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21. 发明授权

US08628858B2 Silicone rubber composition for optical sheet, and optical sheet 失效
标题翻译：光学片用硅橡胶组合物和光学片
公开(公告)号：US08628858B2
公开(公告)日：2014-01-14
申请号：US13338396
申请日：2011-12-28
申请人： Minoru Igarashi , Tsutomu Nakamura , Atsuo Ito , Tomoyoshi Furihata , Hyung-Bae Kim
发明人： Minoru Igarashi , Tsutomu Nakamura , Atsuo Ito , Tomoyoshi Furihata , Hyung-Bae Kim
IPC分类号： B32B9/04
CPC分类号： C08K3/36 , C08K5/5419 , C08K9/06 , Y02E10/52 , Y10T428/31663 , C08L83/04
摘要： Disclosed is a millable type silicone rubber composition including as an essential components: (A) 100 parts by weight of an organopolysiloxane represented by the following average compositional formula (I) and having a polymerization degree of at least 100; R1aSiO(4-a)/2 (I) wherein R1 are, identical or different, unsubstituted or substituted monovalent hydrocarbon groups, and a is a positive number of 1.95 to 2.05; (B) 70 to 150 parts by weight of fumed silica having a specific surface area of more than 200 m2/g; (C) 0.1 to 30 parts by weight of an organohydrogenpolysiloxane having at least two hydrogen atoms bonded to silicon atoms in one molecule; and (D) 0.1 to 10 parts by weight of a hydrosilylation reaction catalyst.
摘要翻译：公开了一种可粉碎型硅橡胶组合物，其包含作为必要成分的（A）100重量份由以下平均组成式（I）表示的聚合度为至少100的有机聚硅氧烷; R1aSiO（4-a）/ 2（I）其中R1是相同或不同的未取代或取代的一价烃基，a是1.95〜2.05的正数; （B）70〜150重量份比表面积大于200m 2 / g的热解法二氧化硅; （C）0.1〜30重量份在1分子中具有与硅原子键合的氢原子中的至少2个氢原子的有机氢聚硅氧烷; 和（D）0.1〜10重量份的氢化硅烷化反应催化剂。

22. 发明授权

US06312869B1 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US06312869B1
公开(公告)日：2001-11-06
申请号：US09592419
申请日：2000-06-12
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C08F8/00 , C08F2810/20 , C08F2810/30 , G03F7/0045 , Y10S430/106 , C08F112/14
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

23. 发明授权

US5523370A Poly(para-T-butoxycarbonyloxystyrene) and method of making 失效
标题翻译：聚（对 - 叔丁氧基羰氧基苯乙烯）及其制备方法
公开(公告)号：US5523370A
公开(公告)日：1996-06-04
申请号：US420798
申请日：1995-04-12
申请人： Osamu Watanabe , Toru Nakanishi , Tomoyoshi Furihata , Motoyuki Yamada , Fujio Yagihashi
发明人： Osamu Watanabe , Toru Nakanishi , Tomoyoshi Furihata , Motoyuki Yamada , Fujio Yagihashi
IPC分类号： C08F12/00 , C08F12/22 , C08F18/16
CPC分类号： C08F12/22
摘要： Provided is a poly(para-t-butoxycarbonyloxystyrene) having recurring units of the formula: ##STR1## which is prepared by anionic polymerization of para-t-butoxycarbonyloxystyrene. The polymer is of a controlled molecular weight and a narrow molecular weight distribution and has a high degree of resolution and development, meeting the requirements of resist materials. The method allows for simple preparation of such polymers.
摘要翻译：提供具有下式的重复单元的聚（对叔丁氧基羰氧基苯乙烯）：其通过对叔丁氧羰基氧基苯乙烯的阴离子聚合制备。该聚合物具有受控的分子量和窄的分子量分布，并且具有高分辨率和显影性，满足抗蚀剂材料的要求。该方法允许简单制备这种聚合物。

24. 发明申请

US20140014182A1 SOLAR CELL MODULE AND METHOD FOR MANUFACTURING SAME 审中-公开
标题翻译：太阳能电池模块及其制造方法
公开(公告)号：US20140014182A1
公开(公告)日：2014-01-16
申请号：US14008919
申请日：2012-05-31
申请人： Tomoyoshi Furihata , Atsuo Ito , Hyung-Bae Kim , Minoru Igarashi , Masakatsu Hotta , Tsutomu Nakamura
发明人： Tomoyoshi Furihata , Atsuo Ito , Hyung-Bae Kim , Minoru Igarashi , Masakatsu Hotta , Tsutomu Nakamura
IPC分类号： H01L31/048 , H01L31/18 , H01L31/052
CPC分类号： H01L31/0481 , B32B17/10036 , B32B17/10091 , B32B17/10302 , B32B17/10798 , B32B2307/302 , B32B2307/412 , B32B2307/558 , B32B2307/704 , B32B2307/712 , B32B2457/00 , H01L31/0488 , H01L31/052 , H01L31/0543 , H01L31/0547 , Y02B10/12 , Y02E10/52
摘要： The present invention relates to a solar cell module which is characterized in that: a light-transmitting elastomer member and a solar cell element are arranged in a space between a panel of a transparent member upon which sunlight is incident and a panel of a thermally conductive member which is arranged on the side opposite to the sunlight incidence side in such a manner that the light-transmitting elastomer member is closer to the sunlight incidence side; and the solar cell element is pressed by the light-transmitting elastomer member toward the panel of a thermally conductive member so that the solar cell element is compression bonded thereto. This solar cell module is most suitable as a solar cell module that has excellent heat dissipation of a cell, the temperature of which is increased due to sunlight or a hot spot, and a structure that suppresses the production cost.
摘要翻译：太阳能电池模块技术领域本发明涉及一种太阳能电池模块，其特征在于：透光性弹性体部件和太阳能电池元件配置在入射了太阳光的透明部件的面板和导热性板构件，其布置在与太阳光入射侧相对的一侧，使得透光弹性体构件更靠近太阳光入射侧; 并且太阳能电池元件被透光弹性体部件压向导热部件的面板，使得太阳能电池元件被压接在其上。该太阳能电池模块最适合作为太阳能电池模块，其具有由于阳光或热点而导致温度升高的电池的良好散热性，以及抑制生产成本的结构。

25. 发明申请

US20120165451A1 SILICONE RUBBER COMPOSITION FOR OPTICAL SHEET, AND OPTICAL SHEET 失效
标题翻译：硅胶硅橡胶组合物和光学片
公开(公告)号：US20120165451A1
公开(公告)日：2012-06-28
申请号：US13338396
申请日：2011-12-28
申请人： Minoru Igarashi , Tsutomu Nakamura , Atsuo Ito , Tomoyoshi Furihata , Hyung-Bae Kim
发明人： Minoru Igarashi , Tsutomu Nakamura , Atsuo Ito , Tomoyoshi Furihata , Hyung-Bae Kim
IPC分类号： C08K5/54 , C08K3/36
CPC分类号： C08K3/36 , C08K5/5419 , C08K9/06 , Y02E10/52 , Y10T428/31663 , C08L83/04
摘要： Disclosed is a minable type silicone rubber composition including as an essential components:(A) 100 parts by weight of an organopolysiloxane represented by the following average compositional formula (I) and having a polymerization degree of at least 100; R1aSiO(4-a)/2 (I) wherein R1 are, identical or different, unsubstituted or substituted monovalent hydrocarbon groups, and a is a positive number of 1.95 to 2.05;(B) 70 to 150 parts by weight of fumed silica having a specific surface area of more than 200 m2/g;(C) 0.1 to 30 parts by weight of an organohydrogenpolysiloxane having at least two hydrogen atoms bonded to silicon atoms in one molecule; and(D) 0.1 to 10 parts by weight of a hydrosilylation reaction catalyst.
摘要翻译：公开了一种包含作为必要成分的微型硅橡胶组合物：（A）100重量份由以下平均组成式（I）表示的聚合度为至少100的有机聚硅氧烷; R1aSiO（4-a）/ 2（I）其中R1是相同或不同的未取代或取代的一价烃基，a是1.95〜2.05的正数; （B）70〜150重量份比表面积大于200m 2 / g的热解法二氧化硅; （C）0.1〜30重量份在1分子中具有与硅原子键合的氢原子中的至少2个氢原子的有机氢聚硅氧烷; 和（D）0.1〜10重量份的氢化硅烷化反应催化剂。

26. 发明授权

US06582767B1 Metal pattern forming method 失效
标题翻译：金属图案形成方法
公开(公告)号：US06582767B1
公开(公告)日：2003-06-24
申请号：US09702852
申请日：2000-11-01
申请人： Motoo Fukushima , Eiichi Tabei , Tomoyoshi Furihata , Masaya Arakawa
发明人： Motoo Fukushima , Eiichi Tabei , Tomoyoshi Furihata , Masaya Arakawa
IPC分类号： B05D310
CPC分类号： B82Y30/00 , C23C18/1605 , H01L21/288 , H01L21/32051 , H01L21/76838 , H05K3/182
摘要： A method for forming a metal pattern by the micro-stamping process involves the steps of treating a substrate bearing a thin film of a reducing silicon polymer with a solution containing a salt of a metal having a standard oxidation-reduction potential of at least 0.54 volt, allowing metal colloid to deposit on the substrate surface, stamping a pattern of an alkane thiol to the substrate surface for transferring the pattern to the metal colloid-bearing silicon polymer thin film, and effecting electroless metal plating for forming a metal pattern only on the region of the silicon polymer thin film which is not covered with the alkane thiol pattern. The finely defined metal pattern can be formed on any type of substrate though inexpensive simple steps and has good adhesion to the substrate.
摘要翻译：通过微冲压法形成金属图案的方法包括以下步骤：用含有至少0.54伏特的标准氧化还原电位的金属盐的溶液处理含有还原硅聚合物薄膜的基片，允许金属胶体沉积在基材表面上，将烷烃硫醇的图案压印到基材表面上，以将图案转移到含金属胶体的硅聚合物薄膜上，并进行化学镀金以仅形成金属图案未被烷烃硫醇图案覆盖的硅聚合物薄膜的区域。精细限定的金属图案可以通过廉价的简单步骤形成在任何类型的基底上，并且对基底具有良好的粘合性。

27. 发明授权

US5942367A Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 失效
公开(公告)号：US5942367A
公开(公告)日：1999-08-24
申请号：US839107
申请日：1997-04-23
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： C08F8/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , C08F8/00 , G03F7/0045 , C08F2810/20 , C08F2810/30 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

28. 发明授权

US5314931A Resist compositions 失效
标题翻译：抗蚀剂组合物
公开(公告)号：US5314931A
公开(公告)日：1994-05-24
申请号：US889370
申请日：1992-05-28
申请人： Motoyuki Yamada , Tomoyoshi Furihata , Osamu Watanabe , Fujio Yagihashi
发明人： Motoyuki Yamada , Tomoyoshi Furihata , Osamu Watanabe , Fujio Yagihashi
IPC分类号： C08F12/00 , C08F12/22 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , C08J3/28 , C08F8/00 , C08F120/10 , C08L33/06
CPC分类号： C08F12/22 , G03F7/039
摘要： A resist based on a living polymer is provided. Living anionic polymerization of p-alkoxycarbonylstyrene monomers results in polymers having a molecular weight distribution (Mw/Mn) of from 1 to 1.4.
摘要翻译：提供了基于活性聚合物的抗蚀剂。对 - 烷氧基羰基苯乙烯单体的活性阴离子聚合导致分子量分布（Mw / Mn）为1至1.4的聚合物。

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