于，用于发射金属离子的装置包括具有可移动液体金属的孔的针状部分，并且针状部分具有用于将液体金属供应到孔的第一开口和用于发射作为金属离子的液态金属的第二开口。

27. 发明专利

AT450878T 未知
公开(公告)号：AT450878T
公开(公告)日：2009-12-15
申请号：AT04001306
申请日：2004-01-22
申请人： GSI HELMHOLTZZENTRUM SCHWERIONENFORSCHUNG GMBH
发明人： MUELLER MICHAEL , JANIK JAN
IPC分类号： H01J27/04 , H01J27/18 , H01J27/20 , H01J27/22 , H01J37/08 , H01J41/04 , H01J41/10

28. 发明专利

AT500917B1 未知
公开(公告)号：AT500917B1
公开(公告)日：2006-07-15
申请号：AT12332004
申请日：2004-07-20
申请人： ARC SEIBERSDORF RES GMBH
IPC分类号： H01J27/22 , H01J37/08 , H01J37/30

29. 发明专利

DE202005020746U1 Glow discharge source for analysis of solid sample by means of glow discharge has anode and cathode and by means of direct and indirect cooling of sample and cooling agent provide at least one peltier-element 未知
公开(公告)号：DE202005020746U1
公开(公告)日：2006-06-22
申请号：DE202005020746
申请日：2005-01-26
申请人： THERMO ELECTRON BREMEN GMBH
IPC分类号： H01J49/10 , G01N27/62 , H01J27/22
摘要： The glow discharge source (10) has anode (11) and cathode (12) and by means of direct and indirect cooling of a sample (16) and cooling agent provide at least one peltier-element (27). The peltier-element is arranged between node and cathode and in each case one of the two parts cooled and other part warmed up.

30. 发明专利

DE10057182A1 Monitoring pulsed metal ion source involves evaluating current and voltage signals forming high voltage pulse in sputter pulser to logically detect one of two possible sputter process states 未知
公开(公告)号：DE10057182A1
公开(公告)日：2002-05-29
申请号：DE10057182
申请日：2000-11-17
申请人： SCHWERIONENFORSCH GMBH
发明人： KHAOULI MUNIR , MUELLER MICHAEL
IPC分类号： H01J27/22 , H01J37/08
摘要： The method involves detecting the current and voltage signals forming the high voltage pulse in a sputter pulser and feeding them to a monitoring device or watchdog in order to logically detect one of two possible operating states of the sputter process in the ion source, that is normal operation, or no short circuit, and abnormal operation, or short circuit. Independent claims are also included for the following: an electronic device for monitoring a pulsed metal ion source

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