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    • 22. 发明授权
    • Method of fabricating inkjet print heads
    • 制造喷墨打印头的方法
    • US07416675B2
    • 2008-08-26
    • US11453012
    • 2006-06-15
    • Dong-sik ShimHyung ChoiYong-seop Yoon
    • Dong-sik ShimHyung ChoiYong-seop Yoon
    • G01D15/00
    • B41J2/1603B41J2/1626B41J2/1635B41J2/1639B41J2/1643
    • A method of fabricating inkjet print heads usable in an ink jet printer. The method of fabricating ink jet print heads includes preparing a plurality of ink jet print heads on a wafer while forming sub sidewalls around the ink jet print heads when the ink jet print heads are being prepared, attaching protection films onto the sub sidewalls of the wafer and the ink jet print heads, and dicing the ink jet print heads and detaching the individual ink jet print heads from the wafer. In the method, the ink jet print heads are diced in a wafer unit. Particularly, connect pads of the ink jet print heads can be prevented from being contaminated by the protection films.
    • 一种制造可用于喷墨打印机的喷墨打印头的方法。 制造喷墨打印头的方法包括:当准备喷墨打印头时,在晶片上准备多个喷墨打印头,同时在喷墨打印头周围形成副侧壁,将保护膜附着在晶片的子侧壁上 和喷墨打印头,并且对喷墨打印头进行切割并将各个喷墨打印头从晶片上分离出来。 在该方法中,喷墨打印头在晶片单元中切割。 特别地,可以防止喷墨打印头的连接垫被保护膜污染。
    • 29. 发明申请
    • Silicon-insulator-silicon structure and method for fabricating the same
    • 硅绝缘体硅结构及其制造方法
    • US20060060847A1
    • 2006-03-23
    • US11228225
    • 2005-09-19
    • Dong-sik Shim
    • Dong-sik Shim
    • H01L29/06H01L21/461
    • H01L21/7624H01L21/3065
    • A silicon-insulator-silicon structure with an insulator having a plurality of openings and a method for fabricating the same are provided. The silicon-insulator-silicon structure includes a lower silicon layer; an insulator formed on the lower silicon layer and having a plurality of openings; and an upper silicon layer formed on the insulator and etched at its predetermined region, wherein the opening of the insulator allows a material used for etching the upper silicon layer at its predetermined region, to move to the lower silicon layer. Accordingly, the silicon-insulator-silicon structure can provide the opening in the insulator, thereby not only preventing the upper silicon layer from being notched when the upper silicon layer is etched, but also relieving the stress of the silicon-insulator-silicon structure.
    • 提供了具有多个开口的绝缘体的硅 - 绝缘体 - 硅结构及其制造方法。 硅绝缘体硅结构包括下硅层; 形成在下硅层上并具有多个开口的绝缘体; 以及形成在绝缘体上并在其预定区域被蚀刻的上硅层,其中绝缘体的开口允许用于在其预定区域蚀刻上硅层的材料移动到下硅层。 因此,硅 - 绝缘体 - 硅结构可以在绝缘体中提供开口,从而不仅防止了上硅层被蚀刻时上硅层被切口,而且还缓解了硅 - 绝缘体 - 硅结构的应力。