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    • 21. 发明授权
    • Method of making a variable-capacitance diode device
    • 制造变容二极管器件的方法
    • US4868134A
    • 1989-09-19
    • US233064
    • 1988-08-17
    • Takeshi Kasahara
    • Takeshi Kasahara
    • H01L21/329H01L29/36H01L29/93
    • H01L29/66174H01L29/36H01L29/93Y10S148/171Y10S438/919
    • A method of making a variable-capacitance diode device including semiconductor layer a first conductivity type in which the impurity concentration decreases with increasing depth from surface of a PN junction. The semiconductor layer of the first conductivity type is formed by diffusing an impurity element of the first conductivity type in a semiconductor substrate with a high degree of concentration. Thereafter, a semiconductor layer of a second conductivity type is formed which has such an impurity concentration profile that the concentration of impurity element of the second conductivity type is lower than the impurity concentration of said semiconductor layer of the first conductivity type formed in said semiconductor substrate and at a predetermined depth, the concentration of the second conductivity type impurity element is substantially equal or close to the concentration of the first conductivity type impurity element. Subsequent to the formation of the first conductivity type semiconductor layer, an impurity element of the second conductivity type is diffused so as to define said PN junction with said first conductivity type semiconductor layer.
    • 一种制造变容二极管器件的方法,该器件包括第一导电类型的半导体层,其中杂质浓度随着PN结表面的深度增加而减小。 第一导电类型的半导体层通过在半导体衬底中以高浓度的浓度扩散第一导电类型的杂质元素而形成。 此后,形成第二导电类型的半导体层,其具有这样的杂质浓度分布,使得第二导电类型的杂质元素的浓度低于形成在所述半导体衬底中的所述第一导电类型的所述半导体层的杂质浓度 并且在预定深度,第二导电型杂质元素的浓度基本上等于或接近于第一导电型杂质元素的浓度。 在形成第一导电类型半导体层之后,第二导电类型的杂质元素被扩散以便与所述第一导电类型半导体层限定所述PN结。
    • 23. 发明授权
    • Diode
    • 二极管
    • US06479840B2
    • 2002-11-12
    • US09800540
    • 2001-03-07
    • Takeshi KasaharaShinichi Shigematsu
    • Takeshi KasaharaShinichi Shigematsu
    • H01L2988
    • H01L29/402H01L24/05H01L29/868H01L2224/04042H01L2224/48453H01L2224/48463H01L2924/12036H01L2924/00
    • Disclosed is an inventive diode which can reduce a stray capacity to improve various characteristics thereof, in which a dielectric layer, a conductive layer and a second dielectric layer are respectively formed by deposition in this order on an upper face of a semiconductor substrate excluding a central portion of an exposed surface of a P-type region. Then, an anode side electrode is formed extending from the exposed surface of the P-type region to the upper face of the second dielectric layer, and is electrically connected with the P-type region. Herein, the conductive layer is formed such that it is isolated from the electrode by the second dielectric layer, is connected with the semiconductor substrate upper face in a location where the dielectric layer has not been formed, and partially resides in a location sandwiched between the electrode and the semiconductor substrate. Such configuration could prevent a depletion layer from being generated in the vicinity of a surface of a higher resistivity region lying under the conductive region. Further, according to such configuration, a stray capacity between the electrode and the semiconductor substrate could be made lower than the capacity value generated between the electrode and the conductive layer.
    • 公开了一种本发明的二极管,其可以降低杂散能力以改善其各种特性,其中介电层,导电层和第二介电层分别通过在半导体衬底的上表面上依次沉积而形成,不包括中心 P型区域的露出表面的一部分。 然后,阳极侧电极形成为从P型区域的露出面延伸到第二介电层的上表面,并与P型区域电连接。 这里,导电层形成为通过第二介电层与电极隔离,在未形成电介质层的位置与半导体基板上表面连接,部分位于夹在 电极和半导体衬底。 这种构造可以防止在位于导电区域下方的较高电阻率区域的表面附近产生耗尽层。 此外,根据这样的结构,可以使电极和半导体衬底之间的杂散电容低于在电极和导电层之间产生的电容值。
    • 28. 发明授权
    • Variable-capacitance diode device
    • 变容二极管器件
    • US4954850A
    • 1990-09-04
    • US231714
    • 1988-08-12
    • Takeshi Kasahara
    • Takeshi Kasahara
    • H01L29/36H01L29/93
    • H01L29/36H01L29/93
    • In a variable-capacitance diode device consisting of a PN junction, and a semiconductor layer of a first conductivity type, the impurity concentration of which decreases as the depth from the PN junction increases, the semiconductor layer of the first conductivity type is arranged to include, except in the vicinity of the PN junction, at least one such point that the following relationship holds true:Ai.ltoreq.Ai+1 (i=1, 2, . . . , n)where Ai represents impurity concentration of said semiconductor layer of the first conductivity type at a distance Xi as viewed depth-wise of the PN junction.
    • 在由PN结组成的变容二极管器件和第一导电类型的半导体层中,其杂质浓度随着PN结的深度增加而减小,第一导电类型的半导体层被布置为包括 除了在PN结附近,至少有一个这样的点,以下关系成立:Ai = i + 1(i = 1,2,...,n)其中Ai表示所述半导体的杂质浓度 在PN结的深度方向上以距离Xi的第一导电类型的层。