专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

US20090161083A1 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US20090161083A1
公开(公告)日：2009-06-25
申请号：US12292961
申请日：2008-12-01
申请人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
发明人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.

22. 发明申请

US20050133727A1 Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method 失效
标题翻译：用于检测光学部件的辐射通量和污染的组件，包括这种组件的光刻设备和器件制造方法
公开(公告)号：US20050133727A1
公开(公告)日：2005-06-23
申请号：US10740829
申请日：2003-12-22
申请人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
发明人： Vadim Banine , Levinus Bakker , Johannes Hubertus Moors , Lucas Henricus Johannes Stevens , Yurii Sidelnikov , Marcel Mathijs Dierichs , Marius Ravensbergen
IPC分类号： G03F7/20 , H01J3/14
CPC分类号： G03F7/70916 , G03F7/7085
摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
摘要翻译：用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号辐射通量和部件污染之一。仪表被配置为测量检测器信号。检测器包括至少一根线。

23. 发明申请

US20090225289A1 LITHOGRAPHIC APPARATUS AND METHODS 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20090225289A1
公开(公告)日：2009-09-10
申请号：US12388230
申请日：2009-02-18
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation passes through the plate. In an embodiment, the member has a through hole in it through which the beam passes.
摘要翻译：描述了一种浸没式光刻设备，其中元件设置在基板表面和基板台的上方。浸没液体设置在基板台与基板和构件之间。在一个实施例中，辐射束穿过板。在一个实施例中，构件在其中具有通孔，梁通过该通孔。

24. 发明授权

US09304077B2 Inspection apparatus and method 有权
标题翻译：检验仪器及方法
公开(公告)号：US09304077B2
公开(公告)日：2016-04-05
申请号：US13166384
申请日：2011-06-22
申请人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
发明人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
IPC分类号： G01N21/00 , G01N21/17 , G01N21/956
CPC分类号： G01N21/1717 , G01N21/00 , G01N21/95623
摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.
摘要翻译：通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。幽灵反射回到瞳孔平面上的相同点。幽灵反射不影响瞳孔平面的非照明区域中的信号。照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。该目的被布置为用电磁辐射束照射基板。照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

25. 发明授权

US08149379B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08149379B2
公开(公告)日：2012-04-03
申请号：US12292961
申请日：2008-12-01
申请人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
发明人： Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03B27/52 , G03F7/70341
摘要： The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
摘要翻译：公开了使用电润湿来控制浸没式光刻设备中浸没液体的行为。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式