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    • 23. 发明申请
    • STEERING APPARATUS
    • 转向装置
    • US20080121457A1
    • 2008-05-29
    • US11945683
    • 2007-11-27
    • Masaaki HashimotoMasahiko HiroseYoshihide OharaTakahiro Tanaka
    • Masaaki HashimotoMasahiko HiroseYoshihide OharaTakahiro Tanaka
    • B62D5/04
    • B62D3/12Y10T74/18976Y10T74/1967
    • A steering apparatus includes an attaching bracket connecting end portions of a pair of tie rods to a rack shaft. The attaching bracket includes a base which is fixed to the rack shaft and includes at least one fixing member inserting hole through which a fixing member fixing the attaching bracket to the rack shaft is provided, and a supporting stay supporting the end portions of the pair of tie rods via ball joints respectively. The supporting stay extends from an intermediate portion of the base in an axial direction of the rack shaft. A center of the ball joint supporting the end portion of each of the tie rods is positioned offset from an axial line of the fixing member by a predetermined distance when viewed along the axial direction of the rack shaft.
    • 转向装置包括将一对拉杆的端部连接到齿条轴的安装支架。 所述安装支架包括固定到所述齿条轴的基座,并且包括至少一个固定构件插入孔,所述至少一个固定构件插入孔将固定所述安装托架的固定构件设置在所述齿条轴上;支撑撑条,其支撑所述一对 通过球接头分别连接杆。 支撑撑条从齿条轴的轴向的基部的中间部延伸。 当沿着齿条轴的轴向观察时,支撑每个拉杆的端部的球形接头的中心定位成从固定构件的轴线偏离预定距离。
    • 28. 发明授权
    • Method of forming a decorative metallic nitride coating
    • 形成装饰性金属氮化物涂层的方法
    • US4420498A
    • 1983-12-13
    • US390904
    • 1982-06-22
    • Masahiko HiroseTsuyoshi YasuiYoshiharu OchiMasatoshi Nakagawa
    • Masahiko HiroseTsuyoshi YasuiYoshiharu OchiMasatoshi Nakagawa
    • C23C16/50C23C16/34C23C16/503C23C13/04
    • C23C16/503C23C16/34
    • There is disclosed a method for forming a decorative metallic nitride coating on the surface of a substrate comprising the steps of disposing said substrate to be coated as a cathode in a material gas atmosphere at a pressure of 0.1 to 10 Torr, with said substrate maintained at a temperature of 200.degree. to 1000.degree. C., and applying a voltage of 200 to 8000 V to said substrate to prepare a direct current glow discharge space in the vicinity of said substrate, the improvement which comprises using as said material gas a mixed gas of a halide of titanium, zirconium or hafnium; hydrogen; and nitrogen, and controlling the current density of the electric current flowing through said substrate to be within the range of 0.01 to 1 mA/cm.sup.2.The method according to the present invention provides a uniform and beautiful metallic nitride coating which has a metallic luster stable with time, is excellent in mar resistance, and is suitable for decoration. Further, according to the method of this invention, a decorative metallic nitride coating capable of varying a tone on a metallic luster surface over a wide range can be formed.
    • 公开了一种在衬底表面上形成装饰性金属氮化物涂层的方法,包括以下步骤:将所述待涂覆的衬底作为阴极设置在材料气体气氛中,压力为0.1至10托,其中所述衬底保持在 温度为200〜1000℃,向所述基板施加200〜8000V的电压,在所述基板的附近配置直流辉光放电空间,其特征在于,使用作为所述原料气体的混合气体 的钛,锆或铪的卤化物; 氢; 和氮气,并且将流过所述基板的电流的电流密度控制在0.01至1mA / cm 2的范围内。 根据本发明的方法提供了一种均匀且美观的金属氮化物涂层,其具有随时间稳定的金属光泽,耐擦伤性优异,并且适于装饰。 此外,根据本发明的方法,可以形成能够在宽范围内改变金属光泽表面上的色调的装饰性金属氮化物涂层。
    • 29. 发明授权
    • Apparatus for forming organic polymer thin films utilizing microwave
induced plasmas
    • 利用微波诱导等离子体形成有机聚合物薄膜的装置
    • US4365587A
    • 1982-12-28
    • US191242
    • 1980-03-24
    • Masahiko HiroseYoshimi Akai
    • Masahiko HiroseYoshimi Akai
    • C08F2/00B01J19/12C08F2/46C08F2/52C08F2/54C08J7/00
    • C08F2/52B01J19/126B01J2219/0894
    • An apparatus for forming a thin organic film on a substrate which includes a reaction chamber for receiving a substrate on which a thin organic film is to be formed; a microwave discharge tube for supplying the reaction chamber with a carrier gas activated by microwave discharge; a microwave-generating mechanism provided with a hollow resonator for a microwave discharge; and a mechanism for supplying a carrier gas to the microwave discharge tube and a mechanism for supplying the reaction chamber with an organic compound monomer to be polymerized. That region of the microwave discharge tube where a plasma is produced by discharge does not extend to the reaction chamber, but is completely separated therefrom.
    • PCT No.PCT / JP79 / 00193 Sec。 371日期1980年3月24日 102(e)1980年3月24日PCT PCT。1979年7月25日PCT公布。 出版物WO80 / 日本1980年3月6日。一种用于在基板上形成薄有机膜的设备,其包括用于接收要在其上形成有机薄膜的基板的反应室; 微波放电管,用于向反应室供应由微波放电激活的载气; 微波发生机构,其设置有用于微波放电的中空谐振器; 以及用于向微波放电管提供载气的机构以及用于向反应室供给待聚合的有机化合物单体的机构。 通过放电产生等离子体的微波放电管的区域不延伸到反应室,而是完全分离。